JP2015076418A5 - - Google Patents
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- Publication number
- JP2015076418A5 JP2015076418A5 JP2013209535A JP2013209535A JP2015076418A5 JP 2015076418 A5 JP2015076418 A5 JP 2015076418A5 JP 2013209535 A JP2013209535 A JP 2013209535A JP 2013209535 A JP2013209535 A JP 2013209535A JP 2015076418 A5 JP2015076418 A5 JP 2015076418A5
- Authority
- JP
- Japan
- Prior art keywords
- ether
- glycol
- acetate
- examples
- ether acetate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013209535A JP6191372B2 (ja) | 2013-10-04 | 2013-10-04 | ウェハの洗浄方法 |
| CN201480054698.3A CN105612606B (zh) | 2013-10-04 | 2014-09-08 | 晶片的清洗方法 |
| US15/026,722 US10037882B2 (en) | 2013-10-04 | 2014-09-08 | Method for cleaning wafer |
| KR1020167006434A KR102232715B1 (ko) | 2013-10-04 | 2014-09-08 | 웨이퍼의 세정 방법 |
| PCT/JP2014/073660 WO2015049956A1 (ja) | 2013-10-04 | 2014-09-08 | ウェハの洗浄方法 |
| TW103134090A TWI625322B (zh) | 2013-10-04 | 2014-09-30 | 晶圓之洗淨方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013209535A JP6191372B2 (ja) | 2013-10-04 | 2013-10-04 | ウェハの洗浄方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017111481A Division JP2017157863A (ja) | 2017-06-06 | 2017-06-06 | ウェハの洗浄方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015076418A JP2015076418A (ja) | 2015-04-20 |
| JP2015076418A5 true JP2015076418A5 (enExample) | 2016-10-27 |
| JP6191372B2 JP6191372B2 (ja) | 2017-09-06 |
Family
ID=52778552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013209535A Active JP6191372B2 (ja) | 2013-10-04 | 2013-10-04 | ウェハの洗浄方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10037882B2 (enExample) |
| JP (1) | JP6191372B2 (enExample) |
| KR (1) | KR102232715B1 (enExample) |
| CN (1) | CN105612606B (enExample) |
| TW (1) | TWI625322B (enExample) |
| WO (1) | WO2015049956A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4743340B1 (ja) * | 2009-10-28 | 2011-08-10 | セントラル硝子株式会社 | 保護膜形成用薬液 |
| KR102056139B1 (ko) * | 2015-07-13 | 2019-12-16 | 후지필름 가부시키가이샤 | 패턴 구조의 처리 방법, 전자 디바이스의 제조 방법 및 패턴 구조의 붕괴 억제용 처리액 |
| JP6897985B2 (ja) | 2015-10-09 | 2021-07-07 | 日本電気株式会社 | 専用コアネットワーク（ｄｃｎ）選択 |
| WO2018058341A1 (en) * | 2016-09-28 | 2018-04-05 | Dow Global Technologies Llc | Sulfoxide/glycol ether based solvents for use in the electronics industry |
| KR102519448B1 (ko) | 2017-03-24 | 2023-04-07 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 표면 처리 방법 및 이를 위한 조성물 |
| JP6963166B2 (ja) * | 2017-04-17 | 2021-11-05 | セントラル硝子株式会社 | ウェハの表面処理方法及び該方法に用いる組成物 |
| SG11202005938SA (en) | 2018-01-05 | 2020-07-29 | Fujifilm Electronic Materials Usa Inc | Surface treatment compositions and methods |
| JP7274919B2 (ja) * | 2019-04-11 | 2023-05-17 | 東京応化工業株式会社 | 洗浄液、及び金属レジストを備えた支持体の洗浄方法 |
| CN115668459B (zh) * | 2020-05-21 | 2025-12-16 | 中央硝子株式会社 | 半导体基板的表面处理方法及表面处理剂组合物 |
| EP4155375A4 (en) * | 2020-05-21 | 2024-07-24 | Central Glass Company, Limited | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION |
| CN116970446B (zh) * | 2023-09-22 | 2024-01-09 | 山东天岳先进科技股份有限公司 | 碳化硅单晶材料amb覆铜的前处理溶液、产品及应用 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7838425B2 (en) | 2008-06-16 | 2010-11-23 | Kabushiki Kaisha Toshiba | Method of treating surface of semiconductor substrate |
| JP4743340B1 (ja) | 2009-10-28 | 2011-08-10 | セントラル硝子株式会社 | 保護膜形成用薬液 |
| JP5630385B2 (ja) * | 2010-06-30 | 2014-11-26 | セントラル硝子株式会社 | 保護膜形成用薬液及びウェハ表面の洗浄方法 |
| JP2013118347A (ja) * | 2010-12-28 | 2013-06-13 | Central Glass Co Ltd | ウェハの洗浄方法 |
| US8828144B2 (en) | 2010-12-28 | 2014-09-09 | Central Grass Company, Limited | Process for cleaning wafers |
| US20120164818A1 (en) | 2010-12-28 | 2012-06-28 | Central Glass Company, Limited | Process for Cleaning Wafers |
| JP2013102109A (ja) | 2011-01-12 | 2013-05-23 | Central Glass Co Ltd | 保護膜形成用薬液 |
-
2013
- 2013-10-04 JP JP2013209535A patent/JP6191372B2/ja active Active
-
2014
- 2014-09-08 KR KR1020167006434A patent/KR102232715B1/ko active Active
- 2014-09-08 US US15/026,722 patent/US10037882B2/en active Active
- 2014-09-08 CN CN201480054698.3A patent/CN105612606B/zh active Active
- 2014-09-08 WO PCT/JP2014/073660 patent/WO2015049956A1/ja not_active Ceased
- 2014-09-30 TW TW103134090A patent/TWI625322B/zh active
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