JPS5780713A - Manufacture of magnetic thin film by sputtering - Google Patents

Manufacture of magnetic thin film by sputtering

Info

Publication number
JPS5780713A
JPS5780713A JP15706580A JP15706580A JPS5780713A JP S5780713 A JPS5780713 A JP S5780713A JP 15706580 A JP15706580 A JP 15706580A JP 15706580 A JP15706580 A JP 15706580A JP S5780713 A JPS5780713 A JP S5780713A
Authority
JP
Japan
Prior art keywords
magnetic field
magnets
substrate
magnetic
vicinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15706580A
Other languages
Japanese (ja)
Inventor
Hirotsugu Takagi
Hikari Niimi
Takeshi Sawada
Hiroshi Yoneda
Shuzo Abiko
Hiroichi Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Canon Electronics Inc
Original Assignee
Canon Inc
Canon Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc, Canon Electronics Inc filed Critical Canon Inc
Priority to JP15706580A priority Critical patent/JPS5780713A/en
Publication of JPS5780713A publication Critical patent/JPS5780713A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To coat a thin magnetic film by applying a DC magnetic field during sputtering to control magnetic anisotropic direction, thereby obtaining locally uniform magnetic field. CONSTITUTION:A substrate 14 is mounted in an opening 13a formed at the center of a ssubstrate holder 13, and square permanent magnets 15 are respectively engaged with grooves 13b formed at both right and left sides of the holder 13. These magnets 15 are secured with clamping screws 16. A magnetic field 17 is produced in a direction designated by an arrow by the magnets 15, which are so disposed that the polarities become opposite at both sides and made of material such as barium ferrite or the like. On the other hand, the magnetic fields becomes in parallel in the vicinity of a substrate 14 with the magnets 15, 15. In this manner, a DC magnetic field is generated by the permanent magnets, locally uniform magnetic field can be produced in the vicinity of the substrate 14, and a film can be coated without disordering the plasma of material to be sputtered.
JP15706580A 1980-11-10 1980-11-10 Manufacture of magnetic thin film by sputtering Pending JPS5780713A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15706580A JPS5780713A (en) 1980-11-10 1980-11-10 Manufacture of magnetic thin film by sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15706580A JPS5780713A (en) 1980-11-10 1980-11-10 Manufacture of magnetic thin film by sputtering

Publications (1)

Publication Number Publication Date
JPS5780713A true JPS5780713A (en) 1982-05-20

Family

ID=15641444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15706580A Pending JPS5780713A (en) 1980-11-10 1980-11-10 Manufacture of magnetic thin film by sputtering

Country Status (1)

Country Link
JP (1) JPS5780713A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961115A (en) * 1982-09-30 1984-04-07 Fujitsu Ltd Magnetic field application device for magnetic thin film
JPS60110111A (en) * 1983-11-21 1985-06-15 Hitachi Ltd Formation of thin film
FR2703793A1 (en) * 1993-04-06 1994-10-14 Commissariat Energie Atomique Method of producing thin layers having perpendicular magnetic anisotropy
WO2000014768A1 (en) * 1998-09-09 2000-03-16 Veeco Instruments, Inc. Electromagnetic field generator and method of operation
WO2000033332A1 (en) * 1998-11-30 2000-06-08 Honeywell Inc. Thin magnetic film deposition process
CN111370224A (en) * 2020-04-20 2020-07-03 新沂市新润电子有限公司 Automatic lead cutting device for production of high-frequency electronic transformer

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5961115A (en) * 1982-09-30 1984-04-07 Fujitsu Ltd Magnetic field application device for magnetic thin film
JPH0556010B2 (en) * 1982-09-30 1993-08-18 Fujitsu Ltd
JPS60110111A (en) * 1983-11-21 1985-06-15 Hitachi Ltd Formation of thin film
JPH0572732B2 (en) * 1983-11-21 1993-10-12 Hitachi Ltd
FR2703793A1 (en) * 1993-04-06 1994-10-14 Commissariat Energie Atomique Method of producing thin layers having perpendicular magnetic anisotropy
WO2000014768A1 (en) * 1998-09-09 2000-03-16 Veeco Instruments, Inc. Electromagnetic field generator and method of operation
US6545580B2 (en) 1998-09-09 2003-04-08 Veeco Instruments, Inc. Electromagnetic field generator and method of operation
WO2000033332A1 (en) * 1998-11-30 2000-06-08 Honeywell Inc. Thin magnetic film deposition process
CN111370224A (en) * 2020-04-20 2020-07-03 新沂市新润电子有限公司 Automatic lead cutting device for production of high-frequency electronic transformer

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