JP2014528164A5 - - Google Patents

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Publication number
JP2014528164A5
JP2014528164A5 JP2014529637A JP2014529637A JP2014528164A5 JP 2014528164 A5 JP2014528164 A5 JP 2014528164A5 JP 2014529637 A JP2014529637 A JP 2014529637A JP 2014529637 A JP2014529637 A JP 2014529637A JP 2014528164 A5 JP2014528164 A5 JP 2014528164A5
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JP
Japan
Prior art keywords
target
bearing
processing tool
target processing
guide surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014529637A
Other languages
English (en)
Japanese (ja)
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JP2014528164A (ja
JP5955964B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/NL2012/050630 external-priority patent/WO2013039387A1/en
Publication of JP2014528164A publication Critical patent/JP2014528164A/ja
Publication of JP2014528164A5 publication Critical patent/JP2014528164A5/ja
Application granted granted Critical
Publication of JP5955964B2 publication Critical patent/JP5955964B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014529637A 2011-09-12 2012-09-07 ターゲット処理ツールのためのガイダンス Active JP5955964B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161533339P 2011-09-12 2011-09-12
US61/533,339 2011-09-12
PCT/NL2012/050630 WO2013039387A1 (en) 2011-09-12 2012-09-07 Guidance for target processing tool

Publications (3)

Publication Number Publication Date
JP2014528164A JP2014528164A (ja) 2014-10-23
JP2014528164A5 true JP2014528164A5 (https=) 2015-10-29
JP5955964B2 JP5955964B2 (ja) 2016-07-20

Family

ID=47003170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014529637A Active JP5955964B2 (ja) 2011-09-12 2012-09-07 ターゲット処理ツールのためのガイダンス

Country Status (5)

Country Link
US (1) US9163664B2 (https=)
EP (1) EP2756354B1 (https=)
JP (1) JP5955964B2 (https=)
TW (1) TW201314382A (https=)
WO (1) WO2013039387A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013039387A1 (en) 2011-09-12 2013-03-21 Mapper Lithography Ip B.V. Guidance for target processing tool
KR101608625B1 (ko) * 2015-07-30 2016-04-11 주식회사 재원 위치 결정 장치
CN112658691A (zh) * 2020-12-16 2021-04-16 惠州城市职业学院(惠州商贸旅游高级职业技术学校) 一种冲浪板切割打磨一体装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637738A (en) * 1985-07-31 1987-01-20 Vincent Barkley Alignment compensator for linear bearings
US4802774A (en) * 1987-10-14 1989-02-07 Brown & Sharpe Manfacturing Co. Gas bearing for guiding relative movement of precision machine parts
JPH01240246A (ja) * 1988-03-22 1989-09-25 Kazuya Hirose テーブルの縦横移動機構
US5180230A (en) * 1991-06-12 1993-01-19 Etec Systems, Inc. Rolling element cage constraint
JP3353941B2 (ja) * 1993-05-11 2002-12-09 オリンパス光学工業株式会社 直線移動部材の支持装置
US5760564A (en) 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
JP4073512B2 (ja) * 1997-02-10 2008-04-09 コニカミノルタホールディングス株式会社 駆動装置
US6114799A (en) * 1997-02-10 2000-09-05 Minolta Co., Ltd. Driving mechanism
DE60032568T2 (de) 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
US6570155B1 (en) * 2000-04-11 2003-05-27 Applied Materials, Inc. Bi-directional electron beam scanning apparatus
DE10140174B4 (de) 2001-08-22 2005-11-10 Leica Microsystems Semiconductor Gmbh Koordinaten-Messtisch und Koordinaten-Messgerät
SG126732A1 (en) * 2002-09-30 2006-11-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI544294B (zh) 2008-08-18 2016-08-01 瑪波微影Ｉｐ公司 帶電粒子射束微影系統以及目標物定位裝置
NL2003846A (en) * 2008-12-19 2010-06-22 Asml Netherlands Bv Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless.
WO2013039387A1 (en) 2011-09-12 2013-03-21 Mapper Lithography Ip B.V. Guidance for target processing tool

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