JP2015107913A5 - - Google Patents

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Publication number
JP2015107913A5
JP2015107913A5 JP2014244984A JP2014244984A JP2015107913A5 JP 2015107913 A5 JP2015107913 A5 JP 2015107913A5 JP 2014244984 A JP2014244984 A JP 2014244984A JP 2014244984 A JP2014244984 A JP 2014244984A JP 2015107913 A5 JP2015107913 A5 JP 2015107913A5
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JP
Japan
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thin film
free
standing
standing thin
locally
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JP2014244984A
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English (en)
Japanese (ja)
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JP2015107913A (ja
JP6224573B2 (ja
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Priority claimed from EP13195596.5A external-priority patent/EP2881970A1/en
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JP2014244984A 2013-12-04 2014-12-03 ナノ結晶カーボン自立薄膜の製造方法 Active JP6224573B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13195596.5 2013-12-04
EP13195596.5A EP2881970A1 (en) 2013-12-04 2013-12-04 Method of producing a freestanding thin film of nano-crystalline carbon

Publications (3)

Publication Number Publication Date
JP2015107913A JP2015107913A (ja) 2015-06-11
JP2015107913A5 true JP2015107913A5 (enExample) 2017-03-02
JP6224573B2 JP6224573B2 (ja) 2017-11-01

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JP2014244984A Active JP6224573B2 (ja) 2013-12-04 2014-12-03 ナノ結晶カーボン自立薄膜の製造方法

Country Status (4)

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US (1) US9908778B2 (enExample)
EP (2) EP2881970A1 (enExample)
JP (1) JP6224573B2 (enExample)
CN (1) CN104701122A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3754689B1 (en) * 2014-01-21 2024-10-23 Ramot at Tel-Aviv University Ltd. Method and device for manipulating particle beam
CN108780672B (zh) * 2016-04-21 2022-03-01 株式会社钟化 放射性同位素制造用支撑基板、放射性同位素制造用靶板、以及支撑基板的制造方法
CN107481913B (zh) * 2016-06-08 2019-04-02 清华大学 一种电子束加工系统
US20210087403A1 (en) * 2019-09-20 2021-03-25 Merck Patent Gmbh Pigments

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2248645A1 (en) * 1999-04-07 2010-11-10 GrafTech International Holdings Inc. Flexible graphite article and method of manufacture
JP2005015325A (ja) * 2003-05-30 2005-01-20 Japan Science & Technology Agency レーザーアブレーション法による極平坦微結晶ダイヤモンド薄膜の作製方法
EP2091062A1 (en) 2008-02-13 2009-08-19 FEI Company TEM with aberration corrector and phase plate
EP2131385A1 (en) 2008-06-05 2009-12-09 FEI Company Hybrid phase plate
US7977633B2 (en) 2008-08-27 2011-07-12 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E. V. Phase plate, in particular for an electron microscope
JPWO2010090343A1 (ja) * 2009-02-05 2012-08-09 帝人株式会社 黒鉛化炭素片分散液およびその製造方法
CN101964291B (zh) * 2009-07-24 2012-03-28 清华大学 透射电镜微栅及其制备方法
US20110200787A1 (en) * 2010-01-26 2011-08-18 The Regents Of The University Of California Suspended Thin Film Structures
KR101456905B1 (ko) * 2010-02-19 2014-10-31 가부시키가이샤 인큐베이션 얼라이언스 탄소 재료 및 그 제조 방법
TWI417934B (zh) * 2010-03-26 2013-12-01 Hon Hai Prec Ind Co Ltd 透射電鏡微柵的製備方法
US20130277573A1 (en) * 2011-01-07 2013-10-24 Dune Sciences, Inc. Functionalized carbon membranes
EP2485239A1 (en) 2011-02-07 2012-08-08 FEI Company Method for centering an optical element in a TEM comprising a contrast enhancing element
DE102011014399B4 (de) * 2011-03-18 2017-08-03 Stiftung Caesar Center Of Advanced European Studies And Research Phasenplatte, Verfahren zum Herstellen einer Phasenplatte sowie Elektronenmikroskop
CN102737935B (zh) * 2011-04-14 2015-08-26 清华大学 透射电镜微栅
JP5812342B2 (ja) * 2011-12-12 2015-11-11 東海カーボン株式会社 グラファイトフィルムの製造方法
WO2013096036A1 (en) * 2011-12-22 2013-06-27 3M Innovative Properties Company Electrically conductive article with high optical transmission
EP2626885A1 (en) * 2012-02-13 2013-08-14 FEI Company Forming a vitrified sample for an electron microscopy
EP2667399A1 (en) * 2012-05-23 2013-11-27 FEI Company Improved phase plate for a TEM
EP2704178B1 (en) 2012-08-30 2014-08-20 Fei Company Imaging a sample in a TEM equipped with a phase plate
JP6286270B2 (ja) 2013-04-25 2018-02-28 エフ イー アイ カンパニFei Company 透過型電子顕微鏡内で位相版を用いる方法
DE102013019297A1 (de) 2013-11-19 2015-05-21 Fei Company Phasenplatte für ein Transmissionselektronenmikroskop

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