JP6215098B2 - Battery plate manufacturing equipment - Google Patents

Description

  The present invention relates to a manufacturing apparatus for manufacturing a battery electrode plate by applying a slurry containing an active material to a base material, and a manufacturing method thereof.

  For example, as in Patent Document 1, a battery electrode plate is manufactured by applying a slurry containing an active material, a binder, a conductive additive, and a solvent to a substrate that is fed in a roll-to-roll manner. In the battery electrode plate manufactured in this way, the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery. In the case of a battery), the film thickness control of the slurry applied to the substrate is very important. That is, the slurry needs to be applied with a uniform thickness along the width direction and the feeding direction of the substrate.

Japanese Patent Laid-Open No. 11-233102

  As described above, the slurry contains an active material and the like, and the active material and the like are mixed and dispersed, but the characteristics vary depending on the method and composition of the slurry, and the dispersed state continues for a long time. Some slurries and other slurries have solid components that settle or aggregate in a short time.

  A die for applying such slurry to a substrate is formed with a manifold (a liquid reservoir) that is long in the width direction and a slit connected to the manifold, as disclosed in Patent Document 1. The slurry is supplied to the manifold and is discharged from the manifold to the substrate through the slit. The slit is formed with a uniform gap size so that the slurry is discharged in a uniform amount along the width direction of the base material. In the case of the unstable slurry as described above, the discharge operation is continuously performed. If this is done, the solid component of the slurry may precipitate or agglomerate in a part of the manifold, and the solid component may stay.

  Slurry is supplied to the manifold from the inlet formed in the center of the die and spreads throughout the manifold, but as described above, when solid components accumulate in a part of the manifold, it is discharged from the slit across the width direction of the die. Variations occur in the amount of slurry to be produced, and variations occur in the thickness of the coating layer formed on the substrate.

  Here, as described above, since the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery, the thickness of the coating layer varies in the electric state. If an electrode plate is manufactured, the quality of the battery using the electrode plate will be reduced. Therefore, in the past, when there is a variation in the amount of slurry discharged in this way, each time the die is disassembled and cleaned, or the width of the slit is adjusted, the amount discharged again becomes a predetermined amount. However, there are problems that it takes time for the work and the success or failure of the adjustment changes depending on the skill level of the worker.

  The present invention has been made in view of the above problems, and it is possible to make the thickness of the coating film layer formed on the substrate uniform even when the slurry is continuously discharged for a long time. Objective.

  The battery electrode plate manufacturing apparatus of the present invention is connected to the first manifold having a space for storing slurry long in the width direction and the first manifold via a wide slit in the width direction. And a supply means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold, the die having a discharge port for discharging to the first manifold. A plurality of adjustment sections that adjust the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or into the first manifold and the first manifold across the width direction. The die is provided with a concave cross-sectional shape of the slurry discharged to the base material under conditions where the adjustment of the discharge amount of the slurry by the adjusting unit is not performed. Characterized in that it has a concave correcting mechanism for correcting the flow of slurry urchin said die.

  According to the present invention, since a plurality of adjustment portions are provided across the width direction, the amount of slurry flowing to the discharge port across the width direction can be adjusted at each adjustment portion, and the amount of slurry discharged from the discharge port can be adjusted. The thickness of the coating film layer can be made uniform by maintaining a predetermined amount in the width direction. In addition, by having a concave correction mechanism, it is possible to mainly adjust the amount of slurry discharged from the end in the width direction with respect to the adjustment of the amount of slurry by the adjustment unit at the start of adjustment, thereby facilitating the adjustment. it can.

  Further, the concave correction mechanism may be a shielding portion provided so as to block a part of the slit at the central portion in the width direction.

  By doing so, a concave correction mechanism can be easily formed.

  The concave correction mechanism may be the first manifold having a shape in which the distance from the discharge port in the width direction approaches from the center to both ends.

  Even in this case, the concave correction mechanism can be easily formed.

  In addition, a second manifold that is long in the width direction and has a smaller volume than the first manifold is provided between the first manifold and the discharge port of the slit, and the adjustment unit includes the first manifold. It is desirable that the two manifolds are provided.

  In this case, the discharge amount of the slurry can be controlled with an appropriate adjustment sensitivity, and the control becomes easy.

  According to the present invention, it is possible to make the thickness of the coating layer formed on the substrate uniform even when the slurry is continuously discharged for a long time.

It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries of this invention. It is sectional drawing of arrow a of FIG. (A) is a top view of the shim board 15, (b) is sectional drawing of b arrow of FIG. It is the example of formation of the coating film layer by the manufacturing apparatus of the electrode plate for batteries of this invention. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is an explanatory diagram showing a schematic configuration of a battery electrode plate manufacturing apparatus. The manufacturing apparatus 1 is an apparatus for applying a slurry 3 containing an active material, a binder, a conductive additive and a solvent to a base material 2 made of a metal foil fed by roll-to-roll. According to this manufacturing apparatus, the layer containing an active material is formed on the base material 2 by drying the applied slurry 3, and the base material 2 is cut into a predetermined shape to form a battery electrode plate. Since the thickness of the layer containing the active material formed on the substrate 2 directly affects the charge / discharge amount of the battery, the film thickness of the coating layer formed by the slurry 3 applied to the substrate 2 is controlled. Is very important. According to this manufacturing apparatus 1, the slurry 3 has a uniform thickness (uniform coating amount) along the feed direction of the base material 2, as described in the following embodiment. Applied. In addition, the width direction of the base material 2 is a direction orthogonal to the feed direction of the base material 2, and the Y-axis direction in FIG. 1 corresponds to this.

  The manufacturing apparatus 1 includes a die 10 that is long along the width direction of the substrate 2, and a supply unit 20 that supplies the slurry 3 to the die 10. In the die 10, the longitudinal direction (the Y-axis direction in FIG. 1) is referred to as the width direction. In this manufacturing apparatus 1, the roller 5 facing the die 10 is installed, and the width direction of the die 10 and the direction of the rotation center line of the roller 5 are parallel. The base material 2 is guided by this roller 5, and the space | interval (gap) between the base material 2 and die | dye 10 (tip of the slit 12 mentioned later) is kept constant, and application | coating of the slurry 3 is performed in this state.

  The die 10 of this embodiment includes a first divided body 13 having a first lip 13a having a tapered shape and a second divided body 14 having a second lip 14a having a tapered shape, and a shim plate 15 therebetween. It is composed of a combination of the two. 2 is a cross-sectional view taken along arrow a in FIG. FIG. 3B is a cross-sectional view taken along the arrow b in FIG. 1, and the shim plate 15 is shown in FIG. The die 10 is formed therein with a first manifold 11 composed of a substantially cylindrical space long in the width direction, and a slit 12 connected to the first manifold 11, and a first lip 13a and a second lip 13a. A discharge port 18 that is an open end of the slit 12 is formed between the lip 14a. That is, the first manifold 11 and the discharge port 18 are connected via the slit 12.

  With this configuration, the slurry 3 supplied by the supply unit 20 is first stored in the first manifold 11 and then discharged from the discharge port 18 via the slit 12.

  The slit 12 is formed long in the width direction similarly to the first manifold 11, and the width direction dimension of the slit 12 is determined by an inner dimension W (see FIG. 3A) of a shim plate 15 to be described later. A slurry 3 having a width direction dimension substantially the same as the width direction dimension of the slit 12 can be applied onto the substrate 2. The clearance dimension (height dimension) of the slit 12 is, for example, 0.4 to 1.5 mm. In the present embodiment, the die 10 is installed in such a posture that the gap direction of the slit 12 is the vertical direction and the width direction is the horizontal direction. That is, the die 10 is installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the horizontal direction. Therefore, the direction in which the slurry 3 stored in the first manifold 11 flows to the base material 2 through the slit 12 and the discharge port 18 is a horizontal direction.

  Note that the pressure (coating pressure) inside the first manifold 11 can be adjusted by changing the thickness of the shim plate 15, and by this adjustment, a uniform film thickness can be obtained with the slurry 3 having various characteristics. It becomes possible to perform coating.

  An inflow portion 16 is provided at the center in the width direction of the die 10, and the inflow portion 16 includes a through hole (inflow port) connected to the first manifold 11 from the outside of the die 10. The supply means 20 supplies the inflow pipe 21 having one end connected to the inflow section 16, the tank 22 storing the slurry 3, and the slurry 3 in the tank 22 to the die 10 through the pipe 21. And a pump 23 for the purpose. As described above, the supply unit 20 can supply the slurry 3 from the inflow portion 16 to the first manifold 11. In the present embodiment, as shown in FIG. 1, the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 is allowed to flow from the bottom portion 17.

  The first manifold 11 can store the slurry 3 supplied from the supply means 20, and the slurry 3 stored in the first manifold 11 passes through the slit 12 from the discharge port 18 to roll-to-roll. The slurry 3 can be discharged onto the base material 2 and the slurry 3 can be continuously applied to the base material 2. The gap dimension of the slit 12 is constant in the width direction, and the thickness of the slurry 3 applied on the substrate 2 is constant in the width direction. Although not shown, a filter for the slurry 3 is provided in the middle of the pipe 21.

  In the middle of the slit 12 (between the first manifold 11 and the discharge port 18), the length in the width direction is the same as that of the first manifold 11 and the slit 12, and the cross-sectional area in the width direction is the first. A second manifold 24 that is smaller than the manifold 11, that is, a substantially cylindrical space having a volume smaller than that of the first manifold is provided, and the second manifold 24 is fed from the first manifold 11. Adjustment units 31, 32, 33, and 34 are provided for allowing the slurry 3 to flow out of the die 10 from other than the discharge port 18, and for allowing the slurry 3 to flow in from other than the inflow portion 16 of the first manifold 11. In the present embodiment, first and second adjustment portions 31 and 32 are provided at both end portions 24a and 24b in the width direction of the second manifold 24, and intermediate portions 24c and 24d between the both end portions 24a and 24b. In addition, third and fourth adjustment sections 33 and 34 are provided.

  The adjustment units 31, 32, 33, and 34 include a through hole that connects the second manifold 24 and the outside of the die 10, and pipes 51, 52, 53, and 54 connected to the through hole. In the present embodiment, one ends of the pipes 51, 52, 53, 54 are connected to the tank 22, and apart from the slurry 3 stored in the tank 22 flowing into the first manifold 11 from the inflow portion 16, It flows into the second manifold 24 from the adjustment units 31, 32, 33, 34. Alternatively, the slurry 3 that has flowed out of the adjusting units 31, 32, 33, and 34 is returned to the tank 22. In addition, it is preferable that a filter is provided in the middle of the pipes 51, 52, 53, and 54 although not shown.

  As described above, in the second manifold 24 of the die 10, the adjustment units 31, 32, which allow the slurry 3 of the first manifold 11 to flow in from other than the inflow portion 16 or to flow out of the die 10 from other than the discharge port 18. Since 33 and 34 are provided in the width direction, the amount of the slurry 3 flowing into the slit 12 from the manifold 11 is not increased in the width direction because, for example, the slurry 3 becomes difficult to flow (stays) at both ends of the manifold 11. Even if it becomes uniform, the amount of the slurry 3 discharged from the discharge port 18 is not uniform in the width direction by adjusting the amount of the slurry 3 flowing out to the discharge port 18 by the adjusting units 31, 32, 33, 34. Can be prevented.

  The reason why the solid component of the slurry 3 is likely to precipitate and aggregate at both ends of the first manifold 11 is that the walls constituting the end face in the width direction of the first manifold 11 are present at these both ends. This is because the slurry 3 supplied from the central portion of the first manifold 11 and spreading to both sides in the width direction tends to have a low flow velocity at both ends, and the slurry 3 tends to stay. In particular, since the slurry 3 has a high viscosity (viscosity), the slurry 3 tends to stay at both ends, and the solid component is likely to precipitate or aggregate.

  Moreover, as the slurry 3 discharged from the die 10 of the manufacturing apparatus 1 of the present embodiment, one having a viscosity of several thousand to several tens of thousands cP (when the shear rate = 1) can be adopted.

  Further, in the present embodiment, each of the adjustment units 31, 32, 33, and 34 is provided with a control device that adjusts the amount of the slurry 3 flowing into or out of the second manifold 24. ing. More specifically, as shown in FIG. 2, valves 61, 62, 63, and 64 are connected to the outflow pipes 51, 52, 53, and 54 as the control device. Each of these valves 61, 62, 63, 64 has a function of adjusting the flow rate of the slurry 3 flowing out from each of the adjusting units 31, 32, 33, 34. Each of the valves 61, 62, 63, 64 may adjust the pressure of the slurry 3 flowing in or out from the adjusting units 31, 32, 33, 34. Alternatively, a device (for example, a pump) that performs flow rate management (outflow amount adjustment) of the slurry 3 is provided in the middle of the pipes 51, 52, 53, 54 that connect the adjustment units 31, 32, 33, 34 and the tank 22. In this case, this device functions as a control device for adjusting the discharge of the slurry 3 flowing into or out of the second manifold 24.

  Further, as will be described later, in the present invention, the die 10 has a concave cross-sectional shape of the slurry 3 discharged to the base material 2 under the condition that the discharge amount of the slurry 3 is not adjusted by the adjusting units 31, 32, 33, and 34. In this embodiment, the shim plate 15 has a portion serving as the concave correction mechanism so that the flow of the slurry 3 in the die 10 is corrected. Thereby, it is possible to easily adjust the discharge amount of the slurry 3 when the conditions for application to the base material 2 are determined (when adjustment is started).

  In addition, the manufacturing apparatus 1 includes a sensor 36 that measures the film thickness of the slurry 3 applied onto the substrate 2 (see FIG. 1). A plurality of sensors 36 may be provided along the width direction. The sensor 36 is a non-contact type, and can measure the film thickness of the slurry 3 on the base material 2 at a plurality of locations along the width direction or over the entire length in the width direction. It is output to the control device (computer) 37 provided. The control device 37 performs feedback control based on the measurement result from the sensor 36 and adjusts the opening degree of the valves 61, 62, 63, 64. That is, according to the measurement result of the film thickness of the slurry 3, the control device 37 outputs a control signal to each of the valves 61, 62, 63, 64, and sets the opening degree of each of the valves 61, 62, 63, 64. adjust. Thereby, the film thickness of the slurry 3 can be kept constant in the width direction.

  Next, the shim plate 15 in the present embodiment will be described with reference to FIG. FIG. 3A is a schematic view of the shim plate 15, and FIG. 3B is a schematic view of a part of the die 10 in which the shim plate 15 is assembled to the second divided body 14.

  As shown in FIG. 3A, the shim plate 15 includes a main body portion 15a that is long in the width direction, and width defining portions 15b and 15c that extend from both sides of the main body portion 15a in the width direction. The width direction dimension (the width direction dimension of the slurry 3 applied to the substrate 2) is determined by the dimension W between the width defining portion 15b and the width defining portion 15c.

  In the present embodiment, the central portion 15a further includes a central protrusion 15d extending in the same direction as the width defining portions 15b and 15c. When the die 10 is formed by incorporating the shim plate 15 having the central protrusion 15d, the central protrusion 15d shields a part of the central portion of the slit 12, as shown in FIG. Here, as seen in FIG. 3B, the central protrusion 15d hides the inflow portion 16, but the first manifold 11 provided with the inflow portion 16 has a substantially cylindrical shape as described above. Since the outer wall is recessed in the depth direction (Z-axis direction) with respect to the shim plate 15, the central protrusion 15 d does not block the inflow portion 16.

  In this way, the central projection 15d shields a part of the central portion of the slit 12, so that the slurry 3 flowing in from the inflow portion 16 and passing through the first manifold 11 is as shown by an arrow in FIG. Since the flow to the central portion is partially obstructed when passing through the slit 12, the flow rate of the slurry 3 discharged from the discharge port 18 tends to be larger at both end portions than at the central portion in the width direction. .

  FIG. 4 shows a cross-sectional shape of the film of the slurry 3 applied to the substrate 2 by the die 10 of the present embodiment.

  When the discharge amount is not controlled by the adjusting units 31, 32, 33, and 34, the flow rate of the slurry 3 discharged from the discharge port 18 is larger at both end portions than at the center portion in the width direction as described above. The cross-sectional shape of the film of the slurry 3 applied to the substrate 2 is a concave shape with a recessed central portion. That is, the central protrusion 15d provided on the shim plate 15 functions as a concave correction mechanism that corrects the flow of the slurry 3 in the die 10 so that the cross-sectional shape of the slurry 3 discharged to the substrate W is concave. doing.

  Thus, when the cross-sectional shape of the film | membrane of the slurry 3 formed in the base material 2 is a concave shape when not adjusting the amount of slurry by the adjustment parts 31, 32, 33, 34, the cross-sectional shape of this film | membrane is changed. In order to make it flat, an adjustment method for reducing the amount of the slurry 3 discharged from the end of the discharge port 18 by causing the slurry 3 to flow out from the adjustment units 31 and 32 corresponding to the end in the width direction, or an adjustment unit corresponding to the center An adjustment method is conceivable in which the amount of the slurry 3 discharged from the central portion of the discharge port 18 is increased by flowing the slurry 3 from 33 and 34.

  On the other hand, when the cross-sectional shape of the film of the slurry 3 is a convex shape, in order to flatten the cross-sectional shape of the film, the slurry 3 is caused to flow in from the adjusting portions 31 and 32 corresponding to the end portions in the width direction. Adjustment method for increasing the amount of slurry 3 discharged from the end of 18 or adjustment for reducing the amount of slurry 3 discharged from the central portion of discharge port 18 by causing slurry 3 to flow out from adjusting portions 33 and 34 corresponding to the central portion A method is conceivable.

  Here, the inventors have empirically learned that, among the above four adjustment methods, the adjustment method for causing the slurry 3 to flow out from the adjustment portions 31 and 32 corresponding to the end portions in the width direction can be adjusted with the highest accuracy. Yes. Therefore, when the amount of slurry is not adjusted by the adjusting portions 31, 32, 33, and 34 as in the present invention, the cross-sectional shape of the film of the slurry 3 formed on the substrate 2 is intentionally made concave so that the width Since the adjustment can be performed mainly by causing the slurry 3 to flow out from the adjusting units 31 and 32 corresponding to the end portions with respect to the direction, it is possible to easily perform the adjustment with high accuracy.

  Next, another embodiment of the die 10 having a concave correction mechanism will be described.

  In the embodiment of FIG. 5, the die 10 (second divided body 14 in FIG. 5) is slit as shown in FIG. 5B, which is a cross-sectional view in the direction a in FIGS. 5A and 5A. 12 has a shielding part 71 which is a projection at the center. The height (dimension in the Z-axis direction) of the shielding part 71 is equal to the thickness of the shim plate 15, and the slit 12 is partially blocked in the shielding part 71.

Since the central portion of the slit 12 is partially blocked in this way, the slurry 3 that has passed through the first manifold 11 is transferred to the central portion when passing through the slit 12 as in this embodiment (see FIG. 3). Therefore, the flow rate of the slurry 3 discharged from the discharge port 18 tends to be larger at both end portions than at the center portion in the width direction.
6 has a form in which the distance between the end on the discharge port 18 side of the first manifold 11 and the discharge port 18 in the width direction approaches from the center to both ends. FIG. 6A shows an embodiment in which the opposite end of the first manifold 11 is a straight shape, and FIG. 6B shows the end on the discharge port 18 side of the opposite end of the first manifold 11. It is an Example which has the shape which the distance with the discharge outlet 18 approaches from a center part to both ends similarly to a part. As in these embodiments, the central portion of the slit 12 has a shape in which the distance between the end on the discharge port 18 side of the first manifold 11 and the discharge port 18 approaches the both ends from the center in the width direction. Even if no shielding portion is provided, the flow rate of the slurry 3 discharged from the discharge port 18 can be made larger at both end portions than at the central portion in the width direction.

  According to the battery plate manufacturing apparatus 1 described above, by adjusting the flow rate of the slurry 3 flowing into or out of the second manifold 24 through the adjusting units 31, 32, 33, and 34, The amount of the slurry 3 discharged from the discharge port 18 is changed. For this reason, it becomes possible to perform stricter control for evenly discharging the slurry 3 from the discharge port 18 over the entire length in the width direction, and the film thickness of the slurry 3 formed on the substrate 2 can be set in the width direction and the feeding direction. Can be made uniform.

  Moreover, the manufacturing apparatus 1 of this invention is not restricted to the form shown in figure, The thing of another form may be sufficient within the scope of the present invention. For example, in the present embodiment (see FIG. 1), the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 is allowed to flow from the bottom portion 17. The structure connected with the side part (intermediate part of a height direction) of the one manifold 11 may be sufficient.

  In the embodiment, the case where the die 10 is installed so that the direction in which the slurry 3 of the first manifold 11 flows from the discharge port 18 to the base material 2 through the slit 12 is horizontal is described. The installation posture of the die 10 may be other than this. For example, the die 10 may be installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the vertical direction. In this case, the slurry 3 of the first manifold 11 is discharged from the discharge port through the slit 12. The die 10 may be installed so that the flow direction from 18 to the base material 2 is upward in the vertical direction.

  Furthermore, although the said embodiment demonstrated the case where the adjustment parts 33 and 34 were provided in the middle part 24c, 24d of two places between both ends 24a and 24b, the number of the adjustment parts provided in a middle part is as follows. Other than this, the adjustment part should just be provided in at least one place in the middle part between both ends 24a and 24b.

  In the present embodiment, the second manifold 24 is provided in the middle of the slit 12, and the adjustment units 31, 32, 33, and 34 are provided in the second manifold 24. 31, 32, 33, 34 may be provided in the slit 12 or the first manifold 11. However, when each adjustment unit is provided in the first manifold 11, the first manifold 11 has a large volume, and the result of the inflow or outflow of the slurry 3 in each adjustment unit is the result of the width direction in the manifold 11. There is a possibility that the flow rate distribution is less likely to be affected. In addition, when each adjustment unit is provided in the slit 12, the space of the slit 12 is conversely narrow, so that the slurry 3 flows in or out at each adjustment unit. As a result, the flow distribution in the width direction in the slit 12 is excessively influenced, which may be difficult to control.

  The manufacturing apparatus 1 of the present invention is effective when the coating liquid to be applied is a slurry having a high viscosity, and is applied when a product (for example, an optical film) is manufactured by applying a slurry having a high viscosity. Also good.

DESCRIPTION OF SYMBOLS 1 Battery electrode plate manufacturing apparatus 2 Base material 3 Slurry 5 Roller 10 Die 11 First manifold 12 Slit 13 First divided body 13a First lip 14 Second divided body 14a Second lip 15 Shim plate 15a Body portion 15b Width Regulation part 15c Width regulation part 15d Center projection part 16 Inflow part 17 Bottom part 18 Discharge port 20 Supply means 21 Inflow pipe 22 Tank 23 Pump 24 Second manifold 24a End part 24b End part 24c Intermediate part 24d Intermediate part 31 Adjustment part 32 Adjustment Part 33 Adjustment part 34 Adjustment part 36 Sensor 37 Control device 51 Pipe 52 Pipe 53 Pipe 54 Pipe 61 Valve 62 Valve 63 Valve 64 Valve 71 Shielding part

Claims (4)

A first manifold having a space for storing slurry long in the width direction and a discharge port for connecting the first manifold via a wide slit in the width direction and discharging the slurry to the substrate were formed. Die,
Supply means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold;
An adjusting unit that adjusts the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or flow into or between the first manifold and the discharge port of the slit. A plurality are provided across the width direction,
The die has a concave correction mechanism that corrects the flow of the slurry in the die so that the cross-sectional shape of the slurry discharged to the base material has a concave shape under the condition that the adjustment of the discharge amount of the slurry by the adjustment unit is not performed. An apparatus for producing an electrode plate for a battery, comprising:   2. The battery electrode plate manufacturing apparatus according to claim 1, wherein the concave correction mechanism is a shielding portion provided so as to block a part of the slit at a central portion in the width direction.   2. The electrode plate according to claim 1, wherein the concave correction mechanism is the first manifold having a shape in which the distance from the discharge port approaches from the center to both ends in the width direction. Manufacturing equipment.   A second manifold that is long in the width direction and has a smaller volume than the first manifold is provided between the first manifold and the discharge port of the slit. The apparatus for manufacturing a battery electrode plate according to any one of claims 1 to 3, wherein the apparatus is provided in a manifold.

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