JP2013514177A - 真空チャンバー中で硬化させるための電子線硬化性組成物 - Google Patents
真空チャンバー中で硬化させるための電子線硬化性組成物 Download PDFInfo
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- JP2013514177A JP2013514177A JP2012544674A JP2012544674A JP2013514177A JP 2013514177 A JP2013514177 A JP 2013514177A JP 2012544674 A JP2012544674 A JP 2012544674A JP 2012544674 A JP2012544674 A JP 2012544674A JP 2013514177 A JP2013514177 A JP 2013514177A
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- ethylenically unsaturated
- methacrylate
- electron beam
- polymers
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- 230000001588 bifunctional effect Effects 0.000 description 1
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- HXCILVUBKWANLN-UHFFFAOYSA-N brilliant green cation Chemical compound C1=CC(N(CC)CC)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](CC)CC)C=C1 HXCILVUBKWANLN-UHFFFAOYSA-N 0.000 description 1
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- JBTHDAVBDKKSRW-UHFFFAOYSA-N chembl1552233 Chemical compound CC1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 JBTHDAVBDKKSRW-UHFFFAOYSA-N 0.000 description 1
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- XOCUHWXGSSSCTJ-UHFFFAOYSA-N chembl3145171 Chemical compound O=C1C(N=NC=2C=CC=CC=2)=C(C)NN1C1=CC=CC=C1 XOCUHWXGSSSCTJ-UHFFFAOYSA-N 0.000 description 1
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- 125000004093 cyano group Chemical group *C#N 0.000 description 1
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- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
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- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
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- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
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- 239000004645 polyester resin Substances 0.000 description 1
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- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
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- 230000002028 premature Effects 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- FZUOVNMHEAPVBW-UHFFFAOYSA-L quinoline yellow ws Chemical compound [Na+].[Na+].O=C1C2=CC=CC=C2C(=O)C1C1=NC2=C(S([O-])(=O)=O)C=C(S(=O)(=O)[O-])C=C2C=C1 FZUOVNMHEAPVBW-UHFFFAOYSA-L 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 239000004627 regenerated cellulose Substances 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 229960000943 tartrazine Drugs 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010981 turquoise Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920001959 vinylidene polymer Polymers 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
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- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
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- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/08—Homopolymers or copolymers of acrylic acid esters
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
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- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
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Abstract
【解決手段】この組成物は、1つ又は複数の成分を含み、その成分の全てが真空条件下で気相又は蒸気相状態にならない。また、エチレン性不飽和メタクリレートモノマー、又はエチレン性不飽和メタクリレートモノマーとエチレン性不飽和メタクリレートオリゴマーとの組合せからなるエチレン性不飽和成分を有する。エチレン性不飽和成分は、十分な電子線放射の適用によって重合又は架橋することができる。この組成物は、エチレン性不飽和アクリレート成分が実質的に無い状態、重合開始剤が実質的に無い状態、及び溶媒が実質的に無い状態である。この組成物は、アクリレート官能基が無く、メタクリレート官能基の無い1つ又は複数のポリマー、1つ又は複数のワックス、顔料、及び/又は湿潤剤を選択的に更に含む。
Description
a)真空条件下の実質的に無酸素の雰囲気中で基板の表面に液体組成物をコーティングするステップであり、
該組成物が1つ又は複数の成分を含み、その成分の全てが前記真空条件下で気相又は蒸気相状態にならず、
前記組成物は、エチレン性不飽和成分を含んでおり、
前記エチレン性不飽和成分が、本質的に、エチレン性不飽和メタクリレートモノマー、又は、エチレン性不飽和メタクリレートモノマーとエチレン性不飽和メタクリレートオリゴマーとの組合せからなり、
該エチレン性不飽和成分は十分な電子線放射の適用によって重合又は架橋することができ、前記組成物はエチレン性不飽和アクリレート成分が実質的に無い状態、重合開始剤が実質的に無い状態、及び溶媒が実質的に無い状態である上記ステップと、
b)前記液体組成物を、真空条件下の実質的に無酸素の雰囲気中で十分な電子線放射に曝露して、該組成物を重合又は架橋するステップと、
を含む上記方法を提供する。
Claims (24)
- 基板をコーティングするための方法であって、
a)真空条件下の実質的に無酸素の雰囲気中で基板の表面に液体組成物をコーティングするステップであり、前記組成物は1つ又は複数の成分を含み、前記成分の全てが前記真空条件下で気相又は蒸気相状態にならず、前記組成物はエチレン性不飽和成分を含んでおり、前記エチレン性不飽和成分が、本質的に、エチレン性不飽和メタクリレートモノマー、又はエチレン性不飽和メタクリレートモノマーとエチレン性不飽和メタクリレートオリゴマーとの組合せからなり、前記エチレン性不飽和成分は十分な電子線放射の適用によって重合又は架橋することができ、前記組成物はエチレン性不飽和アクリレート成分が実質的に無い状態、重合開始剤が実質的に無い状態、及び溶媒が実質的に無い状態である上記ステップと、
b)前記液体組成物を真空条件下の実質的に無酸素の雰囲気中で十分な電子線放射に曝露して該組成物を重合又は架橋するステップと
を含む上記方法。 - 組成物が、アクリレート官能基が無くメタクリレート官能基が無い1つ又は複数のポリマーを更に含む請求項1に記載の方法。
- 組成物が、ロジンエステル、ロジンエステル誘導体、アクリルポリマー、ウレタンポリマー、エポキシポリマー及びケトンポリマーから選択されるアクリレート官能基もメタクリレート官能基も無い1つ又は複数のポリマーを更に含む請求項1に記載の方法。
- 組成物が、ワックス、顔料、及び/又は湿潤剤の1つ又は複数を更に含む請求項1に記載の方法。
- エチレン性不飽和成分が、約5重量%〜約100重量%のエチレン性不飽和メタクリレートモノマーを含む請求項1に記載の方法。
- エチレン性不飽和成分が、約50重量%〜約70重量%のエチレン性不飽和メタクリレートモノマーを含む請求項1に記載の方法。
- エチレン性不飽和成分が、0重量%より多く約95重量%までのエチレン性不飽和メタクリレートオリゴマーを含む請求項1に記載の方法。
- エチレン性不飽和成分が、約15重量%〜約30重量%のエチレン性不飽和メタクリレートオリゴマーを含む請求項1に記載の方法。
- 組成物が、0重量%より多く約30重量%までのアクリレート官能基もメタクリレート官能基も無い1つ又は複数のポリマーを更に含む請求項1に記載の方法。
- 組成物が、8重量%〜約12重量%のアクリレート官能基もメタクリレート官能基も無い1つ又は複数のポリマーを更に含む請求項1に記載の方法。
- 組成物が、0重量%より多く約3重量%までの量の1つ又は複数のワックスを更に含む請求項1に記載の方法。
- 組成物が、0重量%より多く約30重量%までの量の1つ又は複数の顔料を更に含む請求項1に記載の方法。
- 組成物が、約5重量%〜約10重量%の量の1つ又は複数の顔料を更に含む請求項1に記載の方法。
- 組成物が、100%の前記エチレン性不飽和成分を含む請求項1に記載の方法。
- 液体組成物をローラーコーターによって基板の表面にコーティングするステップを含む請求項1に記載の方法。
- 液体組成物をメニスカスコーターによって基板の表面にコーティングするステップを含む請求項1に記載の方法。
- 基板が、ポリエステル又はポリオレフィンを含む請求項1に記載の方法。
- 基板の表面が、金属を含む請求項1に記載の方法。
- 基板の表面が、アルミニウム、銅、ニッケル、鉄、銀、金、スズ、ステンレススチール、クロム、亜鉛又はそれらの合金若しくは組合せの1つ又は複数を含む金属を含む請求項1に記載の方法。
- 前記液体組成物を十分な電子線放射に曝露するステップが、約1kGy〜約40kGyの電子線量により行われる請求項1に記載の方法。
- 前記液体組成物を十分な電子線放射に曝露するステップが、約7kV〜約15kVの電子線電圧により行われる請求項1に記載の方法。
- ステップa)及びステップb)が、約10−1バール〜約10−5バールの真空及び約0℃〜約80℃の温度で行われる請求項1に記載の方法。
- ステップa)が行われ、その後ステップb)が行われ、ステップa)及びステップb)が前記真空条件を抑制しないで行われる請求項1に記載の方法。
- 真空条件下の実質的に無酸素の雰囲気中で基板の表面に液体組成物をコーティングするのに適する液体組成物であって、前記組成物が1つ又は複数の成分を含み、前記成分の全てが前記真空条件下で気相又は蒸気相状態にならず、前記組成物はエチレン性不飽和成分を含んでおり、前記エチレン性不飽和成分が、本質的に、エチレン性不飽和メタクリレートモノマーとエチレン性不飽和メタクリレートオリゴマーとの組合せからなり、前記エチレン性不飽和成分は十分な電子線放射の適用によって重合又は架橋することができ、前記組成物はエチレン性不飽和アクリレート成分が実質的に無い状態、重合開始剤が実質的に無い状態、及び溶媒が実質的に無い状態であり、前記組成物が、アクリレート官能基が無く、メタクリレート官能基の無い1つ又は複数のポリマーを場合によって更に含み、前記組成物が、1つ又は複数のワックス、顔料、及び/又は湿潤剤を場合によって更に含む上記組成物。
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US12/639,955 US8460762B2 (en) | 2009-12-16 | 2009-12-16 | Electron beam curable composition for curing in a vacuum chamber |
PCT/US2010/060034 WO2011084375A2 (en) | 2009-12-16 | 2010-12-13 | Electron beam curable composition for curing in a vacuum chamber |
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JP (1) | JP5748767B2 (ja) |
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US10531349B2 (en) | 2011-04-05 | 2020-01-07 | Samsung Electronics Co., Ltd. | Method and apparatus for controlling inter-PLMN handover to CSG cell |
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EP2760920B1 (en) | 2011-07-29 | 2018-01-24 | Ideon LLC | A process for curing a composition by electron beam radiation, and by gas-generated plasma and ultraviolet radiation |
CN108977047A (zh) * | 2018-05-23 | 2018-12-11 | 无锡万博涂料化工有限公司 | 一种基于eb固化的卷材涂料 |
CN116981722A (zh) * | 2020-12-23 | 2023-10-31 | 应用材料公司 | 处理用于封装应用的经涂覆的柔性基板的方法 |
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JP2003089164A (ja) * | 2001-09-18 | 2003-03-25 | Toppan Printing Co Ltd | 透明ガスバリア材及びその製造方法 |
JP2005169267A (ja) * | 2003-12-11 | 2005-06-30 | Dainippon Printing Co Ltd | 成膜装置および成膜方法 |
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US5260095A (en) * | 1992-08-21 | 1993-11-09 | Battelle Memorial Institute | Vacuum deposition and curing of liquid monomers |
US5440446A (en) * | 1993-10-04 | 1995-08-08 | Catalina Coatings, Inc. | Acrylate coating material |
KR100508714B1 (ko) * | 1997-08-15 | 2005-08-17 | 코닌클리즈케 디에스엠 엔.브이. | 방사선-경화성 수지 조성물 |
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JP2005238625A (ja) | 2004-02-26 | 2005-09-08 | Toppan Printing Co Ltd | 離型フィルム |
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US7997194B2 (en) * | 2008-06-09 | 2011-08-16 | Ideon Llc | Method of printing and decorating packaging materials with electron beam curable inks |
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JP2003089164A (ja) * | 2001-09-18 | 2003-03-25 | Toppan Printing Co Ltd | 透明ガスバリア材及びその製造方法 |
JP2005169267A (ja) * | 2003-12-11 | 2005-06-30 | Dainippon Printing Co Ltd | 成膜装置および成膜方法 |
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US10531349B2 (en) | 2011-04-05 | 2020-01-07 | Samsung Electronics Co., Ltd. | Method and apparatus for controlling inter-PLMN handover to CSG cell |
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EP2512694A4 (en) | 2014-08-06 |
EP2512694A2 (en) | 2012-10-24 |
WO2011084375A3 (en) | 2011-10-20 |
WO2011084375A8 (en) | 2012-07-26 |
WO2011084375A2 (en) | 2011-07-14 |
CN102665938B (zh) | 2015-03-04 |
BR112012014886A2 (pt) | 2018-05-08 |
JP5748767B2 (ja) | 2015-07-15 |
US8460762B2 (en) | 2013-06-11 |
EP2512694B1 (en) | 2016-06-29 |
BR112012014886B1 (pt) | 2020-04-14 |
US20110143046A1 (en) | 2011-06-16 |
CN102665938A (zh) | 2012-09-12 |
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