JP2015146047A5 - - Google Patents

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Publication number
JP2015146047A5
JP2015146047A5 JP2015094362A JP2015094362A JP2015146047A5 JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5 JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015094362 A JP2015094362 A JP 2015094362A JP 2015146047 A5 JP2015146047 A5 JP 2015146047A5
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Japan
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gas
flow
lithographic apparatus
supply line
pressure
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JP2015094362A
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English (en)
Japanese (ja)
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JP2015146047A (ja
JP6145131B2 (ja
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Publication of JP2015146047A5 publication Critical patent/JP2015146047A5/ja
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JP2015094362A 2011-12-20 2015-05-01 ポンプシステム、二酸化炭素供給システム、抽出システム、リソグラフィ装置、およびデバイス製造方法 Active JP6145131B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161578114P 2011-12-20 2011-12-20
US61/578,114 2011-12-20

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2012271675A Division JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2015146047A JP2015146047A (ja) 2015-08-13
JP2015146047A5 true JP2015146047A5 (enExample) 2016-01-21
JP6145131B2 JP6145131B2 (ja) 2017-06-07

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ID=48609815

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012271675A Active JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置
JP2015094362A Active JP6145131B2 (ja) 2011-12-20 2015-05-01 ポンプシステム、二酸化炭素供給システム、抽出システム、リソグラフィ装置、およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2012271675A Active JP6010445B2 (ja) 2011-12-20 2012-12-12 二酸化炭素供給システム、抽出システム、およびリソグラフィ装置

Country Status (6)

Country Link
US (1) US9575406B2 (enExample)
JP (2) JP6010445B2 (enExample)
KR (1) KR101410847B1 (enExample)
CN (1) CN103176367B (enExample)
NL (1) NL2009899A (enExample)
TW (1) TWI461860B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2007453A (en) 2010-10-18 2012-04-19 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009378A (en) * 2011-10-07 2013-04-09 Asml Netherlands Bv Lithographic apparatus and method of cooling a component in a lithographic apparatus.
US10122591B1 (en) * 2013-03-13 2018-11-06 Google Llc Managing access to no-cost content
CN104238277B (zh) * 2013-06-19 2016-12-28 上海微电子装备有限公司 一种浸没式光刻机的流场维持方法
KR101408834B1 (ko) * 2014-01-06 2014-06-20 한국지역난방공사 배기가스 정량 공급이 가능한 산업설비용 추기장치
JP2017538159A (ja) * 2014-12-19 2017-12-21 エーエスエムエル ネザーランズ ビー.ブイ. 流体取扱構造、リソグラフィ装置及びデバイス製造方法
WO2017036830A1 (en) * 2015-08-31 2017-03-09 Asml Netherlands B.V. A gas leak detector and a method of detecting a leak of gas
US10883866B2 (en) * 2015-09-24 2021-01-05 Fujikin Incorporated Pressure-based flow rate control device and malfunction detection method therefor
CN107991384B (zh) * 2017-12-21 2023-10-13 浙江启尔机电技术有限公司 一种微管内气液两相流流型的检测装置及方法
CN109976098B (zh) * 2019-03-22 2024-04-12 福建华佳彩有限公司 一种光阻刀头
DE102020204545A1 (de) * 2020-04-08 2021-10-14 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum trocknen eines bauteilinnenraums
TW202439039A (zh) * 2023-03-21 2024-10-01 聯華電子股份有限公司 微影機台系統及其液體儲存槽的漏液檢測方法
CN121002450A (zh) * 2023-04-04 2025-11-21 Asml荷兰有限公司 流体处理系统和方法以及制造器件的方法

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
US4632275A (en) * 1984-09-21 1986-12-30 Parks Charles K Palatability stabilizer
EP0359620B1 (fr) * 1988-09-08 1993-07-28 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé et récipient pour fournir du CO2 supercritique
CN2077505U (zh) 1990-08-14 1991-05-22 张永茂 液化气安全阀
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
KR19980021718U (ko) * 1996-10-23 1998-07-15 김학용 책표지
JPH10202045A (ja) * 1997-01-20 1998-08-04 Sony Corp 排ガス処理設備
JP3866840B2 (ja) * 1997-10-28 2007-01-10 三機工業株式会社 不活性ガス供給設備
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP3832984B2 (ja) * 1998-10-27 2006-10-11 キヤノン株式会社 露光装置およびデバイス製造方法
KR20010089431A (ko) * 1998-11-19 2001-10-06 시마무라 테루오 광학장치와 노광장치 및 레이저광원, 가스 공급방법,노광방법, 디바이스의 제조방법
JP4878082B2 (ja) * 2001-02-28 2012-02-15 キヤノン株式会社 露光装置およびデバイス製造方法
JP2003102858A (ja) * 2001-09-28 2003-04-08 Nohmi Bosai Ltd 閉鎖空間の防火システム
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2495613B1 (en) 2002-11-12 2013-07-31 ASML Netherlands B.V. Lithographic apparatus
JP2004258113A (ja) * 2003-02-24 2004-09-16 Nikon Corp マスク保護装置、マスク、ガス置換装置、露光装置、ガス置換方法及び露光方法
JP2005142185A (ja) * 2003-11-04 2005-06-02 Canon Inc 露光装置及びその環境制御方法
JP4323946B2 (ja) 2003-12-19 2009-09-02 キヤノン株式会社 露光装置
ATE467902T1 (de) * 2004-01-05 2010-05-15 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
US7481867B2 (en) * 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006064713A1 (ja) * 2004-12-15 2006-06-22 Olympus Medical Systems Corp. 送気装置、送気装置の制御方法、送気システム、及び内視鏡システム
SG124359A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2006084641A2 (en) 2005-02-10 2006-08-17 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
KR101344142B1 (ko) * 2005-04-25 2013-12-23 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US20070085989A1 (en) 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
JP2007115758A (ja) * 2005-10-18 2007-05-10 Nikon Corp 露光方法及び露光装置
JP2007142366A (ja) 2005-10-18 2007-06-07 Canon Inc 露光装置及びデバイス製造方法
US7884999B2 (en) * 2005-11-16 2011-02-08 Olympus Corporation Optical microscope apparatus
US7903232B2 (en) 2006-04-12 2011-03-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4582060B2 (ja) * 2006-06-29 2010-11-17 パナソニック株式会社 ガス遮断装置
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20080075727A (ko) 2007-02-13 2008-08-19 삼성전자주식회사 액침 노광 장치 및 액침 노광 방법
SG151198A1 (en) * 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
JP2009130308A (ja) * 2007-11-28 2009-06-11 Renesas Technology Corp 表面処理装置
NL1036273A1 (nl) 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
US7918367B2 (en) 2008-02-22 2011-04-05 O'donnell Kevin P Apparatus and method for monitoring bulk tank cryogenic systems
PL2251596T3 (pl) * 2008-03-06 2017-01-31 Ihi Corp Sposób oraz instalacja do zasilania dwutlenkiem węgla kotła ze spalaniem tlenowo-paliwowym
EP2131241B1 (en) 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US8421993B2 (en) 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP2010077957A (ja) * 2008-09-29 2010-04-08 Toyota Motor Corp 2次空気供給装置
JP2010098172A (ja) * 2008-10-17 2010-04-30 Canon Inc 液体回収装置、露光装置及びデバイス製造方法
WO2010103822A1 (ja) * 2009-03-10 2010-09-16 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
EP2256553B1 (en) 2009-05-26 2016-05-25 ASML Netherlands B.V. Fluid handling structure and lithographic apparatus
JP5496196B2 (ja) * 2009-06-19 2014-05-21 中央精機株式会社 液化ガス燃料供給装置
JP5544791B2 (ja) * 2009-08-31 2014-07-09 Jfeスチール株式会社 焼結機
NL2005089A (nl) * 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005528A (en) * 2009-12-02 2011-06-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2005655A (en) * 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
JP2011165318A (ja) * 2010-02-04 2011-08-25 Panasonic Corp 燃料電池発電装置システム
NL2007453A (en) 2010-10-18 2012-04-19 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.

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