JP2015146047A5 - - Google Patents
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- Publication number
- JP2015146047A5 JP2015146047A5 JP2015094362A JP2015094362A JP2015146047A5 JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5 JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- flow
- lithographic apparatus
- supply line
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 10
- 239000012530 fluid Substances 0.000 claims 6
- 239000007788 liquid Substances 0.000 claims 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 5
- 239000001569 carbon dioxide Substances 0.000 claims 5
- 230000005499 meniscus Effects 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- 238000011144 upstream manufacturing Methods 0.000 claims 3
- 238000000605 extraction Methods 0.000 claims 2
- 230000001105 regulatory effect Effects 0.000 claims 2
- 239000000284 extract Substances 0.000 claims 1
- 238000004064 recycling Methods 0.000 claims 1
- 238000005201 scrubbing Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161578114P | 2011-12-20 | 2011-12-20 | |
| US61/578,114 | 2011-12-20 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012271675A Division JP6010445B2 (ja) | 2011-12-20 | 2012-12-12 | 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015146047A JP2015146047A (ja) | 2015-08-13 |
| JP2015146047A5 true JP2015146047A5 (enExample) | 2016-01-21 |
| JP6145131B2 JP6145131B2 (ja) | 2017-06-07 |
Family
ID=48609815
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012271675A Active JP6010445B2 (ja) | 2011-12-20 | 2012-12-12 | 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置 |
| JP2015094362A Active JP6145131B2 (ja) | 2011-12-20 | 2015-05-01 | ポンプシステム、二酸化炭素供給システム、抽出システム、リソグラフィ装置、およびデバイス製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012271675A Active JP6010445B2 (ja) | 2011-12-20 | 2012-12-12 | 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9575406B2 (enExample) |
| JP (2) | JP6010445B2 (enExample) |
| KR (1) | KR101410847B1 (enExample) |
| CN (1) | CN103176367B (enExample) |
| NL (1) | NL2009899A (enExample) |
| TW (1) | TWI461860B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2005655A (en) | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| NL2007453A (en) | 2010-10-18 | 2012-04-19 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
| NL2009378A (en) * | 2011-10-07 | 2013-04-09 | Asml Netherlands Bv | Lithographic apparatus and method of cooling a component in a lithographic apparatus. |
| US10122591B1 (en) * | 2013-03-13 | 2018-11-06 | Google Llc | Managing access to no-cost content |
| CN104238277B (zh) * | 2013-06-19 | 2016-12-28 | 上海微电子装备有限公司 | 一种浸没式光刻机的流场维持方法 |
| KR101408834B1 (ko) * | 2014-01-06 | 2014-06-20 | 한국지역난방공사 | 배기가스 정량 공급이 가능한 산업설비용 추기장치 |
| JP2017538159A (ja) * | 2014-12-19 | 2017-12-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 流体取扱構造、リソグラフィ装置及びデバイス製造方法 |
| WO2017036830A1 (en) * | 2015-08-31 | 2017-03-09 | Asml Netherlands B.V. | A gas leak detector and a method of detecting a leak of gas |
| US10883866B2 (en) * | 2015-09-24 | 2021-01-05 | Fujikin Incorporated | Pressure-based flow rate control device and malfunction detection method therefor |
| CN107991384B (zh) * | 2017-12-21 | 2023-10-13 | 浙江启尔机电技术有限公司 | 一种微管内气液两相流流型的检测装置及方法 |
| CN109976098B (zh) * | 2019-03-22 | 2024-04-12 | 福建华佳彩有限公司 | 一种光阻刀头 |
| DE102020204545A1 (de) * | 2020-04-08 | 2021-10-14 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum trocknen eines bauteilinnenraums |
| TW202439039A (zh) * | 2023-03-21 | 2024-10-01 | 聯華電子股份有限公司 | 微影機台系統及其液體儲存槽的漏液檢測方法 |
| CN121002450A (zh) * | 2023-04-04 | 2025-11-21 | Asml荷兰有限公司 | 流体处理系统和方法以及制造器件的方法 |
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| US4509852A (en) | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
| JP2516194B2 (ja) * | 1984-06-11 | 1996-07-10 | 株式会社日立製作所 | 投影露光方法 |
| US4632275A (en) * | 1984-09-21 | 1986-12-30 | Parks Charles K | Palatability stabilizer |
| EP0359620B1 (fr) * | 1988-09-08 | 1993-07-28 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé et récipient pour fournir du CO2 supercritique |
| CN2077505U (zh) | 1990-08-14 | 1991-05-22 | 张永茂 | 液化气安全阀 |
| JP4011643B2 (ja) * | 1996-01-05 | 2007-11-21 | キヤノン株式会社 | 半導体製造装置 |
| KR19980021718U (ko) * | 1996-10-23 | 1998-07-15 | 김학용 | 책표지 |
| JPH10202045A (ja) * | 1997-01-20 | 1998-08-04 | Sony Corp | 排ガス処理設備 |
| JP3866840B2 (ja) * | 1997-10-28 | 2007-01-10 | 三機工業株式会社 | 不活性ガス供給設備 |
| AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
| JP3832984B2 (ja) * | 1998-10-27 | 2006-10-11 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| KR20010089431A (ko) * | 1998-11-19 | 2001-10-06 | 시마무라 테루오 | 광학장치와 노광장치 및 레이저광원, 가스 공급방법,노광방법, 디바이스의 제조방법 |
| JP4878082B2 (ja) * | 2001-02-28 | 2012-02-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP2003102858A (ja) * | 2001-09-28 | 2003-04-08 | Nohmi Bosai Ltd | 閉鎖空間の防火システム |
| SG121818A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| EP2495613B1 (en) | 2002-11-12 | 2013-07-31 | ASML Netherlands B.V. | Lithographic apparatus |
| JP2004258113A (ja) * | 2003-02-24 | 2004-09-16 | Nikon Corp | マスク保護装置、マスク、ガス置換装置、露光装置、ガス置換方法及び露光方法 |
| JP2005142185A (ja) * | 2003-11-04 | 2005-06-02 | Canon Inc | 露光装置及びその環境制御方法 |
| JP4323946B2 (ja) | 2003-12-19 | 2009-09-02 | キヤノン株式会社 | 露光装置 |
| ATE467902T1 (de) * | 2004-01-05 | 2010-05-15 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren |
| US7481867B2 (en) * | 2004-06-16 | 2009-01-27 | Edwards Limited | Vacuum system for immersion photolithography |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7379155B2 (en) | 2004-10-18 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2006064713A1 (ja) * | 2004-12-15 | 2006-06-22 | Olympus Medical Systems Corp. | 送気装置、送気装置の制御方法、送気システム、及び内視鏡システム |
| SG124359A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| WO2006084641A2 (en) | 2005-02-10 | 2006-08-17 | Asml Netherlands B.V. | Immersion liquid, exposure apparatus, and exposure process |
| KR101344142B1 (ko) * | 2005-04-25 | 2013-12-23 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치, 및 디바이스 제조 방법 |
| US20070085989A1 (en) | 2005-06-21 | 2007-04-19 | Nikon Corporation | Exposure apparatus and exposure method, maintenance method, and device manufacturing method |
| JP2007115758A (ja) * | 2005-10-18 | 2007-05-10 | Nikon Corp | 露光方法及び露光装置 |
| JP2007142366A (ja) | 2005-10-18 | 2007-06-07 | Canon Inc | 露光装置及びデバイス製造方法 |
| US7884999B2 (en) * | 2005-11-16 | 2011-02-08 | Olympus Corporation | Optical microscope apparatus |
| US7903232B2 (en) | 2006-04-12 | 2011-03-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4582060B2 (ja) * | 2006-06-29 | 2010-11-17 | パナソニック株式会社 | ガス遮断装置 |
| US8634053B2 (en) | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR20080075727A (ko) | 2007-02-13 | 2008-08-19 | 삼성전자주식회사 | 액침 노광 장치 및 액침 노광 방법 |
| SG151198A1 (en) * | 2007-09-27 | 2009-04-30 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus |
| JP2009130308A (ja) * | 2007-11-28 | 2009-06-11 | Renesas Technology Corp | 表面処理装置 |
| NL1036273A1 (nl) | 2007-12-18 | 2009-06-19 | Asml Netherlands Bv | Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. |
| US7918367B2 (en) | 2008-02-22 | 2011-04-05 | O'donnell Kevin P | Apparatus and method for monitoring bulk tank cryogenic systems |
| PL2251596T3 (pl) * | 2008-03-06 | 2017-01-31 | Ihi Corp | Sposób oraz instalacja do zasilania dwutlenkiem węgla kotła ze spalaniem tlenowo-paliwowym |
| EP2131241B1 (en) | 2008-05-08 | 2019-07-31 | ASML Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
| US8421993B2 (en) | 2008-05-08 | 2013-04-16 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
| JP2010077957A (ja) * | 2008-09-29 | 2010-04-08 | Toyota Motor Corp | 2次空気供給装置 |
| JP2010098172A (ja) * | 2008-10-17 | 2010-04-30 | Canon Inc | 液体回収装置、露光装置及びデバイス製造方法 |
| WO2010103822A1 (ja) * | 2009-03-10 | 2010-09-16 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| EP2256553B1 (en) | 2009-05-26 | 2016-05-25 | ASML Netherlands B.V. | Fluid handling structure and lithographic apparatus |
| JP5496196B2 (ja) * | 2009-06-19 | 2014-05-21 | 中央精機株式会社 | 液化ガス燃料供給装置 |
| JP5544791B2 (ja) * | 2009-08-31 | 2014-07-09 | Jfeスチール株式会社 | 焼結機 |
| NL2005089A (nl) * | 2009-09-23 | 2011-03-28 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
| NL2005528A (en) * | 2009-12-02 | 2011-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| NL2005655A (en) * | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| JP2011165318A (ja) * | 2010-02-04 | 2011-08-25 | Panasonic Corp | 燃料電池発電装置システム |
| NL2007453A (en) | 2010-10-18 | 2012-04-19 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
-
2012
- 2012-11-28 NL NL2009899A patent/NL2009899A/en not_active Application Discontinuation
- 2012-12-10 TW TW101146437A patent/TWI461860B/zh active
- 2012-12-12 JP JP2012271675A patent/JP6010445B2/ja active Active
- 2012-12-13 US US13/714,205 patent/US9575406B2/en active Active
- 2012-12-17 CN CN201210548141.8A patent/CN103176367B/zh active Active
- 2012-12-20 KR KR1020120149727A patent/KR101410847B1/ko active Active
-
2015
- 2015-05-01 JP JP2015094362A patent/JP6145131B2/ja active Active
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