JP2014514744A5 - - Google Patents

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JP2014514744A5
JP2014514744A5 JP2014501055A JP2014501055A JP2014514744A5 JP 2014514744 A5 JP2014514744 A5 JP 2014514744A5 JP 2014501055 A JP2014501055 A JP 2014501055A JP 2014501055 A JP2014501055 A JP 2014501055A JP 2014514744 A5 JP2014514744 A5 JP 2014514744A5
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gas
liner
distribution manifold
gas distribution
assembly
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JP2014514744A (ja
JP5837178B2 (ja
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図４は、図２のインジェクタライナ１３２Ｅ、バッフルライナ１３２Ｇ、および注入インサートライナアセンブリ１３２Ｆの実施形態を有する、図１Ａに示すガス分配アセンブリ１２８の等角図である。インジェクタライナ１３２Ｅのこの実施形態においては、ガスを分配するように構成されたガス分配マニホルドライナ４００が、注入インサートライナアセンブリ１３２Ｆに対して結合されて図示される。ガス分配マニホルドライナ４００は、他のガス分配マニホルドライナと交換可能となるように構成される。ガス分配マニホルドライナ４００は、容易な交換を促進するために、注入インサートライナアセンブリ１３２Ｆに対して容易に結合および結合解除される。
図５Ｂは、図５Ａの注入キャップ１２９、バッフルライナ１３２Ｇ、注入インサートライナアセンブリ１３２Ｆ、およびガス分配マニホルドライナ４００の等角断面図である。第２のガス源１３５Ｂからの第２のガスが、注入キャップ１２９内において第２のチャンバ５０５Ｂから第２の導管５１０Ｂを通して流される。第２の導管５１０Ｂは、バッフルライナ１３２Ｇ内に配設された第２のオリフィス５１５Ｂと流体連通状態にある。次いで、第２のガスは、第２のオリフィス５１５Ｂを通り注入インサートライナアセンブリ１３２Ｆ内へと流れる。注入インサートライナアセンブリ１３２Ｆは、第２のガス通路５２０Ｂを備える。注入インサートライナアセンブリ１３２Ｆは、第２のガス通路５２０Ｂの長手方向軸に対して実質的に直角である長手方向軸を有するチャネル５２５Ｂを備える。第２のガスは、チャネル５２５Ｂからガス分配マニホルドライナ４００内へと流れる。ガス分配マニホルドライナ４００は、第２の出口２１０Ｂ内へと開口する第２のプレナム５３０Ｂを備える。第２のプレナム５３０Ｂは、制限を防止し、ガスが第２の出口２１０Ｂから退出する際に第２のガスの層流を形成するように、サイズ設定される。したがって、第２のガスは、第１の出口２１０Ａから退出する第１のガスの速度をはるかに下回る速度にて第２の出口２１０Ｂから退出して、層流を形成する。
JP2014501055A 2011-03-22 2011-07-26 化学気相堆積チャンバ用のライナアセンブリ Active JP5837178B2 (ja)

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US201161466413P 2011-03-22 2011-03-22
US61/466,413 2011-03-22
PCT/US2011/045288 WO2012128783A1 (en) 2011-03-22 2011-07-26 Liner assembly for chemical vapor deposition chamber

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JP2014514744A JP2014514744A (ja) 2014-06-19
JP2014514744A5 true JP2014514744A5 (ja) 2014-09-11
JP5837178B2 JP5837178B2 (ja) 2015-12-24

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US (2) US8980005B2 (ja)
JP (1) JP5837178B2 (ja)
KR (1) KR101884003B1 (ja)
CN (1) CN103430285B (ja)
TW (1) TWI551720B (ja)
WO (1) WO2012128783A1 (ja)

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