JP2015146047A5 - - Google Patents

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Publication number
JP2015146047A5
JP2015146047A5 JP2015094362A JP2015094362A JP2015146047A5 JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5 JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5
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Japan
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gas
flow
lithographic apparatus
supply line
pressure
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JP2015094362A
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English (en)
Japanese (ja)
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JP2015146047A (ja
JP6145131B2 (ja
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Publication of JP2015146047A5 publication Critical patent/JP2015146047A5/ja
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JP2015094362A 2011-12-20 2015-05-01 ポンプシステム、二酸化炭素供給システム、抽出システム、リソグラフィ装置、およびデバイス製造方法 Active JP6145131B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161578114P 2011-12-20 2011-12-20
US61/578,114 2011-12-20

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2012271675A Division JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2015146047A JP2015146047A (ja) 2015-08-13
JP2015146047A5 true JP2015146047A5 (https=) 2016-01-21
JP6145131B2 JP6145131B2 (ja) 2017-06-07

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ID=48609815

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012271675A Active JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置
JP2015094362A Active JP6145131B2 (ja) 2011-12-20 2015-05-01 ポンプシステム、二酸化炭素供給システム、抽出システム、リソグラフィ装置、およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2012271675A Active JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置

Country Status (6)

Country Link
US (1) US9575406B2 (https=)
JP (2) JP6010445B2 (https=)
KR (1) KR101410847B1 (https=)
CN (1) CN103176367B (https=)
NL (1) NL2009899A (https=)
TW (1) TWI461860B (https=)

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CN121002450A (zh) * 2023-04-04 2025-11-21 Asml荷兰有限公司 流体处理系统和方法以及制造器件的方法
CN119439646B (zh) * 2024-12-10 2026-03-31 上海新毅东半导体科技有限公司 光刻机的微环境控制架构

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