JP2015518270A5 - - Google Patents

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Publication number
JP2015518270A5
JP2015518270A5 JP2015501697A JP2015501697A JP2015518270A5 JP 2015518270 A5 JP2015518270 A5 JP 2015518270A5 JP 2015501697 A JP2015501697 A JP 2015501697A JP 2015501697 A JP2015501697 A JP 2015501697A JP 2015518270 A5 JP2015518270 A5 JP 2015518270A5
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JP
Japan
Prior art keywords
layer
substrate
support
release layer
laminate
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Granted
Application number
JP2015501697A
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English (en)
Japanese (ja)
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JP2015518270A (ja
JP6268158B2 (ja
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Priority claimed from PCT/US2013/029314 external-priority patent/WO2013142054A1/en
Publication of JP2015518270A publication Critical patent/JP2015518270A/ja
Publication of JP2015518270A5 publication Critical patent/JP2015518270A5/ja
Application granted granted Critical
Publication of JP6268158B2 publication Critical patent/JP6268158B2/ja
Active legal-status Critical Current
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JP2015501697A 2012-03-20 2013-03-06 一時的基板支持体及び支持体分離のための積層体、方法、並びに材料 Active JP6268158B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261613062P 2012-03-20 2012-03-20
US61/613,062 2012-03-20
PCT/US2013/029314 WO2013142054A1 (en) 2012-03-20 2013-03-06 Laminate body, method, and materials for temporary substrate support and support separation

Publications (3)

Publication Number Publication Date
JP2015518270A JP2015518270A (ja) 2015-06-25
JP2015518270A5 true JP2015518270A5 (cg-RX-API-DMAC10.html) 2016-03-31
JP6268158B2 JP6268158B2 (ja) 2018-01-24

Family

ID=49223167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015501697A Active JP6268158B2 (ja) 2012-03-20 2013-03-06 一時的基板支持体及び支持体分離のための積層体、方法、並びに材料

Country Status (6)

Country Link
US (1) US20150034238A1 (cg-RX-API-DMAC10.html)
EP (1) EP2828883B1 (cg-RX-API-DMAC10.html)
JP (1) JP6268158B2 (cg-RX-API-DMAC10.html)
KR (1) KR102063559B1 (cg-RX-API-DMAC10.html)
TW (1) TW201345729A (cg-RX-API-DMAC10.html)
WO (1) WO2013142054A1 (cg-RX-API-DMAC10.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015513211A (ja) * 2012-01-30 2015-04-30 スリーエム イノベイティブ プロパティズ カンパニー 一時的な基板支持のための装置、複合積層体、方法、及び材料
US9269623B2 (en) 2012-10-25 2016-02-23 Rohm And Haas Electronic Materials Llc Ephemeral bonding
US9315696B2 (en) * 2013-10-31 2016-04-19 Dow Global Technologies Llc Ephemeral bonding
JP6299290B2 (ja) * 2014-03-07 2018-03-28 富士通株式会社 回路基板の製造方法
JP6193813B2 (ja) * 2014-06-10 2017-09-06 信越化学工業株式会社 ウエハ加工用仮接着材料、ウエハ加工体及びこれらを使用する薄型ウエハの製造方法
TWI692517B (zh) * 2015-09-30 2020-05-01 日商富士軟片股份有限公司 暫時接著劑、積層體、積層體的製造方法、元件基板的製造方法及半導體元件的製造方法
WO2018143014A1 (ja) * 2017-02-02 2018-08-09 日立化成株式会社 電子部品の製造方法、仮保護用樹脂組成物及び仮保護用樹脂フィルム
CN111051256A (zh) * 2017-07-31 2020-04-21 康宁股份有限公司 具有非玻璃芯体和玻璃包封物的层压制品及其方法
WO2019049588A1 (en) 2017-09-07 2019-03-14 Mapper Lithography Ip B.V. METHODS AND SYSTEMS FOR COATING A SUBSTRATE
WO2019116188A1 (en) * 2017-12-12 2019-06-20 3M Innovative Properties Company Composite film, protective cover for an electronic device, and methods of making the same
KR102455146B1 (ko) * 2020-02-10 2022-10-17 주식회사 나노인 기판의 구조충진을 위한 가역적 코팅 방법 및 봉지 방법
JP2021168365A (ja) * 2020-04-13 2021-10-21 株式会社ディスコ 板状物の加工方法
WO2026009830A1 (ja) * 2024-07-03 2026-01-08 日産化学株式会社 剥離剤組成物、積層体、及び加工された半導体基板の製造方法

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US4348454A (en) * 1981-03-02 1982-09-07 General Electric Company Ultraviolet light curable acrylic functional silicone compositions
EP0298448B1 (en) * 1987-07-08 1994-06-29 The Furukawa Electric Co., Ltd. Radiation-curable adhesive tape
JP2661950B2 (ja) * 1988-03-31 1997-10-08 古河電気工業株式会社 半導体ウエハ固定用放射線硬化性粘着テープ
WO1992016590A1 (en) * 1991-03-20 1992-10-01 Minnesota Mining And Manufacturing Company Radiation curable vinyl/silicone release coating
JP3325650B2 (ja) 1993-04-15 2002-09-17 株式会社ディスコ ウェーハの研磨方法
JPH11283279A (ja) 1998-01-30 1999-10-15 Minnesota Mining & Mfg Co <3M> 貼り合わせ型光ディスク並びにその製造方法及び装置
AU773274B2 (en) * 2000-02-22 2004-05-20 Minova International Limited Treatment of rock surfaces
US6420480B1 (en) * 2000-05-05 2002-07-16 3M Innovative Properties Company Waterborne silicone acrylate latex polymers for release
JP4565804B2 (ja) * 2002-06-03 2010-10-20 スリーエム イノベイティブ プロパティズ カンパニー 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置
US7534498B2 (en) 2002-06-03 2009-05-19 3M Innovative Properties Company Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body
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US9263314B2 (en) * 2010-08-06 2016-02-16 Brewer Science Inc. Multiple bonding layers for thin-wafer handling

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