JP2014130817A - 絶縁材料、これを含む絶縁層組成物及び該絶縁層組成物を用いる基板 - Google Patents
絶縁材料、これを含む絶縁層組成物及び該絶縁層組成物を用いる基板 Download PDFInfo
- Publication number
- JP2014130817A JP2014130817A JP2013265098A JP2013265098A JP2014130817A JP 2014130817 A JP2014130817 A JP 2014130817A JP 2013265098 A JP2013265098 A JP 2013265098A JP 2013265098 A JP2013265098 A JP 2013265098A JP 2014130817 A JP2014130817 A JP 2014130817A
- Authority
- JP
- Japan
- Prior art keywords
- group
- liquid crystal
- insulating layer
- crystal oligomer
- thermosetting liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 46
- 239000000758 substrate Substances 0.000 title claims abstract description 31
- 239000011810 insulating material Substances 0.000 title claims abstract description 29
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 70
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 69
- 229920000734 polysilsesquioxane polymer Polymers 0.000 claims abstract description 62
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 36
- 239000000835 fiber Substances 0.000 claims description 24
- 229910021389 graphene Inorganic materials 0.000 claims description 24
- 239000000126 substance Substances 0.000 claims description 22
- 239000003822 epoxy resin Substances 0.000 claims description 21
- 229920000647 polyepoxide Polymers 0.000 claims description 21
- 125000000524 functional group Chemical group 0.000 claims description 18
- -1 ester amide Chemical class 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 239000003365 glass fiber Substances 0.000 claims description 12
- 125000000962 organic group Chemical group 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 5
- 150000001336 alkenes Chemical group 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 4
- 150000001408 amides Chemical class 0.000 claims description 4
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 claims description 4
- 239000004917 carbon fiber Substances 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000005641 methacryl group Chemical group 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- 229920000271 Kevlar® Polymers 0.000 claims description 3
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 3
- 239000004761 kevlar Substances 0.000 claims description 3
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 claims description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 claims 2
- 150000003949 imides Chemical class 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract description 3
- 239000004634 thermosetting polymer Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 45
- 239000011256 inorganic filler Substances 0.000 description 16
- 229910003475 inorganic filler Inorganic materials 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- 239000002131 composite material Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000004744 fabric Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 239000002952 polymeric resin Substances 0.000 description 5
- 239000000779 smoke Substances 0.000 description 5
- 229920003002 synthetic resin Polymers 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000011889 copper foil Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000004745 nonwoven fabric Substances 0.000 description 3
- 239000012779 reinforcing material Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000012662 bulk polymerization Methods 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- HRDCVMSNCBAMAM-UHFFFAOYSA-N 3-prop-2-ynoxyprop-1-yne Chemical compound C#CCOCC#C HRDCVMSNCBAMAM-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- CKENDVLIAVMNDW-UHFFFAOYSA-N Cc(cc1)c(C)cc1-c1ccccc1 Chemical compound Cc(cc1)c(C)cc1-c1ccccc1 CKENDVLIAVMNDW-UHFFFAOYSA-N 0.000 description 1
- XOXIKTPTJGGZHG-UHFFFAOYSA-N Cc(cc1)c(C)cc1S(c1ccc(C)c(C)c1)=O Chemical compound Cc(cc1)c(C)cc1S(c1ccc(C)c(C)c1)=O XOXIKTPTJGGZHG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N Cc1ccccc1C Chemical compound Cc1ccccc1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 238000006957 Michael reaction Methods 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- QJQAMHYHNCADNR-UHFFFAOYSA-N n-methylpropanamide Chemical compound CCC(=O)NC QJQAMHYHNCADNR-UHFFFAOYSA-N 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical group CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0141—Liquid crystal polymer [LCP]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0242—Shape of an individual particle
- H05K2201/0251—Non-conductive microfibers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0242—Shape of an individual particle
- H05K2201/026—Nanotubes or nanowires
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Reinforced Plastic Materials (AREA)
- Organic Insulating Materials (AREA)
Abstract
【解決手段】本発明の絶縁材料は、ポリシルセスキオキサン(POSS)が可溶性熱硬化性液晶オリゴマの主鎖に結合された構造を有する。この可溶性熱硬化性液晶オリゴマは、印刷回路基板の絶縁層に使われる低い熱膨脹係数を有する可溶性熱硬化性液晶高分子である。
【選択図】図5
Description
ここで、Ar3は4価芳香族有機基であって、下記の化4に表示される群から選ばれる少なくとも一つ構造単位を含む。ここで、n及びmは、1〜100の整数である。
Claims (18)
- ポリシルセスキオキサン(POSS)が可溶性熱硬化性液晶オリゴマの主鎖に結合された構造を有する絶縁材料。
- 前記ポリシルセスキオキサン(POSS)と前記可溶性熱硬化性液晶オリゴマとの結合は、前記可溶性熱硬化性液晶オリゴマに含まれた不飽和二重結合と前記ポリシルセスキオキサン(POSS)に含まれた官能基の共有結合とによって形成される請求項1に記載の絶縁材料。
- 前記可溶性熱硬化性液晶オリゴマに含まれた不飽和二重結合は、マレイミド(Maleimide)、ナフタレンアセトアミド(Naphtalene acetaimide)、フタルイミド(Phthalimide)、アセチレン(acetylene)、プロパルギルエーテル(propagyl ether)、ベンゾシクロブテン(benzocyclobutene)、シアン酸塩(cyanate)及びこれらの置換体または誘導体よりなる群から選ばれる少なくとも一つである請求項2に記載の絶縁材料。
- 前記ポリシルセスキオキサン(POSS)に含まれた官能基は、メタクリル基、ビニール基、メルカプト基、ノルボニルギ基、ステリル基、オレフィン基、アクリル基及びこれらの組合よりなる群から選ばれる少なくとも一つである請求項2に記載の絶縁材料。
- 前記ポリシルセスキオキサン(POSS)は、前記可溶性熱硬化性液晶オリゴマの鎖内に3〜85wt%で含まれる請求項1に記載の絶縁材料。
- 前記可溶性熱硬化性液晶オリゴマは、下記の化1によって表示される化合物であり、
前記Ar1は、下記の化2に表示される群から選ばれる少なくとも一つの構造単位を含み、
- 前記可溶性熱硬化性液晶オリゴマの数平均分子量は、500〜15,000である請求項1に記載の絶縁材料。
- 請求項1に記載のPOSS入り可溶性熱硬化性液晶オリゴマ、酸化グラフィン及び単繊維を含む基板絶縁層組成物。
- 前記酸化グラフィンは、その表面及び縁部に、ヒドロキシ基、カルボキシ基及びエポキシ基のうちの少なくともいずれか一つの官能基を有する請求項8に記載の基板絶縁層組成物。
- 前記酸化グラフィンは、酸素に対する炭素数の比(炭素/酸素の比)が1〜20である請求項8に記載の基板絶縁層組成物。
- 前記単繊維は、纎維長さが50μm〜10mmである請求項8に記載の基板絶縁層組成物。
- 前記単繊維は、ガラス纎維、ケブラ、炭素纎維及びアルミナよりなる群から選ばれる少なくとも一つである請求項8に記載の基板絶縁層組成物。
- 前記組成物は、POSS入り可溶性熱硬化性液晶オリゴマ100重量部に対して酸化グラフィン0.01〜80重量部及び単繊維0.01〜50重量部を含む請求項1に記載の基板絶縁層組成物。
- 前記可溶性熱硬化性液晶オリゴマは、主鎖にエポキシ樹脂をさらに含む請求項8に記載の基板絶縁層組成物。
- 前記エポキシ樹脂は、前記可溶性熱硬化性液晶オリゴマ100重量部に対して0.01〜50重量部で含まれる請求項14に記載の基板絶縁層組成物。
- 前記可溶性熱硬化性液晶オリゴマと酸化グラフィンは、硬化反応によって互いに共有結合を形成して有無機ハイブリッド構造を有する請求項8に記載の基板絶縁層組成物。
- 請求項8に記載の絶縁層組成物を用いる絶縁プリプレグまたは絶縁フィルム。
- 請求項17に記載の絶縁プリプレグまたは絶縁フィルムを含む基板。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120157169A KR102054967B1 (ko) | 2012-12-28 | 2012-12-28 | 절연 재료, 이를 포함하는 절연층 조성물, 및 상기 절연층 조성물을 이용한 기판 |
KR10-2012-0157169 | 2012-12-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014130817A true JP2014130817A (ja) | 2014-07-10 |
JP6309264B2 JP6309264B2 (ja) | 2018-04-11 |
Family
ID=51017896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013265098A Expired - Fee Related JP6309264B2 (ja) | 2012-12-28 | 2013-12-24 | 絶縁材料、これを含む絶縁層組成物及び該絶縁層組成物を用いる基板 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20140187687A1 (ja) |
JP (1) | JP6309264B2 (ja) |
KR (1) | KR102054967B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018518544A (ja) * | 2015-04-01 | 2018-07-12 | アルファ・アセンブリー・ソリューションズ・インコーポレイテッドAlpha Assembly Solutions Inc. | エンジニアードポリマー系電子材料 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140079036A (ko) * | 2012-12-18 | 2014-06-26 | 삼성전기주식회사 | 절연층 조성물, 및 이를 이용한 절연층을 포함하는 기판, 및 상기 기판의 제조방법 |
KR20150014214A (ko) * | 2013-07-29 | 2015-02-06 | 삼성전기주식회사 | 반도체 패키지용 몰딩 조성물 및 이를 이용한 반도체 패키지 |
TWI526129B (zh) * | 2014-11-05 | 2016-03-11 | Elite Material Co Ltd | Multilayer printed circuit boards with dimensional stability |
CN107501938A (zh) * | 2017-07-28 | 2017-12-22 | 广东墨睿科技有限公司 | 一种氧化石墨烯复合导热片及其制备方法 |
US10506712B1 (en) * | 2018-07-31 | 2019-12-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Printed circuit board |
CN109797485A (zh) * | 2019-02-26 | 2019-05-24 | 安徽丹凤电子材料股份有限公司 | 一种耐高温耐腐蚀玻璃纤维电子布 |
CN109853234B (zh) * | 2019-03-12 | 2022-01-04 | 深圳华力兴新材料股份有限公司 | 一种提高碳纤维绝缘性能的方法、改性碳纤维及其用途 |
KR20210115486A (ko) * | 2020-03-13 | 2021-09-27 | 엘지이노텍 주식회사 | 회로기판 |
CN111636240A (zh) * | 2020-06-05 | 2020-09-08 | 西南大学 | 一种苯基-聚倍半硅氧烷改性间位芳纶绝缘纸的制备方法 |
KR20240077616A (ko) | 2022-11-24 | 2024-06-03 | 한국전자기술연구원 | 변성 폴리실세스퀴옥산을 포함하는 저유전 기판 소재 및 그를 이용한 기판 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007525803A (ja) * | 2004-01-20 | 2007-09-06 | ワールド・プロパティーズ・インコーポレイテッド | 回路材料、回路、多層回路、およびそれらの製造方法 |
JP2010261006A (ja) * | 2009-05-06 | 2010-11-18 | Samsung Electro-Mechanics Co Ltd | 基板形成用組成物とこれを用いたプリプレグおよび基板 |
JP2011084707A (ja) * | 2009-10-15 | 2011-04-28 | Samsung Electro-Mechanics Co Ltd | 表面処理されたナノ充填剤を含む基板用ナノ複合材料の製造方法 |
JP2012117052A (ja) * | 2010-11-29 | 2012-06-21 | Samsung Electro-Mechanics Co Ltd | 多層配線基板用絶縁樹脂組成物及びこれを含む多層配線基板 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4861823A (en) * | 1986-11-20 | 1989-08-29 | Amoco Corporation | Thermoset composition comprising aromatic cyanate ester of allyl ether of bisphenol |
JP2833433B2 (ja) * | 1993-03-24 | 1998-12-09 | 新神戸電機株式会社 | 積層板用エポキシ樹脂組成物および積層板の製造法 |
US5484867A (en) * | 1993-08-12 | 1996-01-16 | The University Of Dayton | Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments |
US5939576A (en) * | 1998-01-05 | 1999-08-17 | The United States Of America As Represented By The Secretary Of The Air Force | Method of functionalizing polycyclic silicones and the compounds so formed |
JP2001064483A (ja) * | 1999-08-27 | 2001-03-13 | Sumitomo Bakelite Co Ltd | 液晶表示素子用シール材組成物 |
US6767930B1 (en) * | 2001-09-07 | 2004-07-27 | Steven A. Svejda | Polyhedral oligomeric silsesquioxane polyimide composites |
US7540978B2 (en) * | 2004-08-05 | 2009-06-02 | Novaled Ag | Use of an organic matrix material for producing an organic semiconductor material, organic semiconductor material and electronic component |
JP5070692B2 (ja) * | 2005-10-28 | 2012-11-14 | 住友ベークライト株式会社 | 半導体封止用エポキシ樹脂組成物および半導体装置 |
JP2009155354A (ja) * | 2006-03-30 | 2009-07-16 | Ajinomoto Co Inc | 絶縁層用樹脂組成物 |
KR100840924B1 (ko) * | 2007-03-30 | 2008-06-24 | 삼성전기주식회사 | 유크립타이트 세라믹 필러 및 이를 포함하는 절연 복합재 |
KR100835784B1 (ko) * | 2007-06-26 | 2008-06-09 | 주식회사 두산 | 인쇄회로기판용 수지 조성물, 이를 이용한 복합기재 및동박 적층판 |
JP5024205B2 (ja) * | 2007-07-12 | 2012-09-12 | 三菱瓦斯化学株式会社 | プリプレグ及び積層板 |
US8765012B2 (en) * | 2008-11-18 | 2014-07-01 | Samsung Electronics Co., Ltd. | Thermosetting composition and printed circuit board using the same |
US8525112B2 (en) | 2010-08-10 | 2013-09-03 | Seagate Technology Llc | Variable pixel density imaging |
JP5569270B2 (ja) * | 2010-09-06 | 2014-08-13 | 住友ベークライト株式会社 | プリプレグ、金属張積層板、プリント配線板及び半導体装置 |
EP2688949B1 (en) * | 2011-03-24 | 2015-05-06 | Akzo Nobel Chemicals International B.V. | Accelerator for curing resins |
KR101877088B1 (ko) * | 2011-05-31 | 2018-07-10 | 미츠비시 가스 가가쿠 가부시키가이샤 | 수지 조성물, 프리프레그 및 적층판 |
US9428605B2 (en) * | 2012-11-08 | 2016-08-30 | Neo Sitech Llc | Organic-inorganic hybrid material compositions and polymer composites |
-
2012
- 2012-12-28 KR KR1020120157169A patent/KR102054967B1/ko active IP Right Grant
-
2013
- 2013-11-27 US US14/092,339 patent/US20140187687A1/en not_active Abandoned
- 2013-12-24 JP JP2013265098A patent/JP6309264B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007525803A (ja) * | 2004-01-20 | 2007-09-06 | ワールド・プロパティーズ・インコーポレイテッド | 回路材料、回路、多層回路、およびそれらの製造方法 |
JP2010261006A (ja) * | 2009-05-06 | 2010-11-18 | Samsung Electro-Mechanics Co Ltd | 基板形成用組成物とこれを用いたプリプレグおよび基板 |
JP2011084707A (ja) * | 2009-10-15 | 2011-04-28 | Samsung Electro-Mechanics Co Ltd | 表面処理されたナノ充填剤を含む基板用ナノ複合材料の製造方法 |
JP2012117052A (ja) * | 2010-11-29 | 2012-06-21 | Samsung Electro-Mechanics Co Ltd | 多層配線基板用絶縁樹脂組成物及びこれを含む多層配線基板 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018518544A (ja) * | 2015-04-01 | 2018-07-12 | アルファ・アセンブリー・ソリューションズ・インコーポレイテッドAlpha Assembly Solutions Inc. | エンジニアードポリマー系電子材料 |
US10682732B2 (en) | 2015-04-01 | 2020-06-16 | Alpha Assembly Solutions Inc. | Engineered polymer-based electronic materials |
Also Published As
Publication number | Publication date |
---|---|
US20140187687A1 (en) | 2014-07-03 |
KR20140086537A (ko) | 2014-07-08 |
JP6309264B2 (ja) | 2018-04-11 |
KR102054967B1 (ko) | 2019-12-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6309264B2 (ja) | 絶縁材料、これを含む絶縁層組成物及び該絶縁層組成物を用いる基板 | |
JP6116856B2 (ja) | 基板絶縁層組成物、これを用いたプリプレグ及び基板 | |
KR102016474B1 (ko) | 기판 절연층 조성물, 이를 이용한 프리프레그 및 기판 | |
US20140187674A1 (en) | Resin composition with enhanced heat-releasing properties, heat-releasing film, insulating film, and prepreg | |
WO2010035452A1 (ja) | 樹脂組成物、硬化体及び積層体 | |
JP2018518563A (ja) | 半導体パッケージ用熱硬化性樹脂組成物とこれを用いたプリプレグ | |
JP2012117052A (ja) | 多層配線基板用絶縁樹脂組成物及びこれを含む多層配線基板 | |
JP2007138095A (ja) | 樹脂組成物及び板状体 | |
TWI719229B (zh) | 預浸體、覆金屬積層板及印刷配線板 | |
JP6399337B2 (ja) | プリント回路基板用絶縁樹脂組成物およびこれを用いた製品 | |
JP2007224242A (ja) | 熱硬化性樹脂組成物、bステージ化した樹脂フィルムおよび多層ビルドアップ基板 | |
JP5547032B2 (ja) | 熱伝導性樹脂組成物、樹脂シート、プリプレグ、金属積層板およびプリント配線板 | |
TW201412864A (zh) | 熱硬化性樹脂組成物、b階段(半硬化階段)化的樹脂薄膜、金屬箔、覆銅箔板及多層增層基板 | |
JP2015199905A (ja) | 印刷回路基板用絶縁樹脂組成物及びそれを用いた製品 | |
JP5276152B2 (ja) | 樹脂組成物及び板状体 | |
JP2014214307A (ja) | 低熱膨張率および高耐熱性を有するプリント基板用絶縁樹脂組成物、これを用いたプリプレグ、銅張積層板およびプリント基板 | |
JP5398087B2 (ja) | 放熱基板用接着剤および放熱基板 | |
JP6405981B2 (ja) | 樹脂組成物、プリプレグ、金属箔張積層板及びプリント配線板 | |
KR20090036074A (ko) | 폴리이미드/점토 나노복합체 형성용 조성물 및 그를 이용하는 인쇄회로기판 | |
KR102059824B1 (ko) | 광경화성 절연 수지 조성물 및 이를 이용한 인쇄회로기판 | |
JP2017193614A (ja) | プリプレグ、金属張積層板及びプリント配線板 | |
JP4806279B2 (ja) | ガラスクロス含有絶縁基材 | |
JP2013057065A (ja) | プリプレグ、基板および半導体装置 | |
TW201433599A (zh) | 熱硬化性樹脂組成物、b階段(半硬化階段)化的樹脂薄膜、金屬箔、覆銅箔板及多層增層基板 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160905 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170516 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170517 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20170816 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170907 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171107 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180207 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180220 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180314 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6309264 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |