JP2014182057A - Icp発光分光分析装置 - Google Patents
Icp発光分光分析装置 Download PDFInfo
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- JP2014182057A JP2014182057A JP2013057761A JP2013057761A JP2014182057A JP 2014182057 A JP2014182057 A JP 2014182057A JP 2013057761 A JP2013057761 A JP 2013057761A JP 2013057761 A JP2013057761 A JP 2013057761A JP 2014182057 A JP2014182057 A JP 2014182057A
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- gas
- containing gas
- icp emission
- spectrometer
- oxygen
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- 239000007789 gas Substances 0.000 claims abstract description 116
- 238000009616 inductively coupled plasma Methods 0.000 claims abstract description 49
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 32
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000001301 oxygen Substances 0.000 claims abstract description 32
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 32
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 26
- 230000003287 optical effect Effects 0.000 abstract description 18
- 238000004458 analytical method Methods 0.000 description 8
- 238000004611 spectroscopical analysis Methods 0.000 description 7
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 7
- 238000007664 blowing Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000006199 nebulizer Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 230000005283 ground state Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 238000010183 spectrum analysis Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
【課題】装置内の入射窓や光学部品に付着する薄膜(有機薄膜)を簡単な構成で確実に除去できるICP発光分光分析装置を提供する。
【解決手段】ICP発光分光分析装置1は、誘導結合プラズマ装置10と、分光器20と、気体供給装置30と、から概略構成されている。分光器20は、入射窓21と、光学部品22と、真空ポンプ23と、検出器24と、紫外線ランプ25とを備えている。気体供給装置30は、酸素含有ガス又はオゾン含有ガス等を発生させる気体発生器31と、気体発生器31で発生したガスの分光器20内への流入量を制御する気体流量制御部32と、ガスを分光器20内に供給する気体導入管33とを備えている。供給された、酸素含有ガス又はオゾン含有ガスは、誘導結合プラズマ18で励起されて発光した紫外線と反応して、入射窓21や光学部品22に付着した有機薄膜を除去する。
【選択図】図1
Description
10:誘導結合プラズマ装置
18:誘導結合プラズマ
20:分光器
21:入射窓
22:光学部品
25:紫外線ランプ
30:気体供給装置
31:気体発生器
32:気体流量制御部
33:気体導入管
Claims (5)
- 分析対象の元素を誘導結合プラズマにより原子化又はイオン化し、原子発光線を得る誘導結合プラズマ装置と、
前記原子発光線を入射窓を介して取り入れた後、分光して検出する分光器と、
酸素含有ガス又はオゾン含有ガスを供給する気体供給装置と、を備え、
前記分光器は、前記気体供給装置により供給された酸素含有ガス又はオゾン含有ガスを当該分光器内に供給する気体導入口を有する、ICP発光分光分析装置。 - 請求項1に記載のICP発光分光分析装置であって、
少なくとも前記誘導結合プラズマ装置のプラズマ点灯時に、前記酸素含有ガス又は前記オゾン含有ガスを前記気体導入口から前記分光器内に供給可能である、ICP発光分光分析装置。 - 請求項1又は2に記載のICP発光分光分析装置であって、
前記気体導入口が前記分光器の前記入射窓の近傍に設けられた、ICP発光分光分析装置。 - 請求項1から3のいずれか1項に記載のICP発光分光分析装置であって、
前記気体供給装置は、気体発生器と、気体流量制御部と、を備え、
前記気体発生器は、酸素含有ガス又はオゾン含有ガスを発生させ、
前記気体流量制御部は、酸素含有ガス又はオゾン含有ガスの流量を制御する、ICP発光分光分析装置。 - 請求項1から4のいずれか1項に記載のICP発光分光分析装置であって、
前記分光器内に紫外線を照射する紫外線ランプをさらに備える、ICP発光分光分析装置。
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JP2013057761A JP6055348B2 (ja) | 2013-03-21 | 2013-03-21 | Icp発光分光分析装置を用いた分析方法 |
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JP2013057761A JP6055348B2 (ja) | 2013-03-21 | 2013-03-21 | Icp発光分光分析装置を用いた分析方法 |
Publications (2)
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JP2014182057A true JP2014182057A (ja) | 2014-09-29 |
JP6055348B2 JP6055348B2 (ja) | 2016-12-27 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016180622A (ja) * | 2015-03-23 | 2016-10-13 | 三菱重工業株式会社 | 誘導結合プラズマ発光分光分析装置 |
DE102016225122A1 (de) | 2015-12-16 | 2017-06-22 | Yazaki Corporation | Quetschverbindung |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07103897A (ja) * | 1993-09-30 | 1995-04-21 | Shimadzu Corp | 発光分光分析装置 |
US5473162A (en) * | 1987-10-26 | 1995-12-05 | Baylor University | Infrared emission detection of a gas |
JPH09196851A (ja) * | 1996-01-18 | 1997-07-31 | Shimadzu Corp | 発光分光分析装置 |
JP2000292704A (ja) * | 1999-04-02 | 2000-10-20 | Bunshi Biophotonics Kenkyusho:Kk | 対物レンズおよび対物レンズシステム |
JP2002503807A (ja) * | 1998-02-13 | 2002-02-05 | マサチューセッツ・インスティテュート・オブ・テクノロジー | マイクロ波誘導プラズマ元素センサ |
JP2009229442A (ja) * | 2008-02-28 | 2009-10-08 | Horiba Ltd | 試料気化導入装置 |
WO2010018738A1 (ja) * | 2008-08-12 | 2010-02-18 | 住友精化株式会社 | 分析方法および分析システム |
US20120161021A1 (en) * | 2008-01-08 | 2012-06-28 | Eugene Smargiassi | Measuring in-situ uv intensity in uv cure tool |
JP2012242275A (ja) * | 2011-05-20 | 2012-12-10 | Shimadzu Corp | 光学素子の洗浄方法 |
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2013
- 2013-03-21 JP JP2013057761A patent/JP6055348B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5473162A (en) * | 1987-10-26 | 1995-12-05 | Baylor University | Infrared emission detection of a gas |
JPH07103897A (ja) * | 1993-09-30 | 1995-04-21 | Shimadzu Corp | 発光分光分析装置 |
JPH09196851A (ja) * | 1996-01-18 | 1997-07-31 | Shimadzu Corp | 発光分光分析装置 |
JP2002503807A (ja) * | 1998-02-13 | 2002-02-05 | マサチューセッツ・インスティテュート・オブ・テクノロジー | マイクロ波誘導プラズマ元素センサ |
JP2000292704A (ja) * | 1999-04-02 | 2000-10-20 | Bunshi Biophotonics Kenkyusho:Kk | 対物レンズおよび対物レンズシステム |
US20120161021A1 (en) * | 2008-01-08 | 2012-06-28 | Eugene Smargiassi | Measuring in-situ uv intensity in uv cure tool |
JP2009229442A (ja) * | 2008-02-28 | 2009-10-08 | Horiba Ltd | 試料気化導入装置 |
WO2010018738A1 (ja) * | 2008-08-12 | 2010-02-18 | 住友精化株式会社 | 分析方法および分析システム |
JP2012242275A (ja) * | 2011-05-20 | 2012-12-10 | Shimadzu Corp | 光学素子の洗浄方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016180622A (ja) * | 2015-03-23 | 2016-10-13 | 三菱重工業株式会社 | 誘導結合プラズマ発光分光分析装置 |
DE102016225122A1 (de) | 2015-12-16 | 2017-06-22 | Yazaki Corporation | Quetschverbindung |
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