JP2015099287A5 - - Google Patents

Download PDF

Info

Publication number
JP2015099287A5
JP2015099287A5 JP2013239443A JP2013239443A JP2015099287A5 JP 2015099287 A5 JP2015099287 A5 JP 2015099287A5 JP 2013239443 A JP2013239443 A JP 2013239443A JP 2013239443 A JP2013239443 A JP 2013239443A JP 2015099287 A5 JP2015099287 A5 JP 2015099287A5
Authority
JP
Japan
Prior art keywords
electrode
film
insulating film
photoresist
source electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013239443A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015099287A (ja
JP6308757B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2013239443A priority Critical patent/JP6308757B2/ja
Priority claimed from JP2013239443A external-priority patent/JP6308757B2/ja
Priority to US14/534,513 priority patent/US9564459B2/en
Publication of JP2015099287A publication Critical patent/JP2015099287A/ja
Publication of JP2015099287A5 publication Critical patent/JP2015099287A5/ja
Application granted granted Critical
Publication of JP6308757B2 publication Critical patent/JP6308757B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013239443A 2013-11-20 2013-11-20 液晶表示パネルおよび液晶表示パネルの製造方法 Active JP6308757B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013239443A JP6308757B2 (ja) 2013-11-20 2013-11-20 液晶表示パネルおよび液晶表示パネルの製造方法
US14/534,513 US9564459B2 (en) 2013-11-20 2014-11-06 Liquid crystal display panel and method for manufacturing liquid crystal display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013239443A JP6308757B2 (ja) 2013-11-20 2013-11-20 液晶表示パネルおよび液晶表示パネルの製造方法

Publications (3)

Publication Number Publication Date
JP2015099287A JP2015099287A (ja) 2015-05-28
JP2015099287A5 true JP2015099287A5 (enExample) 2016-12-28
JP6308757B2 JP6308757B2 (ja) 2018-04-11

Family

ID=53172972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013239443A Active JP6308757B2 (ja) 2013-11-20 2013-11-20 液晶表示パネルおよび液晶表示パネルの製造方法

Country Status (2)

Country Link
US (1) US9564459B2 (enExample)
JP (1) JP6308757B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6208555B2 (ja) * 2013-11-18 2017-10-04 株式会社ジャパンディスプレイ 液晶表示装置
US10115746B2 (en) * 2014-01-08 2018-10-30 Sakai Display Products Corporation Manufacturing method for active matrix substrate, active matrix substrate and display apparatus
CN105511188A (zh) * 2016-02-01 2016-04-20 昆山龙腾光电有限公司 阵列基板和阵列基板的制作方法以及液晶显示装置
JP6775325B2 (ja) * 2016-05-13 2020-10-28 三菱電機株式会社 薄膜トランジスタ基板および液晶表示装置
CN108735762B (zh) * 2017-04-24 2021-06-15 瀚宇彩晶股份有限公司 画素结构
JP2019101243A (ja) 2017-12-04 2019-06-24 三菱電機株式会社 液晶表示パネルおよびその製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007226175A (ja) 2006-01-26 2007-09-06 Epson Imaging Devices Corp 液晶装置及び電子機器
JP4544251B2 (ja) * 2007-02-27 2010-09-15 ソニー株式会社 液晶表示素子および表示装置
JP5285280B2 (ja) * 2008-01-07 2013-09-11 株式会社ジャパンディスプレイウェスト 液晶表示装置及び液晶表示装置の製造方法
KR101881020B1 (ko) * 2010-12-02 2018-07-24 삼성디스플레이 주식회사 액정 표시 장치 및 그 형성 방법
US9064962B2 (en) * 2010-12-09 2015-06-23 Sharp Kabushiki Kaisha Thin film transistor array substrate
US8760595B2 (en) 2011-09-09 2014-06-24 Lg Display Co., Ltd. Array substrate for fringe field switching mode liquid crystal display device and method for fabricating the same
KR101905757B1 (ko) * 2011-11-17 2018-10-10 엘지디스플레이 주식회사 에프에프에스 방식 액정표시장치용 어레이기판 및 그 제조방법
JP6291950B2 (ja) * 2014-03-25 2018-03-14 セイコーエプソン株式会社 印刷媒体、印刷装置および印刷装置の印刷方法

Similar Documents

Publication Publication Date Title
JP4661913B2 (ja) 液晶表示装置
JP2015099287A5 (enExample)
TW201944141A (zh) 顯示面板及其製造方法
KR20130063072A (ko) 패턴 구조물 형성 방법 및 이를 이용한 커패시터 형성 방법
JP2015108732A5 (enExample)
JP2010087301A (ja) 半導体装置の製造方法
TW201327584A (zh) 面板及其製法
WO2018166178A1 (zh) 一种阵列基板及其制作方法、显示面板和显示装置
JP2018066819A5 (enExample)
US8362623B2 (en) Semiconductor device and method for manufacturing the same
JP4519759B2 (ja) Ｔｆｔ−ｌｃｄのアレイ基板及びその製造方法
JP6309766B2 (ja) 薄膜トランジスタアレイ基板
JP2015025955A5 (enExample)
WO2017202188A1 (zh) 显示基板的制作方法、显示基板和显示装置
JP2015036819A (ja) 薄膜トランジスタ表示板
JP2011107323A (ja) 液晶表示装置及びその製造方法
TWI577000B (zh) 顯示裝置
US10241628B2 (en) Touch panel, manufacturing method thereof, and display device
CN108010922B (zh) 阵列基板及其制备方法及显示屏
JP2016092367A5 (enExample)
KR101878188B1 (ko) 스페이서 및 범프 패턴을 포함하는 액정 표시 장치 및 그의 제조 방법
JP6295543B2 (ja) 液晶表示装置及びその製造方法
JP2016096171A5 (enExample)
WO2016165256A1 (zh) 阵列基板及其制造方法和显示装置
KR101425732B1 (ko) 액정표시장치의 기판