JP2015059078A5 - - Google Patents

Download PDF

Info

Publication number
JP2015059078A5
JP2015059078A5 JP2013195717A JP2013195717A JP2015059078A5 JP 2015059078 A5 JP2015059078 A5 JP 2015059078A5 JP 2013195717 A JP2013195717 A JP 2013195717A JP 2013195717 A JP2013195717 A JP 2013195717A JP 2015059078 A5 JP2015059078 A5 JP 2015059078A5
Authority
JP
Japan
Prior art keywords
group
metal nitride
nitride crystal
crystal
line segment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013195717A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015059078A (ja
JP6263920B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2013195717A priority Critical patent/JP6263920B2/ja
Priority claimed from JP2013195717A external-priority patent/JP6263920B2/ja
Publication of JP2015059078A publication Critical patent/JP2015059078A/ja
Publication of JP2015059078A5 publication Critical patent/JP2015059078A5/ja
Application granted granted Critical
Publication of JP6263920B2 publication Critical patent/JP6263920B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013195717A 2013-09-20 2013-09-20 GaN基板 Active JP6263920B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013195717A JP6263920B2 (ja) 2013-09-20 2013-09-20 GaN基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013195717A JP6263920B2 (ja) 2013-09-20 2013-09-20 GaN基板

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017174489A Division JP6455575B2 (ja) 2017-09-12 2017-09-12 第13族金属窒化物基板の製造方法

Publications (3)

Publication Number Publication Date
JP2015059078A JP2015059078A (ja) 2015-03-30
JP2015059078A5 true JP2015059078A5 (enExample) 2016-06-09
JP6263920B2 JP6263920B2 (ja) 2018-01-24

Family

ID=52816887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013195717A Active JP6263920B2 (ja) 2013-09-20 2013-09-20 GaN基板

Country Status (1)

Country Link
JP (1) JP6263920B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3255181A4 (en) * 2015-02-06 2018-01-10 Mitsubishi Chemical Corporation GaN SINGLE CRYSTAL AND METHOD FOR MANUFACTURING GaN SINGLE CRYSTAL
JP6759831B2 (ja) * 2016-08-08 2020-09-23 三菱ケミカル株式会社 C面GaN基板
JP7327532B2 (ja) * 2020-10-07 2023-08-16 三菱ケミカル株式会社 GaN単結晶およびGaN単結晶製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011051849A (ja) * 2009-09-03 2011-03-17 Hitachi Cable Ltd 窒化物半導体自立基板とその製造方法

Similar Documents

Publication Publication Date Title
JP2013103863A5 (ja) β−Ga2O3単結晶及びその製造方法
JP2014208571A5 (enExample)
JP2011063504A5 (enExample)
BR112018001815A2 (pt) processo para cultivar nanofios ou nanopirâmides em substratos grafíticos
JPWO2019175698A5 (ja) 金属酸化物
EP2460914A4 (en) GROUP III NITRIDE CRYSTAL AND METHOD OF MANUFACTURING THEREOF
JP2011155249A5 (ja) 半導体装置の作製方法
JP2013212952A5 (enExample)
WO2012134092A3 (en) Method of manufacturing single crystal ingot, and single crystal ingot and wafer manufactured thereby
GB201210134D0 (en) Selective sidewall growth of semiconductor material
JP2016100592A5 (enExample)
TW200833884A (en) Method for producing self-supporting nitride semiconductor substrate and self-supporting nitride semiconductor substrate
US20160017515A1 (en) Heterogeneous material integration through guided lateral growth
JP2015059078A5 (enExample)
JP2014236093A5 (enExample)
WO2009007907A3 (en) Single crystal growth on a mis-matched substrate
JP2015079946A5 (enExample)
WO2014064263A3 (fr) Procede de croissance d'au moins un nanofil a partir d'une couche d'un metal de transition nitrure obtenue en deux etapes
EP4012078A4 (en) Sic seed crystal and method for producing same, sic ingot produced by growing said sic seed crystal and method for producing same, and sic wafer produced from said sic ingot and sic wafer with epitaxial film and methods respectively for producing said sic wafer and said sic wafer with epitaxial film
JP2011032154A5 (enExample)
GB2529347A (en) Making a defect free fin based device in lateral epitaxy overgrowth region
EP2570521A3 (en) Manufacturing method of group 13 nitride crystal
WO2011111944A3 (ko) 나노 와이어 제조 방법 및 나노 와이어를 갖는 전자 소자
EP2642000A3 (en) Group 13 nitride crystal and group 13 nitride crystal substrate
EP2708622A3 (en) Group 13 nitride crystal, group 13 nitride crystal substrate, and method of manufacturing group 13 nitride crystal