JPS6438996A - Manufacture of thin film el element - Google Patents

Manufacture of thin film el element

Info

Publication number
JPS6438996A
JPS6438996A JP62195982A JP19598287A JPS6438996A JP S6438996 A JPS6438996 A JP S6438996A JP 62195982 A JP62195982 A JP 62195982A JP 19598287 A JP19598287 A JP 19598287A JP S6438996 A JPS6438996 A JP S6438996A
Authority
JP
Japan
Prior art keywords
substrate
emission layer
emission
parallel
brightness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62195982A
Other languages
Japanese (ja)
Inventor
Takuya Yoshimi
Kazuhiro Watanabe
Kenji Okamoto
Terunobu Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Japan Science and Technology Agency
Original Assignee
Fujitsu Ltd
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Research Development Corp of Japan filed Critical Fujitsu Ltd
Priority to JP62195982A priority Critical patent/JPS6438996A/en
Publication of JPS6438996A publication Critical patent/JPS6438996A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroluminescent Light Sources (AREA)

Abstract

PURPOSE:To improve the brightness or emission effectiveness of an emission layer by forming a magnetic field in parallel to the substrate surface between a substrate and target when forming the emission layer with target components made to be attached to the substrate. CONSTITUTION:When an emission layer is wholly attached and formed on a substrate 1, a magnetic field in parallel to the substrate 1 surface is formed between the substrate 1 and targets 13 and 15. By the magnet field, ion-like charged particles of a sputter gas made to be a plasma state are made to receive an outer force in the parallel direction to the substrate 1, as a result, ions are not collided with the surface of the emission layer formed on the substrate 1. This prevents lowering of the emission effectiveness or brightness of the emission layer with eliminating the damage of a crystal or the disarrangement of a crystal arrangement of the emission layer formed.
JP62195982A 1987-08-04 1987-08-04 Manufacture of thin film el element Pending JPS6438996A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62195982A JPS6438996A (en) 1987-08-04 1987-08-04 Manufacture of thin film el element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62195982A JPS6438996A (en) 1987-08-04 1987-08-04 Manufacture of thin film el element

Publications (1)

Publication Number Publication Date
JPS6438996A true JPS6438996A (en) 1989-02-09

Family

ID=16350240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62195982A Pending JPS6438996A (en) 1987-08-04 1987-08-04 Manufacture of thin film el element

Country Status (1)

Country Link
JP (1) JPS6438996A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01161743U (en) * 1988-04-30 1989-11-10
JPH04248292A (en) * 1991-01-24 1992-09-03 Fuji Electric Co Ltd Formation method of luminous membrane of electro-luminescence display panel
JPWO2006070633A1 (en) * 2004-12-28 2008-06-12 株式会社アルバック Sputtering source, sputtering apparatus, and thin film manufacturing method
JP2009138230A (en) * 2007-12-06 2009-06-25 Ulvac Japan Ltd Sputtering system and film deposition method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01161743U (en) * 1988-04-30 1989-11-10
JPH04248292A (en) * 1991-01-24 1992-09-03 Fuji Electric Co Ltd Formation method of luminous membrane of electro-luminescence display panel
JPWO2006070633A1 (en) * 2004-12-28 2008-06-12 株式会社アルバック Sputtering source, sputtering apparatus, and thin film manufacturing method
JP4865570B2 (en) * 2004-12-28 2012-02-01 株式会社アルバック Sputtering source, sputtering apparatus, and thin film manufacturing method
JP2009138230A (en) * 2007-12-06 2009-06-25 Ulvac Japan Ltd Sputtering system and film deposition method

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