JP2014047134A5 - - Google Patents

Download PDF

Info

Publication number
JP2014047134A5
JP2014047134A5 JP2013173170A JP2013173170A JP2014047134A5 JP 2014047134 A5 JP2014047134 A5 JP 2014047134A5 JP 2013173170 A JP2013173170 A JP 2013173170A JP 2013173170 A JP2013173170 A JP 2013173170A JP 2014047134 A5 JP2014047134 A5 JP 2014047134A5
Authority
JP
Japan
Prior art keywords
plane
gan crystal
base substrate
gan
growing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013173170A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014047134A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2014047134A publication Critical patent/JP2014047134A/ja
Publication of JP2014047134A5 publication Critical patent/JP2014047134A5/ja
Pending legal-status Critical Current

Links

JP2013173170A 2012-08-31 2013-08-23 Iii族窒化物結晶塊 Pending JP2014047134A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201213695531A 2012-08-31 2012-08-31
US61/695531 2012-08-31

Publications (2)

Publication Number Publication Date
JP2014047134A JP2014047134A (ja) 2014-03-17
JP2014047134A5 true JP2014047134A5 (enExample) 2016-11-24

Family

ID=50607163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013173170A Pending JP2014047134A (ja) 2012-08-31 2013-08-23 Iii族窒化物結晶塊

Country Status (1)

Country Link
JP (1) JP2014047134A (enExample)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5420281B2 (ja) * 2009-03-11 2014-02-19 日立金属株式会社 Iii族窒化物半導体単結晶の製造方法、及びiii族窒化物半導体単結晶基板の製造方法
US9175418B2 (en) * 2009-10-09 2015-11-03 Soraa, Inc. Method for synthesis of high quality large area bulk gallium based crystals
CN103282554A (zh) * 2010-12-27 2013-09-04 三菱化学株式会社 半导体结晶的制造方法、结晶制造装置以及第13族氮化物半导体结晶

Similar Documents

Publication Publication Date Title
BR112013029013A2 (pt) Dispositivo de oclusão
JP2012526215A5 (enExample)
MY179209A (en) Wafer producing method
EP2543752A4 (en) SUBSTRATE WITH INTERNAL REFORM FOR EPITACTIC GROWTH, INTERNAL REFORMING SUBSTRATE AND A MULTILAYER FILM, SEMICONDUCTOR ELEMENT, MASS SUBSTRATE SUBSTRATE, AND METHOD OF MANUFACTURING THEREOF
IN2014DN07102A (enExample)
JP2011063504A5 (enExample)
JP2013103863A5 (ja) β−Ga2O3単結晶及びその製造方法
JP2011527428A5 (enExample)
JP2015214448A5 (enExample)
TWD171916S (zh) 太陽能電池基板之電極之部分
IN2014DN07101A (enExample)
JP2010223942A5 (enExample)
JP2011032154A5 (enExample)
Hu et al. Unified solving inverse dynamics of 6-DOF serial–parallel manipulators
EP2889909A3 (en) Etching of infrared sensor membrane
TWD137195S1 (zh) 半導體製造裝置用保溫筒散熱片(二)
JP2015047164A5 (enExample)
JP2012202801A5 (enExample)
JP2013110426A5 (enExample)
JP2015061060A5 (enExample)
JP2015059078A5 (enExample)
RU2016114211A (ru) Способ определения направления дислокаций в монокристаллах с помощью асм
Balakrishnan et al. Computation of optimal plotting points based on Pitman closeness with an application to goodness-of-fit for location-scale families
JP2009200513A5 (enExample)
JP2010150132A5 (enExample)