JP2014199900A - 垂直キャビティ表面発光型半導体レーザ - Google Patents
垂直キャビティ表面発光型半導体レーザ Download PDFInfo
- Publication number
- JP2014199900A JP2014199900A JP2013162172A JP2013162172A JP2014199900A JP 2014199900 A JP2014199900 A JP 2014199900A JP 2013162172 A JP2013162172 A JP 2013162172A JP 2013162172 A JP2013162172 A JP 2013162172A JP 2014199900 A JP2014199900 A JP 2014199900A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- bragg reflector
- distributed bragg
- index layer
- central region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 19
- 230000002093 peripheral effect Effects 0.000 claims abstract description 17
- 230000001681 protective effect Effects 0.000 claims description 17
- 230000010355 oscillation Effects 0.000 abstract description 12
- 238000009826 distribution Methods 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 description 28
- 230000005684 electric field Effects 0.000 description 8
- 239000012212 insulator Substances 0.000 description 8
- 239000013307 optical fiber Substances 0.000 description 8
- 125000006850 spacer group Chemical group 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
- H01S5/18313—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/18347—Mesa comprising active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/18352—Mesa with inclined sidewall
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18391—Aperiodic structuring to influence the near- or far-field distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/185—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]
- H01S5/187—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL] using Bragg reflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/20—Lasers with a special output beam profile or cross-section, e.g. non-Gaussian
- H01S2301/203—Lasers with a special output beam profile or cross-section, e.g. non-Gaussian with at least one hole in the intensity distribution, e.g. annular or doughnut mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0282—Passivation layers or treatments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18322—Position of the structure
- H01S5/18327—Structure being part of a DBR
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18377—Structure of the reflectors, e.g. hybrid mirrors comprising layers of different kind of materials, e.g. combinations of semiconducting with dielectric or metallic layers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
dp×n=(1/4+N/2)×λ、
dc×n=dp×n+(1/4+M/2)×λ
の関係にある。
dp×n=(1/4+N/2)×λ、
dc×n=dp×n+(1/4+M/2)×λ
の関係がある。図4は代表例として、中央領域14bの光学的厚みdc×nが(1/2)λ、周囲領域14aの光学的厚みdp×nが(1/4)λである構成を示している。一例では、レーザの発振波長を850nmとしたときの周囲領域14aの実際の厚みdpがdp×n=(1/4)λに相当する61nm、中央領域14bの実際の厚みdcがdc×n=(1/2)λに相当する122nmである。
2 基板
3 底部分布ブラッグ反射鏡
4 活性層
5 頂部分布ブラッグ反射鏡
5a 高屈折率層
5b 低屈折率層
6 保護膜
10 光出射部
12a,12b スペーサ層
14 頂部高屈折率層
14a 周囲領域
14b 中央領域
14c 凸部
14d 投影点
15 電流制限層
15a 導電層
15b 絶縁体
15c 中心点
17 レーザ光出射面
20 半導体多層膜
L レーザ光
dp 周囲領域14aの物理的膜厚(実際の膜厚)
n 頂部高屈折率層14の屈折率
N 0または自然数
M 0または自然数
Claims (5)
- 底部分布ブラッグ反射鏡と、頂部分布ブラッグ反射鏡と、前記底部分布ブラッグ反射鏡と前記頂部分布ブラッグ反射鏡との間に位置し、レーザ光を生成する活性層と、を有し、前記レーザ光が前記頂部分布ブラッグ反射鏡から出射され、
前記頂部分布ブラッグ反射鏡は交互に重ねられた高屈折率層と低屈折率層とを有し、前記高屈折率層の一つは前記頂部分布ブラッグ反射鏡のレーザ光出射面に位置する頂部高屈折率層であり、前記頂部高屈折率層は前記活性層の中心点を前記頂部分布ブラッグ反射鏡の積層方向に投影して得られる前記頂部高屈折率層上の投影点を含む中央領域と、前記中央領域の周囲に位置する周囲領域と、を有し、前記中央領域は前記周囲領域に対し前記レーザ光の出射方向に突き出した凸部を有し、
前記レーザ光の真空中での波長をλ、前記中央領域における前記頂部高屈折率層の膜厚をdc、前記周囲領域における前記頂部高屈折率層の膜厚をdp、前記頂部高屈折率層の屈折率をnとし、N、Mを0または自然数としたときに、
dp×n=(1/4+N/2)×λ、
dc×n=dp×n+(1/4+M/2)×λ
の関係にある、垂直キャビティ表面発光型半導体レーザ。 - 前記周囲領域のdp×nが(1/4)λであり、前記中央領域のdc×nが(1/2)λまたはλである、請求項1に記載の垂直キャビティ表面発光型半導体レーザ。
- 前記頂部分布ブラッグ反射鏡は、前記活性層と面する端面に、レーザ光の駆動電流の経路を限定する円形の導電開口を備えた電流制限層を有し、前記中央領域は前記導電開口の直径の60%以上、120%以下の直径を有している、請求項1に記載の垂直キャビティ表面発光型半導体レーザ。
- 前記頂部分布ブラッグ反射鏡を覆う、膜厚が一定の保護膜を有している、請求項1に記載の垂直キャビティ表面発光型半導体レーザ。
- 前記保護膜の膜厚と前記保護膜の屈折率の積が(1/2)λである、請求項4に記載の垂直キャビティ表面発光型半導体レーザ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310109611.5A CN104078843A (zh) | 2013-03-29 | 2013-03-29 | 具有窄激光发射角度的多模垂直腔面发射激光器 |
CN201310109611.5 | 2013-03-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014199900A true JP2014199900A (ja) | 2014-10-23 |
JP6298604B2 JP6298604B2 (ja) | 2018-03-20 |
Family
ID=51599960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013162172A Active JP6298604B2 (ja) | 2013-03-29 | 2013-08-05 | 垂直キャビティ表面発光型半導体レーザ |
Country Status (3)
Country | Link |
---|---|
US (1) | US9368937B1 (ja) |
JP (1) | JP6298604B2 (ja) |
CN (1) | CN104078843A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106329313A (zh) * | 2016-09-29 | 2017-01-11 | 华中科技大学 | 光栅辅助的基于tm模式的微柱腔面发射激光器 |
TWI818941B (zh) * | 2017-12-28 | 2023-10-21 | 美商普林斯頓光電公司 | 包括窄光束發散半導體源之經結構化光投射系統 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10530129B2 (en) | 2015-08-10 | 2020-01-07 | Hewlett Packard Enterprise Development Lp | Low impedance VCSELs |
KR102471102B1 (ko) * | 2015-10-23 | 2022-11-25 | 서울바이오시스 주식회사 | 분포 브래그 반사기를 가지는 발광 다이오드 칩 |
CN110011181A (zh) * | 2019-05-24 | 2019-07-12 | 苏州长瑞光电有限公司 | 晶体管垂直腔面发射激光器及其制备方法 |
CN112544021B (zh) * | 2019-07-08 | 2024-02-06 | 泉州市三安光通讯科技有限公司 | 半导体激光光束整形器 |
CN112534660A (zh) * | 2019-07-08 | 2021-03-19 | 厦门市三安集成电路有限公司 | 垂直腔表面发射激光装置 |
CN110535023B (zh) * | 2019-08-09 | 2020-05-22 | 华南理工大学 | 自组装聚集激光器及其制备方法 |
CN110649466B (zh) * | 2019-11-26 | 2021-07-13 | 常州纵慧芯光半导体科技有限公司 | 一种vcsel阵列、制造方法、平顶远场生成方法及照明模组 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1075014A (ja) * | 1996-07-17 | 1998-03-17 | Motorola Inc | 不動態化垂直空洞面発光レーザ |
JP2001156395A (ja) * | 1999-09-13 | 2001-06-08 | Furukawa Electric Co Ltd:The | 面発光半導体レーザ素子 |
JP2001284722A (ja) * | 2000-03-29 | 2001-10-12 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2004063707A (ja) * | 2002-07-29 | 2004-02-26 | Fuji Xerox Co Ltd | 表面発光型半導体レーザ |
JP2006140446A (ja) * | 2004-10-13 | 2006-06-01 | Ricoh Co Ltd | 面発光レーザ素子および面発光レーザアレイおよび面発光レーザ素子の製造方法および面発光レーザモジュールおよび電子写真システムおよび光通信システムおよび光インターコネクションシステム |
JP2008034795A (ja) * | 2006-07-07 | 2008-02-14 | Seiko Epson Corp | 面発光型半導体レーザ |
JP2010040600A (ja) * | 2008-07-31 | 2010-02-18 | Canon Inc | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
JP2010080571A (ja) * | 2008-09-25 | 2010-04-08 | Nec Corp | 面発光レーザ及びその製造方法 |
JP2012104522A (ja) * | 2010-11-05 | 2012-05-31 | Canon Inc | 面発光レーザ及び面発光レーザアレイ、面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザアレイを備えた光学機器 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7408967B2 (en) | 2005-12-19 | 2008-08-05 | Emcore Corporation | Method of fabricating single mode VCSEL for optical mouse |
US20070217472A1 (en) | 2006-03-14 | 2007-09-20 | Doug Collins | VCSEL semiconductor devices with mode control |
-
2013
- 2013-03-29 CN CN201310109611.5A patent/CN104078843A/zh active Pending
- 2013-08-05 JP JP2013162172A patent/JP6298604B2/ja active Active
- 2013-08-15 US US13/967,801 patent/US9368937B1/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1075014A (ja) * | 1996-07-17 | 1998-03-17 | Motorola Inc | 不動態化垂直空洞面発光レーザ |
JP2001156395A (ja) * | 1999-09-13 | 2001-06-08 | Furukawa Electric Co Ltd:The | 面発光半導体レーザ素子 |
JP2001284722A (ja) * | 2000-03-29 | 2001-10-12 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2004063707A (ja) * | 2002-07-29 | 2004-02-26 | Fuji Xerox Co Ltd | 表面発光型半導体レーザ |
JP2006140446A (ja) * | 2004-10-13 | 2006-06-01 | Ricoh Co Ltd | 面発光レーザ素子および面発光レーザアレイおよび面発光レーザ素子の製造方法および面発光レーザモジュールおよび電子写真システムおよび光通信システムおよび光インターコネクションシステム |
JP2008034795A (ja) * | 2006-07-07 | 2008-02-14 | Seiko Epson Corp | 面発光型半導体レーザ |
JP2010040600A (ja) * | 2008-07-31 | 2010-02-18 | Canon Inc | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
JP2010080571A (ja) * | 2008-09-25 | 2010-04-08 | Nec Corp | 面発光レーザ及びその製造方法 |
JP2012104522A (ja) * | 2010-11-05 | 2012-05-31 | Canon Inc | 面発光レーザ及び面発光レーザアレイ、面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザアレイを備えた光学機器 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106329313A (zh) * | 2016-09-29 | 2017-01-11 | 华中科技大学 | 光栅辅助的基于tm模式的微柱腔面发射激光器 |
CN106329313B (zh) * | 2016-09-29 | 2019-03-12 | 华中科技大学 | 光栅辅助的基于tm模式的微柱腔面发射激光器 |
TWI818941B (zh) * | 2017-12-28 | 2023-10-21 | 美商普林斯頓光電公司 | 包括窄光束發散半導體源之經結構化光投射系統 |
Also Published As
Publication number | Publication date |
---|---|
CN104078843A (zh) | 2014-10-01 |
US9368937B1 (en) | 2016-06-14 |
JP6298604B2 (ja) | 2018-03-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6298604B2 (ja) | 垂直キャビティ表面発光型半導体レーザ | |
KR101014412B1 (ko) | 면발광형 반도체 레이저소자 | |
JP5983423B2 (ja) | 面発光型半導体レーザの製造方法 | |
JP4621393B2 (ja) | 表面発光型半導体レーザ及び表面発光型半導体レーザの製造方法 | |
KR100827120B1 (ko) | 수직 단면 발광 레이저 및 그 제조 방법 | |
JP2004063707A (ja) | 表面発光型半導体レーザ | |
JP5434201B2 (ja) | 半導体レーザ | |
JP2012015139A (ja) | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 | |
JP2014086565A (ja) | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 | |
JP2012009727A (ja) | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 | |
JP2009200137A (ja) | 面発光半導体レーザ及び面発光半導体レーザアレイ | |
JP2014199897A (ja) | 垂直キャビティ表面発光型半導体レーザ | |
JP2005158922A (ja) | 表面発光型半導体レーザ素子およびその製造方法 | |
JP6015220B2 (ja) | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 | |
JP2006237648A (ja) | 面発光型半導体レーザ | |
JP2006100858A (ja) | 面発光型半導体レーザ素子 | |
US10008826B1 (en) | Surface-emitting semiconductor laser | |
JP2011155143A (ja) | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 | |
CN112103767B (zh) | 一种垂直腔面发射激光器及其制备方法 | |
JP2010045249A (ja) | 半導体発光素子およびその製造方法 | |
JP4203752B2 (ja) | 面発光型半導体レーザおよびその製造方法、光スイッチ、ならびに、光分岐比可変素子 | |
WO2020170675A1 (ja) | 垂直共振器型発光素子 | |
JP3800852B2 (ja) | 面発光型半導体レーザ及びその製造方法 | |
TWI634715B (zh) | 端面射出型半導體雷射 | |
WO2017045161A1 (zh) | 半导体激光器及其加工方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160613 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170614 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170620 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170908 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180213 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180226 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6298604 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S633 | Written request for registration of reclamation of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313633 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |