TWI491626B - 透明成層聚合物 - Google Patents

透明成層聚合物 Download PDF

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Publication number
TWI491626B
TWI491626B TW100145935A TW100145935A TWI491626B TW I491626 B TWI491626 B TW I491626B TW 100145935 A TW100145935 A TW 100145935A TW 100145935 A TW100145935 A TW 100145935A TW I491626 B TWI491626 B TW I491626B
Authority
TW
Taiwan
Prior art keywords
butyl
tert
bis
group
hydroxy
Prior art date
Application number
TW100145935A
Other languages
English (en)
Chinese (zh)
Other versions
TW201231485A (en
Inventor
Osamu Onishi
Larry Rhodes
Nobuo Tagashira
Original Assignee
Promerus Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Promerus Llc filed Critical Promerus Llc
Publication of TW201231485A publication Critical patent/TW201231485A/zh
Application granted granted Critical
Publication of TWI491626B publication Critical patent/TWI491626B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Epoxy Resins (AREA)
  • Laminated Bodies (AREA)
TW100145935A 2010-12-14 2011-12-13 透明成層聚合物 TWI491626B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42276310P 2010-12-14 2010-12-14
US13/315,404 US8829087B2 (en) 2010-12-14 2011-12-09 Transparent layer forming polymer

Publications (2)

Publication Number Publication Date
TW201231485A TW201231485A (en) 2012-08-01
TWI491626B true TWI491626B (zh) 2015-07-11

Family

ID=45478486

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100145935A TWI491626B (zh) 2010-12-14 2011-12-13 透明成層聚合物

Country Status (7)

Country Link
US (1) US8829087B2 (enExample)
EP (1) EP2651996B1 (enExample)
JP (1) JP5947809B2 (enExample)
KR (1) KR101810502B1 (enExample)
CN (1) CN103249750B (enExample)
TW (1) TWI491626B (enExample)
WO (1) WO2012082705A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6893468B2 (ja) * 2015-03-26 2021-06-23 京セラ株式会社 誘電体フィルム、およびこれを用いたフィルムコンデンサ、連結型コンデンサ、ならびにインバータ、電動車輌
CN111057028B (zh) * 2018-10-17 2021-12-10 北京师范大学 含氟阳离子聚合单体及其合成和应用
GB2579405B (en) 2018-11-30 2022-09-14 Si Group Switzerland Chaa Gmbh Antioxidant compositions
JP7764724B2 (ja) * 2021-10-19 2025-11-06 住友ベークライト株式会社 ポリマーおよびワニス

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060020068A1 (en) * 2004-07-07 2006-01-26 Edmund Elce Photosensitive compositions based on polycyclic polymers for low stress, high temperature films

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6800875B1 (en) 1995-11-17 2004-10-05 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-luminescent display device with an organic leveling layer
JP2004505308A (ja) 2000-07-28 2004-02-19 グッドリッチ コーポレイション 光学導波管及びその製造法
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
US7820356B2 (en) 2003-11-21 2010-10-26 Sumitomo Bakelite Co. Ltd. Optical waveguides and methods thereof
US7524594B2 (en) * 2004-07-07 2009-04-28 Promerus Llc Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
US8084131B2 (en) * 2007-05-24 2011-12-27 Sumitomo Bakelite Company, Ltd. Transparent hybrid sheet
JP5187492B2 (ja) * 2007-11-22 2013-04-24 Jsr株式会社 硬化性樹脂組成物、保護膜および保護膜の形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060020068A1 (en) * 2004-07-07 2006-01-26 Edmund Elce Photosensitive compositions based on polycyclic polymers for low stress, high temperature films

Also Published As

Publication number Publication date
JP5947809B2 (ja) 2016-07-06
WO2012082705A1 (en) 2012-06-21
CN103249750A (zh) 2013-08-14
KR20130125376A (ko) 2013-11-18
CN103249750B (zh) 2015-12-02
US20120149815A1 (en) 2012-06-14
KR101810502B1 (ko) 2017-12-20
JP2014510798A (ja) 2014-05-01
US8829087B2 (en) 2014-09-09
EP2651996B1 (en) 2018-06-06
TW201231485A (en) 2012-08-01
EP2651996A1 (en) 2013-10-23

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