JP2015081365A5 - - Google Patents

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Publication number
JP2015081365A5
JP2015081365A5 JP2013219115A JP2013219115A JP2015081365A5 JP 2015081365 A5 JP2015081365 A5 JP 2015081365A5 JP 2013219115 A JP2013219115 A JP 2013219115A JP 2013219115 A JP2013219115 A JP 2013219115A JP 2015081365 A5 JP2015081365 A5 JP 2015081365A5
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JP
Japan
Prior art keywords
film forming
film
forming material
deposited
vapor deposition
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JP2013219115A
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English (en)
Japanese (ja)
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JP2015081365A (ja
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Priority to JP2013219115A priority Critical patent/JP2015081365A/ja
Priority claimed from JP2013219115A external-priority patent/JP2015081365A/ja
Publication of JP2015081365A publication Critical patent/JP2015081365A/ja
Publication of JP2015081365A5 publication Critical patent/JP2015081365A5/ja
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JP2013219115A 2013-10-22 2013-10-22 成膜装置、成膜方法、成膜材料の除去方法 Withdrawn JP2015081365A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013219115A JP2015081365A (ja) 2013-10-22 2013-10-22 成膜装置、成膜方法、成膜材料の除去方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013219115A JP2015081365A (ja) 2013-10-22 2013-10-22 成膜装置、成膜方法、成膜材料の除去方法

Publications (2)

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JP2015081365A JP2015081365A (ja) 2015-04-27
JP2015081365A5 true JP2015081365A5 (enExample) 2016-08-12

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JP2013219115A Withdrawn JP2015081365A (ja) 2013-10-22 2013-10-22 成膜装置、成膜方法、成膜材料の除去方法

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JP (1) JP2015081365A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116970914B (zh) * 2022-04-22 2025-07-29 光驰科技(上海)有限公司 一种基板装载治具及镀膜装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0685211B2 (ja) * 1985-05-13 1994-10-26 富士写真フイルム株式会社 磁気記録媒体の製造方法
JPS62235464A (ja) * 1985-12-13 1987-10-15 Nippon Telegr & Teleph Corp <Ntt> 有機物高配向膜の作製装置
JPS6455374A (en) * 1987-08-26 1989-03-02 Nec Corp Production of thin el layer
JP3002605B2 (ja) * 1992-05-26 2000-01-24 マルコン電子株式会社 固体電解コンデンサの製造方法
JP3015221B2 (ja) * 1993-03-24 2000-03-06 三菱電機株式会社 有機薄膜の製造方法
JP4294305B2 (ja) * 2001-12-12 2009-07-08 株式会社半導体エネルギー研究所 成膜装置および成膜方法
JP6025591B2 (ja) * 2012-02-17 2016-11-16 株式会社半導体エネルギー研究所 成膜装置
JP5458277B1 (ja) * 2012-09-27 2014-04-02 ミクロ技研株式会社 機能性膜及びその成膜装置、成膜方法

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