JP2009200513A5 - - Google Patents

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Publication number
JP2009200513A5
JP2009200513A5 JP2009101474A JP2009101474A JP2009200513A5 JP 2009200513 A5 JP2009200513 A5 JP 2009200513A5 JP 2009101474 A JP2009101474 A JP 2009101474A JP 2009101474 A JP2009101474 A JP 2009101474A JP 2009200513 A5 JP2009200513 A5 JP 2009200513A5
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JP
Japan
Prior art keywords
gan
crystal
substrate
island
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009101474A
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English (en)
Japanese (ja)
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JP4964271B2 (ja
JP2009200513A (ja
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Application filed filed Critical
Priority to JP2009101474A priority Critical patent/JP4964271B2/ja
Priority claimed from JP2009101474A external-priority patent/JP4964271B2/ja
Publication of JP2009200513A publication Critical patent/JP2009200513A/ja
Publication of JP2009200513A5 publication Critical patent/JP2009200513A5/ja
Application granted granted Critical
Publication of JP4964271B2 publication Critical patent/JP4964271B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2009101474A 2009-04-17 2009-04-17 GaN系結晶膜の製造方法 Expired - Fee Related JP4964271B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009101474A JP4964271B2 (ja) 2009-04-17 2009-04-17 GaN系結晶膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009101474A JP4964271B2 (ja) 2009-04-17 2009-04-17 GaN系結晶膜の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP13577698A Division JP4390090B2 (ja) 1998-05-18 1998-05-18 GaN系結晶膜の製造方法

Publications (3)

Publication Number Publication Date
JP2009200513A JP2009200513A (ja) 2009-09-03
JP2009200513A5 true JP2009200513A5 (enExample) 2009-11-05
JP4964271B2 JP4964271B2 (ja) 2012-06-27

Family

ID=41143612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009101474A Expired - Fee Related JP4964271B2 (ja) 2009-04-17 2009-04-17 GaN系結晶膜の製造方法

Country Status (1)

Country Link
JP (1) JP4964271B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113539786B (zh) * 2020-04-17 2024-05-28 中国科学院苏州纳米技术与纳米仿生研究所 硅基氮化镓外延结构及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH088217B2 (ja) * 1991-01-31 1996-01-29 日亜化学工業株式会社 窒化ガリウム系化合物半導体の結晶成長方法
JP3352712B2 (ja) * 1991-12-18 2002-12-03 浩 天野 窒化ガリウム系半導体素子及びその製造方法
JPH10265297A (ja) * 1997-03-26 1998-10-06 Shiro Sakai GaNバルク単結晶の製造方法

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