JP2016167402A - Apparatus for manufacturing electrode plate for battery - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing apparatus for an electrode plate for a battery that can adjust the flow rate of slurry discharged from a slit with high precision to make uniform the thickness of a coating layer formed on a base material.SOLUTION: A manufacturing apparatus for an electrode plate for a battery includes a first manifold 11 comprising a space for storing slurry in an elongated form in the width direction, a die 10 which is connected to the first manifold 11 via a slit 12 wide in the width direction and has a discharge port 18 for discharging the slurry 3 to a base material 2, and supply means 20 for supplying the slurry to the first manifold 11 from an inlet portion 16 intercommunicating with the first manifold 11. Plural second manifolds 24a to 24d having adjusting parts 31 to 34 which adjust the discharge amount of the slurry 3 from the discharge port 18 by making the slurry 3 flow out or flow in are provided over the width direction between the first manifold 11 of the slit 12 and the discharge port 18 so as to be spaced from one another.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a manufacturing apparatus for manufacturing a battery electrode plate by applying a slurry containing an active material to a base material, and a manufacturing method thereof.

  The battery electrode plate is manufactured by applying a slurry containing an active material, a binder, a conductive additive, and a solvent to a base material that is fed roll-to-roll. In the battery electrode plate manufactured in this way, the thickness of the layer containing the active material formed on the substrate directly affects the charge / discharge amount of the battery. In the case of a battery), the film thickness control of the slurry applied to the substrate is very important. That is, the slurry needs to be applied with a uniform thickness along the width direction and the feeding direction of the substrate.

  For example, in Patent Document 1, in a coating apparatus that discharges slurry from a slit of a die and applies the slurry to a substrate, a plurality of second manifolds provided in the middle of the slit are dealt with. By arranging the adjusting portions in the width direction of the slit and adjusting the supply amount of the slurry to the discharge port so that the amount of slurry discharged from the slit becomes uniform in the width direction of the slit, the width direction The method of making uniform the thickness of the slurry on the base material in is taken.

Japanese Patent Application No. 2013-213851

  However, in the die shown in Patent Document 1, it may be difficult to control the amount of slurry discharged from the slit to be uniform. Specifically, in the range in which the adjustment of the amount of slurry supplied to the discharge port by the adjusting unit extends, when an overlapping part occurs between adjacent adjusting parts, interference occurs in the overlapping part, Adjustment amount increases locally. Therefore, there is a problem that it becomes difficult to control the amount of slurry discharged from the slit to be uniform in the width direction.

  The present invention has been made in view of the above problems, and it is possible to control the amount of slurry discharged from the slit with high accuracy so that the thickness of the coating layer formed on the substrate is uniform. Objective.

  The battery electrode plate manufacturing apparatus of the present invention is connected to the first manifold having a space for storing slurry long in the width direction and the first manifold via a wide slit in the width direction. And a supply means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold, the die having a discharge port for discharging to the first manifold. A plurality of second manifolds having an adjustment unit that adjusts the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or flow in between the one manifold and the discharge port are separated from each other. It is provided over the width direction.

  According to the present invention, since the plurality of second manifolds having the adjusting portions are provided across the width direction so as to be separated from each other, the amount of the slurry supplied to the discharge port between the adjacent second manifolds can be reduced. The interference of the adjustment can be suppressed, and the discharge amount of the slurry in the entire die can be accurately controlled in the width direction.

  Moreover, the said adjustment part is good to be provided in the approximate center part of the said 2nd manifold regarding the said width direction.

  By doing so, the adjustment amount of the slurry supply amount to the discharge port in each second manifold can be eliminated.

  In addition, the adjustment unit exclusively causes the slurry to flow out of the slit, and among the second manifolds, the one far from the inflow portion in the width direction has a larger volume than the one close to the inflow portion. Also good.

  By doing so, any of the second manifolds can have a uniform adjustment amount distribution in the width direction.

  In addition, the adjustment unit exclusively allows the slurry to flow into the slit, and among the second manifolds, the one close to the inflow portion in the width direction has a larger volume than the one far from the inflow portion. Also good.

  By doing so, any of the second manifolds can have a uniform adjustment amount distribution in the width direction.

  According to the present invention, the amount of slurry discharged from the slit can be accurately controlled, and the thickness of the coating film layer formed on the substrate can be made uniform.

(A) is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries of this invention, (B) is a top view of the shim board 15. FIG. It is sectional drawing of arrow a of FIG. It is sectional drawing of b arrow view of FIG. 1 (A). It is a schematic diagram which shows the adjustment state of the slurry supply amount by an adjustment part, (A) is a thing of the manufacturing apparatus of the battery electrode plate of this invention, (B) is the manufacturing apparatus of the conventional battery electrode plate. belongs to. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment. It is explanatory drawing which shows schematic structure of the manufacturing apparatus of the electrode plate for batteries in other embodiment. It is explanatory drawing which shows the structure of die | dye of other embodiment. It is the example of formation of the coating film layer by the manufacturing apparatus of the battery electrode plate of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is an explanatory diagram showing a schematic configuration of a battery electrode plate manufacturing apparatus. The manufacturing apparatus 1 is an apparatus for applying a slurry 3 containing an active material, a binder, a conductive additive and a solvent to a base material 2 made of a metal foil fed by roll-to-roll. According to this manufacturing apparatus, the layer containing an active material is formed on the base material 2 by drying the applied slurry 3, and the base material 2 is cut into a predetermined shape to form a battery electrode plate. Since the thickness of the layer containing the active material formed on the substrate 2 directly affects the charge / discharge amount of the battery, the film thickness of the coating layer formed by the slurry 3 applied to the substrate 2 is controlled. Is very important. According to this manufacturing apparatus 1, the slurry 3 has a uniform thickness (uniform coating amount) along the feed direction of the base material 2, as described in the following embodiment. Applied. In addition, the width direction of the base material 2 is a direction orthogonal to the feed direction of the base material 2, and the Y-axis direction in FIG. 1 corresponds to this.

  The manufacturing apparatus 1 includes a die 10 that is long along the width direction of the substrate 2, and a supply unit 20 that supplies the slurry 3 to the die 10. In the die 10, the longitudinal direction (the Y-axis direction in FIG. 1) is referred to as the width direction. In this manufacturing apparatus 1, the roller 5 facing the die 10 is installed, and the width direction of the die 10 and the direction of the rotation center line of the roller 5 are parallel. The base material 2 is guided by this roller 5, and the space | interval (gap) between the base material 2 and die | dye 10 (tip of the slit 12 mentioned later) is kept constant, and application | coating of the slurry 3 is performed in this state.

  The die 10 of this embodiment includes a first divided body 13 having a first lip 13a having a tapered shape and a second divided body 14 having a second lip 14a having a tapered shape, and a shim plate 15 therebetween. It is composed of a combination of the two. 2 is a cross-sectional view taken along arrow a in FIG. 3A is a cross-sectional view taken along arrow b in FIG. 1, and the shim plate 15 is shown in FIG. The die 10 is formed therein with a first manifold 11 having a long space in the width direction, and a slit 12 connected to the first manifold 11, and a first lip 13a and a second lip 14a. A discharge port 18 that is an open end of the slit 12 is formed therebetween. That is, the first manifold 11 and the discharge port 18 are connected via the slit 12.

  With this configuration, the slurry 3 supplied by the supply unit 20 is first stored in the first manifold 11 and then discharged from the discharge port 18 via the slit 12.

  The slit 12 is formed long in the width direction similarly to the first manifold 11, and the width-direction dimension of the slit 12 is determined by the inner dimension W of the substantially U-shaped shim plate 15 shown in FIG. Then, the slurry 3 having a width direction dimension substantially the same as the width direction dimension of the slit 12 can be applied onto the substrate 2. The clearance dimension (height dimension) of the slit 12 is, for example, 0.4 to 1.5 mm. In the present embodiment, the die 10 is installed in such a posture that the gap direction of the slit 12 is the vertical direction and the width direction is the horizontal direction. That is, the die 10 is installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the horizontal direction. Therefore, the direction in which the slurry 3 stored in the first manifold 11 flows to the base material 2 through the slit 12 and the discharge port 18 is a horizontal direction.

  Note that the pressure (coating pressure) inside the first manifold 11 can be adjusted by changing the thickness of the shim plate 15, and by this adjustment, a uniform film thickness can be obtained with the slurry 3 having various characteristics. It becomes possible to perform coating.

  An inflow portion 16 is provided at the center in the width direction of the die 10, and the inflow portion 16 includes a through hole (inflow port) connected to the first manifold 11 from the outside of the die 10. The supply means 20 supplies the inflow pipe 21 having one end connected to the inflow section 16, the tank 22 storing the slurry 3, and the slurry 3 in the tank 22 to the die 10 through the pipe 21. And a pump 23 for the purpose. As described above, the supply unit 20 can supply the slurry 3 from the inflow portion 16 to the first manifold 11. In the present embodiment, as shown in FIG. 1, the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 is allowed to flow from the bottom portion 17.

  The first manifold 11 can store the slurry 3 supplied from the supply means 20, and the slurry 3 stored in the first manifold 11 passes through the slit 12 from the discharge port 18 to roll-to-roll. The slurry 3 can be discharged onto the base material 2 and the slurry 3 can be continuously applied to the base material 2. The gap dimension of the slit 12 is constant in the width direction, and the thickness of the slurry 3 applied on the substrate 2 is configured to be constant in the width direction.

  The die 10 is provided with a pressure sensor (not shown), and this pressure sensor measures the internal pressure of the slurry 3 in the first manifold 11. Then, based on the measurement result, the supply of the slurry 3 by the supply means 20 is controlled, and the internal pressure of the slurry 3 in the first manifold 11 is kept constant. The slurry 3 whose internal pressure is constant in the first manifold 11 is discharged in an equal amount from the slit 12 over the entire length in the width direction, and is discharged from the discharge port 18 based on the measurement result of the pressure sensor. The amount of 3 is controlled so as not to fluctuate, and the thickness in the feed direction of the slurry 3 applied on the substrate 2 is made constant. Although not shown, a filter for the slurry 3 is provided in the middle of the pipe 21.

  Here, in the present embodiment, as shown in FIGS. 2 and 3, in the middle of the slit 12 (between the first manifold 11 and the discharge port 18), the length in the width direction is the first manifold. A plurality of second manifolds 24 a to 24 d shorter than 11 and smaller in volume than the first manifold 11 are provided so as to be separated from each other in the width direction. In the present description, the second manifolds 24a to 24d are collectively referred to as the second manifold 24. Here, the adjacent second manifolds 24 are separated from each other but are not completely blocked, and the slits 12 exist between the second manifolds 24.

  Then, the slurry 3 of the first manifold 11 is caused to flow out of the die 10 from the portion other than the discharge port 18 or to the second manifold 24 from the portion other than the inflow portion 16 of the first manifold 11. Adjustment units 31, 32, 33, and 34 are provided. In the present embodiment, the first and second adjusting portions 31 and 32 are provided in the second manifolds 24a and 24b located in the vicinity of both ends 12a and 12b in the width direction of the slit 12, and the both ends 12a and 12b Third and fourth adjusting portions 33 and 34 are provided on the second manifolds 24c and 24d located in the vicinity of the intermediate portions 12c and 12d therebetween.

  The adjustment units 31 to 34 include a through hole that connects the slit 12 and the outside of the die 10, and pipes 51, 52, 53, 54 connected to the through hole. In the present embodiment, one ends of the pipes 51 to 54 are connected to the tank 22, and separately from the slurry 3 stored in the tank 22 flowing into the first manifold 11 from the inflow portion 16, the adjusting portions 31 to 34 flows into the slit 12. Alternatively, the slurry 3 that has flowed out of the adjusting units 31 to 34 is returned to the tank 22. In addition, it is preferable that a filter (not shown) is provided in the middle of the pipes 51 to 54.

  As described above, each of the second manifolds 24 is provided with adjusting portions 31 to 34 that allow the slurry 3 of the first manifold 11 to flow in from other than the inflow portion 16 or flow out of the die 10 from other than the discharge port 18. 12 is provided in the width direction, for example, the slurry 3 is difficult to flow (stays) at both ends of the manifold 11, so that the amount of the slurry 3 flowing into the slit 12 from the manifold 11 is uneven in the width direction. Even if it becomes, the amount of the slurry 3 discharged from the discharge port 18 is prevented from becoming uneven in the width direction by adjusting the amount of the slurry 3 flowing out from the discharge port 18 by the adjusting units 31 to 34. Can do.

  The reason why the solid component of the slurry 3 is likely to precipitate and aggregate at both ends of the first manifold 11 is that the walls constituting the end face in the width direction of the first manifold 11 are present at these both ends. This is because the slurry 3 supplied from the central portion of the first manifold 11 and spreading to both sides in the width direction tends to have a low flow velocity at both ends, and the slurry 3 tends to stay. In particular, since the slurry 3 has a high viscosity (viscosity), the slurry 3 tends to stay at both ends, and the solid component is likely to precipitate or aggregate.

  Moreover, as the slurry 3 discharged from the die 10 of the manufacturing apparatus 1 of the present embodiment, one having a viscosity of several thousand to several tens of thousands cP (when the shear rate = 1) can be adopted.

  Here, in the present invention, the adjusting portions 31 to 34 are provided not in the first manifold but in each second manifold 24. This is because the first manifold 11 is formed to have a large cross-sectional area in the width direction in order to spread the slurry 3 flowing in from the inflow portion 16 over the entire first manifold 11, that is, the volume is increased. First, when the adjustment units 31 to 34 are provided in the manifold, even if the local slurry amount is adjusted by each adjustment unit, the sensitivity is poor and it is difficult to obtain a sufficient adjustment effect.

  On the other hand, by providing the adjustment units 31 to 34 in each second manifold 24 having a smaller volume than the first manifold 11, the adjustment in each adjustment unit is reflected in the discharge amount from the discharge port 18 with high sensitivity. Is possible.

  Further, compared with the case where the adjustment parts 31 to 34 are provided directly in the slit 12, if the adjustment parts 31 to 34 are provided directly in the slit 12, the adjustment sensitivity is too good and the discharge amount of the slurry 3 from the discharge port 18 is reduced. In contrast, in this embodiment, the adjustment sensitivity can be moderately moderated to easily adjust the discharge amount of the slurry 3.

  Further, in the present embodiment, each of the adjustment units 31 to 34 is provided with a control device that adjusts the amount of the slurry 3 flowing into or out of each second manifold 24. Yes. Specifically, as shown in FIG. 2, valves 61, 62, 63, and 64 are connected to the outflow pipes 51 to 54 as the control device. Each of these valves 61 to 64 has a function of adjusting the flow rate of the slurry 3 flowing out from each of the adjusting units 31 to 34. Note that each of the valves 61 to 64 may adjust the pressure of the slurry 3 flowing in or out of each of the adjusting units 31 to 34. Alternatively, a device (for example, a pump) that performs flow rate management (outflow amount adjustment) of the slurry 3 may be provided in the middle of the pipes 51 to 54 that connect the adjustment units 31 to 34 and the tank 22. This device functions as a control device that adjusts the discharge of the slurry 3 flowing into or out of the slit 12.

  In addition, the manufacturing apparatus 1 includes a sensor 36 that measures the film thickness of the slurry 3 applied onto the substrate 2 (see FIG. 1A). A plurality of sensors 36 may be provided along the width direction. The sensor 36 is a non-contact type, and can measure the film thickness of the slurry 3 on the base material 2 at a plurality of locations along the width direction or over the entire length in the width direction. It is output to the control device (computer) 37 provided. The control device 37 performs feedback control based on the measurement result from the sensor 36 and adjusts the opening degree of the valves 61 to 64. That is, according to the measurement result of the film thickness of the slurry 3, the control device 37 outputs a control signal to each of the valves 61 to 64, and adjusts the opening degree of each of the valves 61 to 64. Thereby, the film thickness of the slurry 3 can be kept constant in the width direction.

  The opening degree of the valves 61 to 64 may be controlled by a timer function of the control device 37 instead of the sensor 36. That is, when a certain time elapses from the start of coating, precipitation and aggregation of the solid components of the slurry 3 becomes a problem. Therefore, a predetermined time before this time elapses is measured with a timer, and when the predetermined time elapses, the control device 37 may perform control to increase the opening degree of the valves 61 to 64.

  Further, in the present embodiment, the second manifolds 24c and 24d located in the vicinity of the midway portions 12c and 12d between the both end portions 12a and 12b of the slit 12 are also provided with adjusting portions 33 and 34, respectively. It is suppressed that the flow volume of the slurry 3 increases only by the parts 12a and 12b. And by adjusting the opening degree of the valves 63 and 64 connected to the second manifolds 24c and 24d, the slurry 3 is formed on the base material 2 even if the discharge operation of the slurry 3 is continued for a long time. It is possible to make the film thickness of the slurry 3 uniform.

  For example, from the start of the coating operation using the die 10 until a certain time, the first manifold 11 is unlikely to precipitate and agglomerate solid components of the slurry 3 including both ends, and the discharge port 18. A uniform discharge amount can be obtained over the entire width. For this reason, the opening degrees of the valves 61 to 64 are all the same (the opening degree may be zero).

  However, when a certain amount of time has passed and both solid ends of the first manifold 11 are likely to be precipitated and aggregated, the opening degree of the valves 61 and 62 corresponding to both ends is greatly changed. Thereby, the slurry 3 is replenished at both ends, and it is possible to prevent the discharge amount of the slurry 3 from decreasing at both ends of the slit 12.

  And when the opening degree of the valves 61 and 62 on both sides is greatly changed, the discharge amount of the slurry 3 tends to change at both ends in the width direction of the discharge port 18, which causes the width direction of the slit 12. A phenomenon in which the flow rate of the slurry 3 temporarily changes also occurs in the middle portions 12c and 12d adjacent to the center side of the slurry.

  Therefore, when a large amount of precipitation or aggregation of solid components is likely to occur at both ends of the first manifold 11, the opening degree of the valves 61 and 62 corresponding to the both ends 12a and 12b of the slit 12 is changed gradually (gradually). At the same time, control is performed in which the opening degree of the valves 63 and 64 corresponding to the midway portions 12c and 12d is also changed gradually (gradually). In addition, the opening degree of the valves 63 and 64 during the opening degree change is made smaller than the opening degree of the valves 61 and 62 during the opening degree change, and the inflow of the slurry 3 from the adjusting units 33 and 34 provided in the middle. The amount is made smaller than the inflow amount of the slurry 3 from the adjusting portions 31 and 32 at both ends. Further, at this time, the internal pressure of the slurry 3 in the first manifold 11 is also controlled to be constant.

  According to the above control, the amount of the slurry 3 discharged from the discharge port 18 is changed by adjusting the flow rate of the slurry 3 flowing into or out of the slit 12 through the adjusting units 31 to 34. For this reason, it becomes possible to perform stricter control for evenly discharging the slurry 3 from the discharge port 18 over the entire length in the width direction, and the film thickness of the slurry 3 formed on the substrate 2 can be set in the width direction and the feeding direction. Can be made uniform.

  Next, the effect of the present invention will be described with reference to FIG.

  In the present invention, as described above, the second manifolds 24 a to 24 d having the adjusting portions 31 to 34 are arranged in the width direction (Y-axis direction) of the die 10, and the adjacent second manifolds 24 are arranged. There is a slit 12 between them.

  Here, at the end of the second manifold 24 in the width direction (the boundary between the second manifold 24 and the slit 12), there is a sudden change in the cross-sectional area. Therefore, as shown by a two-dot chain line in FIG. 4A, the adjustment of the flow rate of the slurry 3 by the adjusting units 31 to 34 is effected at the back of the end, that is, in the gap between the adjacent second manifolds 24. It decreases rapidly.

  FIG. 4B shows a conventional die 10 provided with a second manifold 25 continuous in the width direction. In this case, a sudden change in the cross-sectional area is caused in the second manifold 25. Since there is no portion to have, the influence of the adjustment of the flow rate of the slurry 3 by the adjusting units 31 to 34 is wider than that of the present embodiment. Therefore, as shown by a two-dot chain line and hatching in FIG. 4B, interference occurs in adjusting the flow rate of the slurry 3 between the adjacent adjustment units, and the slurry 3 heading toward the discharge port 18 at a position intermediate between the adjustment units. There is a possibility that the increase or decrease of the flow rate will be larger than necessary.

  On the other hand, in this embodiment, since the influence of the adjustment of the flow rate of the slurry 3 by the adjustment units 31 to 34 is small in the gap between the adjacent second manifolds 24, the interference between the adjustment units can be reduced. An increase or decrease in the flow rate of the slurry 3 toward the discharge port 18 can be prevented from becoming larger than necessary.

  On the other hand, if the influence of the adjustment of the flow rate of the slurry 3 by the adjusting portions 31 to 34 does not affect the gap between the adjacent second manifolds 24, the flow rate of the slurry 3 in the gap portion cannot be controlled, which is not preferable. . Therefore, the dimension of the gap between the adjacent second manifolds 24 as indicated by the distance d in FIG. 4A is desirably 10 mm or less. In the present embodiment, the dimensions of the three existing gaps are all represented by the distance d, but they are not necessarily uniform gaps.

  Next, the structure of the die 10 according to another embodiment is shown in FIGS.

  In the embodiment shown in FIG. 5, among the second manifolds 24 arranged in the width direction (Y-axis direction), those far from the inflow portion 16 (second manifolds 24 a and 24 b in FIG. 5) The volume is larger than those close to 16 (second manifolds 24c and 24d in FIG. 5). In this embodiment, the adjusting units 31 to 34 flow the slurry 3 out of the slit 12 exclusively.

  Here, when the slurry 3 is applied from the die 10 to the base material 2 without operating the adjustment units 31 to 34, the cross-sectional shape in the width direction of the slurry 3 on the base material 2 is a portion where the inflow portion 16 is located. Often has a convex shape with a maximum thickness. Therefore, if the adjusting units 31 to 34 allow the slurry 3 to flow out of the slit 12 exclusively, the closer the second manifold 24 (second manifolds 24c and 24d) to the inflow portion 16 is, the farther from the inflow portion 16 is. By adjusting the outflow amount of the slurry 3 larger than that of the second manifold 24 (second manifolds 24a and 24b), the slurry 3 having a uniform thickness over the width direction can be formed on the substrate 2.

  Accordingly, in the adjusting portions 31 and 32 provided in the second manifolds 24a and 24b, the opening degree of the valve 61 and the valve 62 becomes small. When the opening degree of the valve is small like this, the amount of the slurry 3 is adjusted. It becomes difficult to reach the entire second manifold 24. That is, the flow rate of the slurry 3 in the width direction may be uneven in the second manifold 24.

  Here, for the same reason as increasing the volume of the first manifold 11, the volume of the second manifold 24 is increased, so that the adjustment of the amount of the slurry 3 can be easily spread throughout the second manifold 24. be able to. That is, it is possible to obtain a uniform adjustment amount distribution in the width direction.

  On the other hand, the total length of the second manifold 24 needs to be equal to or less than the inner dimension of the shim 15 (the width W in FIG. 1B) due to the structure of the die 10 and is limited. Here, as in the embodiment shown in FIG. 5, the size of the second manifolds 24a and 24b is increased by increasing the size in the width direction. Instead, the size of the second manifolds 24c and 24d in the width direction is increased. As a result of reducing the total length of the second manifold 24, any of the second manifolds 24 can have a uniform adjustment amount distribution in the width direction.

  Further, as a means for increasing the volume of the second manifolds 24a and 24b, dimensions other than the width direction may be increased. In the embodiment of FIG. 6, the volume of the second manifolds 24a and 24b is increased by increasing the size in the X-axis direction as well as the width direction (Y-axis direction). Further, the volume of the second manifolds 24a and 24b may be increased by increasing the dimension in the Z-axis direction.

  In addition, unlike the embodiment of FIG. 5, when the adjusting units 31 to 34 exclusively flow the slurry 3 into the slit 12, in order to make the cross section of the slurry 3 applied on the base material 2 uniform in the width direction. The second manifold 24 (second manifolds 24a and 24b) farther from the inflow portion 16 needs to have a larger adjustment amount. Therefore, in this case, contrary to the embodiment of FIG. 5, the second manifold (second manifolds 24c and 24d) close to the inflow portion 16 is distant from the inflow portion 16 as shown in FIG. By making the volume larger than that of the second manifolds 24a and 24b), it is possible to obtain a uniform adjustment amount distribution in the width direction in any of the second manifolds 24.

  As described above, it is possible to make the thickness of the coating film layer formed on the substrate uniform by accurately controlling the amount of slurry discharged from the slit.

  Moreover, the manufacturing apparatus 1 of this invention is not restricted to the form shown in figure, The thing of another form may be sufficient within the scope of the present invention. For example, in the present embodiment (see FIG. 1A), the cross-sectional shape of the second manifold 24 in the width direction (Y-axis direction) is substantially circular or elliptical, but is not limited thereto, and FIG. It may be semicircular or semielliptical as shown in FIG. However, in order to prevent the slurry 3 from staying in the second manifold 24, a cross-sectional shape having no corners is preferable.

  In the present embodiment, the adjustment units 31 to 34 are connected to the second manifold 24 from below, but the present invention is not limited to this, and the adjustment units 31 to 34 may be connected from above as shown in FIG. Here, considering the resistance at the time of supply or discharge of the slurry 3 in the adjustment units 31 to 34, if the adjustment units 31 to 34 flow the slurry 3 exclusively into the slit 12, the adjustment units 31 to 34 are from above. Preferably, it is connected to the second manifold 24. Conversely, if the adjusting units 31 to 34 flow the slurry 3 exclusively from the slit 12, the adjusting units 31 to 34 are connected to the second manifold 24 from below. It is preferable that it is connected to.

  Further, in the present embodiment, the slurry 3 is supplied or discharged from a direction substantially perpendicular to the slit 12, but the present invention is not limited to this, and as shown in FIG. 8C, the slurry 3 is directed from a direction substantially parallel to the slit 12. It may be supplied or discharged. That is, a connecting portion to the adjusting portions 31 to 34 may be provided on the opposite side of the die 10 from the discharge port 18.

  In the present embodiment, the inflow portion 16 is connected to the bottom portion 17 of the first manifold 11, and the slurry 3 is allowed to flow in from the bottom portion 17, but the inflow portion 16 is connected to the first manifold 11. The structure connected with the side part (intermediate part of a height direction) may be sufficient.

  In the embodiment, the case where the die 10 is installed so that the direction in which the slurry 3 of the first manifold 11 flows from the discharge port 18 to the base material 2 through the slit 12 is horizontal is described. The installation posture of the die 10 may be other than this. For example, the die 10 may be installed in such a posture that the first manifold 11 and the slit 12 are arranged side by side in the vertical direction. In this case, the slurry 3 of the first manifold 11 is discharged from the discharge port through the slit 12. The die 10 may be installed so that the flow direction from 18 to the base material 2 is upward in the vertical direction.

  Furthermore, although the said embodiment demonstrated the case where the adjustment parts 33 and 34 were provided in the middle parts 12c and 12d of two places between both ends 12a and 12b, the number of the adjustment parts provided in a middle part is Other than this, the adjustment part should just be provided in the middle part between the both ends 12a and 12b at least one place.

  The manufacturing apparatus 1 of the present invention is effective when the coating liquid to be applied is a slurry having a high viscosity, and is applied when a product (for example, an optical film) is manufactured by applying a slurry having a high viscosity. Also good.

  In the above description, the thickness of the coating layer formed on the substrate 2 is made uniform in the width direction by making the discharge amount from the discharge port 18 uniform in the width direction. The discharge amount of the discharge port 18 is not limited to be uniform over the width direction. For example, as shown in FIG. 9 (A), when the thickness of the coating layer formed on the substrate 2 changes so that the thickness of the end portion decreases with time, the slurry at both ends of the slit 12 is adjusted by each adjusting portion. The flow rate of 3 should be increased. As a result, as shown in FIG. 9B, the shape of the coating layer is thickened at the end in the width direction immediately after discharge, but the thickness at the end decreases with time, resulting in a thickness in the width direction. A uniform coating layer can be obtained.

DESCRIPTION OF SYMBOLS 1 Battery electrode plate manufacturing apparatus 2 Base material 3 Slurry 5 Roller 10 Die 11 First manifold 12 Slit 13 First divided body 13a First lip 14 Second divided body 14a Second lip 15 Shim plate 16 Inflow part 17 Bottom part 18 Discharge Port 20 Supply Unit 21 Inflow Pipe 22 Tank 23 Pump 24 Second Manifold 24a Second Manifold 24b Second Manifold 24c Second Manifold 24d Second Manifold 25 Second Manifold 31 Adjusting Unit 32 Adjusting Unit 33 Adjustment unit 34 Adjustment unit 36 Sensor 37 Control device 51 Pipe 52 Pipe 53 Pipe 54 Pipe 61 Valve 62 Valve 63 Valve 64 Valve

Claims (4)

A first manifold having a space for storing slurry long in the width direction and a discharge port for connecting the first manifold via a wide slit in the width direction and discharging the slurry to the substrate were formed. Die,
Supply means for supplying slurry to the first manifold from an inflow portion communicating with the first manifold;
A plurality of second manifolds having an adjusting portion for adjusting the discharge amount of the slurry from the discharge port by allowing the slurry to flow out or flow in between the first manifold and the discharge port of the slit. Are provided across the width direction so as to be separated from each other.   2. The battery electrode plate manufacturing apparatus according to claim 1, wherein the adjustment portion is provided at a substantially central portion of the second manifold in the width direction.   The adjustment unit exclusively drains the slurry from the slit, and among the second manifolds, the one far from the inflow portion in the width direction has a larger volume than the one close to the inflow portion. An apparatus for producing an electrode plate for a battery according to any one of claims 1 and 2.   The adjusting part is for exclusively allowing the slurry to flow into the slit, and among the second manifolds, the one close to the inflow part in the width direction has a larger volume than that far from the inflow part. An apparatus for producing an electrode plate for a battery according to any one of claims 1 and 2.

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