JP2014177701A - 真空蒸着機 - Google Patents
真空蒸着機 Download PDFInfo
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- JP2014177701A JP2014177701A JP2014047302A JP2014047302A JP2014177701A JP 2014177701 A JP2014177701 A JP 2014177701A JP 2014047302 A JP2014047302 A JP 2014047302A JP 2014047302 A JP2014047302 A JP 2014047302A JP 2014177701 A JP2014177701 A JP 2014177701A
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- unit
- linear motion
- angle limiting
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- vacuum deposition
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- 238000007740 vapor deposition Methods 0.000 title abstract description 16
- 238000001771 vacuum deposition Methods 0.000 claims description 19
- 230000000903 blocking effect Effects 0.000 claims description 9
- 238000007738 vacuum evaporation Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 9
- 238000003780 insertion Methods 0.000 description 12
- 230000037431 insertion Effects 0.000 description 12
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 5
- 230000003014 reinforcing effect Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/18—Mechanical movements
- Y10T74/18056—Rotary to or from reciprocating or oscillating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/18—Mechanical movements
- Y10T74/18056—Rotary to or from reciprocating or oscillating
- Y10T74/18088—Rack and pinion type
- Y10T74/18096—Shifting rack
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- General Engineering & Computer Science (AREA)
- Motorcycle And Bicycle Frame (AREA)
Abstract
【解決手段】駆動部110と、駆動部に連結され、駆動部の作動によって直線運動する直線運動部120と、直線運動部に連結され、直線運動部の直線運動によって、直線運動部の移動方向に対して垂直方向に運動する角度制限部130と、を備える真空蒸着機である。
【選択図】図2
Description
110 駆動部
111 駆動力生成部
112 回転部
120 直線運動部
121 ソース防着板
122 運動ブロック
123 ガイド部
130 角度制限部
131 摺動部
132 角度制限プレート
133 遮断部
140 固定部
150 線形ガイド部
160 側面防着板
170 補助ガイド部
171 固定ブラケット
172 ガイド
173 補強リブ
180 指示部
181 運動部
182 位置表示部
190 カバー部
Claims (10)
- 駆動部と、
前記駆動部に連結され、前記駆動部の作動によって直線運動する直線運動部と、
前記直線運動部に連結され、前記直線運動部の直線運動によって、前記直線運動部の移動方向に対して垂直方向に運動する角度制限部と、
を備えることを特徴とする、真空蒸着機。 - 前記駆動部は、
駆動力を生成する駆動力生成部と、
前記駆動力生成部に連結されて回転運動する回転部と、
を備えることを特徴とする、請求項1に記載の真空蒸着機。 - 前記直線運動部は、
前記回転部に連結され、前記回転部の回転運動時に直線運動する運動ブロックを備えることを特徴とする、請求項2に記載の真空蒸着機。 - 前記直線運動部は、
前記角度制限部の運動時、前記角度制限部の一部をガイドするガイド部を備えることを特徴とする、請求項1に記載の真空蒸着機。 - 前記角度制限部は、
各ソース部の間に設けられ、上下に直線運動する角度制限プレートと、
前記角度制限プレート及び前記直線運動部に連結され、前記直線運動部の直線運動時、前記直線運動部の移動方向と垂直に摺動する摺動部と、
を備えることを特徴とする、請求項1に記載の真空蒸着機。 - 前記角度制限部は、
前記角度制限プレートと、前記摺動部とを連結する連結部と、
をさらに備えることを特徴とする、請求項5に記載の真空蒸着機。 - 前記角度制限部は、
前記角度制限プレートと、
前記摺動部との間に配置され、側面防着板に形成された溝を閉鎖する遮断部と、
をさらに備えることを特徴とする、請求項5に記載の真空蒸着機。 - 前記角度制限部が摺動するように設けられる固定部をさらに備えることを特徴とする、請求項1に記載の真空蒸着機。
- 前記固定部と当該固定部に摺動するように設けられる摺動部との間に設けられ、前記摺動部の運動をガイドする線形ガイド部と、
をさらに備えることを特徴とする、請求項8に記載の真空蒸着機。 - 前記直線運動部と対向して設けられ、前記直線運動部の運動をガイドする補助ガイド部をさらに備えることを特徴とする、請求項1に記載の真空蒸着機。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2013-0027488 | 2013-03-14 | ||
KR1020130027488A KR102136787B1 (ko) | 2013-03-14 | 2013-03-14 | 진공증착기 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014177701A true JP2014177701A (ja) | 2014-09-25 |
JP6348735B2 JP6348735B2 (ja) | 2018-06-27 |
Family
ID=51500365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014047302A Active JP6348735B2 (ja) | 2013-03-14 | 2014-03-11 | 真空蒸着機 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9816172B2 (ja) |
JP (1) | JP6348735B2 (ja) |
KR (1) | KR102136787B1 (ja) |
CN (1) | CN104046980B (ja) |
TW (1) | TWI617682B (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3192094A (en) * | 1960-04-20 | 1965-06-29 | Us Rubber Co | Automatic bias cutting and splicing machine |
US3746571A (en) * | 1971-06-29 | 1973-07-17 | Xerox Corp | Method of vacuum evaporation |
JPH11100663A (ja) * | 1997-09-25 | 1999-04-13 | Nec Corp | 蒸着装置、及び蒸着方法 |
US20010014268A1 (en) * | 1998-10-28 | 2001-08-16 | Charles S. Bryson | Multi-axis transfer arm with an extensible tracked carriage |
JP2004225058A (ja) * | 2002-11-29 | 2004-08-12 | Sony Corp | 成膜装置および表示パネルの製造装置とその方法 |
JP2005061430A (ja) * | 2003-08-11 | 2005-03-10 | O M Ltd | 速度変換装置 |
JP2006188754A (ja) * | 2005-01-05 | 2006-07-20 | Samsung Sdi Co Ltd | 蒸着システム用蒸着源の駆動軸及びこれを具備した蒸着システム |
WO2012026790A2 (ko) * | 2010-08-27 | 2012-03-01 | Kim Young Hee | 힘 전달기구 |
Family Cites Families (12)
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US3459056A (en) * | 1966-12-15 | 1969-08-05 | Seamen S Unit | Constant torque transmission |
US4042128A (en) * | 1975-11-26 | 1977-08-16 | Airco, Inc. | Substrate transfer apparatus for a vacuum coating system |
US5311103A (en) * | 1992-06-01 | 1994-05-10 | Board Of Trustees Operating Michigan State University | Apparatus for the coating of material on a substrate using a microwave or UHF plasma |
KR20050072946A (ko) * | 2004-01-08 | 2005-07-13 | 삼성전자주식회사 | 고균일 증착용 장치 |
KR100589938B1 (ko) | 2004-06-25 | 2006-06-19 | 엘지전자 주식회사 | 진공 증착 장치 |
KR100915509B1 (ko) * | 2005-06-13 | 2009-09-03 | 가부시키가이샤 야스카와덴키 | 얼라이너 장치 |
US7442413B2 (en) * | 2005-11-18 | 2008-10-28 | Daystar Technologies, Inc. | Methods and apparatus for treating a work piece with a vaporous element |
TWI349720B (en) * | 2007-05-30 | 2011-10-01 | Ind Tech Res Inst | A power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same |
JP5527933B2 (ja) | 2007-11-30 | 2014-06-25 | 東京エレクトロン株式会社 | 成膜装置の制御方法、成膜方法、成膜装置、有機el電子デバイスおよびその制御プログラムを格納した記憶媒体 |
CN201713567U (zh) * | 2010-05-21 | 2011-01-19 | 光驰科技(上海)有限公司 | 双层膜厚均匀性修正板驱动装置 |
CN102534529B (zh) | 2010-12-24 | 2015-04-15 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 磁控溅射源及磁控溅射设备 |
KR20120084863A (ko) | 2011-01-21 | 2012-07-31 | (주) 오엘이디플러스 | 쉐도우 현상 방지용 블로킹 쉴드 |
-
2013
- 2013-03-14 KR KR1020130027488A patent/KR102136787B1/ko active IP Right Grant
- 2013-08-26 US US14/010,407 patent/US9816172B2/en active Active
- 2013-09-05 TW TW102131938A patent/TWI617682B/zh active
- 2013-10-08 CN CN201310464725.1A patent/CN104046980B/zh active Active
-
2014
- 2014-03-11 JP JP2014047302A patent/JP6348735B2/ja active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3192094A (en) * | 1960-04-20 | 1965-06-29 | Us Rubber Co | Automatic bias cutting and splicing machine |
US3746571A (en) * | 1971-06-29 | 1973-07-17 | Xerox Corp | Method of vacuum evaporation |
JPH11100663A (ja) * | 1997-09-25 | 1999-04-13 | Nec Corp | 蒸着装置、及び蒸着方法 |
US20010014268A1 (en) * | 1998-10-28 | 2001-08-16 | Charles S. Bryson | Multi-axis transfer arm with an extensible tracked carriage |
JP2004225058A (ja) * | 2002-11-29 | 2004-08-12 | Sony Corp | 成膜装置および表示パネルの製造装置とその方法 |
JP2005061430A (ja) * | 2003-08-11 | 2005-03-10 | O M Ltd | 速度変換装置 |
JP2006188754A (ja) * | 2005-01-05 | 2006-07-20 | Samsung Sdi Co Ltd | 蒸着システム用蒸着源の駆動軸及びこれを具備した蒸着システム |
WO2012026790A2 (ko) * | 2010-08-27 | 2012-03-01 | Kim Young Hee | 힘 전달기구 |
Also Published As
Publication number | Publication date |
---|---|
KR102136787B1 (ko) | 2020-07-23 |
CN104046980B (zh) | 2019-03-26 |
TW201435108A (zh) | 2014-09-16 |
CN104046980A (zh) | 2014-09-17 |
JP6348735B2 (ja) | 2018-06-27 |
US9816172B2 (en) | 2017-11-14 |
KR20140112862A (ko) | 2014-09-24 |
US20140260718A1 (en) | 2014-09-18 |
TWI617682B (zh) | 2018-03-11 |
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