CN103249750B - 透明层形成聚合物 - Google Patents
透明层形成聚合物 Download PDFInfo
- Publication number
- CN103249750B CN103249750B CN201180055847.4A CN201180055847A CN103249750B CN 103249750 B CN103249750 B CN 103249750B CN 201180055847 A CN201180055847 A CN 201180055847A CN 103249750 B CN103249750 B CN 103249750B
- Authority
- CN
- China
- Prior art keywords
- layer
- methyl
- formula
- polymkeric substance
- side base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 *OC(C(N=*)=C)=O Chemical compound *OC(C(N=*)=C)=O 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Epoxy Resins (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42276310P | 2010-12-14 | 2010-12-14 | |
| US61/422,763 | 2010-12-14 | ||
| PCT/US2011/064569 WO2012082705A1 (en) | 2010-12-14 | 2011-12-13 | Transparent layer forming polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103249750A CN103249750A (zh) | 2013-08-14 |
| CN103249750B true CN103249750B (zh) | 2015-12-02 |
Family
ID=45478486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180055847.4A Expired - Fee Related CN103249750B (zh) | 2010-12-14 | 2011-12-13 | 透明层形成聚合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8829087B2 (enExample) |
| EP (1) | EP2651996B1 (enExample) |
| JP (1) | JP5947809B2 (enExample) |
| KR (1) | KR101810502B1 (enExample) |
| CN (1) | CN103249750B (enExample) |
| TW (1) | TWI491626B (enExample) |
| WO (1) | WO2012082705A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6893468B2 (ja) * | 2015-03-26 | 2021-06-23 | 京セラ株式会社 | 誘電体フィルム、およびこれを用いたフィルムコンデンサ、連結型コンデンサ、ならびにインバータ、電動車輌 |
| CN111057028B (zh) * | 2018-10-17 | 2021-12-10 | 北京师范大学 | 含氟阳离子聚合单体及其合成和应用 |
| GB2579405B (en) | 2018-11-30 | 2022-09-14 | Si Group Switzerland Chaa Gmbh | Antioxidant compositions |
| JP7764724B2 (ja) * | 2021-10-19 | 2025-11-06 | 住友ベークライト株式会社 | ポリマーおよびワニス |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101044185A (zh) * | 2004-07-07 | 2007-09-26 | 普罗梅鲁斯有限责任公司 | 基于多环聚合物的感光性组合物 |
| US7524594B2 (en) * | 2004-07-07 | 2009-04-28 | Promerus Llc | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6800875B1 (en) | 1995-11-17 | 2004-10-05 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix electro-luminescent display device with an organic leveling layer |
| JP2004505308A (ja) | 2000-07-28 | 2004-02-19 | グッドリッチ コーポレイション | 光学導波管及びその製造法 |
| US7022790B2 (en) * | 2002-07-03 | 2006-04-04 | Sumitomo Bakelite Company, Ltd. | Photosensitive compositions based on polycyclic polymers |
| US7820356B2 (en) | 2003-11-21 | 2010-10-26 | Sumitomo Bakelite Co. Ltd. | Optical waveguides and methods thereof |
| US8084131B2 (en) * | 2007-05-24 | 2011-12-27 | Sumitomo Bakelite Company, Ltd. | Transparent hybrid sheet |
| JP5187492B2 (ja) * | 2007-11-22 | 2013-04-24 | Jsr株式会社 | 硬化性樹脂組成物、保護膜および保護膜の形成方法 |
-
2011
- 2011-12-09 US US13/315,404 patent/US8829087B2/en active Active
- 2011-12-13 JP JP2013544680A patent/JP5947809B2/ja not_active Expired - Fee Related
- 2011-12-13 TW TW100145935A patent/TWI491626B/zh not_active IP Right Cessation
- 2011-12-13 KR KR1020137016984A patent/KR101810502B1/ko not_active Expired - Fee Related
- 2011-12-13 CN CN201180055847.4A patent/CN103249750B/zh not_active Expired - Fee Related
- 2011-12-13 EP EP11808429.2A patent/EP2651996B1/en not_active Not-in-force
- 2011-12-13 WO PCT/US2011/064569 patent/WO2012082705A1/en not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101044185A (zh) * | 2004-07-07 | 2007-09-26 | 普罗梅鲁斯有限责任公司 | 基于多环聚合物的感光性组合物 |
| US7524594B2 (en) * | 2004-07-07 | 2009-04-28 | Promerus Llc | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5947809B2 (ja) | 2016-07-06 |
| TWI491626B (zh) | 2015-07-11 |
| WO2012082705A1 (en) | 2012-06-21 |
| CN103249750A (zh) | 2013-08-14 |
| KR20130125376A (ko) | 2013-11-18 |
| US20120149815A1 (en) | 2012-06-14 |
| KR101810502B1 (ko) | 2017-12-20 |
| JP2014510798A (ja) | 2014-05-01 |
| US8829087B2 (en) | 2014-09-09 |
| EP2651996B1 (en) | 2018-06-06 |
| TW201231485A (en) | 2012-08-01 |
| EP2651996A1 (en) | 2013-10-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160218 Address after: Tokyo, Japan Patentee after: Sumitomo Bakelite Co., Ltd. Address before: American Ohio Patentee before: Promerus LLC Patentee before: Sumitomo Bakelite Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151202 Termination date: 20201213 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |