JP2015021130A5 - - Google Patents

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Publication number
JP2015021130A5
JP2015021130A5 JP2014144250A JP2014144250A JP2015021130A5 JP 2015021130 A5 JP2015021130 A5 JP 2015021130A5 JP 2014144250 A JP2014144250 A JP 2014144250A JP 2014144250 A JP2014144250 A JP 2014144250A JP 2015021130 A5 JP2015021130 A5 JP 2015021130A5
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JP
Japan
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hydrogen
ochve
hydroxyl
polymer
bond
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JP2014144250A
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English (en)
Japanese (ja)
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JP2015021130A (ja
JP5813832B2 (ja
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Priority claimed from US13/943,169 external-priority patent/US9410016B2/en
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Publication of JP2015021130A5 publication Critical patent/JP2015021130A5/ja
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JP2014144250A 2013-07-16 2014-07-14 芳香族ポリアセタールおよびそれを含む物品 Active JP5813832B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/943,169 2013-07-16
US13/943,169 US9410016B2 (en) 2013-07-16 2013-07-16 Aromatic polyacetals and articles comprising them

Publications (3)

Publication Number Publication Date
JP2015021130A JP2015021130A (ja) 2015-02-02
JP2015021130A5 true JP2015021130A5 (cg-RX-API-DMAC7.html) 2015-09-03
JP5813832B2 JP5813832B2 (ja) 2015-11-17

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ID=52344088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014144250A Active JP5813832B2 (ja) 2013-07-16 2014-07-14 芳香族ポリアセタールおよびそれを含む物品

Country Status (5)

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US (1) US9410016B2 (cg-RX-API-DMAC7.html)
JP (1) JP5813832B2 (cg-RX-API-DMAC7.html)
KR (1) KR101618179B1 (cg-RX-API-DMAC7.html)
CN (1) CN104341583B (cg-RX-API-DMAC7.html)
TW (1) TWI554553B (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
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US9229319B2 (en) 2013-12-19 2016-01-05 Rohm And Haas Electronic Materials Llc Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
US9527790B1 (en) 2015-08-18 2016-12-27 Dow Global Technologies Llc Fluorosulfonyl-substituted bis(aryl)acetal compounds
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