JP2014067797A - 基板処理装置、基板処理方法及び半導体装置の製造方法 - Google Patents

基板処理装置、基板処理方法及び半導体装置の製造方法 Download PDF

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JP2014067797A
JP2014067797A JP2012210759A JP2012210759A JP2014067797A JP 2014067797 A JP2014067797 A JP 2014067797A JP 2012210759 A JP2012210759 A JP 2012210759A JP 2012210759 A JP2012210759 A JP 2012210759A JP 2014067797 A JP2014067797 A JP 2014067797A
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clean unit
substrate processing
substrate
processing apparatus
gas
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JP2012210759A
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Japanese (ja)
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JP2014067797A5 (enrdf_load_stackoverflow
Inventor
Toru Kagaya
徹 加賀谷
Akinari Hayashi
昭成 林
Tomoko Murasaki
智子 村埼
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Kokusai Denki Electric Inc
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Hitachi Kokusai Electric Inc
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Priority to JP2012210759A priority Critical patent/JP2014067797A/ja
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Publication of JP2014067797A5 publication Critical patent/JP2014067797A5/ja
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JP2012210759A 2012-09-25 2012-09-25 基板処理装置、基板処理方法及び半導体装置の製造方法 Pending JP2014067797A (ja)

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JP2012210759A JP2014067797A (ja) 2012-09-25 2012-09-25 基板処理装置、基板処理方法及び半導体装置の製造方法

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JP2012210759A JP2014067797A (ja) 2012-09-25 2012-09-25 基板処理装置、基板処理方法及び半導体装置の製造方法

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JP2014067797A true JP2014067797A (ja) 2014-04-17
JP2014067797A5 JP2014067797A5 (enrdf_load_stackoverflow) 2015-11-12

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017112137A (ja) * 2015-12-14 2017-06-22 Tdk株式会社 ミニエンバイロメント装置
CN107504557A (zh) * 2017-07-14 2017-12-22 太仓诚泽网络科技有限公司 室内空气净化系统
KR20210066937A (ko) * 2018-10-26 2021-06-07 어플라이드 머티어리얼스, 인코포레이티드 측면 저장 포드들, 장비 전단부 모듈들, 및 이를 동작시키기 위한 방법들
US11342201B2 (en) 2019-03-28 2022-05-24 SCREEN Holdings Co., Ltd. Substrate processing apparatus
CN119617552A (zh) * 2024-11-26 2025-03-14 华能(嘉峪关)新能源有限公司 单晶硅电池生产线和电池生产车间内环境控制方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226456A (ja) * 1992-02-17 1993-09-03 Dainippon Screen Mfg Co Ltd 縦型基板熱処理装置のクリーンエアユニットの取付構造
JPH06302679A (ja) * 1993-04-13 1994-10-28 Tokyo Electron Ltd 被処理物搬送ボックス及び処理装置
JPH06318553A (ja) * 1993-04-30 1994-11-15 Tokyo Electron Ltd 熱処理装置
JPH07283288A (ja) * 1994-04-07 1995-10-27 Tokyo Electron Ltd 処理装置
JPH1092760A (ja) * 1996-09-09 1998-04-10 Tokyo Electron Ltd 熱処理装置
JPH10267338A (ja) * 1997-03-21 1998-10-09 Sanki Eng Co Ltd クリーンルーム
US20070141851A1 (en) * 2005-12-16 2007-06-21 Selen Louis J System and method of reducing particle contamination of semiconductor substrates

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226456A (ja) * 1992-02-17 1993-09-03 Dainippon Screen Mfg Co Ltd 縦型基板熱処理装置のクリーンエアユニットの取付構造
JPH06302679A (ja) * 1993-04-13 1994-10-28 Tokyo Electron Ltd 被処理物搬送ボックス及び処理装置
JPH06318553A (ja) * 1993-04-30 1994-11-15 Tokyo Electron Ltd 熱処理装置
JPH07283288A (ja) * 1994-04-07 1995-10-27 Tokyo Electron Ltd 処理装置
JPH1092760A (ja) * 1996-09-09 1998-04-10 Tokyo Electron Ltd 熱処理装置
JPH10267338A (ja) * 1997-03-21 1998-10-09 Sanki Eng Co Ltd クリーンルーム
US20070141851A1 (en) * 2005-12-16 2007-06-21 Selen Louis J System and method of reducing particle contamination of semiconductor substrates

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017112137A (ja) * 2015-12-14 2017-06-22 Tdk株式会社 ミニエンバイロメント装置
CN107504557A (zh) * 2017-07-14 2017-12-22 太仓诚泽网络科技有限公司 室内空气净化系统
KR20210066937A (ko) * 2018-10-26 2021-06-07 어플라이드 머티어리얼스, 인코포레이티드 측면 저장 포드들, 장비 전단부 모듈들, 및 이를 동작시키기 위한 방법들
KR102784803B1 (ko) * 2018-10-26 2025-03-19 어플라이드 머티어리얼스, 인코포레이티드 측면 저장 포드들, 장비 전단부 모듈들, 및 이를 동작시키기 위한 방법들
US11342201B2 (en) 2019-03-28 2022-05-24 SCREEN Holdings Co., Ltd. Substrate processing apparatus
CN119617552A (zh) * 2024-11-26 2025-03-14 华能(嘉峪关)新能源有限公司 单晶硅电池生产线和电池生产车间内环境控制方法

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