JP2013533893A5 - - Google Patents
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- Publication number
- JP2013533893A5 JP2013533893A5 JP2013503824A JP2013503824A JP2013533893A5 JP 2013533893 A5 JP2013533893 A5 JP 2013533893A5 JP 2013503824 A JP2013503824 A JP 2013503824A JP 2013503824 A JP2013503824 A JP 2013503824A JP 2013533893 A5 JP2013533893 A5 JP 2013533893A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- self
- norbornene
- imaging
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000642 polymer Polymers 0.000 claims description 20
- 239000000178 monomer Substances 0.000 claims description 9
- 238000003384 imaging method Methods 0.000 claims 12
- 229920001519 homopolymer Polymers 0.000 claims 10
- 238000000034 method Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 238000000671 immersion lithography Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000007848 Bronsted acid Substances 0.000 description 2
- 0 C*(C)C(CN)N Chemical compound C*(C)C(CN)N 0.000 description 2
- KMUUXFHTXINJEK-UHFFFAOYSA-N CC(C1C)C2CC1C(CC(COCC(C(F)(F)F)(C(F)(F)F)O)COCC(C(F)(F)F)(C(F)(F)F)O)C2 Chemical compound CC(C1C)C2CC1C(CC(COCC(C(F)(F)F)(C(F)(F)F)O)COCC(C(F)(F)F)(C(F)(F)F)O)C2 KMUUXFHTXINJEK-UHFFFAOYSA-N 0.000 description 2
- UMJFUIPKJGVJNK-UHFFFAOYSA-N CC(C1C)C2CC1C(CCCCOCC(C(F)(F)F)(C(F)(F)F)O)C2 Chemical compound CC(C1C)C2CC1C(CCCCOCC(C(F)(F)F)(C(F)(F)F)O)C2 UMJFUIPKJGVJNK-UHFFFAOYSA-N 0.000 description 2
- PENPUHOXLBDAOF-UHFFFAOYSA-N CC(C1C)C2CC1C(COCCOCC(C(F)(F)F)(C(F)(F)F)O)C2 Chemical compound CC(C1C)C2CC1C(COCCOCC(C(F)(F)F)(C(F)(F)F)O)C2 PENPUHOXLBDAOF-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- GZJUSRPDKYIOMJ-UHFFFAOYSA-N CC(C1C)C2CC1C(CCOCC(C(F)(F)F)(C(F)(F)F)O)C2 Chemical compound CC(C1C)C2CC1C(CCOCC(C(F)(F)F)(C(F)(F)F)O)C2 GZJUSRPDKYIOMJ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34181010P | 2010-04-05 | 2010-04-05 | |
| US61/341,810 | 2010-04-05 | ||
| PCT/US2011/031178 WO2011127014A1 (en) | 2010-04-05 | 2011-04-05 | Norbornene-type polymers, comositions thereof and lithographic process using such compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013533893A JP2013533893A (ja) | 2013-08-29 |
| JP2013533893A5 true JP2013533893A5 (enExample) | 2014-04-24 |
Family
ID=44710083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013503824A Pending JP2013533893A (ja) | 2010-04-05 | 2011-04-05 | ノルボルネン型ポリマー、それらの組成物、およびこのような組成物を用いたリソグラフィープロセス |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8541523B2 (enExample) |
| EP (1) | EP2556044A1 (enExample) |
| JP (1) | JP2013533893A (enExample) |
| KR (1) | KR20130093483A (enExample) |
| CN (1) | CN102892746A (enExample) |
| WO (1) | WO2011127014A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101247830B1 (ko) * | 2009-09-15 | 2013-03-26 | 도오꾜오까고오교 가부시끼가이샤 | 보호막 형성용 재료 및 포토레지스트 패턴 형성 방법 |
| JP2011227290A (ja) * | 2010-04-20 | 2011-11-10 | Tokyo Ohka Kogyo Co Ltd | 保護膜形成用材料及びレジストパターン形成方法 |
| GB2499663A (en) * | 2012-02-27 | 2013-08-28 | Conductive Inkjet Tech Ltd | Protective coatings for photo-resists that are separately applied with different solvents but removed together using same solvent |
| JP6973082B2 (ja) * | 2015-12-16 | 2021-11-24 | 日本ゼオン株式会社 | 接着型細胞の培養方法 |
| TWI692674B (zh) | 2015-12-31 | 2020-05-01 | 日商住友電木股份有限公司 | 衍生自降莰二烯和馬來酸酐之聚合物及其用途 |
| KR102682124B1 (ko) * | 2018-11-30 | 2024-07-08 | 삼성전자주식회사 | 고분자 화합물, 이를 포함하는 고체 전해질막, 및 상기 고체 전해질막을 포함하는 리튬공기전지 |
| CN109730819B (zh) * | 2019-03-06 | 2020-05-19 | 大连理工大学 | 表面具有疏水结构可降解的药物洗脱支架及制作方法 |
| CN111747966A (zh) * | 2020-06-16 | 2020-10-09 | 徐州博康信息化学品有限公司 | 一种三氟磺酰胺2-氧杂二环[2.2.1]庚烷类光刻胶树脂单体及其制备方法 |
| CN111675720B (zh) * | 2020-06-16 | 2023-01-17 | 徐州博康信息化学品有限公司 | 一种三氟磺酰胺六氢呋喃并[3,2-b]呋喃类光刻胶树脂单体及其制备方法 |
| CN111763160A (zh) * | 2020-06-16 | 2020-10-13 | 徐州博康信息化学品有限公司 | 一种三氟磺酰胺金刚烷类光刻胶树脂单体及其制备方法 |
Family Cites Families (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5219966A (en) * | 1988-05-20 | 1993-06-15 | Monsanto Company | Norbornene dicarboximide polymers |
| MX166210B (es) * | 1988-12-23 | 1992-12-23 | Goodrich Co B F | Procedimiento para obtener un laminado y el laminado asi obtenido |
| JPH0463807A (ja) * | 1990-03-06 | 1992-02-28 | Idemitsu Kosan Co Ltd | ノルボルネン系重合体およびその製造方法ならびに該重合体からなるフィルムおよびその製造方法 |
| JPH04218557A (ja) * | 1990-04-13 | 1992-08-10 | Nippon Zeon Co Ltd | 熱可塑性飽和ノルボルネン系ポリマー成形品 |
| US5677405A (en) * | 1995-05-24 | 1997-10-14 | The B.F. Goodrich Company | Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation |
| FR2748487B1 (fr) * | 1996-05-10 | 1998-07-10 | Elf Antar France | Compositions bitume/polymere a stabilite amelioree et leur application a la realisation de revetements |
| KR100520148B1 (ko) * | 1997-12-31 | 2006-05-12 | 주식회사 하이닉스반도체 | 신규한바이시클로알켄유도체와이를이용한포토레지스트중합체및이중합체를함유한포토레지스트조성물 |
| US6512152B1 (en) * | 1998-07-02 | 2003-01-28 | Nippon Petrochemicals Company, Limited | Tetracyclododecene compositions and process for producing the same |
| CN1847270B (zh) | 1998-10-05 | 2012-05-09 | 普罗米鲁斯有限责任公司 | 含聚合催化剂前体的组合物 |
| US6903171B2 (en) | 1998-10-05 | 2005-06-07 | Promerus, Llc | Polymerized cycloolefins using transition metal catalyst and end products thereof |
| US6420503B1 (en) * | 1999-02-05 | 2002-07-16 | Sumitomo Bakelite Co. Ltd. | Norbornene sulfonamide polymers |
| US6235849B1 (en) * | 1999-02-05 | 2001-05-22 | The B. F. Goodrich Company | Method of preparing norbornene sulfonamide polymers |
| JP2001098035A (ja) * | 1999-09-28 | 2001-04-10 | Nippon Zeon Co Ltd | 不飽和結合を有するノルボルネン系付加共重合体及びノルボルネン系付加重合体の製造方法 |
| JP4923376B2 (ja) * | 2000-04-04 | 2012-04-25 | ダイキン工業株式会社 | 酸反応性基を有する新規なフッ素ポリマーおよびそれを用いた化学増幅型フォトレジスト組成物 |
| US6433113B1 (en) * | 2000-12-07 | 2002-08-13 | Zeon Corporation | Ring-opening metathesis polymerization (ROMP) of cyclo-olefins with molybdenum catalysts |
| US6548219B2 (en) * | 2001-01-26 | 2003-04-15 | International Business Machines Corporation | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions |
| US6509134B2 (en) * | 2001-01-26 | 2003-01-21 | International Business Machines Corporation | Norbornene fluoroacrylate copolymers and process for the use thereof |
| JP2004524564A (ja) | 2001-02-27 | 2004-08-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物 |
| US6858379B2 (en) * | 2001-03-22 | 2005-02-22 | Shipley Company, L.L.C. | Photoresist compositions for short wavelength imaging |
| TW591329B (en) * | 2001-04-21 | 2004-06-11 | Samsung Electronics Co Ltd | Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same |
| WO2003006413A1 (en) * | 2001-07-12 | 2003-01-23 | Daikin Industries, Ltd. | Process for production of fluorine-containing norbornene derivatives |
| JP4242833B2 (ja) * | 2002-07-10 | 2009-03-25 | エルジー・ケム・リミテッド | エステル基又はアセチル基を含むノルボルネン系付加重合体の製造方法 |
| EP1468027B1 (en) * | 2002-12-05 | 2014-05-07 | LG Chem, Ltd. | Method for polymerizing cycloolefin polymer containing polar functional groups and electronic devices employing the polymerized cycloolefins |
| US20040166434A1 (en) * | 2003-02-21 | 2004-08-26 | Dammel Ralph R. | Photoresist composition for deep ultraviolet lithography |
| DE10350685B4 (de) * | 2003-10-30 | 2010-05-27 | Az Electronic Materials Usa Corp. | Fotoresist geeignet zur Verwendung in der 157 nm-Fotolithografie, enthaltend ein Polymer auf Basis von fluorierten Norbornen-Derivaten |
| US20050187398A1 (en) | 2003-10-31 | 2005-08-25 | Andrew Bell | Single component cationic palladium proinitiators for the latent polymerization of cycloolefins |
| JP4525912B2 (ja) * | 2004-01-30 | 2010-08-18 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| US20050192409A1 (en) * | 2004-02-13 | 2005-09-01 | Rhodes Larry F. | Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
| JP4484603B2 (ja) | 2004-03-31 | 2010-06-16 | セントラル硝子株式会社 | トップコート組成物 |
| US7335456B2 (en) | 2004-05-27 | 2008-02-26 | International Business Machines Corporation | Top coat material and use thereof in lithography processes |
| KR100971299B1 (ko) | 2004-07-07 | 2010-07-20 | 프로메러스, 엘엘씨 | 감광성 유전체 수지 조성물 및 그 용도 |
| KR101252976B1 (ko) | 2004-09-30 | 2013-04-15 | 제이에스알 가부시끼가이샤 | 액침 상층막 형성 조성물 |
| KR100574993B1 (ko) | 2004-11-19 | 2006-05-02 | 삼성전자주식회사 | 포토레지스트용 탑 코팅 조성물과 이를 이용한포토레지스트 패턴 형성 방법 |
| EP1853972B1 (en) * | 2005-02-22 | 2011-07-20 | Promerus LLC | Norbornene-type polymers and their manufacture process |
| US7799883B2 (en) * | 2005-02-22 | 2010-09-21 | Promerus Llc | Norbornene-type polymers, compositions thereof and lithographic process using such compositions |
| US7288362B2 (en) * | 2005-02-23 | 2007-10-30 | International Business Machines Corporation | Immersion topcoat materials with improved performance |
| TWI382280B (zh) * | 2005-07-27 | 2013-01-11 | 信越化學工業股份有限公司 | 光阻保護性塗覆材料以及圖形化的方法 |
| KR100740611B1 (ko) | 2005-10-12 | 2007-07-18 | 삼성전자주식회사 | 탑 코팅 막용 고분자, 탑 코팅 용액 조성물 및 이를 이용한이머젼 리소그라피 공정 |
| KR100882315B1 (ko) * | 2006-04-28 | 2009-02-10 | 주식회사 엘지화학 | 루이스 산을 이용한 α-올레핀-아크릴레이트-노보넨 3원공중합체 제조방법 및 이에 의해 제조된 공중합체 |
| TWI403523B (zh) * | 2006-06-26 | 2013-08-01 | Lg Chemical Ltd | 包含極性官能基之富外式環合降冰片烯單體之製備方法,其所製成之聚合物及其製備方法 |
| JP4571598B2 (ja) | 2006-06-27 | 2010-10-27 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| US20080027246A1 (en) * | 2006-07-26 | 2008-01-31 | Andrew Bell | Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers |
| JP4753043B2 (ja) * | 2006-12-19 | 2011-08-17 | 信越化学工業株式会社 | パターン形成方法 |
| EP2139849A4 (en) | 2007-03-23 | 2012-07-04 | Rhodia | METHOD FOR THE PRODUCTION OF AN ACRYLIC MONOMER WITH ONE OR MORE QUATERNARY AMMONIUM GROUPS AND THEIR POLYMERS |
| US7759439B2 (en) * | 2007-03-30 | 2010-07-20 | Promerus Llc | Use of a combination chain transfer and activating agent to control molecular weight and optical density of Pd catalyzed norbornene polymers |
| KR100971066B1 (ko) * | 2007-06-29 | 2010-07-20 | 샌트랄 글래스 컴퍼니 리미티드 | 불소 함유 화합물, 불소 함유 고분자 화합물, 네거티브형레지스트 조성물 및 이것을 사용한 패턴 형성방법 |
| US7662996B2 (en) * | 2007-11-05 | 2010-02-16 | Promerus, Llc | Generation of endo- and/or exo-norbornenecarboxaldehyde as an intermediate to functionalized norbornenes |
| JP5010569B2 (ja) | 2008-01-31 | 2012-08-29 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| JP5228995B2 (ja) * | 2008-03-05 | 2013-07-03 | 信越化学工業株式会社 | 重合性モノマー化合物、パターン形成方法並びにこれに用いるレジスト材料 |
| JP4623324B2 (ja) * | 2008-03-18 | 2011-02-02 | 信越化学工業株式会社 | 水酸基を有する単量体、高分子化合物、レジスト材料及びパターン形成方法 |
| JP5101541B2 (ja) * | 2008-05-15 | 2012-12-19 | 信越化学工業株式会社 | パターン形成方法 |
| EP2204392A1 (en) | 2008-12-31 | 2010-07-07 | Rohm and Haas Electronic Materials LLC | Compositions and processes for photolithography |
| KR101796318B1 (ko) * | 2009-07-31 | 2017-11-09 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물 및 그것에 이용되는 화합물 |
| KR101247830B1 (ko) * | 2009-09-15 | 2013-03-26 | 도오꾜오까고오교 가부시끼가이샤 | 보호막 형성용 재료 및 포토레지스트 패턴 형성 방법 |
| US8580477B2 (en) * | 2009-09-21 | 2013-11-12 | Promerus Llc | Aqueous base-developable negative-tone films based on functionalized norbornene polymers |
-
2011
- 2011-04-04 US US13/079,240 patent/US8541523B2/en not_active Expired - Fee Related
- 2011-04-05 CN CN2011800241233A patent/CN102892746A/zh active Pending
- 2011-04-05 WO PCT/US2011/031178 patent/WO2011127014A1/en not_active Ceased
- 2011-04-05 KR KR1020127029036A patent/KR20130093483A/ko not_active Withdrawn
- 2011-04-05 EP EP11715344A patent/EP2556044A1/en not_active Withdrawn
- 2011-04-05 JP JP2013503824A patent/JP2013533893A/ja active Pending
-
2013
- 2013-08-07 US US13/961,121 patent/US8663904B2/en not_active Expired - Fee Related
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