JP2014506377A5 - - Google Patents

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Publication number
JP2014506377A5
JP2014506377A5 JP2013543950A JP2013543950A JP2014506377A5 JP 2014506377 A5 JP2014506377 A5 JP 2014506377A5 JP 2013543950 A JP2013543950 A JP 2013543950A JP 2013543950 A JP2013543950 A JP 2013543950A JP 2014506377 A5 JP2014506377 A5 JP 2014506377A5
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JP
Japan
Prior art keywords
refractory metal
anode
ductile
manufacturing
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013543950A
Other languages
English (en)
Japanese (ja)
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JP2014506377A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2011/055656 external-priority patent/WO2012080958A2/en
Publication of JP2014506377A publication Critical patent/JP2014506377A/ja
Publication of JP2014506377A5 publication Critical patent/JP2014506377A5/ja
Pending legal-status Critical Current

Links

JP2013543950A 2010-12-16 2011-12-14 高融点中間層及びvps焦点軌道を伴うアノード・ディスク素子 Pending JP2014506377A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US42369010P 2010-12-16 2010-12-16
US61/423,690 2010-12-16
PCT/IB2011/055656 WO2012080958A2 (en) 2010-12-16 2011-12-14 Anode disk element with refractory interlayer and vps focal track

Publications (2)

Publication Number Publication Date
JP2014506377A JP2014506377A (ja) 2014-03-13
JP2014506377A5 true JP2014506377A5 (https=) 2015-01-29

Family

ID=45476547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013543950A Pending JP2014506377A (ja) 2010-12-16 2011-12-14 高融点中間層及びvps焦点軌道を伴うアノード・ディスク素子

Country Status (6)

Country Link
US (1) US9053897B2 (https=)
EP (1) EP2652767B1 (https=)
JP (1) JP2014506377A (https=)
CN (1) CN103370764B (https=)
RU (1) RU2598529C2 (https=)
WO (1) WO2012080958A2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012256559A (ja) * 2011-06-10 2012-12-27 Canon Inc 放射線透過型ターゲット
JP6140983B2 (ja) * 2012-11-15 2017-06-07 キヤノン株式会社 透過型ターゲット、x線発生ターゲット、x線発生管、x線x線発生装置、並びに、x線x線撮影装置
CN104795301B (zh) * 2014-08-06 2017-11-28 上海联影医疗科技有限公司 X射线靶组件
CN114808068B (zh) * 2022-03-01 2024-04-05 季华实验室 一种石墨腔内表面处理方法、石墨腔薄板及石墨腔

Family Cites Families (30)

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FR2166625A5 (https=) 1971-12-31 1973-08-17 Thomson Csf
US4235692A (en) * 1972-01-24 1980-11-25 Townsend Douglas W Electrolytic apparatus
US3979267A (en) * 1972-01-24 1976-09-07 Townsend Douglas W Electrolytic method
US3731128A (en) 1972-03-08 1973-05-01 Siemens Ag X-ray tube with rotary anodes
US4178413A (en) * 1977-10-03 1979-12-11 The Carborundum Company Fiber reinforced carbon and graphite articles and a method of producing said articles
FR2535344A1 (fr) * 1982-10-29 1984-05-04 Thomson Csf Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite
JPS6122546A (ja) * 1984-07-09 1986-01-31 Showa Denko Kk カ−ボン製x線タ−ゲツト基材
US4777643A (en) 1985-02-15 1988-10-11 General Electric Company Composite rotary anode for x-ray tube and process for preparing the composite
US4802196A (en) * 1986-12-31 1989-01-31 General Electric Company X-ray tube target
US4972449A (en) 1990-03-19 1990-11-20 General Electric Company X-ray tube target
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US5204891A (en) * 1991-10-30 1993-04-20 General Electric Company Focal track structures for X-ray anodes and method of preparation thereof
US5414748A (en) * 1993-07-19 1995-05-09 General Electric Company X-ray tube anode target
JPH08120466A (ja) * 1994-10-19 1996-05-14 Furukawa Electric Co Ltd:The 貴金属めっき材およびその製造方法
DE59703543D1 (de) * 1996-12-24 2001-06-21 Sulzer Metco Ag Wohlen Verfahren zum Beschichten von Kohlenstoffsubstraten oder nichtmetallischen, kohlenstoffhaltigen Substraten sowie Substrat beschichtet nach dem Verfahren
AT1984U1 (de) * 1997-04-22 1998-02-25 Plansee Ag Verfahren zur herstellung einer anode für röntgenröhren
US6390875B1 (en) * 2000-03-24 2002-05-21 General Electric Company Method for enhancing thermal radiation transfer in X-ray tube components
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DE10147473C2 (de) 2001-09-25 2003-09-25 Siemens Ag Drehanodenröntgenröhre
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US20090086920A1 (en) * 2007-09-30 2009-04-02 Lee David S K X-ray Target Manufactured Using Electroforming Process
US8280008B2 (en) 2007-10-02 2012-10-02 Hans-Henning Reis X-ray rotating anode plate, and method for the production thereof
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