JP2015511980A5 - - Google Patents

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JP2015511980A5
JP2015511980A5 JP2014559950A JP2014559950A JP2015511980A5 JP 2015511980 A5 JP2015511980 A5 JP 2015511980A5 JP 2014559950 A JP2014559950 A JP 2014559950A JP 2014559950 A JP2014559950 A JP 2014559950A JP 2015511980 A5 JP2015511980 A5 JP 2015511980A5
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JP
Japan
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coating
radical
ito
mixture
colloidal silica
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JP2014559950A
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Japanese (ja)
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JP2015511980A (ja
JP6313228B2 (ja
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Priority claimed from US13/681,791 external-priority patent/US9862842B2/en
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JP2014559950A 2012-02-29 2013-02-27 赤外輻射吸収物品及び製造方法 Active JP6313228B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261604939P 2012-02-29 2012-02-29
US61/604,939 2012-02-29
US13/681,791 US9862842B2 (en) 2012-02-29 2012-11-20 Infrared radiation absorbing articles and method of manufacture
US13/681,791 2012-11-20
PCT/US2013/027840 WO2013130489A1 (en) 2012-02-29 2013-02-27 Infrared radiation absorbing articles and method of manufacture

Related Child Applications (1)

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JP2018002851A Division JP6474501B2 (ja) 2012-02-29 2018-01-11 赤外輻射吸収物品及び製造方法

Publications (3)

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JP2015511980A JP2015511980A (ja) 2015-04-23
JP2015511980A5 true JP2015511980A5 (enExample) 2015-06-11
JP6313228B2 JP6313228B2 (ja) 2018-04-18

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JP2014559950A Active JP6313228B2 (ja) 2012-02-29 2013-02-27 赤外輻射吸収物品及び製造方法
JP2018002851A Active JP6474501B2 (ja) 2012-02-29 2018-01-11 赤外輻射吸収物品及び製造方法

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JP2018002851A Active JP6474501B2 (ja) 2012-02-29 2018-01-11 赤外輻射吸収物品及び製造方法

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US (3) US9862842B2 (enExample)
EP (1) EP2820092A4 (enExample)
JP (2) JP6313228B2 (enExample)
KR (1) KR101896411B1 (enExample)
CN (1) CN104144991B (enExample)
WO (1) WO2013130489A1 (enExample)

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