JP2014167492A - ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子 - Google Patents

ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子 Download PDF

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Publication number
JP2014167492A
JP2014167492A JP2011137086A JP2011137086A JP2014167492A JP 2014167492 A JP2014167492 A JP 2014167492A JP 2011137086 A JP2011137086 A JP 2011137086A JP 2011137086 A JP2011137086 A JP 2011137086A JP 2014167492 A JP2014167492 A JP 2014167492A
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JP
Japan
Prior art keywords
group
carbon atoms
hydrogen atom
alkyl group
negative photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2011137086A
Other languages
English (en)
Japanese (ja)
Inventor
Masaki Koo
正樹 小尾
Kotaro Yamada
光太郎 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2011137086A priority Critical patent/JP2014167492A/ja
Priority to PCT/JP2012/065774 priority patent/WO2012176816A1/ja
Priority to TW101122234A priority patent/TW201308007A/zh
Publication of JP2014167492A publication Critical patent/JP2014167492A/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2011137086A 2011-06-21 2011-06-21 ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子 Withdrawn JP2014167492A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011137086A JP2014167492A (ja) 2011-06-21 2011-06-21 ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子
PCT/JP2012/065774 WO2012176816A1 (ja) 2011-06-21 2012-06-20 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子
TW101122234A TW201308007A (zh) 2011-06-21 2012-06-21 負型感光性樹脂組成物、隔壁、黑色矩陣、濾色器及液晶顯示元件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011137086A JP2014167492A (ja) 2011-06-21 2011-06-21 ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子

Publications (1)

Publication Number Publication Date
JP2014167492A true JP2014167492A (ja) 2014-09-11

Family

ID=47422647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011137086A Withdrawn JP2014167492A (ja) 2011-06-21 2011-06-21 ネガ型用感光性組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子

Country Status (3)

Country Link
JP (1) JP2014167492A (zh)
TW (1) TW201308007A (zh)
WO (1) WO2012176816A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190019133A (ko) 2016-06-14 2019-02-26 닛산 가가쿠 가부시키가이샤 Boa 기판 또는 bcs 부착 기판 도포용 액정 배향제 및 액정 표시 소자
CN111886544A (zh) * 2018-03-23 2020-11-03 东丽株式会社 固化膜的制造方法以及有机el显示器的制造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103890128B (zh) * 2011-10-21 2016-06-29 旭硝子株式会社 拒墨剂的制造方法、负型感光性树脂组合物、分隔壁以及光学元件
CN106462069B (zh) * 2014-04-25 2019-10-18 Ａｇｃ株式会社 负型感光性树脂组合物、分隔壁及光学元件
JP7234946B2 (ja) * 2018-01-26 2023-03-08 三菱ケミカル株式会社 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
JP5266760B2 (ja) * 2005-12-15 2013-08-21 旭硝子株式会社 含フッ素重合体、ネガ型感光性組成物及び隔壁
JP5192876B2 (ja) * 2008-03-28 2013-05-08 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5494479B2 (ja) * 2008-04-25 2014-05-14 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用
JP5306009B2 (ja) * 2009-03-24 2013-10-02 富士フイルム株式会社 カラーフィルタ用重合性組成物、カラーフィルタ、及び固体撮像素子

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190019133A (ko) 2016-06-14 2019-02-26 닛산 가가쿠 가부시키가이샤 Boa 기판 또는 bcs 부착 기판 도포용 액정 배향제 및 액정 표시 소자
CN111886544A (zh) * 2018-03-23 2020-11-03 东丽株式会社 固化膜的制造方法以及有机el显示器的制造方法
JPWO2019182041A1 (ja) * 2018-03-23 2021-02-04 東レ株式会社 硬化膜の製造方法、及び有機ｅｌディスプレイの製造方法
JP7351220B2 (ja) 2018-03-23 2023-09-27 東レ株式会社 硬化膜の製造方法、及び有機ｅｌディスプレイの製造方法
CN111886544B (zh) * 2018-03-23 2024-02-23 东丽株式会社 固化膜的制造方法以及有机el显示器的制造方法

Also Published As

Publication number Publication date
WO2012176816A1 (ja) 2012-12-27
TW201308007A (zh) 2013-02-16

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Effective date: 20140902