JP2015109121A - 半導体記憶装置 - Google Patents
半導体記憶装置 Download PDFInfo
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- JP2015109121A JP2015109121A JP2013250219A JP2013250219A JP2015109121A JP 2015109121 A JP2015109121 A JP 2015109121A JP 2013250219 A JP2013250219 A JP 2013250219A JP 2013250219 A JP2013250219 A JP 2013250219A JP 2015109121 A JP2015109121 A JP 2015109121A
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- 238000003860 storage Methods 0.000 title claims abstract description 9
- 239000004065 semiconductor Substances 0.000 title abstract description 4
- 238000012795 verification Methods 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 4
- 230000005764 inhibitory process Effects 0.000 claims 1
- 230000002040 relaxant effect Effects 0.000 abstract description 2
- 238000009826 distribution Methods 0.000 description 18
- 238000007667 floating Methods 0.000 description 9
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5628—Programming or writing circuits; Data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0483—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3436—Arrangements for verifying correct programming or erasure
- G11C16/3454—Arrangements for verifying correct programming or for detecting overprogrammed cells
- G11C16/3459—Circuits or methods to verify correct programming of nonvolatile memory cells
Abstract
Description
110:メモリアレイ
120:入出力バッファ
130:アドレスレジスタ
140:データレジスタ
150:コントローラ
152:ベリファイメモリ
160:ワード線選択回路
170:ページバッファ/センス回路
180:列選択回路
Claims (8)
- NAND型の複数のメモリセルが形成されたメモリアレイを有するフラッシュメモリであって、
メモリアレイのページを選択するページ選択手段と、
ビット線にプログラムまたはプログラム禁止のビット線電圧を設定する設定手段と、
選択されたページにプログラムパルスを印加する印加手段と、
プログラムの合否を判定するベリファイ手段と、
ベリファイの結果に基づき合格から不合格に変化した不合格シフトメモリセルの有無を判定する判定手段と、
前記不合格シフトメモリセルがあると判定されたとき、前記設定手段は、前記不合格シフトメモリセルのビット線電圧として次のプログラムパルスの電圧を緩和する緩和電圧を設定する、フラッシュメモリ。 - 前記緩和電圧は、プログラムパルス間のステップ電圧である、請求項1に記載のフラッシュメモリ。
- 前記緩和電圧は、プログラムのときの電圧とプログラム禁止のときの電圧の間である、請求項1に記載のフラッシュメモリ。
- 前記判定手段は、プログラムパルスの印加の前後のベリファイ結果を比較することにより不合格シフトメモリセルの有無を判定する、請求項1に記載のフラッシュメモリ。
- 前記判定手段は、前記ベリファイ手段によるベリファイ結果を記憶する記憶手段を有し、前記記憶されたベリファイ結果を用いて不合格シフトメモリセルの有無を判定する、請求項4に記載のフラッシュメモリ。
- NAND型の複数のメモリセルが形成されたメモリアレイを有するフラッシュメモリのプログラム方法であって、
プログラムデータに基づきビット線にプログラムのための電圧またはプログラム禁止のための電圧を設定し、選択されたページにプログラムパルスを印加し、
前記選択されたページのプログラムのベリファイを行い、
ベリファイの結果、合格から不合格に変化した不合格シフトメモリセルが発生した場合には、当該不合格シフトメモリセルのビット線に次のプログラムパルスによる電圧を緩和する緩和電圧を設定する、プログラム方法。 - 前記緩和電圧は、プログラムパルス間のステップ電圧である、請求項6に記載のプログラム方法。
- プログラムパルスの印加の前後のベリファイ結果を比較することにより前記不合格シフトメモリセルの有無を判定する、請求項6に記載のプログラム方法。
Priority Applications (2)
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---|---|---|---|
JP2013250219A JP5868381B2 (ja) | 2013-12-03 | 2013-12-03 | 半導体記憶装置 |
US14/447,051 US9224481B2 (en) | 2013-12-03 | 2014-07-30 | Semiconductor storage device |
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JP2013250219A JP5868381B2 (ja) | 2013-12-03 | 2013-12-03 | 半導体記憶装置 |
Publications (2)
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JP2015109121A true JP2015109121A (ja) | 2015-06-11 |
JP5868381B2 JP5868381B2 (ja) | 2016-02-24 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10049760B2 (en) | 2016-09-06 | 2018-08-14 | Toshiba Memory Corporation | Programming and verification methods for three-dimensional memory device |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10381075B2 (en) | 2017-12-14 | 2019-08-13 | Micron Technology, Inc. | Techniques to access a self-selecting memory device |
US11139025B2 (en) | 2020-01-22 | 2021-10-05 | International Business Machines Corporation | Multi-level cell threshold voltage operation of one-selector-one-resistor structure included in a crossbar array |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000048582A (ja) * | 1998-07-28 | 2000-02-18 | Toshiba Corp | 半導体記憶装置 |
JP2006318584A (ja) * | 2005-05-13 | 2006-11-24 | Renesas Technology Corp | 半導体装置 |
JP2009522703A (ja) * | 2005-12-29 | 2009-06-11 | サンディスク コーポレイション | 不揮発性メモリの書込動作における継続的な検証 |
JP2010211883A (ja) * | 2009-03-11 | 2010-09-24 | Toshiba Corp | 不揮発性半導体記憶装置 |
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US5493526A (en) * | 1992-01-22 | 1996-02-20 | Altera Corporation | Method and apparatus for enhanced EPROM and EEPROM programmability and process scaling |
JP3626221B2 (ja) | 1993-12-13 | 2005-03-02 | 株式会社東芝 | 不揮発性半導体記憶装置 |
KR100255161B1 (ko) * | 1996-12-24 | 2000-05-01 | 김영환 | 플래쉬 메모리셀의 섹터 보호 회로 |
JP4162863B2 (ja) * | 2001-03-30 | 2008-10-08 | 株式会社ルネサステクノロジ | マイクロコンピュータ |
US6874069B2 (en) * | 2002-07-26 | 2005-03-29 | Silicon Storage Technology, Inc. | Microcontroller having an embedded non-volatile memory array with read protection for the array or portions thereof |
US7093091B2 (en) * | 2003-09-26 | 2006-08-15 | Atmel Corporation | Selectable block protection for non-volatile memory |
US7154779B2 (en) | 2004-01-21 | 2006-12-26 | Sandisk Corporation | Non-volatile memory cell using high-k material inter-gate programming |
WO2006059374A1 (ja) * | 2004-11-30 | 2006-06-08 | Spansion Llc | 半導体装置および半導体装置の制御方法 |
US7755945B2 (en) * | 2008-07-30 | 2010-07-13 | Macronix International Co., Ltd. | Page buffer and method of programming and reading a memory |
JP2013122799A (ja) | 2011-12-09 | 2013-06-20 | Toshiba Corp | 不揮発性半導体記憶装置 |
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- 2013-12-03 JP JP2013250219A patent/JP5868381B2/ja active Active
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- 2014-07-30 US US14/447,051 patent/US9224481B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000048582A (ja) * | 1998-07-28 | 2000-02-18 | Toshiba Corp | 半導体記憶装置 |
JP2006318584A (ja) * | 2005-05-13 | 2006-11-24 | Renesas Technology Corp | 半導体装置 |
JP2009522703A (ja) * | 2005-12-29 | 2009-06-11 | サンディスク コーポレイション | 不揮発性メモリの書込動作における継続的な検証 |
JP2010211883A (ja) * | 2009-03-11 | 2010-09-24 | Toshiba Corp | 不揮発性半導体記憶装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10049760B2 (en) | 2016-09-06 | 2018-08-14 | Toshiba Memory Corporation | Programming and verification methods for three-dimensional memory device |
Also Published As
Publication number | Publication date |
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US9224481B2 (en) | 2015-12-29 |
US20150155045A1 (en) | 2015-06-04 |
JP5868381B2 (ja) | 2016-02-24 |
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