JP2014529846A - 方法 - Google Patents

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Publication number
JP2014529846A
JP2014529846A JP2014525500A JP2014525500A JP2014529846A JP 2014529846 A JP2014529846 A JP 2014529846A JP 2014525500 A JP2014525500 A JP 2014525500A JP 2014525500 A JP2014525500 A JP 2014525500A JP 2014529846 A JP2014529846 A JP 2014529846A
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Japan
Prior art keywords
active material
particles
working electrode
silicon
conductive
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Pending
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JP2014525500A
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English (en)
Japanese (ja)
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JP2014529846A5 (enExample
Inventor
レイナー フィル
レイナー フィル
レイン マイク
レイン マイク
バーカー ジェレミー
バーカー ジェレミー
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Nexeon Ltd
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Nexeon Ltd
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Publication of JP2014529846A publication Critical patent/JP2014529846A/ja
Publication of JP2014529846A5 publication Critical patent/JP2014529846A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10721—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of tetrachloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/186—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof from or via fluosilicic acid or salts thereof by a wet process
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C25D1/22—Separating compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/006—Nanoparticles
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0404—Methods of deposition of the material by coating on electrode collectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0438—Processes of manufacture in general by electrochemical processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0438—Processes of manufacture in general by electrochemical processing
    • H01M4/045—Electrochemical coating; Electrochemical impregnation
    • H01M4/0452—Electrochemical coating; Electrochemical impregnation from solutions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/36—Selection of substances as active materials, active masses, active liquids
    • H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
    • H01M4/386—Silicon or alloys based on silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/36—Selection of substances as active materials, active masses, active liquids
    • H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
    • H01M4/387—Tin or alloys based on tin
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/36—Selection of substances as active materials, active masses, active liquids
    • H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
    • H01M4/46—Alloys based on magnesium or aluminium
    • H01M4/463—Aluminium based
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Secondary Cells (AREA)
  • Silicon Compounds (AREA)
JP2014525500A 2011-08-18 2012-08-17 方法 Pending JP2014529846A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB1114266.8A GB2500163B (en) 2011-08-18 2011-08-18 Method
GB1114266.8 2011-08-18

Publications (2)

Publication Number Publication Date
JP2014529846A true JP2014529846A (ja) 2014-11-13
JP2014529846A5 JP2014529846A5 (enExample) 2015-10-01

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Country Status (7)

Country Link
US (1) US20140170303A1 (enExample)
EP (1) EP2744929A2 (enExample)
JP (1) JP2014529846A (enExample)
KR (1) KR20140067050A (enExample)
CN (1) CN104093887A (enExample)
GB (1) GB2500163B (enExample)
WO (1) WO2013024305A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014135239A (ja) * 2013-01-11 2014-07-24 Waseda Univ リチウム二次電池活物質の製造方法、及びリチウム二次電池
CN107134577A (zh) * 2017-05-09 2017-09-05 东北大学 一种纳米级磷酸锰锂的制备方法

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2492167C (en) 2011-06-24 2018-12-05 Nexeon Ltd Structured particles
WO2013114095A1 (en) 2012-01-30 2013-08-08 Nexeon Limited Composition of si/c electro active material
GB2499984B (en) 2012-02-28 2014-08-06 Nexeon Ltd Composite particles comprising a removable filler
GB2502625B (en) 2012-06-06 2015-07-29 Nexeon Ltd Method of forming silicon
GB2507535B (en) 2012-11-02 2015-07-15 Nexeon Ltd Multilayer electrode
WO2015009311A1 (en) 2013-07-19 2015-01-22 United Technologies Corporation Method and system for core-shell catalyst processing
TWI504047B (zh) * 2013-09-16 2015-10-11 Auo Crystal Corp 電池矽材及其製法
WO2015191126A2 (en) * 2014-03-24 2015-12-17 United Technologies Corporation Synthesis of alloy and diffusion material nanoparticles
KR101567203B1 (ko) 2014-04-09 2015-11-09 (주)오렌지파워 이차 전지용 음극 활물질 및 이의 방법
KR101604352B1 (ko) 2014-04-22 2016-03-18 (주)오렌지파워 음극 활물질 및 이를 포함하는 리튬 이차 전지
KR101588577B1 (ko) * 2014-06-11 2016-01-28 한국표준과학연구원 대면적의 수직 정렬된 갈륨비소 반도체 나노선 어레이 제작 공정
CN104064732A (zh) * 2014-07-07 2014-09-24 盐城市新能源化学储能与动力电源研究中心 一种脉冲电沉积制备锂硅薄膜锂离子电池负极的方法
PL3172169T4 (pl) * 2014-07-22 2022-01-10 Xerion Advanced Battery Corp. Litowane tlenki metali przejściowych
KR101550781B1 (ko) 2014-07-23 2015-09-08 (주)오렌지파워 2 차 전지용 실리콘계 활물질 입자의 제조 방법
KR101637993B1 (ko) * 2014-10-17 2016-07-11 한양대학교 에리카산학협력단 금속 분말 제조방법 및 제조장치
US10006134B1 (en) * 2014-11-07 2018-06-26 University Of South Florida Electrodeposition of metal microstructures
GB2533161C (en) 2014-12-12 2019-07-24 Nexeon Ltd Electrodes for metal-ion batteries
KR101726037B1 (ko) 2015-03-26 2017-04-11 (주)오렌지파워 실리콘계 음극 활물질 및 이의 제조 방법
WO2016160703A1 (en) 2015-03-27 2016-10-06 Harrup Mason K All-inorganic solvents for electrolytes
US10173176B2 (en) 2015-04-29 2019-01-08 Ppg Industries Ohio, Inc. Method for preparing a resin-treated microporous membrane
ES2993278T3 (en) 2016-06-14 2024-12-26 Nexeon Ltd Electrodes for metal-ion batteries
US10707531B1 (en) 2016-09-27 2020-07-07 New Dominion Enterprises Inc. All-inorganic solvents for electrolytes
CN107394176B (zh) * 2017-07-31 2020-07-24 中国地质大学（北京） 硅碳复合材料、制备方法和应用及锂离子电池负极材料
US20190100850A1 (en) 2017-10-03 2019-04-04 Xerion Advanced Battery Corporation Electroplating Transitional Metal Oxides
JP6986921B2 (ja) * 2017-10-12 2021-12-22 株式会社荏原製作所 めっき装置及びめっき方法
US10886523B2 (en) * 2018-05-24 2021-01-05 Xerion Advanced Battery Corporation Electroplating lithiated transition metal oxides using low purity starting precursors
CN111384360B (zh) * 2018-12-27 2022-02-22 财团法人工业技术研究院 金属离子电池
KR102831428B1 (ko) * 2019-10-15 2025-07-08 한양대학교 에리카산학협력단 기능성 양극 활물질, 및 그 제조 방법
US12489138B2 (en) 2019-10-15 2025-12-02 Industry-University Cooperation Foundation Hanyang University Erica Campus Intermediate product of solid electrolyte, solid electrolyte using same, secondary battery including same, and method for manufacturing same
US20220399539A1 (en) * 2019-11-21 2022-12-15 Volkswagen Aktiengesellschaft Dry electrode manufacturing
CN111928979B (zh) * 2020-07-22 2022-02-15 浙江理工大学 一种高灵敏度、类毛囊结构的压力传感器的制备方法
US12100828B2 (en) * 2021-01-29 2024-09-24 Pure Lithium Corporation Microscopically smooth substrates for lithium metal deposition
US12431480B2 (en) 2020-08-28 2025-09-30 Pure Lithium Corporation Methods for forming an energy storage device
US12368155B2 (en) 2020-08-28 2025-07-22 Pure Lithium Corporation Lithium metal anode and battery
WO2022240696A1 (en) 2021-05-12 2022-11-17 Pure Lithium Corporation Rechargeable battery and electrolysis method of making the same
US20240204163A1 (en) * 2022-12-16 2024-06-20 Global Graphene Group, Inc. Process for Depositing and Prelithiating an Anode Active Material in Porous Conductive Particles for Lithium Batteries
CN116111078B (zh) * 2023-04-12 2023-11-10 贝特瑞新材料集团股份有限公司 负极材料及其制备方法、锂离子电池

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116264A (ja) * 2003-10-06 2005-04-28 National Institute Of Advanced Industrial & Technology 非水溶媒メッキ法によるリチウムイオン二次電池負極用箔帯の製造方法
JP2009521082A (ja) * 2005-12-23 2009-05-28 コミツサリア タ レネルジー アトミーク リチウム電池の陰極に利用可能なカーボンナノチューブ及びシリコンベースの材料
JP2009283248A (ja) * 2008-05-21 2009-12-03 Toyota Motor Corp 非水電解液二次電池用負極及びその製造方法
JP2010533637A (ja) * 2007-07-17 2010-10-28 ネグゼオン・リミテッド シリコン又はシリコンベースの材料で構成される構造化粒子の製造方法及びリチウム蓄電池におけるそれらの使用
WO2010138619A2 (en) * 2009-05-27 2010-12-02 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
WO2011005693A1 (en) * 2009-07-06 2011-01-13 Zeptor Corporation Carbon nanotube composite structures and methods of manufacturing the same
JP2011513906A (ja) * 2008-02-26 2011-04-28 コミサリア ア レネルジィ アトミーク エ オ ゼネ ルジイ アルテアナティーフ シリコン系電極を作製する方法、シリコン系電極、およびそのような電極を備えたリチウム電池

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US486013A (en) * 1892-11-08 Philip wuest
GB1543440A (en) * 1976-07-30 1979-04-04 Bicc Ltd Fabrication of elongate copper bodies
IT7849594A0 (it) * 1977-06-01 1978-05-30 British Insulated Callenders Procedimento per la fabbricazione di prodotti di rame e prodotti co si' ottenuti
US4192720A (en) 1978-10-16 1980-03-11 Exxon Research & Engineering Co. Electrodeposition process for forming amorphous silicon
US4686013A (en) * 1986-03-14 1987-08-11 Gates Energy Products, Inc. Electrode for a rechargeable electrochemical cell and method and apparatus for making same
US6337156B1 (en) * 1997-12-23 2002-01-08 Sri International Ion battery using high aspect ratio electrodes
AU4822499A (en) * 1998-06-15 2000-01-05 Boeing Company, The Making particulates of controlled dimensions
JP3714665B2 (ja) 2002-01-25 2005-11-09 Ｎｅｃトーキン栃木株式会社 リチウムイオン二次電池の製造方法
US20040140222A1 (en) * 2002-09-12 2004-07-22 Smedley Stuart I. Method for operating a metal particle electrolyzer
US7244513B2 (en) 2003-02-21 2007-07-17 Nano-Proprietary, Inc. Stain-etched silicon powder
JP3799049B2 (ja) * 2004-05-12 2006-07-19 三井金属鉱業株式会社 非水電解液二次電池用負極及びその製造方法
US7713849B2 (en) 2004-08-20 2010-05-11 Illuminex Corporation Metallic nanowire arrays and methods for making and using same
JP2006172860A (ja) 2004-12-15 2006-06-29 Matsushita Electric Ind Co Ltd リチウム二次電池用負極およびその製造方法、ならびにリチウム二次電池
US20060147802A1 (en) * 2005-01-05 2006-07-06 Kiyotaka Yasuda Anode for nonaqueous secondary battery, process of producing the anode, and nonaqueous secondary battery
US20060216603A1 (en) 2005-03-26 2006-09-28 Enable Ipc Lithium-ion rechargeable battery based on nanostructures
CN101472839A (zh) * 2006-05-09 2009-07-01 诺尔斯海德公司 四氯化硅的制造方法
JP2009542561A (ja) * 2006-05-09 2009-12-03 ノルスク・ヒドロ・アーエスアー 四塩化ケイ素を製造する方法
KR101400994B1 (ko) 2007-04-10 2014-05-29 한국과학기술원 고용량 리튬 이차전지용 전극 및 이를 함유하는 리튬이차전지
GB0709165D0 (en) * 2007-05-11 2007-06-20 Nexeon Ltd A silicon anode for a rechargeable battery
GB2464158B (en) * 2008-10-10 2011-04-20 Nexeon Ltd A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
US20100285358A1 (en) 2009-05-07 2010-11-11 Amprius, Inc. Electrode Including Nanostructures for Rechargeable Cells
EP3859830B1 (en) 2009-05-19 2022-03-09 OneD Material, Inc. Nanostructured materials for battery applications
KR101732608B1 (ko) * 2009-06-29 2017-05-04 어플라이드 머티어리얼스, 인코포레이티드 에너지 저장 디바이스 내의 3차원 구리 함유 전극의 고체 전해질 인터페이스를 위한 패시베이션 막

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116264A (ja) * 2003-10-06 2005-04-28 National Institute Of Advanced Industrial & Technology 非水溶媒メッキ法によるリチウムイオン二次電池負極用箔帯の製造方法
JP2009521082A (ja) * 2005-12-23 2009-05-28 コミツサリア タ レネルジー アトミーク リチウム電池の陰極に利用可能なカーボンナノチューブ及びシリコンベースの材料
JP2010533637A (ja) * 2007-07-17 2010-10-28 ネグゼオン・リミテッド シリコン又はシリコンベースの材料で構成される構造化粒子の製造方法及びリチウム蓄電池におけるそれらの使用
JP2011513906A (ja) * 2008-02-26 2011-04-28 コミサリア ア レネルジィ アトミーク エ オ ゼネ ルジイ アルテアナティーフ シリコン系電極を作製する方法、シリコン系電極、およびそのような電極を備えたリチウム電池
JP2009283248A (ja) * 2008-05-21 2009-12-03 Toyota Motor Corp 非水電解液二次電池用負極及びその製造方法
WO2010138619A2 (en) * 2009-05-27 2010-12-02 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
WO2011005693A1 (en) * 2009-07-06 2011-01-13 Zeptor Corporation Carbon nanotube composite structures and methods of manufacturing the same

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
J.MALLET,ET.AL.: "Growth of Silicon Nanowires of Controlled Diameters by Electrodeposition in lonic Liquid at Room Tem", NANO LETTERS,AMERICAN CHEMICAL SOCIETY, vol. 8, no. 10, JPN6016027531, 2008, pages 3468 - 3474, ISSN: 0003362572 *
RONGGUAN LV,ET.AL.: "Electrodeposited porous-microspheres Li-Si films as negative electrodes in lithium-ion batteries", JOURNAL OF POWER SOURCES, vol. 196, JPN6016027535, 12 January 2011 (2011-01-12), pages 3868 - 3873, ISSN: 0003362573 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014135239A (ja) * 2013-01-11 2014-07-24 Waseda Univ リチウム二次電池活物質の製造方法、及びリチウム二次電池
CN107134577A (zh) * 2017-05-09 2017-09-05 东北大学 一种纳米级磷酸锰锂的制备方法
CN107134577B (zh) * 2017-05-09 2019-07-26 东北大学 一种纳米级磷酸锰锂的制备方法

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