JP2014185332A - 酸化防止処理方法、これを用いた電子デバイスの製造方法、及びこれらに用いられる金属防食剤 - Google Patents
酸化防止処理方法、これを用いた電子デバイスの製造方法、及びこれらに用いられる金属防食剤 Download PDFInfo
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- JP2014185332A JP2014185332A JP2014030911A JP2014030911A JP2014185332A JP 2014185332 A JP2014185332 A JP 2014185332A JP 2014030911 A JP2014030911 A JP 2014030911A JP 2014030911 A JP2014030911 A JP 2014030911A JP 2014185332 A JP2014185332 A JP 2014185332A
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- copper
- metal anticorrosive
- amino
- antioxidant
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Images
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
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- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
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WO2020017283A1 (ja) * | 2018-07-20 | 2020-01-23 | 富士フイルム株式会社 | 処理液および処理方法 |
WO2020017329A1 (ja) * | 2018-07-20 | 2020-01-23 | 富士フイルム株式会社 | 処理液および処理方法 |
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CN114277376A (zh) * | 2021-12-01 | 2022-04-05 | 厦门大学 | 一种金属抗氧化的处理方法 |
CN115763494A (zh) * | 2022-11-16 | 2023-03-07 | Tcl华星光电技术有限公司 | 显示面板及其制作方法、蚀刻液组合物 |
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- 2014-02-20 JP JP2014030911A patent/JP2014185332A/ja active Pending
- 2014-02-21 WO PCT/JP2014/054170 patent/WO2014129584A1/ja active Application Filing
- 2014-02-21 TW TW103105753A patent/TW201441423A/zh unknown
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WO2020017283A1 (ja) * | 2018-07-20 | 2020-01-23 | 富士フイルム株式会社 | 処理液および処理方法 |
WO2020017329A1 (ja) * | 2018-07-20 | 2020-01-23 | 富士フイルム株式会社 | 処理液および処理方法 |
JPWO2020017329A1 (ja) * | 2018-07-20 | 2021-05-20 | 富士フイルム株式会社 | 処理液および処理方法 |
JPWO2020017283A1 (ja) * | 2018-07-20 | 2021-06-10 | 富士フイルム株式会社 | 処理液および処理方法 |
JP7039706B2 (ja) | 2018-07-20 | 2022-03-22 | 富士フイルム株式会社 | 処理液および処理方法 |
JP7196177B2 (ja) | 2018-07-20 | 2022-12-26 | 富士フイルム株式会社 | 処理液および処理方法 |
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