JP2015153527A - Manufacturing apparatus for electrode plate for battery - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing apparatus for an electrode plate for a battery that can make uniform the thickness of a coating layer formed on a substrate even when a slurry discharge work is continued for a long time.SOLUTION: A manufacturing apparatus for an electrode plate for a battery is equipped with a die 10 having a first manifold 11 comprising a space which is long in a width direction and stores slurry therein, and a discharge port 18 which is connected to the first manifold 11 through a slit 12 and discharges slurry 3 to a base material 2, and supply means 20 for supplying the slurry 3 from a flow-in portion 16 to the first manifold 11. A second manifold 24 which is long in the width direction is provided between the first manifold 11 and the discharge port 18. Adjusting portions 31 to 34 for adjusting the discharge amount of the slurry 3 from the discharge port 18 by making the slurry 3 flow out or in are provided between the first manifold 11 and the second manifold 24 or to the second manifold 24. Liquid discharging portions 71, 72 for discharging the slurry 3 are provided at both the end portions of the second manifold 24.

Description

  The present invention relates to a manufacturing apparatus for manufacturing a battery electrode plate by applying a slurry containing an active material to a base material.

  For example, as in Patent Document 1, a battery electrode plate is manufactured by applying a slurry containing an active material, a binder, a conductive additive, and a solvent to a substrate that is fed in a roll-to-roll manner. In the battery electrode plate manufactured in this way, the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery. In the case of a battery), the film thickness control of the slurry applied to the substrate is very important. That is, the slurry needs to be applied with a uniform thickness along the width direction and the feeding direction of the substrate.

Japanese Patent Laid-Open No. 11-233102

  As described above, the slurry contains an active material and the like, and the active material and the like are mixed and dispersed, but the characteristics vary depending on the method and composition of the slurry, and the dispersed state continues for a long time. Some slurries and other slurries have solid components that settle or aggregate in a short time.

  A die for applying such slurry to a substrate is formed with a manifold (a liquid reservoir) that is long in the width direction and a slit connected to the manifold, as disclosed in Patent Document 1. The slurry is supplied to the manifold and is discharged from the manifold to the substrate through the slit. The slit is formed with a uniform gap size so that the slurry is discharged in a uniform amount along the width direction of the base material. In the case of the unstable slurry as described above, the discharge operation is continuously performed. If this is done, the solid component of the slurry may precipitate or agglomerate in a part of the manifold, and the solid component may stay.

  Slurry is supplied to the manifold from the inlet formed in the center of the die and spreads throughout the manifold, but as described above, when solid components accumulate in a part of the manifold, it is discharged from the slit across the width direction of the die. Variations occur in the amount of slurry to be produced, and variations occur in the thickness of the coating layer formed on the substrate.

  Here, as described above, since the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery, the thickness of the coating layer varies in the electric state. If an electrode plate is manufactured, the quality of the battery using the electrode plate will be reduced. Therefore, in the past, when there is a variation in the amount of slurry discharged in this way, each time the die is disassembled and cleaned, or the width of the slit is adjusted, the amount discharged again becomes a predetermined amount. However, there are problems that it takes time for the work and the success or failure of the adjustment changes depending on the skill level of the worker.

  The present invention has been made in view of the above problems, and it is possible to make the thickness of the coating film layer formed on the substrate uniform even when the slurry is continuously discharged for a long time. Objective.

  The battery electrode plate manufacturing apparatus of the present invention is connected to the first manifold having a space for storing slurry long in the width direction and the first manifold via a wide slit in the width direction. And a supply means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold. A second manifold that is long in the width direction is provided between the first manifold of the slit and the discharge port, and the first manifold and the second manifold of the slit Or the second manifold has an adjustment section for adjusting the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or into the second manifold. Provided in a plurality across direction, wherein the opposite ends of the second manifold, characterized in that the drainage unit discharging the slurry is further provided.

  According to the present invention, the thickness of the coating layer can be made uniform by maintaining the discharge amount of the slurry from the discharge port at a predetermined amount in the width direction. Specifically, since there are a plurality of adjustment units that allow the slurry to flow out or flow in over the width direction, the amount of slurry flowing to the discharge port over the width direction can be adjusted in each adjustment unit, Further, by providing the adjustment unit in the slit or the second manifold instead of the first manifold, the adjustment in each adjustment unit can be reflected in the discharge amount from the discharge port with high sensitivity. In addition, by providing a second manifold between the first manifold and the discharge port, variations in the flow rate of the slurry generated in the first manifold can be reduced by the adjustment unit, and the flow rate can be reduced by the second manifold. By leveling, the discharge amount of the slurry from the discharge port can be maintained at a predetermined amount in the width direction, and a drainage part for discharging the slurry is provided at both ends of the second manifold. Furthermore, by being provided, it is possible to prevent the slurry from staying at both ends of the second manifold and affecting the shape of the coating layer.

  The drainage unit may be further provided with switching means for switching whether or not to discharge the slurry from the drainage unit.

  In this case, for example, when the maintenance of the die is performed, the slurry is discharged from the drainage part, and when the slurry is applied to the base material, the slurry is not discharged from the drainage part. While preventing the slurry from staying at both ends, it is possible to prevent the discharge amount of the slurry from decreasing at both ends of the discharge port due to the discharge of the slurry from the drainage portion.

  Moreover, the diameter of each said drainage part may be smaller than the diameter of each said adjustment part.

  In this case, since the amount of slurry discharged from the drainage unit can be less than the amount of slurry adjusted by the adjustment unit, the influence of the discharge from the drainage unit is small, while the slurry is being discharged from the drainage unit. However, the adjustment unit can adjust the flow rate of the slurry so that the amount of the slurry discharged from the discharge port is uniform in the width direction.

  Further, it is desirable that the adjustment unit is provided with a control device that controls the amount of slurry flowing out from the slit or flowing into the slit.

  In this case, the amount of slurry discharged from the discharge port can be adjusted by controlling the amount of slurry flowing out from the slit or flowing into the slit through the adjusting unit. For this reason, stricter control for discharging the slurry uniformly from the slit over the entire length in the width direction is possible.

  The second manifold may be smaller in volume than the first manifold.

  In this case, it is possible to control the discharge rate of the slurry with higher sensitivity than providing the adjusting unit in the first manifold.

  According to the present invention, it is possible to make the thickness of the coating layer formed on the substrate uniform even when the slurry is continuously discharged for a long time.

It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries of this invention. It is sectional drawing of arrow a of FIG. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment. (A) is sectional drawing of the arrow b of FIG. 1, (B) is a top view of the shim board 15. FIG. (A) is a top view which shows the modification of a shim board, (B) is sectional drawing explaining the coating-film layer apply | coated with the die | dye using this shim board. It is the example of formation of the coating film layer by the manufacturing apparatus of the electrode plate for batteries of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is an explanatory diagram showing a schematic configuration of a battery electrode plate manufacturing apparatus. The manufacturing apparatus 1 is an apparatus for applying a slurry 3 containing an active material, a binder, a conductive additive and a solvent to a base material 2 made of a metal foil fed by roll-to-roll. According to this manufacturing apparatus, the layer containing an active material is formed on the base material 2 by drying the applied slurry 3, and the base material 2 is cut into a predetermined shape to form a battery electrode plate. Since the thickness of the layer containing the active material formed on the substrate 2 directly affects the charge / discharge amount of the battery, the film thickness of the coating layer formed by the slurry 3 applied to the substrate 2 is controlled. Is very important. According to this manufacturing apparatus 1, the slurry 3 has a uniform thickness (uniform coating amount) along the feed direction of the base material 2, as described in the following embodiment. Applied. In addition, the width direction of the base material 2 is a direction orthogonal to the feed direction of the base material 2, and the Y-axis direction in FIG. 1 corresponds to this.

  The manufacturing apparatus 1 includes a die 10 that is long along the width direction of the substrate 2, and a supply unit 20 that supplies the slurry 3 to the die 10. In the die 10, the longitudinal direction (the Y-axis direction in FIG. 1) is referred to as the width direction. In this manufacturing apparatus 1, the roller 5 facing the die 10 is installed, and the width direction of the die 10 and the direction of the rotation center line of the roller 5 are parallel. The base material 2 is guided by this roller 5, and the space | interval (gap) between the base material 2 and die | dye 10 (tip of the slit 12 mentioned later) is kept constant, and application | coating of the slurry 3 is performed in this state.

  The die 10 of this embodiment includes a first divided body 13 having a first lip 13a having a tapered shape and a second divided body 14 having a second lip 14a having a tapered shape, and a shim plate 15 therebetween. It is composed of a combination of the two. 2 is a cross-sectional view taken along arrow a in FIG. 4A is a cross-sectional view taken along the arrow b in FIG. 1, and the shim plate 15 is shown in FIG. The die 10 is formed therein with a first manifold 11 having a long space in the width direction, and a slit 12 connected to the first manifold 11, and a first lip 13a and a second lip 14a. A discharge port 18 that is an open end of the slit 12 is formed therebetween. That is, the first manifold 11 and the discharge port 18 are connected via the slit 12.

  With this configuration, the slurry 3 supplied by the supply unit 20 is first stored in the first manifold 11 and then discharged from the discharge port 18 via the slit 12.

  The slit 12 is formed long in the width direction similarly to the first manifold 11, and the width direction dimension of the slit 12 is determined by an inner dimension W (see FIG. 4B) of a shim plate 15 to be described later. A slurry 3 having a width direction dimension substantially the same as the width direction dimension of the slit 12 can be applied onto the substrate 2. The clearance dimension (height dimension) of the slit 12 is, for example, 0.4 to 1.5 mm. In the present embodiment, the die 10 is installed in such a posture that the gap direction of the slit 12 is the vertical direction and the width direction is the horizontal direction. That is, the die 10 is installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the horizontal direction. Therefore, the direction in which the slurry 3 stored in the first manifold 11 flows to the base material 2 through the slit 12 and the discharge port 18 is a horizontal direction.

  Note that the pressure (coating pressure) inside the first manifold 11 can be adjusted by changing the thickness of the shim plate 15, and by this adjustment, a uniform film thickness can be obtained with the slurry 3 having various characteristics. It becomes possible to perform coating.

  An inflow portion 16 is provided at the center in the width direction of the die 10, and the inflow portion 16 includes a through hole (inflow port) connected to the first manifold 11 from the outside of the die 10. The supply means 20 supplies the inflow pipe 21 having one end connected to the inflow section 16, the tank 22 storing the slurry 3, and the slurry 3 in the tank 22 to the die 10 through the pipe 21. And a pump 23 for the purpose. As described above, the supply unit 20 can supply the slurry 3 from the inflow portion 16 to the first manifold 11. In the present embodiment, as shown in FIG. 1, the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 is allowed to flow from the bottom portion 17.

  The first manifold 11 can store the slurry 3 supplied from the supply means 20, and the slurry 3 stored in the first manifold 11 passes through the slit 12 from the discharge port 18 to roll-to-roll. The slurry 3 can be discharged onto the base material 2 and the slurry 3 can be continuously applied to the base material 2. The gap dimension of the slit 12 is constant in the width direction, and the thickness of the slurry 3 applied on the substrate 2 is constant in the width direction.

  The die 10 is provided with a pressure sensor (not shown), and this pressure sensor measures the internal pressure of the slurry 3 in the first manifold 11. Then, based on the measurement result, the supply of the slurry 3 by the supply means 20 is controlled, and the internal pressure of the slurry 3 in the first manifold 11 is kept constant. The slurry 3 whose internal pressure is constant in the first manifold 11 is discharged from the slit 12 in an equal amount over the entire length in the width direction, and the slurry 3 discharged from the slit 12 based on the measurement result of the pressure sensor. Is controlled so as not to fluctuate, and the thickness of the slurry 3 applied on the substrate 2 in the feeding direction is made constant. Although not shown, a filter for the slurry 3 is provided in the middle of the pipe 21.

  Here, in the manufacturing apparatus 1 according to the present invention, in the middle of the slit 12 (between the first manifold 11 and the discharge port 18), the cross-sectional area in the width direction is smaller than that of the first manifold 11 (the volume is small). ) A second manifold 24 is provided. As a result, even if the flow rate of the slurry 3 in the width direction varies in the first manifold 11, the second manifold has a function of leveling the flow rate again. And the discharge amount of the slurry 3 from the discharge outlet 18 is made uniform over the width direction with the function of the adjustment parts 31, 32, 33, and 34 described later.

  The second manifold 24 adjusts the slurry 3 of the first manifold 11 to flow out of the die 10 from other than the discharge port 18 or flows the slurry 3 from other than the inlet 16 of the first manifold 11. 31, 32, 33, and 34 are provided. In the present embodiment, first and second adjustment portions 31 and 32 are provided at both end portions 12a and 12b in the width direction of the second manifold 24, and intermediate portions 12c and 12d between the both end portions 12a and 12b. In addition, third and fourth adjusting sections 33 and 34 are provided.

  The adjustment units 31, 32, 33, and 34 include a through hole that connects the second manifold 24 and the outside of the die 10, and pipes 51, 52, 53, and 54 connected to the through hole. In the present embodiment, one end of each of the pipes 51, 52, 53, 54 is connected to the tank 22, and apart from the slurry 3 stored in the tank 22 flowing into the first manifold 11 from the inflow portion 16, It flows into the slit 12 from the adjustment units 31, 32, 33, 34. Alternatively, the slurry 3 that has flowed out of the adjusting units 31, 32, 33, and 34 is returned to the tank 22. In addition, it is preferable that a filter is provided in the middle of the pipes 51, 52, 53, and 54 although not shown.

  As described above, the adjusting portions 31, 32, 33, and 34 that allow the slurry 3 to flow in from other than the inflow portion 16 or flow out of the die 10 from other than the discharge port 18 are provided in the width direction of the second manifold 24. Therefore, for example, when the slurry 3 becomes difficult to flow (stays) at both ends of the first manifold 11, the amount of the slurry 3 flowing into the slit 12 from the first manifold 11 becomes uneven in the width direction. Even if it becomes, the amount of the slurry 3 discharged from the discharge port 18 becomes non-uniform in the width direction by adjusting the amount of the slurry 3 flowing out to the discharge port 18 by the adjusting units 31, 32, 33, 34. Can be prevented.

  Here, in the present embodiment, the adjustment units 31, 32, 33, and 34 are provided not in the first manifold 11 but in the second manifold 24. This is because the first manifold 11 has a larger cross-sectional area in the width direction, that is, a larger volume in order to spread the slurry 3 flowing in from the inflow portion 16 over the entire first manifold 11. If the adjustment unit is provided in the first manifold 11, even if the local slurry amount is adjusted by each adjustment unit, the sensitivity is poor and it is difficult to obtain a sufficient adjustment effect.

  On the other hand, adjustments 31, 32, 33, and 34 are provided in the second manifold 24 having a smaller cross-sectional area in the width direction than the first manifold 11, that is, the volume is small. It is possible to reflect the discharge amount from the discharge port 18 well.

  The reason why the solid component of the slurry 3 is likely to precipitate and aggregate at both ends of the first manifold 11 is that the walls constituting the end face in the width direction of the first manifold 11 are present at these both ends. This is because the slurry 3 supplied from the central portion of the first manifold 11 and spreading to both sides in the width direction tends to have a low flow velocity at both ends, and the slurry 3 tends to stay. In particular, since the slurry 3 has a high viscosity (viscosity), the slurry 3 tends to stay at both ends, and precipitation and aggregation of solid components are likely to occur.

  Such stagnation of the slurry 3 may also occur in the second manifold 24. If stagnation or aggregation of the slurry 3 occurs at both ends of the second manifold 24, the discharge port 18 passes through the slit 12. There is a risk that the amount of the slurry 3 discharged from the nozzles is significantly reduced at both ends in the width direction.

  Therefore, in the present invention, drainage portions 71 and 72 for discharging the slurry 3 are further provided at both ends of the second manifold 24.

  In this embodiment, the drainage parts 71 and 72 are through holes provided in the die 10 at the positions of both ends of the second manifold 24, and a part of the slurry 3 passing through the slit 12 passes through the through holes to form the die. By discharging to the outside of 10, the flow of the slurry 3 can be secured also at both ends of the second manifold 24, and the possibility of occurrence of stagnation can be suppressed.

  In the present embodiment, the drainage parts 71 and 72 are provided at the bottom of the second manifold 24 so that the slurry 3 can flow more easily. The drainage parts 71 and 72 are connected to the pipes 81 and 82, and the pipes 81 and 82 are connected to the tank 22, and the slurry 3 discharged from the drainage parts 71 and 72 is returned to the tank 22. .

  On the other hand, when the slurry 3 is discharged from the drainage parts 71 and 72 when the slurry 3 is applied to the substrate 2, the discharge amount of the slurry 3 from the discharge ports 18 at both ends in the width direction may be reduced. . Therefore, in this embodiment, on-off valves 91 and 92 are provided in the middle of the pipes 81 and 82 as switching means for switching whether or not to discharge the slurry 3 from the drainage parts 71 and 72.

  When the on-off valve 91 is in the open state, the slurry 3 can be discharged through the drainage parts 71 and 72 and the pipes 81 and 82. When the on-off valve 91 is in the closed state, the drainage part 71, 72 and the flow paths passing through the pipes 81 and 82 are blocked. Therefore, for example, when maintenance of the die 10 is performed, the on-off valves 91 and 92 are opened, and the slurry 3 is discharged from the drainage portions 71 and 72 to ensure the flow of the slurry 3 at both ends of the second manifold 24. When applying the slurry 3 to the substrate 2, the on-off valves 91 and 92 are closed so that the slurry is not discharged from the drainage portions 71 and 72. As a result, by maintaining the die 10 at an appropriate frequency, the slurry 3 is discharged from the drainage portions 71 and 72 while preventing the slurry 3 from staying at both ends of the second manifold 24. Thus, it is possible to prevent the discharge amount of the slurry 3 from decreasing at both ends of the discharge port 18.

  In addition, as the slurry 3 discharged from the die 10 of the manufacturing apparatus 1 of the present embodiment, one having a viscosity of several thousand to several tens of thousands cP (when the shear rate = 1) can be employed.

  Further, in the present embodiment, each of the adjustment units 31, 32, 33, and 34 is provided with a control device that adjusts the amount of the slurry 3 flowing into or out of the second manifold 24. ing. More specifically, as shown in FIG. 2, adjusting valves 61, 62, 63, and 64 are connected to the pipes 51, 52, 53, and 54 as the control device. Each of these adjusting valves 61, 62, 63, 64 has a function of adjusting the flow rate of the slurry 3 flowing out from each of the adjusting units 31, 32, 33, 34. The adjusting valves 61, 62, 63, 64 may adjust the pressure of the slurry 3 flowing in or out from the adjusting units 31, 32, 33, 34, respectively. Alternatively, a device (for example, a pump) that performs flow rate management (outflow amount adjustment) of the slurry 3 is provided in the middle of the pipes 51, 52, 53, 54 that connect the adjustment units 31, 32, 33, 34 and the tank 22. In this case, this device functions as a control device that adjusts the discharge of the slurry 3 flowing into or out of the second manifold 24.

  In addition, the manufacturing apparatus 1 includes a sensor 36 that measures the film thickness of the slurry 3 applied onto the substrate 2 (see FIG. 1). A plurality of sensors 36 may be provided along the width direction. The sensor 36 is a non-contact type, and can measure the film thickness of the slurry 3 on the base material 2 at a plurality of locations along the width direction or over the entire length in the width direction. It is output to the control device (computer) 37 provided. The control device 37 performs feedback control based on the measurement result from the sensor 36 and adjusts the opening degree of the adjustment valves 61, 62, 63, 64. That is, according to the measurement result of the film thickness of the slurry 3, the control device 37 outputs a control signal to each of the adjustment valves 61, 62, 63, 64, and opens each of the adjustment valves 61, 62, 63, 64. Adjust the degree. Thereby, the film thickness of the slurry 3 can be kept constant in the width direction.

  Note that the opening degree of the adjusting valves 61, 62, 63, 64 may be controlled by a timer function of the control device 37 instead of the sensor 36. That is, when a certain time elapses from the start of coating, precipitation and aggregation of the solid components of the slurry 3 becomes a problem. Therefore, a predetermined time before this time elapses is measured with a timer, and when the predetermined time elapses, the control device 37 may perform control to increase the opening degree of the adjusting valves 61, 62, 63, 64.

  Furthermore, in this embodiment, the adjustment parts 33 and 34 are provided also in the middle parts 12c and 12d between the both ends 12a and 12b of the slit 12, and the flow rate of the slurry 3 is large only by the both ends 12a and 12b. It is restrained to become. And by adjusting the opening degree of the adjusting valves 63 and 64 connected to the midway portions 12c and 12d, the slurry 3 is formed on the base material 2 even if the slurry 3 is continuously discharged for a long time. It is possible to make the film thickness of the slurry 3 uniform.

  For example, from the start of the coating operation using the die 10 until a certain time, the first manifold 11 is unlikely to precipitate and agglomerate solid components of the slurry 3 including both ends, and the discharge port 18. A uniform discharge amount can be obtained over the entire width. For this reason, the opening degree of the adjusting valves 61, 62, 63, 64 is all the same (the opening degree may be zero).

  However, when a certain amount of time has passed and both solid ends of the slurry 3 are likely to be precipitated or aggregated at both ends of the first manifold 11, the opening degree of the adjustment valves 61 and 62 corresponding to both ends is greatly changed. . Thereby, the slurry 3 is replenished at both ends, and it is possible to prevent the discharge amount of the slurry 3 from decreasing at both ends of the slit 12.

  And when the opening degree of the adjustment valves 61 and 62 on both sides is largely changed, the discharge amount of the slurry 3 tends to change at both ends in the width direction of the discharge port 18, which causes the width of the slit 12. A phenomenon in which the flow rate of the slurry 3 temporarily changes also occurs in the middle portions 12c and 12d adjacent to the center in the direction.

  Therefore, if a large amount of precipitation or aggregation of solid components is likely to occur at both ends of the first manifold 11, the opening degree of the adjustment valves 61 and 62 corresponding to the both ends 12a and 12b of the slit 12 is increased gradually. In addition to the change, control is performed in which the opening degree of the adjustment valves 63 and 64 corresponding to the midway portions 12c and 12d is also changed gradually (gradually). In addition, the opening degree of the adjustment valves 63 and 64 during the opening degree change is made smaller than the opening degree of the adjustment valves 61 and 62 during the opening degree change, and the slurry 3 from the adjustment units 33 and 34 provided in the middle. Is less than the inflow amount of the slurry 3 from the adjusting portions 31 and 32 at both ends. Further, at this time, the internal pressure of the slurry 3 in the first manifold 11 is also controlled to be constant.

  According to the above control, the amount of the slurry 3 discharged from the discharge port 18 is changed by adjusting the flow rate of the slurry 3 flowing into or out of the slit 12 through the adjusting units 31, 32, 33, 34. The For this reason, it becomes possible to perform stricter control for evenly discharging the slurry 3 from the discharge port 18 over the entire length in the width direction, and the film thickness of the slurry 3 formed on the substrate 2 can be set in the width direction and the feeding direction. Can be made uniform.

  In the present embodiment, as described above, the second manifold 24 is provided with the drainage parts 71 and 72, but the first manifold 11 is not provided with a part corresponding to the drainage part. This is because when the drainage portions are provided in both the first manifold 11 and the second manifold 24, the number of members increases and the apparatus becomes complicated. Temporarily, the slurry 3 stays in the first manifold. Even if it occurs, the amount of the slurry 3 discharged from the discharge port 18 can be made uniform in the width direction by the action of the second manifold 24 and the adjustment parts 31, 32, 33, 34. The arrangement of the drainage part to 11 is omitted.

  On the other hand, as described above, if the slurry 3 stays or aggregates at both ends of the second manifold 24, the amount of the slurry 3 discharged from the discharge port 18 through the slit 12 Therefore, the arrangement of the drainage parts 71 and 72 in the second manifold 24 is essential.

  As another embodiment other than the present embodiment, as shown in FIG. 3, the adjusting portions 31, 32 are not provided in the slit 12 between the first manifold 11 and the second manifold 24, but in the second manifold 24. , 33, 34 may be provided.

  By adopting such a configuration, the sensitivity of adjusting the flow rate of the slurry 3 by the adjusting units 31, 32, 33, and 34 is further increased than when the adjusting units 31, 32, 33, and 34 are provided in the second manifold 24. Becomes higher. On the other hand, in the embodiment shown in FIG. 3, when the adjustment sensitivity is too high to control the discharge amount of the slurry 3 from the discharge port 18, the embodiment shown in FIG. The adjustment sensitivity can be relaxed and the discharge amount of the slurry 3 can be easily controlled.

  As described above, even when the slurry 3 is continuously discharged for a long time, the thickness of the coating layer formed on the substrate 2 can be made uniform.

  Moreover, the manufacturing apparatus 1 of this invention is not restricted to the form shown in figure, The thing of another form may be sufficient within the scope of the present invention. For example, in the present embodiment (see FIG. 1), the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11 and the slurry 3 is allowed to flow from the bottom portion 17. The structure connected with the side part (intermediate part of a height direction) of the one manifold 11 may be sufficient.

  Further, in the present embodiment, the case where the die 10 is installed so that the direction in which the slurry 3 of the first manifold 11 flows from the discharge port 18 to the base material 2 through the slit 12 is horizontal is described. The installation posture of the die 10 may be other than this. For example, the die 10 may be installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the vertical direction. In this case, the slurry 3 of the first manifold 11 is discharged from the discharge port through the slit 12. The die 10 may be installed so that the flow direction from 18 to the base material 2 is upward in the vertical direction.

  Further, in the present embodiment, the on-off valves 91 and 92 are provided in the drainage parts 71 and 72 so that the on-off valves 91 and 92 are closed when the base material 2 is coated. Instead of this, the diameters of the drainage parts 71 and 72 may be made smaller than the diameters of the adjustment parts 31, 32, 33 and 34. In this case, since the amount of the slurry 3 flowing out from the drainage parts 71 and 72 can be made smaller than the adjustment amount of the slurry 3 by the adjustment parts 31, 32, 33 and 34, The adjustment units 31, 32, 33, and 34 are less affected, so that the amount of the slurry 3 discharged from the discharge port 18 is uniform in the width direction even when the slurry 3 is discharged from the drainage units 71 and 72. Can adjust the flow rate of the slurry 3. In addition, it is of course possible to reduce the diameter of the drainage parts 71 and 72 and provide the opening / closing valves 91 and 92 in this way.

  In addition, instead of reducing the diameter of the drainage parts 71 and 72, the discharge amount from the liquid parts 71 and 72 is adjusted by an adjustment valve or the like, and is less than the adjustment amount of the slurry 3 by the adjustment parts 31, 32, 33, and 34. By setting, it is also possible to suppress the staying while constantly discharging.

  In addition, the drainage parts 71 and 72 are provided at the bottom of the second manifold 24 in this embodiment, but may be provided at the side walls forming both ends of the second manifold 24.

  Further, in the present embodiment, the case where the adjusting portions 33 and 34 are provided in the two middle portions 12c and 12d between the both end portions 12a and 12b has been described, but the number of adjusting portions provided in the middle portion is as follows. Other than this, the adjustment part should just be provided in the middle part between the both ends 12a and 12b at least one place.

  Further, the shape of the shim plate 15 (see FIG. 4B) may be other than that illustrated. Since the shape of the slit 12 (the flow path of the slurry 3) is determined by the shape of the shim plate 15, an adjustment unit may be provided in the middle of the solid component of the slurry 3 where precipitation or the like is likely to occur due to the shape of the shim plate 15. That's fine.

  For example, as shown in FIG. 5A, the shim plate 15 includes a main body portion 15a that is long in the width direction, first projecting pieces 15b and 15c that extend from both sides of the main body portion 15a in the width direction, A comb shape having at least one second protruding piece (in this embodiment, two protruding pieces 15d and 15e) provided between the protruding pieces 15b and 15c may be used. The width direction dimension of the slit 12 is defined by the first projecting pieces 15b and 15c, and the slit 12 is blocked in the middle by the second projecting pieces (15d and 15e) and divided in the width direction. In the case of the shim plate 15, the slurry 3 is discharged from between the adjacent protruding pieces in the slit 12, and as shown in FIG. A coating layer) is formed.

  And as above-mentioned (refer FIG. 2), the adjustment | control part 31, 32, 33, 34 is on the die | dye 10, and the middle part between both ends 12a and 12b of the slit 12 width direction and these both ends 12a and 12b Even if the coating operation is continuously performed, the discharge amount of the slurry 3 from each section of the slit 12 divided by the comb-shaped shim plate 15 can be made uniform by being provided in 12c and 12d. It is possible to make the film thickness of each of the plurality of coating layers constant.

  Here, in the embodiment shown in FIG. 3, for example, when the adjusting portion 33 or the adjusting portion 34 is provided at a position where the protruding pieces 15 d and 15 e in FIG. Since the through hole is blocked by the projecting pieces 15d and 15e, the function of adjusting the flow rate of the slurry 3 is lost, so such a situation needs to be avoided.

  As means for avoiding the above situation, for example, it is conceivable to provide an adjusting portion at a place other than the position where the protruding pieces 15d and 15e are arranged.

  The manufacturing apparatus 1 of the present invention is effective when the coating liquid to be applied is a slurry having a high viscosity, and is applied when a product (for example, an optical film) is manufactured by applying a slurry having a high viscosity. Also good.

  In the above description, the thickness of the coating layer formed on the substrate 2 is made uniform in the width direction by making the discharge amount from the discharge port 18 uniform in the width direction. The discharge amount of the discharge port 18 is not limited to be uniform over the width direction. For example, as shown in FIG. 6A, when the thickness of the coating layer formed on the substrate 2 changes so that the thickness of the end portion decreases with time, the slurry at both ends of the slit 12 is adjusted by each adjusting portion. The flow rate of 3 should be increased. As a result, as shown in FIG. 6B, the shape of the coating layer is thickened at the end in the width direction immediately after discharge, but the thickness at the end decreases with time, resulting in a thickness in the width direction. A uniform coating layer can be obtained.

1: Battery electrode plate manufacturing apparatus 2: Base material 3: Slurry 10: Die 11: First manifold 12: Slit 12a: End portion 12b: End portion 12c: Intermediate portion 12d: Intermediate portion 16: Inflow portion 17: Bottom 18: Discharge port 20: Supply means 31: Adjustment unit 32: Adjustment unit 33: Adjustment unit 34: Adjustment unit 61: Adjustment valve 62: Adjustment valve 63: Adjustment valve 64: Adjustment valve 71: Drainage unit 72: Drainage Part 91: Open / close valve 92: Open / close valve

Claims (5)

A first manifold having a space for storing slurry long in the width direction and a discharge port for connecting the first manifold via a wide slit in the width direction and discharging the slurry to the substrate were formed. Die,
A battery electrode plate manufacturing apparatus comprising: a supply unit configured to supply slurry to the first manifold from an inflow portion communicating with the first manifold;
A second manifold that is long in the width direction is provided between the first manifold and the discharge port of the slit,
An adjustment unit that adjusts the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or flow into or between the first manifold and the second manifold of the slit. Is provided in a plurality over the width direction,
An apparatus for manufacturing a battery electrode plate, wherein a drainage part for discharging slurry is further provided at both ends of the second manifold.   The battery drain plate manufacturing apparatus according to claim 1, wherein the drainage part is further provided with switching means for switching whether or not to discharge the slurry from the drainage part.   The diameter of each said drainage part is smaller than the diameter of each said adjustment part, The manufacturing apparatus of the electrode plate for batteries of Claim 1 characterized by the above-mentioned.   The apparatus for manufacturing a battery electrode plate according to any one of claims 1 to 3, wherein the adjustment unit is provided with a control device that controls an amount of slurry flowing out or flowing in.   5. The battery electrode plate manufacturing apparatus according to claim 3, wherein the second manifold has a volume smaller than that of the first manifold. 6.

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