SG10201708105UA - Quartz upper and lower domes - Google Patents
Quartz upper and lower domesInfo
- Publication number
- SG10201708105UA SG10201708105UA SG10201708105UA SG10201708105UA SG10201708105UA SG 10201708105U A SG10201708105U A SG 10201708105UA SG 10201708105U A SG10201708105U A SG 10201708105UA SG 10201708105U A SG10201708105U A SG 10201708105UA SG 10201708105U A SG10201708105U A SG 10201708105UA
- Authority
- SG
- Singapore
- Prior art keywords
- lower domes
- quartz upper
- quartz
- domes
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/45504—Laminar flow
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361753410P | 2013-01-16 | 2013-01-16 | |
US201361780447P | 2013-03-13 | 2013-03-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201708105UA true SG10201708105UA (en) | 2017-11-29 |
Family
ID=51165213
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201504342SA SG11201504342SA (en) | 2013-01-16 | 2013-12-18 | Quartz upper and lower domes |
SG10201708105UA SG10201708105UA (en) | 2013-01-16 | 2013-12-18 | Quartz upper and lower domes |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201504342SA SG11201504342SA (en) | 2013-01-16 | 2013-12-18 | Quartz upper and lower domes |
Country Status (7)
Country | Link |
---|---|
US (2) | US9768043B2 (en) |
JP (2) | JP6388876B2 (en) |
KR (1) | KR20150108392A (en) |
CN (3) | CN107658245A (en) |
SG (2) | SG11201504342SA (en) |
TW (1) | TWI638070B (en) |
WO (1) | WO2014113179A1 (en) |
Families Citing this family (23)
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US20140083360A1 (en) * | 2012-09-26 | 2014-03-27 | Applied Materials, Inc. | Process chamber having more uniform gas flow |
US10405375B2 (en) | 2013-03-11 | 2019-09-03 | Applied Materials, Inc. | Lamphead PCB with flexible standoffs |
US9814099B2 (en) * | 2013-08-02 | 2017-11-07 | Applied Materials, Inc. | Substrate support with surface feature for reduced reflection and manufacturing techniques for producing same |
US11414759B2 (en) * | 2013-11-29 | 2022-08-16 | Taiwan Semiconductor Manufacturing Co., Ltd | Mechanisms for supplying process gas into wafer process apparatus |
US11060203B2 (en) * | 2014-09-05 | 2021-07-13 | Applied Materials, Inc. | Liner for epi chamber |
US20160071749A1 (en) * | 2014-09-05 | 2016-03-10 | Applied Materials, Inc. | Upper dome for epi chamber |
US10760161B2 (en) | 2014-09-05 | 2020-09-01 | Applied Materials, Inc. | Inject insert for EPI chamber |
US10872790B2 (en) | 2014-10-20 | 2020-12-22 | Applied Materials, Inc. | Optical system |
WO2016109063A1 (en) * | 2015-01-02 | 2016-07-07 | Applied Materials, Inc. | Processing chamber |
US10475674B2 (en) * | 2015-03-25 | 2019-11-12 | SCREEN Holdings Co., Ltd. | Light irradiation type heat treatment apparatus and method for manufacturing heat treatment apparatus |
US10781533B2 (en) * | 2015-07-31 | 2020-09-22 | Applied Materials, Inc. | Batch processing chamber |
CN108028200B (en) * | 2015-12-30 | 2022-05-27 | 玛特森技术公司 | Method for improving process uniformity in millisecond anneal systems |
JP6847610B2 (en) * | 2016-09-14 | 2021-03-24 | 株式会社Screenホールディングス | Heat treatment equipment |
IT201600099783A1 (en) | 2016-10-05 | 2018-04-05 | Lpe Spa | REACTOR FOR EPITAXIAL DEPOSITION WITH EXTERIOR REFLECTOR OF THE REACTION CHAMBER AND METHOD OF COOLING A SUSCECTOR AND SUBSTRATES |
KR102203745B1 (en) * | 2017-02-23 | 2021-01-18 | 가부시키가이샤 코쿠사이 엘렉트릭 | Substrate processing device, semiconductor device manufacturing method, computer program and reaction tube |
WO2020046567A1 (en) | 2018-08-29 | 2020-03-05 | Applied Materials, Inc. | Chamber injector |
US11032945B2 (en) * | 2019-07-12 | 2021-06-08 | Applied Materials, Inc. | Heat shield assembly for an epitaxy chamber |
JP2021068871A (en) * | 2019-10-28 | 2021-04-30 | 株式会社Sumco | Epitaxial growth device and method of manufacturing epitaxial wafer |
CN110981172A (en) * | 2019-12-21 | 2020-04-10 | 张忠恕 | Epitaxial process quartz weldment assembly and processing process thereof |
US20220056583A1 (en) * | 2020-08-18 | 2022-02-24 | Globalwafers Co., Ltd. | Window for chemical vapor deposition systems and related methods |
JP2024510364A (en) * | 2021-05-11 | 2024-03-07 | アプライド マテリアルズ インコーポレイテッド | Gas injector for epitaxy chamber and CVD chamber |
KR20230012803A (en) * | 2021-07-16 | 2023-01-26 | 주성엔지니어링(주) | Upper Dome for Substrate Processing Apparatus and Substrate Processing Apparatus |
CN115020303B (en) * | 2022-08-09 | 2022-11-04 | 北京屹唐半导体科技股份有限公司 | Heat treatment device for wafer |
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TW315493B (en) * | 1996-02-28 | 1997-09-11 | Tokyo Electron Co Ltd | Heating apparatus and heat treatment apparatus |
US6108490A (en) * | 1996-07-11 | 2000-08-22 | Cvc, Inc. | Multizone illuminator for rapid thermal processing with improved spatial resolution |
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KR101884003B1 (en) * | 2011-03-22 | 2018-07-31 | 어플라이드 머티어리얼스, 인코포레이티드 | Liner assembly for chemical vapor deposition chamber |
US20140026816A1 (en) | 2012-07-27 | 2014-01-30 | Applied Materials, Inc. | Multi-zone quartz gas distribution apparatus |
-
2013
- 2013-12-18 CN CN201710626296.1A patent/CN107658245A/en active Pending
- 2013-12-18 WO PCT/US2013/076295 patent/WO2014113179A1/en active Application Filing
- 2013-12-18 US US14/132,215 patent/US9768043B2/en active Active
- 2013-12-18 CN CN201810152083.4A patent/CN108364889A/en active Pending
- 2013-12-18 JP JP2015553739A patent/JP6388876B2/en active Active
- 2013-12-18 KR KR1020157022182A patent/KR20150108392A/en active IP Right Grant
- 2013-12-18 CN CN201380067617.9A patent/CN104885192B/en active Active
- 2013-12-18 SG SG11201504342SA patent/SG11201504342SA/en unknown
- 2013-12-18 SG SG10201708105UA patent/SG10201708105UA/en unknown
- 2013-12-24 TW TW102147992A patent/TWI638070B/en active
-
2017
- 2017-09-18 US US15/707,810 patent/US20180005856A1/en not_active Abandoned
-
2018
- 2018-08-15 JP JP2018152887A patent/JP2019009453A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN104885192B (en) | 2018-03-27 |
WO2014113179A1 (en) | 2014-07-24 |
JP2019009453A (en) | 2019-01-17 |
CN107658245A (en) | 2018-02-02 |
US20140199056A1 (en) | 2014-07-17 |
TWI638070B (en) | 2018-10-11 |
CN108364889A (en) | 2018-08-03 |
SG11201504342SA (en) | 2015-08-28 |
CN104885192A (en) | 2015-09-02 |
JP6388876B2 (en) | 2018-09-12 |
US9768043B2 (en) | 2017-09-19 |
JP2016509751A (en) | 2016-03-31 |
TW201432103A (en) | 2014-08-16 |
KR20150108392A (en) | 2015-09-25 |
US20180005856A1 (en) | 2018-01-04 |
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