JP2015073978A - 光触媒担持体 - Google Patents
光触媒担持体 Download PDFInfo
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- JP2015073978A JP2015073978A JP2013214153A JP2013214153A JP2015073978A JP 2015073978 A JP2015073978 A JP 2015073978A JP 2013214153 A JP2013214153 A JP 2013214153A JP 2013214153 A JP2013214153 A JP 2013214153A JP 2015073978 A JP2015073978 A JP 2015073978A
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 58
- 239000002184 metal Substances 0.000 claims abstract description 58
- 239000010409 thin film Substances 0.000 claims abstract description 40
- 239000000126 substance Substances 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 238000004544 sputter deposition Methods 0.000 claims abstract description 19
- 239000007921 spray Substances 0.000 claims abstract description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052709 silver Inorganic materials 0.000 claims abstract description 9
- 239000004332 silver Substances 0.000 claims abstract description 9
- 238000002834 transmittance Methods 0.000 claims abstract description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 6
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 6
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000010949 copper Substances 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- 239000010931 gold Substances 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 claims abstract description 4
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 4
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 4
- 239000010948 rhodium Substances 0.000 claims abstract description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 62
- 230000001699 photocatalysis Effects 0.000 claims description 54
- 239000004408 titanium dioxide Substances 0.000 claims description 21
- 238000007751 thermal spraying Methods 0.000 claims description 18
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 13
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
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- 239000002245 particle Substances 0.000 description 8
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- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 6
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 6
- 229960000907 methylthioninium chloride Drugs 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 5
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- 238000012360 testing method Methods 0.000 description 5
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- 239000000498 cooling water Substances 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
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- 229910052725 zinc Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000004887 air purification Methods 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
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- 239000011248 coating agent Substances 0.000 description 2
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- 239000000567 combustion gas Substances 0.000 description 2
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- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000010285 flame spraying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
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- 230000031700 light absorption Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
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- 238000000746 purification Methods 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
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- 239000011787 zinc oxide Substances 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 238000003877 atomic layer epitaxy Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 238000010288 cold spraying Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- 239000011888 foil Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
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- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
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- 239000004745 nonwoven fabric Substances 0.000 description 1
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- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
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- -1 polyethylene terephthalate Polymers 0.000 description 1
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- 238000003980 solgel method Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000012855 volatile organic compound Substances 0.000 description 1
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- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
図1に示すように、光触媒担持体1は、基材2と、基材2の表面に形成した金属薄膜層3と、金属薄膜層3の表面に形成した光触媒層4とを備えている。
溶射方法としては、次のような構成の溶射装置10を用いて、例えば光触媒物質としてアナターゼ型の二酸化チタンを溶射する場合には、溶射フレーム16の温度を700℃〜2000℃の低温度に設定した状態で、金属薄膜層3の表面に光触媒物質の粉末4Aを高速溶射することになる。ただし、酸化タングステンは、1400℃で溶融し、3000℃では昇華するので、光触媒物質として、酸化タングステンを溶射する場合には、溶射フレーム16の温度を700℃〜2000℃、より好ましくは700℃以上1400℃未満の低温に設定することが好ましい。
スパッタリング装置20として、図3に示すように、基材2を収容可能な大きさの真空槽21と、真空槽21の上板の下面に固定したカソード22と、真空槽21の下板の上面に固定した基材2の設置台23と、カソード22と設置台23に接続された直流電源24と、真空槽21内を減圧する真空ポンプ25とを備えた周知の構成のものを用いることになる。
厚さが0.1mmで、大きさが210mm×297mmのポリエチレンテレフタレート(PET)製のフィルム材からなる6枚の基材を製作し、そのうちの4枚の基材2の表面に対して膜厚が0.8nm、2.0nm、3.0nm、8.0nmとなるように、白金(Pt)からなる金属薄膜層を無電解メッキにより製膜した。
。その結果を表1に示す。判定基準は、○;透過率60%以上、△;透過率40〜60%未満、×;40%未満とした。
2 基材
3 金属薄膜層
4 光触媒層
4A 粉末
10 溶射装置
11 チャンバ
12 ノズル
12a スロート
13 バレル
14 冷却水通路
15 点火プラグ
16 溶射フレーム
20 スパッタリング装置
21 真空槽
22 カソード
23 設置台
24 直流電源
25 真空ポンプ
26 ターゲット
Claims (7)
- 基材の表面に形成した厚さ0.5〜2.5nmの金属および/又は金属酸化物薄膜層と、
前記金属および/又は金属酸化物薄膜層の表面に、光触媒物質を低温度の高速溶射あるいはスパッタリングすることで形成した光触媒層と、
を備えた光触媒担持体。 - 前記金属および/又は金属酸化物薄膜層が、ルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金、銀、銅、鉄、金、アルミニウム、ニッケルのいずれかから選ばれる一種あるいは二種以上の合金、或いはこれらの金属酸化物からなる請求項1記載の光触媒担持体。
- 前記光触媒物質の溶射量が0.5〜6g/m2である請求項1又は2記載の光触媒担持体。
- 前記光触媒物質が二酸化チタン及び/又は酸化タングステンからなる請求項1〜3のいずれか1項記載の光触媒担持体。
- 前記光触媒層は、溶射フレームの温度を700℃〜2000℃の低温度に設定した状態で、光触媒物質を高速溶射して形成した請求項1〜4のいずれか1項記載の光触媒担持体。
- 前記基材が透明樹脂シートからなる請求項1〜5のいずれか1項記載の光触媒担持体。
- 厚さ方向の可視光透過率が40%以上である請求項6記載の光触媒担持体。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019069430A (ja) * | 2017-10-11 | 2019-05-09 | 株式会社フジコー | 光触媒シートの製造方法及び光触媒シート |
CN115707517A (zh) * | 2021-08-20 | 2023-02-21 | 中国科学院大连化学物理研究所 | 一种负载型铜基纳米催化剂及其制备方法和应用 |
WO2023079766A1 (ja) * | 2021-11-03 | 2023-05-11 | アンデス電気株式会社 | 光触媒抗菌脱臭材料、その製造方法、抗菌脱臭材、および抗菌脱臭フィルター |
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JPH10328611A (ja) * | 1997-05-30 | 1998-12-15 | Mitsubishi Materials Corp | 有害物質除去部材の製造方法 |
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JP2003183814A (ja) * | 2001-12-13 | 2003-07-03 | Toppan Printing Co Ltd | 光触媒機能層を備えたフィルム |
JP2005028225A (ja) * | 2003-07-08 | 2005-02-03 | Toto Ltd | 光触媒材料 |
JP2013017925A (ja) * | 2011-07-08 | 2013-01-31 | Hitachi Cable Ltd | 光触媒反応型化学的加工方法及び装置 |
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2013
- 2013-10-11 JP JP2013214153A patent/JP6176050B2/ja not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10328611A (ja) * | 1997-05-30 | 1998-12-15 | Mitsubishi Materials Corp | 有害物質除去部材の製造方法 |
JPH11267515A (ja) * | 1998-03-23 | 1999-10-05 | Tayca Corp | 光触媒機能を有するシートおよび該シートを用いた微生物の繁殖抑制方法 |
JP2001322202A (ja) * | 2000-05-17 | 2001-11-20 | Murakami Corp | 複合材 |
JP2003183814A (ja) * | 2001-12-13 | 2003-07-03 | Toppan Printing Co Ltd | 光触媒機能層を備えたフィルム |
JP2005028225A (ja) * | 2003-07-08 | 2005-02-03 | Toto Ltd | 光触媒材料 |
JP2013017925A (ja) * | 2011-07-08 | 2013-01-31 | Hitachi Cable Ltd | 光触媒反応型化学的加工方法及び装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019069430A (ja) * | 2017-10-11 | 2019-05-09 | 株式会社フジコー | 光触媒シートの製造方法及び光触媒シート |
CN115707517A (zh) * | 2021-08-20 | 2023-02-21 | 中国科学院大连化学物理研究所 | 一种负载型铜基纳米催化剂及其制备方法和应用 |
CN115707517B (zh) * | 2021-08-20 | 2024-02-02 | 中国科学院大连化学物理研究所 | 一种负载型铜基纳米催化剂及其制备方法和应用 |
WO2023079766A1 (ja) * | 2021-11-03 | 2023-05-11 | アンデス電気株式会社 | 光触媒抗菌脱臭材料、その製造方法、抗菌脱臭材、および抗菌脱臭フィルター |
JP2023068678A (ja) * | 2021-11-03 | 2023-05-18 | アンデス電気株式会社 | 光触媒抗菌脱臭材料、その製造方法、抗菌脱臭材、および抗菌脱臭フィルター |
JP7436992B2 (ja) | 2021-11-03 | 2024-02-22 | アンデス電気株式会社 | 光触媒抗菌脱臭材料、その製造方法、抗菌脱臭材、および抗菌脱臭フィルター |
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