JP2014154616A5 - - Google Patents

Download PDF

Info

Publication number
JP2014154616A5
JP2014154616A5 JP2013021074A JP2013021074A JP2014154616A5 JP 2014154616 A5 JP2014154616 A5 JP 2014154616A5 JP 2013021074 A JP2013021074 A JP 2013021074A JP 2013021074 A JP2013021074 A JP 2013021074A JP 2014154616 A5 JP2014154616 A5 JP 2014154616A5
Authority
JP
Japan
Prior art keywords
chamber
heat shield
target material
ultraviolet light
extreme ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013021074A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014154616A (ja
JP6189041B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2013021074A priority Critical patent/JP6189041B2/ja
Priority claimed from JP2013021074A external-priority patent/JP6189041B2/ja
Priority to US14/173,677 priority patent/US9040943B2/en
Publication of JP2014154616A publication Critical patent/JP2014154616A/ja
Publication of JP2014154616A5 publication Critical patent/JP2014154616A5/ja
Application granted granted Critical
Publication of JP6189041B2 publication Critical patent/JP6189041B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013021074A 2013-02-06 2013-02-06 チャンバ及び極端紫外光生成装置 Active JP6189041B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013021074A JP6189041B2 (ja) 2013-02-06 2013-02-06 チャンバ及び極端紫外光生成装置
US14/173,677 US9040943B2 (en) 2013-02-06 2014-02-05 Chamber and extreme ultraviolet light generation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013021074A JP6189041B2 (ja) 2013-02-06 2013-02-06 チャンバ及び極端紫外光生成装置

Publications (3)

Publication Number Publication Date
JP2014154616A JP2014154616A (ja) 2014-08-25
JP2014154616A5 true JP2014154616A5 (enExample) 2016-02-25
JP6189041B2 JP6189041B2 (ja) 2017-08-30

Family

ID=51258516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013021074A Active JP6189041B2 (ja) 2013-02-06 2013-02-06 チャンバ及び極端紫外光生成装置

Country Status (2)

Country Link
US (1) US9040943B2 (enExample)
JP (1) JP6189041B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017017834A1 (ja) * 2015-07-30 2017-02-02 ギガフォトン株式会社 極端紫外光生成装置
WO2018179417A1 (ja) 2017-03-31 2018-10-04 ギガフォトン株式会社 極端紫外光生成装置
CN107894692B (zh) * 2017-11-20 2019-11-12 张家港奇点光电科技有限公司 一种改进型的曝光机灯管冷却装置
WO2019146064A1 (ja) * 2018-01-26 2019-08-01 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法
US10791616B1 (en) * 2019-03-27 2020-09-29 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source apparatus
JP7368984B2 (ja) * 2019-09-05 2023-10-25 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
IL293935B2 (en) * 2019-12-23 2025-02-01 Asml Netherlands Bv Flow ring collector
JP7467174B2 (ja) * 2020-03-16 2024-04-15 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置、及び電子デバイスの製造方法
JP7389691B2 (ja) 2020-03-18 2023-11-30 ギガフォトン株式会社 極端紫外光生成装置、極端紫外光生成システム、及び電子デバイスの製造方法
JP7553296B2 (ja) * 2020-09-16 2024-09-18 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
DE102024105046A1 (de) * 2024-02-22 2025-08-28 TRUMPF Lasersystems for Semiconductor Manufacturing SE Vorrichtung zum Fokussieren von Laserstrahlung und Lithographiesystem
EP4628961A1 (en) * 2024-04-05 2025-10-08 TRUMPF Lasersystems for Semiconductor Manufacturing SE Beam guiding device for guiding laser radiation and lithography system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4320999B2 (ja) 2002-02-04 2009-08-26 株式会社ニコン Ｘ線発生装置及び露光装置
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
US6992306B2 (en) * 2003-04-15 2006-01-31 Canon Kabushiki Kaisha Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method
EP1779089A4 (en) * 2004-07-28 2010-03-24 Univ Community College Sys Nev ELECTRODE-FREE EXTREME UV DISCHARGE LIGHT SOURCE
JP5034362B2 (ja) * 2006-08-08 2012-09-26 ウシオ電機株式会社 極端紫外光光源装置
JP2010078921A (ja) * 2008-09-26 2010-04-08 Nikon Corp マスク及び露光方法並びにデバイス製造方法
JP5758750B2 (ja) 2010-10-29 2015-08-05 ギガフォトン株式会社 極端紫外光生成システム
US8746975B2 (en) * 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
JP5535108B2 (ja) * 2011-02-18 2014-07-02 ギガフォトン株式会社 極端紫外光源装置

Similar Documents

Publication Publication Date Title
JP2014154616A5 (enExample)
JP6189041B2 (ja) チャンバ及び極端紫外光生成装置
JP2008537162A5 (enExample)
JP2017510823A5 (enExample)
JP2015153889A5 (enExample)
BRPI0914472A2 (pt) dispositivo gerador integrado para produção de energia a partir de fontes alternativas renováveis de emissão zero, respeitando e preservando o meio ambiente.
RU2016125134A (ru) Световое устройство с гибкой оболочкой
ATE554336T1 (de) Lichtemittierende vorrichtung
WO2014049056A3 (de) Faseroptisches konversionsmodul
RU2015152239A (ru) Осветительное устройство
JP2017168252A5 (enExample)
JP2015513223A5 (enExample)
BR112015032100A2 (pt) processo de geração de germânio
RU2015139691A (ru) Устройство генерации лазерного излучения
JP2018169379A5 (enExample)
WO2018093097A3 (ko) 의료용 광역학 치료 장치
BR112016000088A2 (pt) atomizador-haste acústico pneumático
WO2015019187A3 (en) System and method for return beam metrology with optical switch
EA201791135A1 (ru) Осветительное устройство
WO2015075551A3 (en) System and method for correcting the focus of a laser beam
EP2568216A3 (en) Luminaire
MX2021003755A (es) Nanoestructuras de carbono novedosas para aplicaciones de generacion de energia.
ATE535043T1 (de) Abstimmbares diodenlasersystem mit externem resonator
JP5809933B2 (ja) 光源装置
WO2016116304A3 (de) Parabolrinnenkollektormodul, parabolrinnenkollektormoduleinheit sowie solarthermisches kraftwerk