JP2018037206A - Apparatus for manufacturing electrode plate for battery and maintenance method of the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make a thickness of a coating film layer formed on a base material uniform even if discharging operation of a slurry is continued for a long time.SOLUTION: The apparatus includes: a first flow path 50 for pressure-feeding a slurry 3 flowing out from a plurality of adjustment sections 31, 32, 33, 34 arranged along a width direction by the pressure of supply means 20; and a second flow path 60 provided with a suction pump 68 for discharging the slurry 3 flowing out from the plurality of adjustment sections 31, 32, 33, 34 by suction.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a manufacturing apparatus for manufacturing a battery electrode plate by applying a slurry containing an active material to a base material, and a maintenance method thereof.

  For example, as in Patent Document 1, a battery electrode plate is manufactured by applying a slurry containing an active material, a binder, a conductive additive, and a solvent to a substrate that is fed in a roll-to-roll manner. In the battery electrode plate manufactured in this way, the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery. In the case of a battery), the film thickness control of the slurry applied to the substrate is very important. That is, the slurry needs to be applied with a uniform thickness along the width direction and the feeding direction of the substrate.

  For example, as in Patent Document 2 or Patent Document 3, there is a method and an apparatus for more uniformly applying the thickness along the width direction and the feeding direction of the base material of the slurry.

Japanese Patent Laid-Open No. 11-233102 JP-A-2015-97198 Japanese Patent Laying-Open No. 2015-176822

  The slurry contains an active material, etc., and the active material is mixed and dispersed. However, there are some slurries that have different characteristics depending on the method and composition of the slurry and continue to be dispersed for a long time. There are also unstable slurries in which solid components precipitate or aggregate in a short time.

  A die for continuously applying such a slurry to a substrate for a long time includes a first manifold (a liquid reservoir) that is long in the width direction, as disclosed in Patent Document 2 or Patent Document 3. The base material by flowing the slurry between the slit connected to the first manifold, the discharge port connected to the first manifold and discharging the slurry to the base material, and the first manifold and the discharge port. A plurality of adjusting portions are formed over the width direction for adjusting the amount of slurry discharged from the discharge port with respect to the substrate, but the amount of slurry discharged from the discharge port to the substrate is In order to make it uniform in the width direction, the amount of slurry flowing out from each adjustment unit is individually adjusted, so that the flow rate of the slurry can be changed in each adjustment unit. In the adjustment unit with a small flow rate of the slurry, precipitation and aggregation of the solid component of the slurry occurs, and the solid component stays, so that the sensitivity of the flow rate control of the slurry in the adjustment unit is deteriorated, and the discharge port extends in the width direction of the die. Variation in the flow rate of the slurry discharged from the substrate occurs, and variation occurs in the thickness of the coating layer formed on the substrate.

  Here, as described above, since the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery, the thickness of the coating layer varies in the electric state. If an electrode plate is manufactured, the quality of the battery using the electrode plate will be reduced. Therefore, in the past, when there was a variation in the discharge amount of the slurry as described above, the adjustment unit was disassembled and cleaned so that the discharge amount becomes a predetermined amount again. was there.

  Further, a pumping device such as a pump is used as means for supplying the slurry to the die, but the plurality of adjusting portions are provided in the vicinity of the discharge port for discharging the slurry to the base material. Attempting to apply a pressure that can extrude the solid content of the slurry remaining in the adjustment section increases the pressure at the discharge port, which affects the uniform application to the substrate, so it remains in the adjustment section. It was difficult to discharge the solid content of the slurry by pumping, and it was necessary to disassemble and clean it.

  The present invention has been made in view of the above problems, and it is possible to make the thickness of the coating film layer formed on the substrate uniform even when the slurry is continuously discharged for a long time. Objective.

  The battery electrode plate manufacturing apparatus of the present invention is connected to the first manifold having a space in which slurry is accumulated long in the width direction and the first manifold via a wide slit in the width direction, and the slurry is used as a base material. A plurality of adjustments provided across the width direction for adjusting the discharge amount of the slurry from the discharge port by discharging the slurry between the discharge port for discharging and the first manifold and the discharge port A die having a portion, means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold, and a flow path for the slurry discharged from the plurality of adjustment portions to the first manifold A flow path and a flow path that branches into two of the second flow paths provided with slurry suction means.

  According to the present invention, the flow path of the slurry that has flowed out of the adjustment section is branched into two, and the second flow path is provided with suction means. At the time of suspension such as time or at the time of re-operation after the suspension, the slurry staying in the adjustment unit by the suction means is discharged to the second flow path without disassembling and cleaning the adjustment unit. The discharge amount of the slurry discharged from the discharge port to the substrate can be maintained at a predetermined amount in the width direction, and the thickness of the coating layer can be made uniform.

  The apparatus for manufacturing a battery electrode plate according to the present invention includes a means for switching the flow path of the slurry to the first flow path and the second flow path for the flow path of the slurry that has flowed out from the plurality of adjusting sections. Is provided.

  In the above, by switching the flow path of the slurry that has flowed out of the adjustment section from the first flow path to the second flow path, the suction means prevents the suction from being performed from the first flow path. The slurry staying in the adjusting section can be efficiently discharged to the second flow path.

  The plurality of adjusting units are provided with a control device that controls the amount of slurry flowing out of the adjusting unit.

  In this case, by performing control to individually adjust the amount of slurry flowing out from the plurality of adjusting units, it is possible to discharge the slurry staying in each adjusting unit individually and intensively.

  The maintenance method for the battery electrode plate manufacturing apparatus of the present invention is characterized in that the slurry is sucked using the second flow path during maintenance of the die.

  According to the present invention, the slurry retained in the adjusting section is discharged to the second flow path by the suction means when the base material is replaced, at the time of suspension such as when changing the lot, or at the time of re-operation after the suspension. The die can be maintained without disassembling and cleaning the adjusting portion.

  According to the present invention, it is possible to make the thickness of the coating layer formed on the substrate uniform even when the slurry is continuously discharged for a long time.

It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries of this invention. (A) is sectional drawing which shows schematic structure of the die | dye 10, (B) is sectional drawing of arrow a of FIG. 1A is a cross-sectional view taken along arrow b in FIG. 1, FIG. 1B is a cross-sectional view taken along arrow c in FIG. 1, and FIG. It is sectional drawing of d arrow of FIG. It is an operation | movement flow at the time of the maintenance of the manufacturing apparatus of the battery electrode plate of this invention. It is explanatory drawing which shows schematic structure of other embodiment of the manufacturing apparatus of the electrode plate for batteries of this invention. It is explanatory drawing which shows schematic structure of other embodiment of the manufacturing apparatus of the electrode plate for batteries of this invention. It is explanatory drawing of other embodiment of the manufacturing apparatus of the electrode plate for batteries of this invention. (A), (B) is explanatory drawing of other embodiment of the die | dye of the manufacturing apparatus of the electrode plate for batteries of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is an explanatory diagram showing a schematic configuration of a battery electrode plate manufacturing apparatus. The manufacturing apparatus 1 is an apparatus for applying a slurry 3 containing an active material, a binder, a conductive additive and a solvent to a base material 2 made of a metal foil fed by roll-to-roll. According to this manufacturing apparatus, the layer containing an active material is formed on the base material 2 by drying the applied slurry 3, and the base material 2 is cut into a predetermined shape to form a battery electrode plate. Since the thickness of the layer containing the active material formed on the substrate 2 directly affects the charge / discharge amount of the battery, the film thickness of the coating layer formed by the slurry 3 applied to the substrate 2 is controlled. Is very important. According to this manufacturing apparatus 1, the slurry 3 has a uniform thickness (uniform coating amount) along the feed direction of the base material 2, as described in the following embodiment. Applied. In addition, the width direction of the base material 2 is a direction orthogonal to the feed direction of the base material 2, and the Y-axis direction in FIG. 1 corresponds to this.

The manufacturing apparatus 1 includes a die 10 that is long along the width direction of the base material 2, and a supply unit 20 that supplies the slurry 3 to the die 10, and the slurry 3 supplied from the supply unit 20 is a die. The slurry 3 is applied to the base material 2 by discharging from the discharge port 18 provided in the substrate.
In the die 10, the longitudinal direction (the Y-axis direction in FIG. 1) is referred to as the width direction. In this manufacturing apparatus 1, the roller 5 facing the die 10 is installed, and the width direction of the die 10 and the direction of the rotation center line of the roller 5 are parallel. The base material 2 is guided by this roller 5, and the space | interval (gap) between the base material 2 and die | dye 10 (tip of the slit 12 mentioned later) is kept constant, and application | coating of the slurry 3 is performed in this state.

  Aside from discharging the slurry 3 from the die 10 to the base material 2, a plurality of adjusting portions 31, 32, 33, provided along the width direction of the base material 2 for flowing the slurry 3 to the outside. 34, and the discharge amount of the slurry 3 discharged from the discharge port 18 is adjusted by causing the slurry 3 to flow out from the plurality of adjustment units 31, 32, 33, 34.

  In addition, the slurry 3 that has flowed out from the plurality of adjustment units 31, 32, 33, and 34 is caused to flow out from the first flow path 50 that pumps the slurry 3 with the pressure of the supply unit 20 and the plurality of adjustment units 31, 32, 33, and 34. The second flow path 60 provided with the suction pump 68 for discharging the slurry 3 by suction, and the flow of the slurry 3 that has flowed out from the plurality of adjusting portions 31, 32, 33, 34 are the first flow path 50 and the first flow path. The switching valves 55 and 65 for switching to the second flow path 60 are provided, and the slurry 3 retained in the plurality of adjusting units 31, 32, 33, and 34 by the suction pump 68 provided in the second flow path 60 during maintenance is provided. Discharge.

  An explanatory view of the die 10 of this embodiment is shown in FIGS. FIG. 2A is a cross-sectional view showing a schematic configuration of the die 10. The die 10 includes a first divided body 13 having a first lip 13a having a tapered shape and a second divided body 14 having a second lip 14a having a tapered shape, with a shim plate 15 interposed therebetween, It consists of a combined configuration. FIG. 2B is a cross-sectional view taken along arrow a in FIG. 3A is a cross-sectional view taken along the arrow b in FIG. 1, FIG. 3B is a cross-sectional view taken along the arrow c in FIG. 1, and the shim plate 15 is shown in FIG. ing. The die 10 is formed therein with a first manifold 11 having a long space in the width direction, and a slit 12 connected to the first manifold 11, and a first lip 13a and a second lip 14a. A discharge port 18 that is an open end of the slit 12 is formed therebetween. That is, the first manifold 11 and the discharge port 18 are connected via the slit 12.

  With this configuration, the slurry 3 supplied by the supply unit 20 is first stored in the first manifold 11 and then discharged from the discharge port 18 via the slit 12.

  The slit 12 is formed long in the width direction similarly to the first manifold 11, and the width direction dimension of the slit 12 is determined by an inner dimension W (see FIG. 3C) of a shim plate 15 to be described later. A slurry 3 having a width direction dimension substantially the same as the width direction dimension of the slit 12 can be applied onto the substrate 2.

  An inflow portion 16 is provided at the center in the width direction of the die 10, and the inflow portion 16 includes a through hole (inflow port) connected to the first manifold 11 from the outside of the die 10. The supply means 20 supplies the inflow pipe 21 having one end connected to the inflow section 16, the tank 22 storing the slurry 3, and the slurry 3 in the tank 22 to the die 10 through the pipe 21. And a pump 23 for the purpose. As described above, the supply unit 20 can supply the slurry 3 from the inflow portion 16 to the first manifold 11. In this embodiment, as shown in FIG. 2A, the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 flows from the bottom portion 17.

  The first manifold 11 can store the slurry 3 supplied from the supply means 20, and the slurry 3 stored in the first manifold 11 passes through the slit 12 from the discharge port 18 to roll-to-roll. The slurry 3 can be discharged onto the base material 2 and the slurry 3 can be continuously applied to the base material 2. The gap dimension of the slit 12 is constant in the width direction, and the thickness of the slurry 3 applied on the substrate 2 is constant in the width direction.

  The die 10 is provided with a pressure sensor (not shown), and this pressure sensor measures the internal pressure of the slurry 3 in the first manifold 11. Then, based on the measurement result, the supply of the slurry 3 by the supply means 20 is controlled, and the internal pressure of the slurry 3 in the first manifold 11 is kept constant. The slurry 3 whose internal pressure is constant in the first manifold 11 is discharged from the slit 12 in an equal amount over the entire length in the width direction, and the slurry 3 discharged from the slit 12 based on the measurement result of the pressure sensor. The amount is controlled so as not to fluctuate, and the thickness of the slurry 3 applied on the substrate 2 in the feeding direction is made constant. Although not shown, a filter for the slurry 3 is provided in the middle of the pipe 21.

  Further, in the present embodiment, as shown in FIGS. 2A and 3A and 3B, a second manifold 24 having a long space in the width direction is provided between the slit 12 and the discharge port 18. The second manifold 24 is provided with a plurality of adjusting portions 31, 32, 33, 34 that allow the slurry 3 of the first manifold 11 to flow out of the die 10 from other than the discharge port 18. Each of the plurality of adjustment units 31, 32, 33, and 34 is provided with a control device that adjusts the amount of the slurry 3 that flows out from the second manifold 24. Here, the second manifold 24 has the same length in the width direction as the first manifold 11 and the slit 12, and the cross-sectional area in the width direction is smaller than that of the first manifold 11. That is, by providing the adjustment units 31, 32, 33, and 34 in the second manifold 24 having a volume smaller than that of the first manifold, the flow rate of the slurry 3 flowing out from each adjustment unit can be adjusted from the discharge port 18 with high sensitivity. It is possible to reflect this in the discharge amount.

  As shown in FIG. 2B, valves 41, 42, 43, and 44 are provided on the pipes 46, 47, 48, and 49 connected to the adjusting portions 31, 32, 33, and 34 of the die 10. The flow rate ratio of the slurry 3 passing through the valves 41, 42, 43, 44 is adjusted by individually controlling the opening degree of the valves 41, 42, 43, 44. That is, the pipes 46, 47, 48, and 49 provided with the valves 41, 42, 43, and 44 function as adjustment flow paths that adjust the flow rate of the slurry 3 in the adjustment units 31, 32, 33, and 34. Each of the valves 41, 42, 43, 44 may adjust the pressure of the slurry 3 flowing out from each of the adjusting units 31, 32, 33, 34.

  In addition, the manufacturing apparatus 1 includes a sensor 36 that measures the film thickness of the slurry 3 applied onto the substrate 2 (see FIG. 1). A plurality of sensors 36 may be provided along the width direction. The sensor 36 is a non-contact type, and can measure the film thickness of the slurry 3 on the base material 2 at a plurality of locations along the width direction or over the entire length in the width direction. It is output to the control device (computer) 37 provided. The control device 37 performs feedback control based on the measurement result from the sensor 36 and adjusts the opening degree of the valves 41, 42, 43, 44. That is, according to the measurement result of the film thickness of the slurry 3, the control device 37 outputs a control signal to each of the valves 41, 42, 43, and 44, and sets the opening degree of each of the valves 41, 42, 43, and 44. adjust. Thereby, the film thickness of the slurry 3 can be kept constant in the width direction.

  For example, from the measurement result of the sensor 36 that measures the film thickness of the slurry 3 applied onto the base material 2, the slit 3 has a thickness smaller than that of the central part at both ends in the width direction of the base material 2. The opening degree of the valves 41 and 42 corresponding to the both end portions 12a and 12b of the twelve parts is changed gradually (gradually), and the opening degree of the valves 43 and 44 corresponding to the midway parts 12c and 12d is also changed (gradually) greatly. Control is performed. Thereby, the opening degree of the valves 43 and 44 during the opening degree change is made larger than the opening degree of the valves 41 and 42 during the opening degree change, and the slurry 3 from the adjusting units 31 and 32 provided in the middle is changed. The outflow amount is made smaller than the outflow amount of the slurry 3 from the adjusting portions 33 and 34 at both ends. Further, at this time, the internal pressure of the slurry 3 in the first manifold 11 is controlled to be constant based on the measurement result of the pressure sensor provided in the die 10.

  According to the above control, the amount of the slurry 3 discharged from the discharge port 18 is changed by adjusting the flow rate of the slurry 3 flowing out from the slit 12 through the adjusting units 31, 32, 33 and 34. For this reason, it becomes possible to perform stricter control for evenly discharging the slurry 3 from the discharge port 18 over the entire length in the width direction, and the film thickness of the slurry 3 formed on the substrate 2 can be set in the width direction and the feeding direction. Can be made uniform. As a result, there can be prepared an adjusting unit in which the flow rate of the slurry 3 flowing out from the adjusting units 31, 32, 33, and 34 is relatively small and an adjusting unit in which the flow rate of the slurry 3 is relatively small. Minute precipitation and aggregation (stagnation) occur, and the sensitivity of strict control for evenly discharging the slurry 3 from the discharge port 18 over the entire length in the width direction deteriorates.

  In this embodiment, the pipes at the ends of the adjustment channels on the side not connected to the adjustment units 31, 32, 33, 34 of the pipes 46, 47, 48, 49 are integrated channels as shown in FIG. 40 is integrated into one. 4 is a cross-sectional view taken along arrow d in FIG.

  The integrated flow path 40 is provided with an integrated flow rate adjusting unit 45 that controls the flow rate of the slurry 3 in addition to the valves 41, 42, 43, and 44. The integrated flow rate adjusting unit 45 may be a valve that adjusts the flow rate of the integrated flow path 40 having the same configuration as the valves 41, 42, 43, and 44, but changes the pipe diameter, the pipe length, and the like of the integrated flow path 40. It is also possible to change the flow rate by making them.

  As shown in FIG. 1, the integrated flow path 40 is branched into a first flow path 50 connected to the tank 22 and a second flow path 60 connected to the suction pump 68. The first flow path 50 is provided with a valve 55 that can be opened and closed between the integrated flow path 40 and the tank 22, and the second flow path 60 is provided between the integrated flow path 40 and the suction pump 68. A valve 65 that can be opened and closed is provided, and by operating the opening and closing of the valve 55 and the valve 65, the flow path of the slurry 3 that has flowed out of the adjusting portions 31, 32, 33, 34 is changed to the first flow path 50 or Switching to the second flow path 60 is possible.

  The integrated flow rate adjustment unit 45 may be provided in the first flow path 50.

  Further, an integrated flow rate adjusting function may be provided to the valve 55 provided in the first flow path 50 and having an opening / closing function.

  When applying the slurry 3 to the substrate 2, only the first flow path 50 is selected. Specifically, the switching valve 55 of the first channel 50 is opened, and the switching valve 65 of the second channel 60 is closed. In this case, the slurry 3 is pumped to the adjustment units 31, 32, 33, and 34 through the slit 12 separately from being applied to the base material 2 through the slit 12 by the supply pump 23 of the supply means 20. However, the internal pressure of the slurry 3 in the slit 12 is limited because it affects the uniform thickness of the slurry 3 applied to the base material 2, and the adjusting portions 31, 32, 33, and 34 are Since it is located downstream, the internal pressure of the slurry 3 flowing through the adjusting portions 31, 32, 33, and 34 is low, and the slurry 3 is likely to stay in the adjusting portions 31, 32, 33, and 34.

  When the maintenance of the adjustment units 31, 32, 33, and 34 is performed, the second flow path 60 is selected. Specifically, the switching valve 55 of the first channel 50 is closed and the switching valve 65 of the second channel 60 is opened. In this case, due to the suction force of the suction pump 68, the slurry 3 in the vicinity of the adjusting units 31, 32, 33, and 34 can be flowed with a stronger flow than when pumping with the pressure of the supply pump 23.

  In the present embodiment, when the first flow path 50 is selected, the slurry 3 that has flowed out of the adjustment units 31, 32, 33, and 34 is returned to the tank 22. In addition, although not shown, it is preferable that a filter is provided in the middle of the first flow path 50. When the second flow path 60 is selected, the slurry 3 that has flowed out of the adjusting units 31, 32, 33, and 34 is discharged to the outside by the suction pump 68. Here, the flow path of the slurry 3 exiting the suction pump 68 may be connected to the waste liquid tank 67.

  As described above, the adjustment units 31, 32, 33, and 34 have a second suction unit that is separate from the first flow path 50 that causes the slurry to flow out by pressure feeding by the pressure of the pump 23 of the supply unit 20. Since the flow path 60 is provided, for example, the amount of the slurry 3 flowing into the slit 12 from the manifold 11 is reduced by making the slurry 3 difficult to flow (stagnate) in a part of the adjustment units 31, 32, 33, and 34. Even if it becomes non-uniform in the width direction, it is switched to the second flow path 60 at the time of suspension such as when changing the base material or changing the lot, or at the time of re-operation after the suspension, and a part of the adjustment unit that makes it difficult for the slurry 3 to flow The slurry retained in step S1 can be discharged by the suction pump 68 and switched to the first flow path 50 again to return the amount of the slurry 3 discharged from the discharge port 18 to a uniform state in the width direction.

  Further, even if the amount of the slurry 3 flowing from the manifold 11 to the slit 12 does not become uneven in the width direction, the above operation is performed at the time of suspension such as when changing the base material or changing the lot or at the time of re-operation after the suspension. Thus, the amount of the slurry 3 discharged from the discharge port 18 continuously for a long period can be maintained in a uniform state in the width direction.

  The maintenance method of the manufacturing apparatus 1 is to supply the slurry 3 from the state in which the slurry 3 is applied to the base material 2, when the base material is changed, when the lot is changed, or when it is restarted after the stoppage. The pump 23 is stopped, or the supply pressure of the supply pump 23 is lowered, the suction pump 68 provided in the second flow path 60 is operated, and the slurry 3 retained in the plurality of adjustment units 31, 32, 33, 34 is The second flow path 60 is discharged. By this maintenance method, the amount of the slurry 3 discharged from the discharge port 18 is maintained in a uniform state in the width direction continuously without disassembling and cleaning the plurality of adjusting portions 31, 32, 33, 34. It becomes possible to do.

  Further, in the above, the switching valve 55 provided in the first flow path 50 is closed, the switching valve 65 provided in the second flow path 60 is opened, and the selection is performed when the slurry 3 is applied to the substrate 2. A step of switching from the first flow path 50 to the second flow path 60 may be added. Thereby, it is possible to prevent the suction pump 68 from sucking from the first flow path 50.

  An example of the operation flow during maintenance of the manufacturing apparatus 1 is shown in FIG.

  First, in the stop state, the supply pump 23 for the slurry 3 is stopped (step S11). At this time, the supply pump 23 may be stopped simultaneously with the stop of the manufacturing apparatus 1.

  Next, the adjustment unit to which the slurry 3 staying in the adjustment units 31, 32, 33, and 34 is to be discharged is selected, and the corresponding valve is fully opened among the valves 41, 42, 43, and 44, and the others are all opened. Close (step S12). For example, when the flow rate of the slurry 3 flowing through the adjusting units 31 and 32 is reduced during the operation of applying the slurry 3 to the base material 2, the adjusting unit 31 and 32 are likely to retain the slurry 3. By fully opening the valves 41 and 42 that adjust the flow rate of 32, and fully closing the valves 43 and 44 that adjust the flow rates of the adjusting units 33 and 34, the suction force of the suction pump 68 can be efficiently increased. It can be used for discharging the slurry 3 staying in the adjusting sections 31 and 32. In step S12, all of the valves 41, 42, 43, 44 may be fully opened.

  Next, the valve 55 is closed (step 13) and the valve 65 is opened (step 14), thereby switching from the first flow path 50 to the second flow path 60.

  Here, steps 11, 12, 13, and 14 may be performed simultaneously.

  Next, the suction pump 68 is started, and the slurry 3 of each of the adjusting units 31, 32, 33, 34 in which the valves 41, 42, 43, 44 are opened in the adjusting units 31, 32, 33, 34 is sucked. Then, the liquid is discharged from the second flow path 60 (step 15).

  After the slurry 3 is discharged from each of the adjusting sections 31, 32, 33, 34, the suction pump 68 is stopped (step S16).

  Next, the valve 65 is closed (step 17), and the valve 55 is opened (step 18), so that the second flow path 60 is switched to the first flow path 50, and the adjustment units 31, 32, The opening degree of the valves 41, 42, 43, 44 of 33, 34 is returned to the opening degree when the slurry 3 is applied to the substrate 2 (step 19).

  Here, steps 16, 17, 18, and 19 may be performed simultaneously.

  Then, the supply pump 23 is turned on to resume the application of the slurry 3 to the base material 2 (step 20).

  In step 11, the supply pump 23 may not be turned off, and the pressure may be reduced to supply an amount equal to or less than the amount of the slurry 3 sucked by the suction pump 68. In that case, even if the slurry 3 staying in the adjustment units 31, 32, 33, 34 is sucked by the suction pump 68, the slurry 3 is replenished to the adjustment units 31, 32, 33, 34. It is possible to prevent air from entering from the discharge port 18 of the die.

  As described above, even when the slurry 3 is continuously discharged for a long time, the thickness of the coating layer formed on the substrate 2 can be made uniform.

  Moreover, the manufacturing apparatus 1 of this invention is not restricted to the form shown in figure, The thing of another form may be sufficient within the scope of the present invention. For example, as shown in FIG. 6, the slurry discharged by the suction pump 68 of the second flow path may be returned to the supply tank 22.

  In addition, as shown in FIG. 7, as an embodiment other than the present embodiment, the first flow path 50 and the second flow path branched from the integrated flow path 40 that exits the adjustment units 31, 32, 33, and 34 and is integrated. The flow path 60 may be switched by using a three-way valve instead of the valve 55 provided in the first flow path 50 and the valve 65 provided in the second flow path 60.

  In another embodiment, the switching valve 55 and the switching valve 65 of the second channel 60 may not be provided in the first channel 50. However, if the switching valve 55 and the switching valve 65 are not provided, the slurry 3 also enters the second flow path 60 when the slurry 3 is applied to the substrate 2, so that the slurry 3 stays in the second flow path 60. Occur. Further, when the slurry 3 staying in each of the adjustment units 31, 32, 33, 34 is sucked by the suction pump 68 provided in the second flow path during maintenance, the first flow path 50 is also sucked, Since the maintenance efficiency of each of the adjusting units 31, 32, 33, and 34 is poor, it is better to have the switching valves 55 and 65.

  Further, only the switching valve 65 may be used for the switching valve 55 of the first flow path 50 or the second flow path 60. However, when the switching valve 55 is not provided, when the slurry 3 staying in each of the adjustment units 31, 32, 33, 34 is sucked by the suction pump 68 provided in the second flow path during maintenance, the first flow path is used. 50 is also sucked, and the maintenance efficiency of each of the adjustment units 31, 32, 33, 34 is poor. If the switching valve 65 is not provided, the slurry 3 also enters the second flow path 60 during application to the substrate 2, so that the retention of the slurry 3 occurs in the second flow path 60. Better.

  In addition, the integrated flow path 40 is not provided, and the flow path of the slurry 3 that has exited the adjustment units 31, 32, 33, and 34 has the first flow path 50 and the second flow path 60, respectively. good.

  Further, as shown in FIG. 8, pipes 71, 72, 73, 74 that are connected to the integrated flow path 40 through the valves 41, 42, 43, 44 connected to the adjustment unit adjustment units 31, 32, 33, 34 are connected. Valves 76, 77, 78, 79 that can be opened and closed may be provided on the way. In this case, the valves 76, 77, 78, at the time of discharging the slurry from the adjusting units 31, 32, 33, 34 at the time of the above-mentioned replacement of the base material, at the time of suspension such as when changing the lot, or at the time of re-operation after the suspension. By operating the opening and closing of 79, it is possible to select the adjusting unit that discharges the slurry.

  In the above, instead of providing the valves 76, 77, 78, 79, the valves 41, 42, 43, 44 may have an opening / closing function.

  As another embodiment other than the present embodiment, as shown in FIG. 9A, the second manifold 24 is in the middle of the slit 12 and provided with adjustment portions 31, 32, 33, and 34. It may be provided between the portion and the discharge port 18.

  Furthermore, as yet another embodiment, as shown in FIG. 9B, the second manifold 24 is not provided, and the adjusting unit 31 is provided in the middle of the slit 12 (between the first manifold 11 and the discharge port 18). 32, 33, and 34 may be provided.

  The manufacturing apparatus 1 of the present invention is effective when the coating liquid to be applied is a slurry having a high viscosity, and is applied when a product (for example, an optical film) is manufactured by applying a slurry having a high viscosity. Also good.

DESCRIPTION OF SYMBOLS 1 Battery electrode plate manufacturing apparatus 2 Base material 3 Slurry 10 Die 11 First manifold 12 Slit 16 Inflow portion 17 Bottom portion 18 Discharge port 20 Supply means 22 Tank 23 Supply pump 24 Second manifold 31, 32, 33, 34 Adjustment unit 40 Integrated flow path 41, 42, 43, 44 Valve 50 First flow path 55 Switching valve 60 Second flow path 65 Switching valve 68 Suction pump

Claims (4)

A first manifold comprising a space for storing slurry long in the width direction;
A discharge port connected to the first manifold via a wide slit in the width direction and discharging slurry to the substrate;
A plurality of adjusting portions provided across the width direction for adjusting the discharge amount of the slurry from the discharge port by allowing the slurry to flow out from between the first manifold and the discharge port;
A die having
Means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold;
A flow path that divides the flow path of the slurry that has flowed out from the plurality of adjusting sections into a first flow path and a second flow path that is provided with a slurry suction means;
An apparatus for manufacturing a battery electrode plate.   2. The battery according to claim 1, wherein means for switching the flow path of the slurry to the first flow path and the second flow path is provided in the flow path of the slurry discharged from the plurality of adjusting units. Production equipment for electrode plates.   The apparatus for manufacturing a battery electrode plate according to claim 1 or 2, wherein the plurality of adjusting units are provided with a control device for individually controlling the amount of slurry to be discharged. 2. The maintenance method for a battery electrode manufacturing apparatus according to claim 1, wherein the slurry is sucked using the second flow path during maintenance of the die. Maintenance method for manufacturing equipment.

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