KR101810502B1 - 투명층 형성 중합체 - Google Patents

투명층 형성 중합체 Download PDF

Info

Publication number
KR101810502B1
KR101810502B1 KR1020137016984A KR20137016984A KR101810502B1 KR 101810502 B1 KR101810502 B1 KR 101810502B1 KR 1020137016984 A KR1020137016984 A KR 1020137016984A KR 20137016984 A KR20137016984 A KR 20137016984A KR 101810502 B1 KR101810502 B1 KR 101810502B1
Authority
KR
South Korea
Prior art keywords
delete delete
type
polymer
layer forming
repeating unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020137016984A
Other languages
English (en)
Korean (ko)
Other versions
KR20130125376A (ko
Inventor
오사무 오니시
래리 에프. 로데스
노부오 타가시라
Original Assignee
스미토모 베이클리트 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미토모 베이클리트 컴퍼니 리미티드 filed Critical 스미토모 베이클리트 컴퍼니 리미티드
Publication of KR20130125376A publication Critical patent/KR20130125376A/ko
Application granted granted Critical
Publication of KR101810502B1 publication Critical patent/KR101810502B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Epoxy Resins (AREA)
  • Laminated Bodies (AREA)
KR1020137016984A 2010-12-14 2011-12-13 투명층 형성 중합체 Expired - Fee Related KR101810502B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US42276310P 2010-12-14 2010-12-14
US61/422,763 2010-12-14
PCT/US2011/064569 WO2012082705A1 (en) 2010-12-14 2011-12-13 Transparent layer forming polymer

Publications (2)

Publication Number Publication Date
KR20130125376A KR20130125376A (ko) 2013-11-18
KR101810502B1 true KR101810502B1 (ko) 2017-12-20

Family

ID=45478486

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137016984A Expired - Fee Related KR101810502B1 (ko) 2010-12-14 2011-12-13 투명층 형성 중합체

Country Status (7)

Country Link
US (1) US8829087B2 (enExample)
EP (1) EP2651996B1 (enExample)
JP (1) JP5947809B2 (enExample)
KR (1) KR101810502B1 (enExample)
CN (1) CN103249750B (enExample)
TW (1) TWI491626B (enExample)
WO (1) WO2012082705A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6893468B2 (ja) * 2015-03-26 2021-06-23 京セラ株式会社 誘電体フィルム、およびこれを用いたフィルムコンデンサ、連結型コンデンサ、ならびにインバータ、電動車輌
CN111057028B (zh) * 2018-10-17 2021-12-10 北京师范大学 含氟阳离子聚合单体及其合成和应用
GB2579405B (en) 2018-11-30 2022-09-14 Si Group Switzerland Chaa Gmbh Antioxidant compositions
JP7764724B2 (ja) * 2021-10-19 2025-11-06 住友ベークライト株式会社 ポリマーおよびワニス

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6800875B1 (en) 1995-11-17 2004-10-05 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-luminescent display device with an organic leveling layer
JP2004505308A (ja) 2000-07-28 2004-02-19 グッドリッチ　コーポレイション 光学導波管及びその製造法
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
US20060020068A1 (en) * 2004-07-07 2006-01-26 Edmund Elce Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
US7820356B2 (en) 2003-11-21 2010-10-26 Sumitomo Bakelite Co. Ltd. Optical waveguides and methods thereof
US7524594B2 (en) * 2004-07-07 2009-04-28 Promerus Llc Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
US8084131B2 (en) * 2007-05-24 2011-12-27 Sumitomo Bakelite Company, Ltd. Transparent hybrid sheet
JP5187492B2 (ja) * 2007-11-22 2013-04-24 Ｊｓｒ株式会社 硬化性樹脂組成物、保護膜および保護膜の形成方法

Also Published As

Publication number Publication date
JP5947809B2 (ja) 2016-07-06
TWI491626B (zh) 2015-07-11
WO2012082705A1 (en) 2012-06-21
CN103249750A (zh) 2013-08-14
KR20130125376A (ko) 2013-11-18
CN103249750B (zh) 2015-12-02
US20120149815A1 (en) 2012-06-14
JP2014510798A (ja) 2014-05-01
US8829087B2 (en) 2014-09-09
EP2651996B1 (en) 2018-06-06
TW201231485A (en) 2012-08-01
EP2651996A1 (en) 2013-10-23

Similar Documents

Publication Publication Date Title
US8715900B2 (en) Self-imageable layer forming polymer and compositions thereof
WO2018022952A1 (en) Nadic anhydride polymers and photosensitive compositions derived therefrom
KR101810502B1 (ko) 투명층 형성 중합체
CN109976091B (zh) 光敏树脂组合物、图案形成方法和光电半导体器件的制造
WO2017117483A1 (en) Polymers derived from norbornadiene and maleic anhydride and use thereof
JP2021152634A (ja) ネガ型感光性樹脂組成物、ネガ型感光性ポリマー及びその用途
US20200285151A1 (en) Photosensitive polyimide compositions
KR20180003564A (ko) 영구적인 유전체로서 말레이미드 및 시클로올레핀 단량체의 중합체
WO2020232338A1 (en) Positive tone photosensitive compositions containing amic acid as latent base catalyst
TWI846894B (zh) 樹脂組成物、電子零件及樹脂膜之製造方法
CN111198480B (zh) 感光性树脂组合物、图案形成方法和减反射膜
KR20200063991A (ko) 이소시아누르산 골격 및 폴리에테르 골격을 포함하는 실록산 폴리머, 감광성 수지 조성물, 패턴 형성 방법, 및 광반도체 소자의 제조 방법
KR20190132928A (ko) 감광성 수지 조성물, 패턴 형성 방법, 및 광반도체 소자의 제조 방법
JP2024024621A (ja) 感光性樹脂組成物、硬化膜および半導体装置
KR20240051067A (ko) 고굴절률 재료
TW202313799A (zh) 含有矽伸苯基骨架之聚合物、感光性樹脂組成物、圖型形成方法，及光半導體元件之製造方法
KR102783782B1 (ko) 폴리실록산 골격 함유 폴리머, 감광성 수지 조성물, 패턴 형성 방법, 및 광반도체 소자의 제조 방법
KR20230146050A (ko) 감광성 수지 조성물, 경화막 및 반도체 장치
JP7673669B2 (ja) シルフェニレン骨格含有ポリマー、感光性樹脂組成物、パターン形成方法、及び光半導体素子の製造方法
JP7736225B1 (ja) 感光性樹脂組成物、硬化物および半導体装置
CN117794985A (zh) 含有硅亚苯基骨架的聚合物、感光性树脂组合物、图案形成方法和光半导体元件的制造方法
KR20230095576A (ko) 감광성 수지 조성물, 이를 이용한 감광성 수지막, 재배선층 및 반도체 장치
CN119192537A (zh) 含有不饱和基的聚合性树脂、硬化性树脂组合物、树脂硬化膜、半导体封装及显示装置

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
A302 Request for accelerated examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

X701 Decision to grant (after re-examination)
N231 Notification of change of applicant
PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20201214

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20201214