JP6055348B2 - Icp発光分光分析装置を用いた分析方法 - Google Patents
Icp発光分光分析装置を用いた分析方法 Download PDFInfo
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- JP6055348B2 JP6055348B2 JP2013057761A JP2013057761A JP6055348B2 JP 6055348 B2 JP6055348 B2 JP 6055348B2 JP 2013057761 A JP2013057761 A JP 2013057761A JP 2013057761 A JP2013057761 A JP 2013057761A JP 6055348 B2 JP6055348 B2 JP 6055348B2
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- gas
- containing gas
- icp emission
- emission spectroscopic
- analysis method
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- 238000004458 analytical method Methods 0.000 title claims description 22
- 239000007789 gas Substances 0.000 claims description 104
- 238000009616 inductively coupled plasma Methods 0.000 claims description 44
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 30
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 30
- 239000001301 oxygen Substances 0.000 claims description 30
- 229910052760 oxygen Inorganic materials 0.000 claims description 30
- 238000004611 spectroscopical analysis Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000010409 thin film Substances 0.000 description 23
- 230000003287 optical effect Effects 0.000 description 15
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 7
- 238000007664 blowing Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000006199 nebulizer Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 230000005283 ground state Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 238000010183 spectrum analysis Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
10:誘導結合プラズマ装置
18:誘導結合プラズマ
20:分光器
21:入射窓
22:光学部品
25:紫外線ランプ
30:気体供給装置
31:気体発生器
32:気体流量制御部
33:気体導入管
Claims (4)
- 分析対象の元素を誘導結合プラズマにより原子化又はイオン化し、原子発光線を得る誘導結合プラズマ装置と、
前記原子発光線を入射窓を介して取り入れた後、分光して検出する分光器と、
酸素含有ガス又はオゾン含有ガスを供給する気体供給装置と、を備え、
前記分光器は、前記気体供給装置により供給された酸素含有ガス又はオゾン含有ガスを当該分光器内に供給する気体導入口を有する、ICP発光分光分析装置を用いた分析方法であって、
少なくとも前記誘導結合プラズマ装置をプラズマ点灯させて分析する時に、前記酸素含有ガス又は前記オゾン含有ガスを前記気体導入口から前記分光器内に供給する、ICP発光分光分析装置を用いた分析方法。 - 請求項1に記載のICP発光分光分析装置を用いた分析方法であって、
前記気体導入口が前記分光器の前記入射窓の近傍に設けられた、ICP発光分光分析装置を用いた分析方法。 - 請求項1又は2に記載のICP発光分光分析装置を用いた分析方法であって、
前記気体供給装置は、気体発生器と、気体流量制御部と、を備え、
前記気体発生器は、酸素含有ガス又はオゾン含有ガスを発生させ、
前記気体流量制御部は、酸素含有ガス又はオゾン含有ガスの流量を制御する、ICP発
光分光分析装置を用いた分析方法。 - 請求項1から3のいずれか1項に記載のICP発光分光分析装置を用いた分析方法であって、
前記分光器内に紫外線を照射する紫外線ランプをさらに備える、ICP発光分光分析装置を用いた分析方法。
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JP2013057761A JP6055348B2 (ja) | 2013-03-21 | 2013-03-21 | Icp発光分光分析装置を用いた分析方法 |
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JP2013057761A JP6055348B2 (ja) | 2013-03-21 | 2013-03-21 | Icp発光分光分析装置を用いた分析方法 |
Publications (2)
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JP2014182057A JP2014182057A (ja) | 2014-09-29 |
JP6055348B2 true JP6055348B2 (ja) | 2016-12-27 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6482341B2 (ja) * | 2015-03-23 | 2019-03-13 | 三菱重工業株式会社 | 誘導結合プラズマ発光分光分析装置 |
JP6279540B2 (ja) | 2015-12-16 | 2018-02-14 | 矢崎総業株式会社 | 圧着端子 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5473162A (en) * | 1987-10-26 | 1995-12-05 | Baylor University | Infrared emission detection of a gas |
JPH07103897A (ja) * | 1993-09-30 | 1995-04-21 | Shimadzu Corp | 発光分光分析装置 |
JPH09196851A (ja) * | 1996-01-18 | 1997-07-31 | Shimadzu Corp | 発光分光分析装置 |
US5909277A (en) * | 1998-02-13 | 1999-06-01 | Massachusetts Institute Of Technology | Microwave plasma element sensor |
JP3071778B1 (ja) * | 1999-04-02 | 2000-07-31 | 株式会社分子バイオホトニクス研究所 | 対物レンズおよび対物レンズシステム |
US8283644B2 (en) * | 2008-01-08 | 2012-10-09 | Novellus Systems, Inc. | Measuring in-situ UV intensity in UV cure tool |
JP5096264B2 (ja) * | 2008-02-28 | 2012-12-12 | 株式会社堀場製作所 | 試料気化導入装置 |
TW201007165A (en) * | 2008-08-12 | 2010-02-16 | Sumitomo Seika Chemicals | Analysis method and analysis system |
JP2012242275A (ja) * | 2011-05-20 | 2012-12-10 | Shimadzu Corp | 光学素子の洗浄方法 |
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