JPS6455374A - Production of thin el layer - Google Patents
Production of thin el layerInfo
- Publication number
- JPS6455374A JPS6455374A JP21338687A JP21338687A JPS6455374A JP S6455374 A JPS6455374 A JP S6455374A JP 21338687 A JP21338687 A JP 21338687A JP 21338687 A JP21338687 A JP 21338687A JP S6455374 A JPS6455374 A JP S6455374A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin
- vacuum deposition
- low
- zns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To produce a thin electroluminescent layer having high luminance over a large area without deteriorating high productivity by forming a thin ZnS:Mn film on a substrate by vacuum deposition while projecting low-speed ions on the substrate. CONSTITUTION:A low-speed ion gun 5 of end hole type or other type is set in an electron beam vacuum deposition device. The vacuum chamber 1 is evacuated and a substrate 2 having a first insulating layer is kept at a prescribed temp. with a heating lamp 3. Vacuum deposition is then carried out with an electron beam evaporating source 4 contg. pellets of a ZnS:Mn sintered body as the evaporating source. As this time, low-speed ions of Ar, etc., from the gun 5 are projected on the substrate 2 with 5-100eV acceleration energy. Thus, a thin film EL element having high luminance and superior adhesion to the base is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21338687A JPS6455374A (en) | 1987-08-26 | 1987-08-26 | Production of thin el layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21338687A JPS6455374A (en) | 1987-08-26 | 1987-08-26 | Production of thin el layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6455374A true JPS6455374A (en) | 1989-03-02 |
Family
ID=16638342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21338687A Pending JPS6455374A (en) | 1987-08-26 | 1987-08-26 | Production of thin el layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6455374A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003520296A (en) * | 1999-12-30 | 2003-07-02 | ジェンヴァック エアロスペース コーポレーション | Electron beam evaporation method of transparent indium tin oxide |
JP2015081365A (en) * | 2013-10-22 | 2015-04-27 | 株式会社半導体エネルギー研究所 | Film deposition device, film deposition method, and film deposition material removal method |
-
1987
- 1987-08-26 JP JP21338687A patent/JPS6455374A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003520296A (en) * | 1999-12-30 | 2003-07-02 | ジェンヴァック エアロスペース コーポレーション | Electron beam evaporation method of transparent indium tin oxide |
JP2015081365A (en) * | 2013-10-22 | 2015-04-27 | 株式会社半導体エネルギー研究所 | Film deposition device, film deposition method, and film deposition material removal method |
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