JP2015513223A5 - - Google Patents

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JP2015513223A5
JP2015513223A5 JP2015502109A JP2015502109A JP2015513223A5 JP 2015513223 A5 JP2015513223 A5 JP 2015513223A5 JP 2015502109 A JP2015502109 A JP 2015502109A JP 2015502109 A JP2015502109 A JP 2015502109A JP 2015513223 A5 JP2015513223 A5 JP 2015513223A5
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JP
Japan
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objective
laser beam
optical element
pulsed laser
focus spot
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JP2015502109A
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JP6049043B2 (ja
JP2015513223A (ja
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Priority claimed from PCT/EP2012/055621 external-priority patent/WO2013143594A1/en
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Publication of JP2015513223A5 publication Critical patent/JP2015513223A5/ja
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ステアリングミラー又はステアリング系４９０は、パルスレーザビーム４３５を集束対物系４４０内に向ける。対物系４４０は、パルスレーザビーム４３５を光学要素４１０内に集束させる。適用される対物系４４０のＮＡ（開口数）は、光学要素４１０の材料内での予め決められたフォーカススポットサイズ及びフォーカス位置に依存する。表１に示すように、対物系４４０のＮＡは、０．９までとすることができ、この値は、実質的に１μｍのフォーカススポット直径、及び実質的に１０ 20 Ｗ／ｃｍ 2 の最大強度をもたらす。
JP2015502109A 2012-03-29 2012-03-29 マイクロリソグラフィ投影露光系のチャネルの欠陥を補償するための装置及び方法 Active JP6049043B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2012/055621 WO2013143594A1 (en) 2012-03-29 2012-03-29 Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system

Publications (3)

Publication Number Publication Date
JP2015513223A JP2015513223A (ja) 2015-04-30
JP2015513223A5 true JP2015513223A5 (ja) 2016-02-25
JP6049043B2 JP6049043B2 (ja) 2016-12-21

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ID=45894483

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JP2015502109A Active JP6049043B2 (ja) 2012-03-29 2012-03-29 マイクロリソグラフィ投影露光系のチャネルの欠陥を補償するための装置及び方法

Country Status (6)

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US (1) US9632413B2 (ja)
JP (1) JP6049043B2 (ja)
KR (1) KR101968796B1 (ja)
CN (1) CN104220931B (ja)
TW (1) TWI603157B (ja)
WO (1) WO2013143594A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012205045A1 (de) 2012-03-29 2013-10-02 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206287A1 (de) * 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102013201133A1 (de) 2013-01-24 2014-07-24 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
CN106933060B (zh) * 2015-12-30 2018-10-16 上海微电子装备（集团）股份有限公司 一种棱镜旋转调节机构和光刻机曝光系统及光刻机
JP2021531502A (ja) 2018-07-17 2021-11-18 カール ツァイス エスエムエス リミテッド フォトリソグラフィマスクの基板に導入される１つまたは複数のピクセルの効果を決定するための方法および装置
DE102019201497B3 (de) * 2019-02-06 2020-06-18 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Bestimmen von Platzierungen von Pattern-Elementen einer reflektiven fotolithographischen Maske in deren Betriebsumgebung
FR3098710B1 (fr) * 2019-07-19 2021-12-31 Keranova Appareil de decoupe a coupleur optique incluant un correcteur de polarisation
US11366382B2 (en) * 2020-02-24 2022-06-21 Carl Zeiss Smt Gmbh Method and apparatus for performing an aerial image simulation of a photolithographic mask

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US20040108167A1 (en) 2002-12-05 2004-06-10 Elliott Christopher M. Variable resistance control of a gear train oil pump
EP1467253A1 (en) * 2003-04-07 2004-10-13 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7911584B2 (en) * 2003-07-30 2011-03-22 Carl Zeiss Smt Gmbh Illumination system for microlithography
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
AU2003304487A1 (en) 2003-09-26 2005-04-14 Carl Zeiss Smt Ag Microlithographic projection exposure
KR101295439B1 (ko) * 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
CN100409045C (zh) * 2004-02-06 2008-08-06 株式会社尼康 偏光变换元件、光学照明装置、曝光装置以及曝光方法
DE102004011733A1 (de) 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
US7345740B2 (en) * 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
TW200923418A (en) 2005-01-21 2009-06-01 Nikon Corp Exposure device, exposure method, fabricating method of device, exposure system, information collecting device, and measuring device
WO2007096250A1 (de) * 2006-02-21 2007-08-30 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
DE102006038643B4 (de) 2006-08-17 2009-06-10 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102008003916A1 (de) * 2007-01-23 2008-07-24 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit Messvorrichtung sowie Verfahren zum Messen einer Bestrahlungsstärkeverteilung
DE102007043958B4 (de) 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102008054582A1 (de) 2007-12-21 2009-07-09 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
DE102008009601A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
WO2009152867A1 (en) * 2008-06-20 2009-12-23 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
JP2010016317A (ja) * 2008-07-07 2010-01-21 Canon Inc 露光装置及びデバイス製造方法
EP2369413B1 (en) * 2010-03-22 2021-04-07 ASML Netherlands BV Illumination system and lithographic apparatus

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