JP2014181354A - 銀めっき材 - Google Patents
銀めっき材 Download PDFInfo
- Publication number
- JP2014181354A JP2014181354A JP2013054877A JP2013054877A JP2014181354A JP 2014181354 A JP2014181354 A JP 2014181354A JP 2013054877 A JP2013054877 A JP 2013054877A JP 2013054877 A JP2013054877 A JP 2013054877A JP 2014181354 A JP2014181354 A JP 2014181354A
- Authority
- JP
- Japan
- Prior art keywords
- silver plating
- silver
- nickel
- plating material
- bending workability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 102
- 238000007747 plating Methods 0.000 title claims abstract description 89
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 89
- 239000004332 silver Substances 0.000 title claims abstract description 88
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 86
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 28
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010949 copper Substances 0.000 claims abstract description 11
- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 25
- 239000002344 surface layer Substances 0.000 claims description 19
- 238000005452 bending Methods 0.000 description 44
- 238000000034 method Methods 0.000 description 10
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 10
- 238000009713 electroplating Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- VDMJCVUEUHKGOY-JXMROGBWSA-N (1e)-4-fluoro-n-hydroxybenzenecarboximidoyl chloride Chemical compound O\N=C(\Cl)C1=CC=C(F)C=C1 VDMJCVUEUHKGOY-JXMROGBWSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910001316 Ag alloy Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- KYEKHFSRAXRJBR-UHFFFAOYSA-M potassium;selenocyanate Chemical compound [K+].[Se-]C#N KYEKHFSRAXRJBR-UHFFFAOYSA-M 0.000 description 2
- 150000003378 silver Chemical class 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QORAAKXXLPYSCF-UHFFFAOYSA-N [K+].[C-]#N.[C-]#N Chemical compound [K+].[C-]#N.[C-]#N QORAAKXXLPYSCF-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- ISDDBQLTUUCGCZ-UHFFFAOYSA-N dipotassium dicyanide Chemical compound [K+].[K+].N#[C-].N#[C-] ISDDBQLTUUCGCZ-UHFFFAOYSA-N 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 238000001887 electron backscatter diffraction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/04—Co-operating contacts of different material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Non-Insulated Conductors (AREA)
Abstract
【解決手段】銅または銅合金からなる素材上にニッケルからなる下地層が形成され、この下地層の表面に銀からなる厚さ10μm以下の表層が形成された銀めっき材において、下地層の厚さを2μm以下、好ましくは1.5μm以下にし、表層の{200}方位の面積分率を15%以上、好ましくは25%以上にする。
【選択図】なし
Description
まず、被めっき材として67mm×50mm×0.3mmの純銅板を用意し、この被めっき材とSUS板をアルカリ脱脂液に入れ、被めっき材を陽極とし、SUS板を陰極として、電圧5Vで30秒間電解脱脂し、水洗した後、3%硫酸中で15秒間酸洗することによって前処理を行った。
下地層としてのニッケルめっき皮膜の厚さを0.2μmとした以外は、実施例1と同様の方法により銀めっき材を作製した。
下地層としてのニッケルめっき皮膜の厚さを1.0μmとした以外は、実施例1と同様の方法により銀めっき材を作製した。
下地層としてのニッケルめっき皮膜の厚さを1.5μmとした以外は、実施例1と同様の方法により銀めっき材を作製した。
銀めっきにおいて、148g/Lのシアン化銀カリウムと140g/Lのシアン化カリウムと73mg/Lのセレノシアン酸カリウムとからなる銀めっき液を使用した以外は、実施例2と同様の方法により銀めっき材を作製した。なお、使用した銀めっき液中のSe濃度は40mg/L、Ag濃度は80g/L、フリーCN濃度は56g/L、Ag/フリーCN質量比は1.44である。
銀めっきにおいて、148g/Lのシアン化銀カリウムと140g/Lのシアン化カリウムとからなる(セレノシアン酸カリウムを含まない)銀めっき液を使用した以外は、実施例2と同様の方法により銀めっき材を作製した。なお、使用した銀めっき液中のSe濃度は0mg/L、Ag濃度は80g/L、フリーCN濃度は56g/L、Ag/フリーCN質量比は1.44である。
Claims (4)
- 素材上にニッケルからなる下地層が形成され、この下地層の表面に銀からなる表層が形成された銀めっき材において、下地層の厚さが2μm以下であり、表層の{200}方位の面積分率が15%以上であることを特徴とする、銀めっき材。
- 前記素材が銅または銅合金からなることを特徴とする、請求項1に記載の銀めっき材。
- 前記表層の厚さが10μm以下であることを特徴とする、請求項1または2に記載の銀めっき材。
- 請求項1乃至3のいずれかに記載の銀めっき材を材料として用いたことを特徴とする、接点または端子部品。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013054877A JP6086531B2 (ja) | 2013-03-18 | 2013-03-18 | 銀めっき材 |
PCT/JP2014/054253 WO2014148201A1 (ja) | 2013-03-18 | 2014-02-18 | 銀めっき材 |
US14/777,706 US10072348B2 (en) | 2013-03-18 | 2014-02-18 | Silver-plated product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013054877A JP6086531B2 (ja) | 2013-03-18 | 2013-03-18 | 銀めっき材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014181354A true JP2014181354A (ja) | 2014-09-29 |
JP6086531B2 JP6086531B2 (ja) | 2017-03-01 |
Family
ID=51579893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013054877A Active JP6086531B2 (ja) | 2013-03-18 | 2013-03-18 | 銀めっき材 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10072348B2 (ja) |
JP (1) | JP6086531B2 (ja) |
WO (1) | WO2014148201A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017014588A (ja) * | 2015-07-03 | 2017-01-19 | Dowaメタルテック株式会社 | 銀めっき材およびその製造方法 |
WO2017154288A1 (ja) * | 2016-03-09 | 2017-09-14 | Jx金属株式会社 | Niめっき銅又は銅合金材、それを用いたコネクタ端子、コネクタ及び電子部品 |
WO2019031549A1 (ja) | 2017-08-08 | 2019-02-14 | 三菱マテリアル株式会社 | 銀皮膜付端子材及び銀皮膜付端子 |
KR20200039680A (ko) | 2017-08-08 | 2020-04-16 | 미쓰비시 마테리알 가부시키가이샤 | 은 피막이 형성된 단자재 및 은 피막이 형성된 단자 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012162775A (ja) * | 2011-02-08 | 2012-08-30 | Dowa Metaltech Kk | 銀めっき材およびその製造方法 |
WO2013047628A1 (ja) * | 2011-09-30 | 2013-04-04 | Dowaメタルテック株式会社 | 銀めっき材およびその製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3889718B2 (ja) | 2003-03-04 | 2007-03-07 | Smk株式会社 | 電気接点に用いる金属板及び同金属板の製造方法 |
JP4279285B2 (ja) | 2005-11-17 | 2009-06-17 | 古河電気工業株式会社 | 可動接点用銀被覆ステンレス条およびその製造方法 |
JP2010146925A (ja) | 2008-12-19 | 2010-07-01 | Furukawa Electric Co Ltd:The | モータ用接触子材料およびその製造方法 |
-
2013
- 2013-03-18 JP JP2013054877A patent/JP6086531B2/ja active Active
-
2014
- 2014-02-18 WO PCT/JP2014/054253 patent/WO2014148201A1/ja active Application Filing
- 2014-02-18 US US14/777,706 patent/US10072348B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012162775A (ja) * | 2011-02-08 | 2012-08-30 | Dowa Metaltech Kk | 銀めっき材およびその製造方法 |
WO2013047628A1 (ja) * | 2011-09-30 | 2013-04-04 | Dowaメタルテック株式会社 | 銀めっき材およびその製造方法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017014588A (ja) * | 2015-07-03 | 2017-01-19 | Dowaメタルテック株式会社 | 銀めっき材およびその製造方法 |
WO2017154288A1 (ja) * | 2016-03-09 | 2017-09-14 | Jx金属株式会社 | Niめっき銅又は銅合金材、それを用いたコネクタ端子、コネクタ及び電子部品 |
CN108779569A (zh) * | 2016-03-09 | 2018-11-09 | Jx金属株式会社 | 镀Ni的铜或铜合金材料、使用该材料的连接器端子、连接器以及电子部件 |
US10361501B2 (en) | 2016-03-09 | 2019-07-23 | Jx Nippon Mining & Metals Corporation | Ni-plated copper or copper alloy material, connector terminal, connector and electronic component using the same |
CN108779569B (zh) * | 2016-03-09 | 2021-02-02 | Jx金属株式会社 | 镀Ni的铜或铜合金材料、使用该材料的连接器端子、连接器以及电子部件 |
WO2019031549A1 (ja) | 2017-08-08 | 2019-02-14 | 三菱マテリアル株式会社 | 銀皮膜付端子材及び銀皮膜付端子 |
KR20200039680A (ko) | 2017-08-08 | 2020-04-16 | 미쓰비시 마테리알 가부시키가이샤 | 은 피막이 형성된 단자재 및 은 피막이 형성된 단자 |
US11530490B2 (en) | 2017-08-08 | 2022-12-20 | Mitsubishi Materials Corporation | Terminal material with silver coating film and terminal with silver coating film |
Also Published As
Publication number | Publication date |
---|---|
US20160273120A1 (en) | 2016-09-22 |
JP6086531B2 (ja) | 2017-03-01 |
WO2014148201A1 (ja) | 2014-09-25 |
US10072348B2 (en) | 2018-09-11 |
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