JP2015507692A - 金属表面の腐食のための活性化剤としてのフェノール化合物の使用 - Google Patents
金属表面の腐食のための活性化剤としてのフェノール化合物の使用 Download PDFInfo
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- JP2015507692A JP2015507692A JP2014547660A JP2014547660A JP2015507692A JP 2015507692 A JP2015507692 A JP 2015507692A JP 2014547660 A JP2014547660 A JP 2014547660A JP 2014547660 A JP2014547660 A JP 2014547660A JP 2015507692 A JP2015507692 A JP 2015507692A
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- 230000003851 biochemical process Effects 0.000 description 1
- QCOAPBRVQHMEPF-UHFFFAOYSA-N bis(2-methylpropyl) butanedioate Chemical compound CC(C)COC(=O)CCC(=O)OCC(C)C QCOAPBRVQHMEPF-UHFFFAOYSA-N 0.000 description 1
- UFWRCRCDRAUAAO-UHFFFAOYSA-N bis(2-methylpropyl) pentanedioate Chemical compound CC(C)COC(=O)CCCC(=O)OCC(C)C UFWRCRCDRAUAAO-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- OUWSNHWQZPEFEX-UHFFFAOYSA-N diethyl glutarate Chemical compound CCOC(=O)CCCC(=O)OCC OUWSNHWQZPEFEX-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 229940031769 diisobutyl adipate Drugs 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- RZZLQHQXWZLBCJ-UHFFFAOYSA-N dimethyl 2-ethylbutanedioate Chemical compound COC(=O)C(CC)CC(=O)OC RZZLQHQXWZLBCJ-UHFFFAOYSA-N 0.000 description 1
- ZWKKRUNHAVNSFW-UHFFFAOYSA-N dimethyl 2-methylpentanedioate Chemical compound COC(=O)CCC(C)C(=O)OC ZWKKRUNHAVNSFW-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940102253 isopropanolamine Drugs 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/12—Light metals
- C23G1/125—Light metals aluminium
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/02—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring monocyclic with no unsaturation outside the aromatic ring
- C07C39/10—Polyhydroxy benzenes; Alkylated derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C65/00—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
- C07C65/01—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups
- C07C65/03—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring
- C07C65/05—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring o-Hydroxy carboxylic acids
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/22—Light metals
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
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- Health & Medical Sciences (AREA)
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- Detergent Compositions (AREA)
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- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Cleaning By Liquid Or Steam (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
[式中、R1、R2およびR4の各々が水素、ヒドロキシル、アルキル、スルホン酸基またはカルボン酸基であり、R3が水素、アルキル、スルホン酸基またはカルボン酸基である]の化合物の使用を提供する。
R1−OOC−A−COO−R2
[式中、
− R1およびR2が、同一または異なっており、C1〜C20アルキル、アリール、アルキアリール、またはアリールアルキル基であり、直鎖または分岐状、環状または非環状であり、
− Aが直鎖または分岐状二価アルキレン基である]のジエステルとして溶媒を含んでもよい。
この式に関して、「アルキル」は、1〜20個の炭素原子および好ましくは1個または2〜10個の炭素原子を有する直鎖または分岐状炭化水素鎖、または3〜8個の炭素原子を含む環状炭化水素基、好ましくはシクロペンチルまたはシクロヘキシル基を意味すると理解される。
− 式−CH(CH3)−CH2−CH2−のAMG、
− 式−CH(C2H5)−CH2−のAES、および
− それらの混合物。
CH3−OOC−CH(CH3)−CH2−CH2−COO−CH3、またはこのような化合物を含むジエステルの混合物である。
− R1−OOC−AMG−COO−R2 (II’)
− R1−OOC−AES−COO−R2 (II’’)、
− 任意選択によりR1−OOC−(CH2)4−COO−R2 (II’’’)、
式中、
− AMGが−CH(CH3)−CH2−CH2−であり、
− AESが−CH(C2H5)−CH2−である。
− 式(II’)のジエステル70〜95重量%
− 式(II’’)のジエステル5〜30重量%、および
− 式(II’’’)のジエステル0〜10重量%を含むことができる。
− ジメチルアジペート9〜17重量%、
− ジメチルグルタレート59〜67重量%、および
− ジメチルスクシネート20〜28重量%を含む混合物である。
[式中、R1およびR2が、同一または異なっており、水素を表わすかまたは少なくともアルキル、アルケニルまたはフェニル基を含む群から選択される基またはラジカルを表わし、nが整数1、2、3、4または5である。好ましくはnが1または2である]のジオキソラン誘導体であってもよい。
化学物質の性能を測定するために行なわれる電気化学試験は、3電極構成に基づいている。化学溶液は、油で加熱されて60℃に熱的に制御された1つのジャケット付き反応器内に置かれる。このような反応器は凝縮器を備えており、一切の蒸気の放出を避ける。
浸漬試験を実施して長い観察によって化学物質の性能を評価し、そこで清浄化溶液中に所定の時間浸漬した後に主に重量減少が記録される。
2,3−DBHA:2,3−ジヒドロキシ安息香酸
PC:カテコール
TBC:4−tert−ブチルカテコール
4−MePC:4−メチル−カテコール
全ての固形分が溶解するまで容器内で成分を一緒に混合して、本明細書において開示された調合物を調製した。
Al試料上の実施例1において調製された一連の調合物を上に記載したように電気化学試験によって評価した。試験の結果を図lおよび以下の表2に示す。
実施例1において調製された調合物を上に記載したように電気化学試験によってCu試料上で評価した。試験の結果を図2および以下の表3に示す。
実施例1において調製された一連の調合物は、上に記載されたように浸漬試験によってAl試料上で試験された。これは重量減少、したがって腐食活性化剤の清浄化性能を特性決定することである。金属試料は、重量減少を測定する前に7日間浸漬された。試験の結果が図3に示され、それはmm/年の厚さの減少として記録される。本発明のフェノール化合物に関して見出されるような厚さの減少速度は金属表面の過度の腐食がなく金属表面の清浄化に良いことに留意すると興味深い。
Claims (16)
- 金属表面の腐食活性化剤として式(1)
[式中、R1、R2およびR4の各々が水素、ヒドロキシル基、アルキル基、スルホン酸基またはカルボン酸基であり、R3が水素、アルキル基、スルホン酸基またはカルボン酸基である]の化合物の使用。 - 式(1)の前記化合物がモノフェノール化合物またはジフェノール化合物である、請求項1に記載の使用。
- 式(1)の前記化合物がカテコール、2,3−ジヒドロキシ安息香酸、4−メチルカテコールまたは4−tert−ブチルカテコールである、請求項1に記載の使用。
- 金属表面の腐食のための調合物の製造において請求項1〜3のいずれか一項に記載の式(1)の化合物の使用。
- 式(1)の前記化合物が金属表面の腐食のための調合物において使用される、請求項1〜3のいずれか一項に記載の使用。
- 式(1)の前記化合物が、前記調合物の約0.1重量%〜約20重量%、好ましくは前記調合物の約1重量%〜約5重量%の量において存在している、請求項4または5に記載の使用。
- 前記調合物が水をさらに含む、請求項5または6に記載の使用。
- 前記調合物が双極性非プロトン溶媒をさらに含む、請求項5〜7のいずれか一項に記載の使用。
- 前記調合物が、水と混和性の有機溶媒をさらに含み、好ましくは前記水と混和性の有機溶媒が、エチレングリコール、プロピレングリコール、ベンジルアルコール、グリセロール、ジプロピレングリコールモノメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールおよびそれらの混合物からなる群から選択され、より好ましくは前記水と混和性の有機溶媒がジエチレングリコールジエチルエーテルである、請求項5〜8のいずれか一項に記載の使用。
- 前記調合物が、式(II):
R1−OOC−A−COO−R2
[式中、
− R1およびR2が、同一または異なっており、C1〜C20アルキル、アリール、アルキアリール、またはアリールアルキル基であり、直鎖または分岐状、環状または非環状であり、
− Aが直鎖または分岐状二価アルキレン基である]のジエステルをさらに含む、請求項5〜7のいずれか一項に記載の使用。 - 前記調合物が、式(III):
[式中、R1およびR2が、同一または異なっており、水素を表わすかまたは少なくともアルキル、アルケニルまたはフェニル基を含む群から選択される基またはラジカルを表わし、nが整数1、2、3、4または5である]のジオキソラン誘導体をさらに含む、請求項5〜7のいずれか一項に記載の使用。 - 前記調合物が、pHを調節するための有機塩基をさらに含み、好ましくは前記有機塩基が、アミンからなる群から選択される、請求項5〜11のいずれか一項に記載の使用。
- 表面腐食によって清浄な金属表面を提供する方法であって、前記金属表面を式(1)
[式中、R1、R2およびR4の各々が水素、ヒドロキシル基、アルキル基、スルホン酸基またはカルボン酸基であり、R3が水素、アルキル基、スルホン酸基またはカルボン酸基である]の金属表面の腐食活性化剤と接触させる工程を含む、方法。 - 式(1)の前記化合物がモノフェノール化合物またはジフェノール化合物である、請求項13に記載の方法。
- 式(1)の前記化合物がカテコール、2,3−ジヒドロキシ安息香酸、4−メチルカテコールまたは4−tert−ブチルカテコールである、請求項13に記載の方法。
- 式(1)の前記化合物が、金属表面の腐食のための調合物の形態において使用される、請求項13〜15のいずれか一項に記載の方法。
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JPS6050182A (ja) * | 1983-08-22 | 1985-03-19 | ダ−ト・インダストリ−ス・インコ−ポレ−テツド | グリコールエーテルを使用する銅または銅合金の溶解 |
JPH02250986A (ja) * | 1989-03-24 | 1990-10-08 | Daiwa Kasei Kenkyusho:Kk | すず及びすず‐鉛合金層の剥離液 |
JPH10251874A (ja) * | 1997-03-13 | 1998-09-22 | Nippon Hyomen Kagaku Kk | チタン化合物皮膜及びジルコニウム化合物皮膜の剥離液 |
JP2000219978A (ja) * | 1999-01-28 | 2000-08-08 | Okuno Chem Ind Co Ltd | アルミニウム箔に微小貫通孔を形成させる方法、該方法のための腐食用液及び微小貫通孔を有するアルミニウム箔 |
JP2002121598A (ja) * | 2000-10-11 | 2002-04-26 | Idm:Kk | 工業用洗浄剤 |
JP2004067846A (ja) * | 2002-08-06 | 2004-03-04 | Nippon Shokubai Co Ltd | 金属表面浸食剤 |
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US7144849B2 (en) | 1993-06-21 | 2006-12-05 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
CN1091161A (zh) | 1994-01-08 | 1994-08-24 | 大连北港表面处理研究所 | 金属表面高效除油除锈剂 |
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US8772214B2 (en) * | 2005-10-14 | 2014-07-08 | Air Products And Chemicals, Inc. | Aqueous cleaning composition for removing residues and method using same |
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US20090291873A1 (en) * | 2008-05-22 | 2009-11-26 | Air Products And Chemicals, Inc. | Method and Composition for Post-CMP Cleaning of Copper Interconnects Comprising Noble Metal Barrier Layers |
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2011
- 2011-12-20 US US14/366,716 patent/US9523154B2/en not_active Expired - Fee Related
- 2011-12-20 JP JP2014547660A patent/JP2015507692A/ja active Pending
- 2011-12-20 CN CN201180076392.4A patent/CN104220643B/zh not_active Expired - Fee Related
- 2011-12-20 WO PCT/CN2011/084301 patent/WO2013091177A1/en active Application Filing
- 2011-12-20 KR KR1020147019748A patent/KR20140107467A/ko active IP Right Grant
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JPS6050182A (ja) * | 1983-08-22 | 1985-03-19 | ダ−ト・インダストリ−ス・インコ−ポレ−テツド | グリコールエーテルを使用する銅または銅合金の溶解 |
JPH02250986A (ja) * | 1989-03-24 | 1990-10-08 | Daiwa Kasei Kenkyusho:Kk | すず及びすず‐鉛合金層の剥離液 |
JPH10251874A (ja) * | 1997-03-13 | 1998-09-22 | Nippon Hyomen Kagaku Kk | チタン化合物皮膜及びジルコニウム化合物皮膜の剥離液 |
JP2000219978A (ja) * | 1999-01-28 | 2000-08-08 | Okuno Chem Ind Co Ltd | アルミニウム箔に微小貫通孔を形成させる方法、該方法のための腐食用液及び微小貫通孔を有するアルミニウム箔 |
JP2002121598A (ja) * | 2000-10-11 | 2002-04-26 | Idm:Kk | 工業用洗浄剤 |
JP2004067846A (ja) * | 2002-08-06 | 2004-03-04 | Nippon Shokubai Co Ltd | 金属表面浸食剤 |
JP2006521464A (ja) * | 2003-03-25 | 2006-09-21 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 銅表面をエッチングするための溶液と銅表面に金属を蒸着させる方法 |
WO2010043796A1 (fr) * | 2008-10-15 | 2010-04-22 | Arkema France | Composition de nettoyage |
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KR20180087186A (ko) * | 2017-01-23 | 2018-08-01 | 버슘머트리얼즈 유에스, 엘엘씨 | 텅스텐 및 gst 막을 위한 에칭 용액 |
KR102219829B1 (ko) * | 2017-01-23 | 2021-02-24 | 버슘머트리얼즈 유에스, 엘엘씨 | 텅스텐 및 gst 막을 위한 에칭 용액 |
Also Published As
Publication number | Publication date |
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WO2013091177A1 (en) | 2013-06-27 |
CN104220643A (zh) | 2014-12-17 |
CN104220643B (zh) | 2016-05-04 |
US20150005219A1 (en) | 2015-01-01 |
US9523154B2 (en) | 2016-12-20 |
KR20140107467A (ko) | 2014-09-04 |
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