JP2015513223A5 - - Google Patents
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- Publication number
- JP2015513223A5 JP2015513223A5 JP2015502109A JP2015502109A JP2015513223A5 JP 2015513223 A5 JP2015513223 A5 JP 2015513223A5 JP 2015502109 A JP2015502109 A JP 2015502109A JP 2015502109 A JP2015502109 A JP 2015502109A JP 2015513223 A5 JP2015513223 A5 JP 2015513223A5
- Authority
- JP
- Japan
- Prior art keywords
- objective
- laser beam
- optical element
- pulsed laser
- focus spot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2012/055621 WO2013143594A1 (en) | 2012-03-29 | 2012-03-29 | Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015513223A JP2015513223A (ja) | 2015-04-30 |
| JP2015513223A5 true JP2015513223A5 (enExample) | 2016-02-25 |
| JP6049043B2 JP6049043B2 (ja) | 2016-12-21 |
Family
ID=45894483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015502109A Expired - Fee Related JP6049043B2 (ja) | 2012-03-29 | 2012-03-29 | マイクロリソグラフィ投影露光系のチャネルの欠陥を補償するための装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9632413B2 (enExample) |
| JP (1) | JP6049043B2 (enExample) |
| KR (1) | KR101968796B1 (enExample) |
| CN (1) | CN104220931B (enExample) |
| TW (1) | TWI603157B (enExample) |
| WO (1) | WO2013143594A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012205045A1 (de) | 2012-03-29 | 2013-10-02 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012206287A1 (de) | 2012-04-17 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102013201133A1 (de) | 2013-01-24 | 2014-07-24 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| CN106933060B (zh) * | 2015-12-30 | 2018-10-16 | 上海微电子装备（集团）股份有限公司 | 一种棱镜旋转调节机构和光刻机曝光系统及光刻机 |
| CN112639612B (zh) | 2018-07-17 | 2024-12-06 | 卡尔蔡司Sms有限公司 | 决定要引入光刻掩模的基板的一个或多个像素的效应的方法和设备 |
| DE102019201497B3 (de) * | 2019-02-06 | 2020-06-18 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zum Bestimmen von Platzierungen von Pattern-Elementen einer reflektiven fotolithographischen Maske in deren Betriebsumgebung |
| FR3098710B1 (fr) * | 2019-07-19 | 2021-12-31 | Keranova | Appareil de decoupe a coupleur optique incluant un correcteur de polarisation |
| US11366382B2 (en) * | 2020-02-24 | 2022-06-21 | Carl Zeiss Smt Gmbh | Method and apparatus for performing an aerial image simulation of a photolithographic mask |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19535392A1 (de) | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
| JP2000331927A (ja) * | 1999-03-12 | 2000-11-30 | Canon Inc | 投影光学系及びそれを用いた投影露光装置 |
| US20050094268A1 (en) * | 2002-03-14 | 2005-05-05 | Carl Zeiss Smt Ag | Optical system with birefringent optical elements |
| US20040108167A1 (en) | 2002-12-05 | 2004-06-10 | Elliott Christopher M. | Variable resistance control of a gear train oil pump |
| EP1467253A1 (en) * | 2003-04-07 | 2004-10-13 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7911584B2 (en) * | 2003-07-30 | 2011-03-22 | Carl Zeiss Smt Gmbh | Illumination system for microlithography |
| EP1668421A2 (en) | 2003-09-12 | 2006-06-14 | Carl Zeiss SMT AG | Illumination system for a microlithography projection exposure installation |
| ATE396428T1 (de) | 2003-09-26 | 2008-06-15 | Zeiss Carl Smt Ag | Belichtungsverfahren sowie projektions- belichtungssystem zur ausführung des verfahrens |
| US7408616B2 (en) | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| EP1716457B9 (en) * | 2004-01-16 | 2012-04-04 | Carl Zeiss SMT GmbH | Projection system with a polarization-modulating element having a variable thickness profile |
| CN101078812B (zh) * | 2004-02-06 | 2013-11-27 | 株式会社尼康 | 偏光变换元件、光学照明装置、曝光装置以及曝光方法 |
| DE102004011733A1 (de) | 2004-03-04 | 2005-09-22 | Carl Zeiss Smt Ag | Transmissionsfiltervorrichtung |
| JP2006173305A (ja) * | 2004-12-15 | 2006-06-29 | Canon Inc | 露光装置及び方法、並びに、デバイス製造方法 |
| US7345740B2 (en) * | 2004-12-28 | 2008-03-18 | Asml Netherlands B.V. | Polarized radiation in lithographic apparatus and device manufacturing method |
| TWI453795B (zh) | 2005-01-21 | 2014-09-21 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| WO2007096250A1 (de) * | 2006-02-21 | 2007-08-30 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage |
| DE102006032810A1 (de) | 2006-07-14 | 2008-01-17 | Carl Zeiss Smt Ag | Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement |
| DE102006038643B4 (de) | 2006-08-17 | 2009-06-10 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102008003916A1 (de) | 2007-01-23 | 2008-07-24 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit Messvorrichtung sowie Verfahren zum Messen einer Bestrahlungsstärkeverteilung |
| DE102007043958B4 (de) * | 2007-09-14 | 2011-08-25 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102008054582A1 (de) * | 2007-12-21 | 2009-07-09 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| DE102008009601A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| WO2009152867A1 (en) * | 2008-06-20 | 2009-12-23 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
| JP2010016317A (ja) * | 2008-07-07 | 2010-01-21 | Canon Inc | 露光装置及びデバイス製造方法 |
| EP2369413B1 (en) * | 2010-03-22 | 2021-04-07 | ASML Netherlands BV | Illumination system and lithographic apparatus |
-
2012
- 2012-03-29 KR KR1020147027710A patent/KR101968796B1/ko not_active Expired - Fee Related
- 2012-03-29 WO PCT/EP2012/055621 patent/WO2013143594A1/en not_active Ceased
- 2012-03-29 JP JP2015502109A patent/JP6049043B2/ja not_active Expired - Fee Related
- 2012-03-29 CN CN201280071975.2A patent/CN104220931B/zh active Active
-
2013
- 2013-03-29 TW TW102111377A patent/TWI603157B/zh not_active IP Right Cessation
-
2014
- 2014-08-22 US US14/466,053 patent/US9632413B2/en active Active
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