JP2013516768A5 - - Google Patents

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Publication number
JP2013516768A5
JP2013516768A5 JP2012547231A JP2012547231A JP2013516768A5 JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5 JP 2012547231 A JP2012547231 A JP 2012547231A JP 2012547231 A JP2012547231 A JP 2012547231A JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5
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JP
Japan
Prior art keywords
main surface
polishing
polishing pad
polymer phase
polymer
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JP2012547231A
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English (en)
Japanese (ja)
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JP2013516768A (ja
JP6004941B2 (ja
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Priority claimed from PCT/US2010/062204 external-priority patent/WO2011082155A2/en
Publication of JP2013516768A publication Critical patent/JP2013516768A/ja
Publication of JP2013516768A5 publication Critical patent/JP2013516768A5/ja
Application granted granted Critical
Publication of JP6004941B2 publication Critical patent/JP6004941B2/ja
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JP2012547231A 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法 Active JP6004941B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US29117609P 2009-12-30 2009-12-30
US61/291,176 2009-12-30
PCT/US2010/062204 WO2011082155A2 (en) 2009-12-30 2010-12-28 Polishing pads including phase-separated polymer blend and method of making and using the same

Publications (3)

Publication Number Publication Date
JP2013516768A JP2013516768A (ja) 2013-05-13
JP2013516768A5 true JP2013516768A5 (https=) 2014-02-06
JP6004941B2 JP6004941B2 (ja) 2016-10-12

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ID=44227135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012547231A Active JP6004941B2 (ja) 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法

Country Status (7)

Country Link
US (1) US9162340B2 (https=)
JP (1) JP6004941B2 (https=)
KR (1) KR20120125612A (https=)
CN (1) CN102686362A (https=)
SG (1) SG181678A1 (https=)
TW (1) TWI552832B (https=)
WO (1) WO2011082155A2 (https=)

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US11331767B2 (en) 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
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