JP2014501937A - リソグラフィ法及び装置 - Google Patents
リソグラフィ法及び装置 Download PDFInfo
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Classifications
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01J3/4531—Devices without moving parts
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
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- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
・フーリエ変換干渉分光法によって、単一の短い非反復性のパルス信号の分光測定が可能となる。
・連続波信号の測定の際に時間分解能を向上させる。
・振動に対するスペクトル感度を除去する(全ての干渉データが同一の瞬間に収集されるため、振動が全てのデータ点で同一であり、従ってデータの精度を変化させない)。
・マイケルソン型干渉計と比較して機械的部品がより少ないことにより、デバイスの機械的寿命が延長される。
・化学産業における化学製品
・工程分析
・生物学及び薬学における非侵襲分析
・医薬品産業の薬品開発
・安全保障および軍事産業を含む環境監視
・研究開発市場の物質の特定及び定量化
102 楕円ミラー
104 コリメートミラー
106 光源
108 反射光
110 平行光ビーム
112 サブビーム
114 集束ミラー
116 空間フィルター
118 開口
120 ビーム
122 検出器
200 マルチミラーアレイ(MMA)
202 格子セル
300 X線リソグラフィ装置
302 X線走査テーブル
304 ホルダープレート
306 摺動板
308 中央下部領域
310 微小移動ステージ
312 基板テーブル
314 ポリメチルメタクリレート(PMMA)レジスト
316 第1のマスク
318 マスクホルダープレート
320 微動ねじ
322 開口部
324 マスクホルダーリング
326 マスクホルダー取り付けクランプ
328 第2のマスク
330 X線ビーム
332 第1の部分
334 第2の部分
336 照射部
337 非照射部
338 第1のマスク部
340 第2のマスク部
400 ステンシルマスク
402 X線ステンシルマスク領域
404 シリコンマスクフレーム
405 シリコンフレーム
406 金の部材
450 PMMAレジスト
452 第1のマスク
454 第2のマスク
456 第3のマスク
458 X線ビーム
460 第4のマスク
462 開口部
470 菱形マスク
471 開口部
472 中心点
473 ステンシルマスク
474 PMMAレジスト
476 半円開口部
478 円錐形凹部
479 隔壁
490 文字
492 レジストの左上角
Claims (25)
- (i)3次元構造を形成するための露出パターンを有する第1のマスクを提供する段階、
(ii)第1のマスクを放射線に露出して放射線感受性レジスト上に前記露出パターンを形成する段階であって、前記露出パターンが、レジストの照射領域及び非照射領域によって画定される、段階、
(ii)第2のマスクを提供する段階、
(iii)露出の間に、前記第1のマスクと前記第2のマスクとの間の相対的な位置を変更して、前記照射領域のうち選択された部分を放射線から遮蔽し、異なる深さプロファイルを前記3次元構造内に形成可能にする段階、
を含む、リソグラフィ法。 - 前記第1のマスクが、前記レジストと接触する、請求項1に記載のリソグラフィ法。
- 前記相対位置を間隔をあけて変更する段階をさらに含む、請求項1または2に記載のリソグラフィ法。
- 前記相対位置を連続的に変更する段階をさらに含む、請求項1または2に記載のリソグラフィ法。
- 前記相対位置を変更する段階が、前記第2のマスクの位置を維持し、前記第1のマスク及び前記レジストの両方を共に移動させる段階を含む、請求項1から4のいずれか一項に記載のリソグラフィ法。
- 前記第1のマスク及び前記レジストの両方を、第1の移動軸に沿って移動させ、次いで前記第1の移動軸に対して直交する第2の移動軸に沿って移動させる段階をさらに含む、請求項5に記載のリソグラフィ法。
- 前記相対位置を変更する段階が、前記第1のマスク及び前記レジストの位置を維持し、前記第2のマスクの位置を移動させる段階を含む、請求項1から4のいずれか一項に記載のリソグラフィ法。
- 前記第2のマスクを第1の移動軸に沿って移動させ、次いで前記第1の移動軸に対して直交する第2の移動軸に沿って移動させる段階をさらに含む、請求項7に記載のリソグラフィ法。
- 前記第2のマスクを、中心点の周りに回転させる段階をさらに含む、請求項1から4のいずれか一項に記載のリソグラフィ法。
- 前記第2のマスクが、2つの対向する開口部を含む、請求項9に記載のリソグラフィ法。
- 前記開口部が、菱形の開口部である、請求項9または10に記載のリソグラフィ法。
- 第3のマスクを提供する段階をさらに含む、請求項1から4のいずれか一項に記載のリソグラフィ法。
- 前記第2のマスクを第1の移動軸に沿って移動させ、前記第3のマスクを前記第1の軸に直交する第2の移動軸に沿って移動させ、その間前記第1のマスク及び前記レジストの位置を維持する段階をさらに含む、請求項12に記載のリソグラフィ法。
- 前記露出パターンが、層状構造を含む、請求項1から13のいずれか一項に記載のリソグラフィ法。
- 露出後に、前記レジストを現像溶液中で現像して前記照射領域の部分をエッチングで除去し、異なる深さプロファイルを有する前記3次元構造を形成する段階をさらに含む、請求項1から14のいずれか一項に記載のリソグラフィ法。
- 前記放射線がX線である、請求項1から15のいずれか一項に記載のリソグラフィ法。
- 前記レジストが、ポリマーである、請求項1から16のいずれか一項に記載のリソグラフィ法。
- 前記レジストが、ポリメチルメタクリレート(PMMA)である、請求項1から17のいずれか一項に記載のリソグラフィ法。
- 請求項1から18のいずれか一項に記載のリソグラフィ法から得られる3次元構造から、マイクロ構造またはナノ構造を製造する方法。
- 前記3次元構造からモールドを形成する段階をさらに含む、請求項19に記載の方法。
- 前記モールドに基づいて、前記マイクロ構造または前記ナノ構造を製造する段階をさらに含む、請求項20に記載の方法。
- 請求項19から21のいずれか一項の方法から得られる、異なる高低差を有する異なる表面領域上に配置された層状格子セルのアレイを含む格子構造。
- 請求項22に記載の格子構造を有するマルチミラーアレイ。
- 請求項23に記載のマルチミラーアレイを含む、フーリエ分光計。
- (i)3次元構造を形成するための露出パターンを有する第1のマスク、
(ii)第2のマスク、
(ii)前記第1のマスクを放射線に露出して放射線感受性レジスト上に露出パターンを形成するための放射線源であって、前記露出パターンが、前記レジストの照射領域及び非照射領域によって画定される、放射線源、及び
(iii)前記第1のマスクと前記第2のマスクとの間の相対的な位置を変更して前記照射領域の選択された部分を放射線から遮蔽し、異なる深さプロファイルを前記3次元構造内に形成することを可能にする手段、
を含む、リソグラフィ装置。
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US20130215406A1 (en) | 2013-08-22 |
WO2012057707A1 (en) | 2012-05-03 |
TW201224677A (en) | 2012-06-16 |
EP2633368A1 (en) | 2013-09-04 |
SG189460A1 (en) | 2013-05-31 |
JP6022464B2 (ja) | 2016-11-09 |
EP2633368A4 (en) | 2016-08-10 |
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