JP2014203062A - 感光性ネガ型樹脂組成物 - Google Patents
感光性ネガ型樹脂組成物 Download PDFInfo
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- JP2014203062A JP2014203062A JP2013081950A JP2013081950A JP2014203062A JP 2014203062 A JP2014203062 A JP 2014203062A JP 2013081950 A JP2013081950 A JP 2013081950A JP 2013081950 A JP2013081950 A JP 2013081950A JP 2014203062 A JP2014203062 A JP 2014203062A
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- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FDMAFOTXGNYBFG-UHFFFAOYSA-N 2-methylcycloheptan-1-one Chemical compound CC1CCCCCC1=O FDMAFOTXGNYBFG-UHFFFAOYSA-N 0.000 description 1
- XYYMFUCZDNNGFS-UHFFFAOYSA-N 2-methylheptan-3-one Chemical compound CCCCC(=O)C(C)C XYYMFUCZDNNGFS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- MZWXWSVCNSPBLH-UHFFFAOYSA-N 3-(3-aminopropyl-methoxy-methylsilyl)oxypropan-1-amine Chemical compound NCCC[Si](C)(OC)OCCCN MZWXWSVCNSPBLH-UHFFFAOYSA-N 0.000 description 1
- ALZLTHLQMAFAPA-UHFFFAOYSA-N 3-Methylbutyrolactone Chemical compound CC1COC(=O)C1 ALZLTHLQMAFAPA-UHFFFAOYSA-N 0.000 description 1
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- ZDZYGYFHTPFREM-UHFFFAOYSA-N 3-[3-aminopropyl(dimethoxy)silyl]oxypropan-1-amine Chemical compound NCCC[Si](OC)(OC)OCCCN ZDZYGYFHTPFREM-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
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- 239000007848 Bronsted acid Substances 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 description 1
- QGLBZNZGBLRJGS-UHFFFAOYSA-N Dihydro-3-methyl-2(3H)-furanone Chemical compound CC1CCOC1=O QGLBZNZGBLRJGS-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
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- 239000002671 adjuvant Substances 0.000 description 1
- 125000005529 alkyleneoxy group Chemical group 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- GSCLMSFRWBPUSK-UHFFFAOYSA-N beta-Butyrolactone Chemical compound CC1CC(=O)O1 GSCLMSFRWBPUSK-UHFFFAOYSA-N 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 1
- MKJDUHZPLQYUCB-UHFFFAOYSA-N decan-4-one Chemical compound CCCCCCC(=O)CCC MKJDUHZPLQYUCB-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
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- 238000007599 discharging Methods 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
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- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- MBAKFIZHTUAVJN-UHFFFAOYSA-I hexafluoroantimony(1-);hydron Chemical compound F.F[Sb](F)(F)(F)F MBAKFIZHTUAVJN-UHFFFAOYSA-I 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- XVTQAXXMUNXFMU-UHFFFAOYSA-N methyl 2-(3-oxo-2-pyridin-2-yl-1h-pyrazol-5-yl)acetate Chemical compound N1C(CC(=O)OC)=CC(=O)N1C1=CC=CC=N1 XVTQAXXMUNXFMU-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- HMDRAGZZZBGZJC-UHFFFAOYSA-N n-[3-[3-aminopropoxy(dimethoxy)silyl]propyl]-1-phenylprop-2-en-1-amine Chemical compound NCCCO[Si](OC)(OC)CCCNC(C=C)C1=CC=CC=C1 HMDRAGZZZBGZJC-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- PJGSXYOJTGTZAV-UHFFFAOYSA-N pinacolone Chemical compound CC(=O)C(C)(C)C PJGSXYOJTGTZAV-UHFFFAOYSA-N 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- HTSABYAWKQAHBT-UHFFFAOYSA-N trans 3-methylcyclohexanol Natural products CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
Abstract
【解決手段】本実施形態は、(a)エポキシ基を有する化合物と、(b)(b1)で表されるカチオン部構造および(b2)で表されるアニオン部構造を含有する第1のオニウム塩と、(c)(c1)で表されるカチオン部構造および(c2)で表されるアニオン部構造を含有する第2のオニウム塩と、を含むことを特徴とする感光性ネガ型樹脂組成物である。
【選択図】なし
Description
(a)エポキシ基を有する化合物と、
(b)(b1)で表されるカチオン部構造および(b2)で表されるアニオン部構造を含有する第1のオニウム塩と、
(c)(c1)で表されるカチオン部構造および(c2)で表されるアニオン部構造を含有する第2のオニウム塩と、
を含むことを特徴とする感光性ネガ型樹脂組成物である。
(a)エポキシ基を有する化合物と、
(b)(b1)で表されるカチオン部構造および(b2)で表されるアニオン部構造を含有する第1のオニウム塩と、
(d)(d1)で表されるカチオン部構造および(d2)で表されるアニオン部構造を含有する第3のオニウム塩と、
を含むことを特徴とする感光性ネガ型樹脂組成物。
(1)感光性ネガ型樹脂組成物
本発明の感光性ネガ型樹脂組成物に含まれる各成分について詳細に説明する。
エポキシ基を有する化合物(以下、(a)成分とも略す)としては特に限定されないが、エポキシ重合が可能な化合物であって、エポキシ基を1分子中に複数有する多官能エポキシ樹脂化合物が好ましい。このような多官能エポキシ樹脂としては、例えば、多官能脂環型エポキシ樹脂、多官能フェノール・ノボラック型エポキシ樹脂、多官能オルソクレゾールノボラック型エポキシ樹脂、多官能トリフェニル型ノボラック型エポキシ樹脂、多官能ビスフェノールAノボラック型エポキシ樹脂等が挙げられる。これらのうち、多官能ビスフェノールAノボラック型エポキシ樹脂、多官能脂環型エポキシ樹脂又は多官能フェノール・ノボラック型エポキシ樹脂が好ましく用いられる。その官能性は5官能以上が好ましく、例えば、ジャパンエポキシレジン社製「エピコート157S70」や、大日本インキ化学工業株式会社製の「エピクロンN−865」、ダイセル化学工業株式会社製「EHPE 3150」が市販品として入手でき、より好ましく用いられる。
第1のオニウム塩(以下、(b)成分とも略す)は、(b1)で表されるカチオン部構造と、(b2)で表されるアニオン部構造との1対1の組み合わせからなる。
第2のオニウム塩(以下、(c)成分とも略す)は、それぞれ特定の構造である(c1)で表されるカチオン部構造と、(c2)で表されるアニオン部構造との1対1の組み合わせからなる。
この関係を満たす場合、クエンチャーとして機能する(c)成分に対してエポキシ重合に有効な酸を発生させる(b)成分が多い状態となり、高感度化を図ることができる。
第2のオニウム塩の添加量を増し、第2のオニウム塩(c)のモル数を第1のオニウム塩(b)のモル数×0.02より大きくすることで、第2のオニウム塩のクエンチャーとしての効果を十分に得ることができる。
第3のオニウム塩(以下、(d)成分とも略す)は、それぞれ特定の構造である(d1)で表されるカチオン部構造と、(d2)で表されるアニオン部構造との1対1の組み合わせからなる。
この関係を満たす場合、クエンチャーとして機能する(d)成分に対してエポキシ重合に有効な酸を発生させる(b)成分が多い状態となり、高感度化を図ることができる。
第3のオニウム塩の添加量を増し、第3のオニウム塩(d)のモル数を第1のオニウム塩(b)のモル数×0.02より大きくすることで、第3のオニウム塩のクエンチャーとしての効果を十分に得ることができる。
本実施形態の感光性ネガ型樹脂組成物は、シラン化合物を含んでもよい。
溶剤としては特に限定されないが、感光性ネガ型樹脂組成物の作製に用いる各成分を溶解できる有機溶剤であることが望ましい。例えば、アルキレングリコールモノアルキルエーテルカルボキシレート、アルキレングリコールモノアルキルエーテル、乳酸アルキルエステル、アルコキシプロピオン酸アルキル、環状ラクトン(好ましくは炭素数4以上10以下)、環を含有してもよいモノケトン化合物(好ましくは炭素数4以上10以下)、アルキレンカーボネート、アルコキシ酢酸アルキル、ピルビン酸アルキル、ベンゼン環を有する化合物、等の有機溶剤を挙げることができる。
感光性ネガ型樹脂組成物には、上記成分以外に、例えば以下の他の成分を含むことができる。即ち、その成分に特に制限はないが、用途に応じて、界面活性剤や増感剤、吸光剤、重合促進剤、難燃剤、難燃助剤などを使用することができる。
本実施形態の微細構造体の製造方法は、例えば、液体吐出ヘッドの作製に適用することができる。すなわち、本実施形態による感光性ネガ型樹脂組成物を用いて、例えば、液体吐出ヘッドを形成することができる。液体吐出ヘッドとしては、特に限定されるものではないが、一例として、インクジェット記録ヘッドが挙げられる。
以下、本発明の実施例について説明するが、本発明はこれら実施例に限定されるものではない。
表1に記載の配合に従って、(a)成分、(b)成分及び、必要に応じて(c)成分、(d)成分、界面活性剤、シラン化合物を、溶剤としてのプロピレングリコールモノメチルエーテルを(a)成分100質量部に対して45質量部に混合し、感光性樹脂組成物を調製し、それを用いて評価した。表1において、単位は質量部を表す。
(真円性)
図4に、設計寸法が直径15μmの真円パターンマスクを使用して露光し、上記レジストパターン形成方法により形成した円ノズル(硬化物)を示す。得られた円ノズルにおいて、Y1からY4で測長を行い、それぞれ距離を算出した。単位はμmである。図4中のAおよびBは、図1のAおよびBに対応しており、方向が同じことを意味する。得られた4つの距離中、最も距離の長いものをMAX(Y)、最も距離の短いものをMIN(Y)と定義し、下記式(1)に従って真円性を算出した。真円性の値は、小さいほど良いことを意味する。
(感度)
図4に示した円ノズルの形成にあたっては、露光量を500〜30000J/m2の範囲で段階的に変更してi線露光を行い、Y1の距離が、ちょうど15μmになったときの露光量を最適露光量として見積もり、それを感度として定義した。
表1に記載の配合に従って、(a)成分、(b)成分、(c)成分、界面活性剤、シラン化合物、増感剤を、溶剤としてのプロピレングリコールモノメチルエーテルを(a)成分100質量部に対して45質量部に混合し、感光性樹脂組成物を調整し、それを用いて評価した。増感剤としては、1−ナフトールを用いた。
表1に記載の配合に従って、(a)成分、(b)成分、(c)成分、(e)成分、界面活性剤、シラン化合物を、溶剤としてのプロピレングリコールモノメチルエーテルを(a)成分100質量部に対して45質量部に混合し、感光性樹脂組成物を調整し、それを用いて評価した。(e)成分は、カチオン部構造が下記化合物で表されるe1−21であり、アニオン部構造がb2−23である。
(c1−21):
表1に記載の配合に従って、(a)成分、界面活性剤及び、シラン化合物を、必要に応じて(b)成分、(c)成分及び、(e)成分を、溶剤としてのプロピレングリコールモノメチルエーテルを(a)成分100質量部に対して45質量部に混合し、感光性樹脂組成物を調製し、それを用いて評価した。
(a−2):JER157S70 (ジャパンエポキシレジン社製 商品名)
(a−3):EHPE 3150 (ダイセル化学工業株式会社製 商品名)
*1:PF−6520(OMNOVA SOLUTIONS製 商品名)
*2:SILQUEST A−187 SILANE(モメンティブ・パフォーマンス・マテリアルズ・ジャパン製 商品名)
実施例1〜16では、(b)成分と(c)成分、または(d)成分を含有する感光性ネガ型樹脂組成物を用いて真円性を求めたところ、真円性が0.4以下となり、高いマスク再現性が得られた。
2 エネルギー発生素子
3a 溶解可能な樹脂層
3b 流路パターン
3c 液体流路
4 流路形成層
5 吐出口
6 供給口
Claims (10)
- (a)エポキシ基を有する化合物と、
(b)(b1)で表されるカチオン部構造および(b2)で表されるアニオン部構造を含有する第1のオニウム塩と、
(c)(c1)で表されるカチオン部構造および(c2)で表されるアニオン部構造を含有する第2のオニウム塩と、
を含むことを特徴とする感光性ネガ型樹脂組成物。
- (a)エポキシ基を有する化合物と、
(b)(b1)で表されるカチオン部構造および(b2)で表されるアニオン部構造を含有する第1のオニウム塩と、
(d)(d1)で表されるカチオン部構造および(d2)で表されるアニオン部構造を含有する第3のオニウム塩と、
を含むことを特徴とする感光性ネガ型樹脂組成物。
- 前記第1のオニウム塩のモル数×0.7>前記第2のオニウム塩のモル数、又は前記第3のオニウム塩のモル数>前記第1のオニウム塩のモル数×0.02の関係を満たす請求項1又は2に記載の感光性ネガ型樹脂組成物。
- 前記(b)成分は、少なくともi線に対する感光性を有する請求項1乃至3のいずれかに記載の感光性ネガ型樹脂組成物。
- R1からR3のうち少なくとも1つは、環状カルボニル構造を含む請求項1乃至4のいずれかに記載の感光性ネガ型樹脂組成物。
- R8又はR11は、芳香族炭化水素又は脂環炭化水素を含む請求項1乃至5のいずれかに記載の感光性ネガ型樹脂組成物。
- Xがリン原子である請求項1乃至6のいずれかに記載の感光性ネガ型樹脂組成物。
- 基板上に形成される微細構造体であって、請求項1乃至7のいずれかに記載の感光性ネガ型樹脂組成物の硬化物であることを特徴とする微細構造体。
- 請求項8に記載の微細構造体により流路形成層が構成されている液体吐出ヘッド。
- (1)請求項1乃至7のいずれかに記載の感光性ネガ型樹脂組成物を基板上に配置する工程と、
(2)前記感光性ネガ型樹脂組成物をi線を用いたフォトリソグラフィーによりパターニング処理する工程と、
を含むことを特徴とする微細構造体の形成方法。
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