JP2014510798A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2014510798A5 JP2014510798A5 JP2013544680A JP2013544680A JP2014510798A5 JP 2014510798 A5 JP2014510798 A5 JP 2014510798A5 JP 2013544680 A JP2013544680 A JP 2013544680A JP 2013544680 A JP2013544680 A JP 2013544680A JP 2014510798 A5 JP2014510798 A5 JP 2014510798A5
- Authority
- JP
- Japan
- Prior art keywords
- type
- represented
- formula
- methyl
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 5
- 229910052731 fluorine Inorganic materials 0.000 claims 5
- 239000011737 fluorine Substances 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 3
- -1 dimethyl (p-acetoxyphenyl) sulfonium hexafluoroantimonate Chemical compound 0.000 claims 3
- 150000002431 hydrogen Chemical class 0.000 claims 3
- 125000005647 linker group Chemical group 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000011254 layer-forming composition Substances 0.000 claims 2
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 claims 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 2
- GEWWCWZGHNIUBW-UHFFFAOYSA-N 1-(4-nitrophenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C([N+]([O-])=O)C=C1 GEWWCWZGHNIUBW-UHFFFAOYSA-N 0.000 claims 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 claims 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 claims 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 239000003963 antioxidant agent Substances 0.000 claims 1
- 230000003078 antioxidant effect Effects 0.000 claims 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 claims 1
- 238000005266 casting Methods 0.000 claims 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 229940057867 methyl lactate Drugs 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 230000002195 synergetic effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42276310P | 2010-12-14 | 2010-12-14 | |
| US61/422,763 | 2010-12-14 | ||
| PCT/US2011/064569 WO2012082705A1 (en) | 2010-12-14 | 2011-12-13 | Transparent layer forming polymer |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014510798A JP2014510798A (ja) | 2014-05-01 |
| JP2014510798A5 true JP2014510798A5 (enExample) | 2015-02-12 |
| JP5947809B2 JP5947809B2 (ja) | 2016-07-06 |
Family
ID=45478486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013544680A Expired - Fee Related JP5947809B2 (ja) | 2010-12-14 | 2011-12-13 | 透明層形成性ポリマー |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8829087B2 (enExample) |
| EP (1) | EP2651996B1 (enExample) |
| JP (1) | JP5947809B2 (enExample) |
| KR (1) | KR101810502B1 (enExample) |
| CN (1) | CN103249750B (enExample) |
| TW (1) | TWI491626B (enExample) |
| WO (1) | WO2012082705A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3276632B1 (en) * | 2015-03-26 | 2023-06-07 | Kyocera Corporation | Dielectric film, and film capacitor, connective capacitor, inverter, and electric vehicle each including same |
| CN111057028B (zh) * | 2018-10-17 | 2021-12-10 | 北京师范大学 | 含氟阳离子聚合单体及其合成和应用 |
| GB2579405B (en) | 2018-11-30 | 2022-09-14 | Si Group Switzerland Chaa Gmbh | Antioxidant compositions |
| JP7764724B2 (ja) * | 2021-10-19 | 2025-11-06 | 住友ベークライト株式会社 | ポリマーおよびワニス |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6800875B1 (en) | 1995-11-17 | 2004-10-05 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix electro-luminescent display device with an organic leveling layer |
| US6538087B2 (en) | 2000-07-28 | 2003-03-25 | Promerus, Llc | Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| US7022790B2 (en) * | 2002-07-03 | 2006-04-04 | Sumitomo Bakelite Company, Ltd. | Photosensitive compositions based on polycyclic polymers |
| US20060020068A1 (en) | 2004-07-07 | 2006-01-26 | Edmund Elce | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| JP4930059B2 (ja) | 2003-11-21 | 2012-05-09 | 住友ベークライト株式会社 | 光導波路およびその方法 |
| WO2006017035A1 (en) * | 2004-07-07 | 2006-02-16 | Promerus Llc | Photosensitive dielectric resin compositions and their uses |
| US8084131B2 (en) * | 2007-05-24 | 2011-12-27 | Sumitomo Bakelite Company, Ltd. | Transparent hybrid sheet |
| JP5187492B2 (ja) * | 2007-11-22 | 2013-04-24 | Ｊｓｒ株式会社 | 硬化性樹脂組成物、保護膜および保護膜の形成方法 |
-
2011
- 2011-12-09 US US13/315,404 patent/US8829087B2/en active Active
- 2011-12-13 TW TW100145935A patent/TWI491626B/zh not_active IP Right Cessation
- 2011-12-13 CN CN201180055847.4A patent/CN103249750B/zh not_active Expired - Fee Related
- 2011-12-13 KR KR1020137016984A patent/KR101810502B1/ko not_active Expired - Fee Related
- 2011-12-13 WO PCT/US2011/064569 patent/WO2012082705A1/en not_active Ceased
- 2011-12-13 EP EP11808429.2A patent/EP2651996B1/en not_active Not-in-force
- 2011-12-13 JP JP2013544680A patent/JP5947809B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103562793B (zh) | 感光性硅氧烷树脂组合物 | |
| CN103069341B (zh) | 正型感光性硅氧烷组合物 | |
| TWI456352B (zh) | 圖案形成方法 | |
| JP2013166932A5 (enExample) | ||
| JP6641879B2 (ja) | レジスト下層膜形成用組成物、レジスト下層膜及びパターニングされた基板の製造方法 | |
| JP2014524942A5 (enExample) | ||
| TWI553042B (zh) | 圖型反轉膜形成用組成物及反轉圖型形成方法 | |
| JP6079263B2 (ja) | レジスト下層膜形成用組成物及びパターン形成方法 | |
| TW201404781A (zh) | 矽烷偶合劑、感光性樹脂組成物、硬化膜及觸控面板構件 | |
| EP3098653A1 (en) | Negative photosensitive resin composition, cured film obtained by curing same, method for producing cured film, optical device provided with cured film, and backside-illuminated cmos image sensor | |
| WO2016140057A1 (ja) | 感放射線性組成物及びパターン形成方法 | |
| JP2014510798A5 (enExample) | ||
| CN105934693B (zh) | 树脂组合物 | |
| JP6821988B2 (ja) | 感放射線性樹脂組成物及びレジストパターン形成方法 | |
| JP5611907B2 (ja) | ポジ型レジスト組成物及びパターン形成方法 | |
| TW201213301A (en) | Radiation-sensitive resin composition, polymer, and compound | |
| WO2014142296A1 (ja) | 上層膜形成用組成物およびそれを用いたレジストパターン形成方法 | |
| JP2014178573A5 (enExample) | ||
| JP6361361B2 (ja) | ポジ型リフトオフレジスト組成物及びパターン形成方法 | |
| TWI871442B (zh) | 負型感光性樹脂組成物、圖案結構及圖案固化膜的製造方法 | |
| JPWO2023223670A5 (enExample) | ||
| JP5423367B2 (ja) | 酸転写用組成物、酸転写用膜及びパターン形成方法 | |
| JP2012203393A (ja) | レジスト下層膜形成用組成物、レジスト下層膜及びパターン形成方法 | |
| JP6237766B2 (ja) | 自己組織化リソグラフィプロセスに用いられる組成物 | |
| JP2011074314A (ja) | 高分子化合物、感光性樹脂組成物、および硬化レリーフパターン形成方法 |