JP2013542591A - インプリント・リソフラフィで用いる蒸気供給システム - Google Patents

インプリント・リソフラフィで用いる蒸気供給システム Download PDF

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Publication number
JP2013542591A
JP2013542591A JP2013528296A JP2013528296A JP2013542591A JP 2013542591 A JP2013542591 A JP 2013542591A JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013542591 A JP2013542591 A JP 2013542591A
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JP
Japan
Prior art keywords
adhesive material
reservoir
steam supply
supply system
vaporizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2013528296A
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English (en)
Japanese (ja)
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JP2013542591A5 (enExample
Inventor
イェ，ゼンマオ
ラモス，リック
フレッチャー，エドワード，ビイ
ジョーンズ，クリストファー，イー
ラブレイク，ドゥウェイン，エル
Original Assignee
モレキュラー・インプリンツ・インコーポレーテッド
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Application filed by モレキュラー・インプリンツ・インコーポレーテッド filed Critical モレキュラー・インプリンツ・インコーポレーテッド
Publication of JP2013542591A publication Critical patent/JP2013542591A/ja
Publication of JP2013542591A5 publication Critical patent/JP2013542591A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/02—Moulds or cores; Details thereof or accessories therefor with incorporated heating or cooling means
    • B29C33/04—Moulds or cores; Details thereof or accessories therefor with incorporated heating or cooling means using liquids, gas or steam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2013528296A 2010-09-08 2011-09-08 インプリント・リソフラフィで用いる蒸気供給システム Pending JP2013542591A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38076010P 2010-09-08 2010-09-08
US61/380,760 2010-09-08
PCT/US2011/050874 WO2012033943A2 (en) 2010-09-08 2011-09-08 Vapor delivery system for use in imprint lithography

Publications (2)

Publication Number Publication Date
JP2013542591A true JP2013542591A (ja) 2013-11-21
JP2013542591A5 JP2013542591A5 (enExample) 2014-10-02

Family

ID=45811164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013528296A Pending JP2013542591A (ja) 2010-09-08 2011-09-08 インプリント・リソフラフィで用いる蒸気供給システム

Country Status (4)

Country Link
US (1) US20120070572A1 (enExample)
JP (1) JP2013542591A (enExample)
KR (1) KR20130105648A (enExample)
WO (1) WO2012033943A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013115208A (ja) * 2011-11-28 2013-06-10 Tokyo Electron Ltd 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法
JP6343937B2 (ja) * 2014-01-10 2018-06-20 デクセリアルズ株式会社 反射防止構造体及びその設計方法
US10921706B2 (en) * 2018-06-07 2021-02-16 Canon Kabushiki Kaisha Systems and methods for modifying mesa sidewalls

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554077A (en) * 1978-10-16 1980-04-21 Tokuyama Soda Co Ltd Vaporizing of high boiling point residue discharged from vinyl chloride monomer production process
JPS6452731A (en) * 1987-08-24 1989-02-28 Mitsubishi Chem Ind Thermal decomposition of dichloroethane
JPH0390429U (enExample) * 1989-12-28 1991-09-13
JPH06310444A (ja) * 1993-04-27 1994-11-04 Ryoden Semiconductor Syst Eng Kk 液体原料用ｃｖｄ装置
JPH11269653A (ja) * 1998-03-26 1999-10-05 Shimadzu Corp 液体材料気化装置
US20070017631A1 (en) * 2005-07-22 2007-01-25 Molecular Imprints, Inc. Method for adhering materials together
JP2009108387A (ja) * 2007-10-31 2009-05-21 Omron Corp 気化装置
WO2009122646A1 (ja) * 2008-04-01 2009-10-08 株式会社フジキン 気化器を備えたガス供給装置
US20100098862A1 (en) * 2008-10-21 2010-04-22 Intevac, Inc. Method and apparatus for precision surface modification in nano-imprint lithography
JP2010526426A (ja) * 2007-04-12 2010-07-29 モレキュラー・インプリンツ・インコーポレーテッド 接着プライマー層を利用するインプリント・リソグラフィーのための方法
JP2012507391A (ja) * 2008-10-30 2012-03-29 モレキュラー・インプリンツ・インコーポレーテッド 基板とパターン形成層との間の接着性の促進
JP2012508978A (ja) * 2008-11-13 2012-04-12 モレキュラー・インプリンツ・インコーポレーテッド ナノサイズ形状の大面積パターニング

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19600630A1 (de) * 1996-01-10 1997-07-17 Bayer Ag Verfahren und Vorrichtung zum kontinuierlichen Eindampfen von zähflüssigen, zum Haften neigenden Lösungen und Suspensionen bis zur Trockenmasse
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
US20030101938A1 (en) * 1998-10-27 2003-06-05 Applied Materials, Inc. Apparatus for the deposition of high dielectric constant films
US6178925B1 (en) * 1999-09-29 2001-01-30 Advanced Technology Materials, Inc. Burst pulse cleaning method and apparatus for liquid delivery system
US6501052B2 (en) * 2000-12-22 2002-12-31 Chrysalis Technologies Incorporated Aerosol generator having multiple heating zones and methods of use thereof
US20030021595A1 (en) * 2001-07-16 2003-01-30 Mindi Xu Apparatus and method for vaporizing a liquid chemical
US20030049933A1 (en) * 2001-09-07 2003-03-13 Applied Materials, Inc. Apparatus for handling liquid precursor material for semiconductor processing
US20060207503A1 (en) * 2005-03-18 2006-09-21 Paul Meneghini Vaporizer and method of vaporizing a liquid for thin film delivery

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554077A (en) * 1978-10-16 1980-04-21 Tokuyama Soda Co Ltd Vaporizing of high boiling point residue discharged from vinyl chloride monomer production process
JPS6452731A (en) * 1987-08-24 1989-02-28 Mitsubishi Chem Ind Thermal decomposition of dichloroethane
JPH0390429U (enExample) * 1989-12-28 1991-09-13
JPH06310444A (ja) * 1993-04-27 1994-11-04 Ryoden Semiconductor Syst Eng Kk 液体原料用ｃｖｄ装置
JPH11269653A (ja) * 1998-03-26 1999-10-05 Shimadzu Corp 液体材料気化装置
US20070017631A1 (en) * 2005-07-22 2007-01-25 Molecular Imprints, Inc. Method for adhering materials together
JP2010526426A (ja) * 2007-04-12 2010-07-29 モレキュラー・インプリンツ・インコーポレーテッド 接着プライマー層を利用するインプリント・リソグラフィーのための方法
JP2009108387A (ja) * 2007-10-31 2009-05-21 Omron Corp 気化装置
WO2009122646A1 (ja) * 2008-04-01 2009-10-08 株式会社フジキン 気化器を備えたガス供給装置
US20100098862A1 (en) * 2008-10-21 2010-04-22 Intevac, Inc. Method and apparatus for precision surface modification in nano-imprint lithography
JP2010118136A (ja) * 2008-10-21 2010-05-27 Intevac Inc ナノインプリントリソグラフィーにおける精密表面改質の方法及び装置
JP2012507391A (ja) * 2008-10-30 2012-03-29 モレキュラー・インプリンツ・インコーポレーテッド 基板とパターン形成層との間の接着性の促進
JP2012508978A (ja) * 2008-11-13 2012-04-12 モレキュラー・インプリンツ・インコーポレーテッド ナノサイズ形状の大面積パターニング

Also Published As

Publication number Publication date
WO2012033943A3 (en) 2012-08-16
KR20130105648A (ko) 2013-09-25
WO2012033943A2 (en) 2012-03-15
US20120070572A1 (en) 2012-03-22

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