JP2013542591A5 - - Google Patents

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Publication number
JP2013542591A5
JP2013542591A5 JP2013528296A JP2013528296A JP2013542591A5 JP 2013542591 A5 JP2013542591 A5 JP 2013542591A5 JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013542591 A5 JP2013542591 A5 JP 2013542591A5
Authority
JP
Japan
Prior art keywords
adhesive material
supply system
steam supply
line
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013528296A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013542591A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2011/050874 external-priority patent/WO2012033943A2/en
Publication of JP2013542591A publication Critical patent/JP2013542591A/ja
Publication of JP2013542591A5 publication Critical patent/JP2013542591A5/ja
Pending legal-status Critical Current

Links

JP2013528296A 2010-09-08 2011-09-08 インプリント・リソフラフィで用いる蒸気供給システム Pending JP2013542591A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38076010P 2010-09-08 2010-09-08
US61/380,760 2010-09-08
PCT/US2011/050874 WO2012033943A2 (en) 2010-09-08 2011-09-08 Vapor delivery system for use in imprint lithography

Publications (2)

Publication Number Publication Date
JP2013542591A JP2013542591A (ja) 2013-11-21
JP2013542591A5 true JP2013542591A5 (enExample) 2014-10-02

Family

ID=45811164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013528296A Pending JP2013542591A (ja) 2010-09-08 2011-09-08 インプリント・リソフラフィで用いる蒸気供給システム

Country Status (4)

Country Link
US (1) US20120070572A1 (enExample)
JP (1) JP2013542591A (enExample)
KR (1) KR20130105648A (enExample)
WO (1) WO2012033943A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013115208A (ja) * 2011-11-28 2013-06-10 Tokyo Electron Ltd 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法
JP6343937B2 (ja) * 2014-01-10 2018-06-20 デクセリアルズ株式会社 反射防止構造体及びその設計方法
US10921706B2 (en) * 2018-06-07 2021-02-16 Canon Kabushiki Kaisha Systems and methods for modifying mesa sidewalls

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554077A (en) * 1978-10-16 1980-04-21 Tokuyama Soda Co Ltd Vaporizing of high boiling point residue discharged from vinyl chloride monomer production process
JPS6452731A (en) * 1987-08-24 1989-02-28 Mitsubishi Chem Ind Thermal decomposition of dichloroethane
JPH0612801Y2 (ja) * 1989-12-28 1994-04-06 大日本スクリーン製造株式会社 気相表面処理装置
JP3118493B2 (ja) * 1993-04-27 2000-12-18 菱電セミコンダクタシステムエンジニアリング株式会社 液体原料用ｃｖｄ装置
DE19600630A1 (de) * 1996-01-10 1997-07-17 Bayer Ag Verfahren und Vorrichtung zum kontinuierlichen Eindampfen von zähflüssigen, zum Haften neigenden Lösungen und Suspensionen bis zur Trockenmasse
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
JPH11269653A (ja) * 1998-03-26 1999-10-05 Shimadzu Corp 液体材料気化装置
US20030101938A1 (en) * 1998-10-27 2003-06-05 Applied Materials, Inc. Apparatus for the deposition of high dielectric constant films
US6178925B1 (en) * 1999-09-29 2001-01-30 Advanced Technology Materials, Inc. Burst pulse cleaning method and apparatus for liquid delivery system
US6501052B2 (en) * 2000-12-22 2002-12-31 Chrysalis Technologies Incorporated Aerosol generator having multiple heating zones and methods of use thereof
US20030021595A1 (en) * 2001-07-16 2003-01-30 Mindi Xu Apparatus and method for vaporizing a liquid chemical
US20030049933A1 (en) * 2001-09-07 2003-03-13 Applied Materials, Inc. Apparatus for handling liquid precursor material for semiconductor processing
US20060207503A1 (en) * 2005-03-18 2006-09-21 Paul Meneghini Vaporizer and method of vaporizing a liquid for thin film delivery
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8557351B2 (en) * 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
JP2009108387A (ja) * 2007-10-31 2009-05-21 Omron Corp 気化装置
JP5461786B2 (ja) * 2008-04-01 2014-04-02 株式会社フジキン 気化器を備えたガス供給装置
US8697189B2 (en) * 2008-10-21 2014-04-15 Intevac, Inc. Method and apparatus for precision surface modification in nano-imprint lithography
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
US8529778B2 (en) * 2008-11-13 2013-09-10 Molecular Imprints, Inc. Large area patterning of nano-sized shapes

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